Tuesday 20.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
MIRA-STAN
TITAN
UHV-SPM
LITESCOPE-MIRA…
MIRA-EBL
UHV-PLD
UHV-DEPOSITION
UHV-LEEM
RIGAKU3
UHV-PREPARATION
UHV-XPS
SUSS-WETBENCH
nanoCT
MINIFLEX
nano-CT
RSA
RIE-CHLORINE
NANO-ONE-2PP
ICON-SPM
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
STEMI
SNOM-NANONICS
DIENER
RIE-FLUORINE
3D-PRUSA-BLACK
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
SW-BEAMER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
BET-ANAMET
TENUPOL
SW-LAB
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
SW-TRACER
TEST-RFID4
LEICA-TXP
MONOWAVE
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
UHV…
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-CLUSTER
CITOPRESS
ML3-BABY
DSC-DISCOVERY
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
3D-PRUSA-XL
LAKESHORE
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
K70
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
KEITHLEY-4200
IR-RAMAN
FUMEHOOD…
VERIOS
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
KAUFMAN
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
UV-LASER
Polčák, Josef
Kalleshappa, Bindu
Fatima, Areej
Tantis, Iosif
Kramář, Jan
Štindl, Jáchym
S Michalička, Jan
Hrůza, Dominik
Kramář, Jan
Rovenská, Katarína
Dey, Sharmistha
Hrůza, Dominik
Hrůza, Dominik
Thelappurath, Aiswarya Vijayakumar
Hrůza, Dominik
Hrůza, Dominik
Rovenská, Katarína

Upcoming trainings

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Term Name Description Max. attendees
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Patricie Chýlková, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Patricie Chýlková, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1