Monday 19.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-DEPOSITION
UHV-LEEM
UHV-PREPARATION
UHV-XPS
UHV-SPM
MIRA-STAN
UHV…
RIGAKU3
SUSS-RCD8
VERSALAB
UHV-PLD
UHV…
VERIOS
R2-PECVD
UHV-MBE
UHV-FTIR
EVAPORATOR
LITESCOPE-MIRA…
SUSS-WETBENCH
NANOSAM
SUSS-MA8
WOOLLAM-VIS
TITAN
AMBER
MAGNETRON
SHAKER-B1.18
SUMMIT
nanoCT
LaserMIRA
SEE-SYSTEM
RSA
MIRA-EBL
SIMS
PARYLENE-SCS
ICON-SPM
ICON-SPM
SNOM-NANONICS
nano-CT
MINIFLEX
NANO-ONE-2PP
RIE-CHLORINE
3D-PRUSA-ORANGE
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
TEM-SW
RIE-FLUORINE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
DIENER
FISCHIONE-160
NANOCALC
VACUUM-OVEN-B1…
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRASONIC…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
ULTRAFAST-LASER
STEMI
TEST2
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
Test Ondra 3
Test O2
Test školení
UHV-CLUSTER
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-LEIS
NIKON-NANO
ML3-BABY
NANOSCAN
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
ELECTROWORKSHOP
CPD
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
CITOPRESS
PROTOMAT
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
KEITHLEY-4200
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
LASER-DICER
K70
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
LEICACOAT-NANO
IR-RAMAN
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
UV-LASER
Kelarová, Štěpánka
Janů, Lucie
Šik, Ondřej
Přibyl, Roman
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Michlovská, Lenka
Kramář, Jan
U Danchuk, Viktor
Pišťák, Jan
Jakešová, Marie
Song, Yanzhen
U Danchuk, Viktor
U Danchuk, Viktor
Šťastný, Přemysl
Janů, Lucie
U Danchuk, Viktor
U Danchuk, Viktor
Otýpka, Martin
Kramář, Jan
Cmíralová, Marie
U Danchuk, Viktor
Jakešová, Marie
Dubroka, Adam
S Michalička, Jan
Spousta, Jiří
U Prášek, Jan

Upcoming trainings

Show more

Term Name Description Max. attendees
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Patricie Chýlková, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Patricie Chýlková, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1