Wednesday 21.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
MIRA-STAN
DIENER
HELIOS
RIGAKU3
LEICACOAT-STAN
FUMEHOOD…
UHV-LEEM
FUMEHOOD…
FUMEHOOD…
VERIOS
UHV-SPM
FUMEHOOD-HF
MAGNETRON
NIKON-NANO
NANOCALC
UHV-PLD
TITAN
AMBER
ARES
ZEISS-NANO
UHV-XPS
UHV-DEPOSITION
UHV-PREPARATION
ICON-SPM
PARYLENE-SCS
NANO-ONE-2PP
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
STEMI
BET-ANAMET
SW-BEAMER
ICON-SPM
RSA
SNOM-NANONICS
SAW-ACCUTOM
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
MIRKA
SPINCOATER…
MIRA-EBL
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
RIE-FLUORINE
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
SW-LAB
Test školení
SW-TRACER
VUVAS
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
US-CUTTER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
DWL
ULTRASONIC…
LEICA-TXP
THEORY-SUPPORT
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
ULTRAFAST-LASER
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-CLUSTER
UHV…
UHV…
NIRQUEST512
ML3-BABY
NANOSAM
EVAPORATOR
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
VERSALAB
R4…
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
CLARUS-680
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
Micromex
NANOSCAN
KERR-MICROSCOPE
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
HENRY-MAGNET
LIBS-Discovery
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
LIBS-LabSys1
LIBS-FireFly
micro-CT-L240
CHEMLAB-B1.16
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LAURELL-NANO
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
Čechal, Jan
Fatima, Areej
Kubinec, Ondrej
Papež, Nikola
Pavliňák, David
Žaloudková, Lucie
E Zita, Jiří
T Eliáš, Marek
B Man, Ondřej
Wirthová, Michaela
Pavliňák, David
E Zita, Jiří
Hrůza, Dominik
E Zita, Jiří
E Zita, Jiří
T Kicmerova, Dina
Hrůza, Dominik
E Zita, Jiří
Bajwa, Laiba Asad
E Zita, Jiří
E Zita, Jiří
Dey, Sharmistha
T Michalička, Jan
Iakoubovskii, Konstantin
T Lepcio, Petr
E Zita, Jiří
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Patricie Chýlková, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Patricie Chýlková, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1