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VERIOS
MIRA
HELIOS
KRATOS-XPS
LYRA
EVAPORATOR
WOOLLAM-MIR
ICON-SPM
SIMS
3D-PRUSA MK3
RAITH
RAMAN
DRIE
LEICACOAT-STAN
UHV-LEIS
SUMMIT
SUSS-WETBENCH
FISCHIONE-TEM…
PECVD
UHV-DEPOSITION
NANOSAM
TITAN
SUSS-RCD8
UHV-MBE
DWL
3D-PRUSA MK2.5
RIE-FLUORINE
UHV-XPS
VERSALAB
SEE-SYSTEM
RIGAKU3
UHV-SPM
WOOLLAM-VIS
UHV-PREPARATION
DIENER
RIGAKU9
GLOVEBOX
XEF2
SNOM-NANONICS
TERS
PARYLENE
XERION
RIE-CHLORINE
SW-LAB
DICING-SAW
UHV-LEEM
VUVAS
FTIR
JAZ3-CHANNEL
FISCHIONE-170
UHV-PLD
WIRE-BONDER
FISCHIONE-160
NANOCALC
TFP-2
TXP
SW-TRACER
CITOVAC
SW-BEAMER
STEMI
TENUPOL
MPS150
SAW-ACCUTOM
FumeHoodLabwar…
LEICACOAT-NANO
PECVD-NANOFAB
VNA-MPI
TEGRAMIN
FUMEHOOD…
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FumeHood6
ZEISS-Z1M
FLOWBOX
Experimental…
LECTROPOL
FISCHIONE-200
TIC3X
CPD-Autosamdri…
CEITEC-NANO
MECHANICAL…
ALD
NANOINDENTOR
SCIA
ZEISS-A2
KERR-MICROSCOPE
OLYMPUS
SCOPE-VARIO
APCVD
CITOPRESS
LABOTOM5
MOCVD
DEKTAK
SUSS-MA8
MAGNETRON
CRYOGENIC
KAUFMAN
LAKESHORE
LPCVD-SiN
LPCVD-polySi
Litescope
LIBS
LAURELL
LASER-DICER
UHV
KEITHLEY-4200
NIRQUEST512
Bijalwan, Vijay
Alberto Torres Rodríguez, Jorge
Maniš, Jaroslav
Lednický, Tomáš
Kaštyl, Jaroslav
Kolíbal, Miroslav
Švarc, Vojtěch
Liška, Jiří
Jéhn, Zoltán
Liška, Jiří
Hajduček, Jan
Bukvišová, Kristýna
Kolíbal, Miroslav
Hreščak, Jitka
Man, Ondřej
Hreščak, Jitka
Polčák, Josef
Kolíbal, Miroslav
Lednický, Tomáš
Michlíček, Miroslav
Šamořil, Tomáš
Šamořil, Tomáš
Fecko, Peter
Potoček, Michal
Liška, Jiří
Brodský, Jan
Turčan, Igor
Konečný, Aleš
Humlíček, Josef
Jaskowiec, Jiří
Zahradníček, Radim
Bábor, Petr
Bábor, Petr
Fernandez Baldis, Federico
Zita, Jiří
Dhankhar, Meena
Dhankhar, Meena
Kaushik, Preeti
Majerová, Irena
Fecko, Peter
Fecko, Peter
Kaštyl, Jaroslav
Bijalwan, Vijay
Průša, Stanislav
Dóczy, Robert
Pálesch, Erik
Holas, Jiří
Brodský, Jan
Kormoš, Lukáš
Staňo, Michal
Michalička, Jan
Pálesch, Erik
Stanislav, Silvestr
Gablech, Imrich
Potoček, Michal
Lednický, Tomáš
Kormoš, Lukáš
Kiaba, Michal
Polášková, Kateřina
Tinoco Navarro, Lizeth Katherine
Kormoš, Lukáš
Dvořák, Jan
Kormoš, Lukáš

Upcoming trainings

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Term Name Description
27.3. 08:30 - 12:00 Rigaku 9kW - SAXS SAXS training, bring your own samples
27.3. 09:00 - 11:00 Ellipsometry basic Measurement on Woolam V-VASE
27.3. 09:30 - 12:00 ALD - training max. 3 attendees
27.3. 10:00 - 11:30 RCD8 Training MAX 2 attendees (2 PLACES RESERVED)
27.3. 11:00 - 12:30 Critical Point Dryer - CPD Training for Critical Point Dryer - one drying cycle is 90 minutes. Bring your sample for testing. Please go through the instrument manual prior the training (available on instrument page at nano.ceitec.cz
29.3. 09:00 - 13:00 RAMAN training Max 2 attendees. Data acquisiton and data processing.
3.4. 09:00 - 12:00 Verios_basic Verios_basic: training for new users. Max. 5 attendees. Meeting point: at the entrance to the corridor leading towards the StAn labs in in building A.
4.4. 09:00 - 16:00 Helios_basic Helios_basic: training for new users. Max 5 attendees. Prerequisite: Verios_basic training! Meeting point in front of the cleanroom entrance at building A.
9.4. 13:00 - 13:25 Safety excursion - Nanocharacterization lab Limit 10 people per excursion. Meeting point: in front of the CEITEC Nano User Office (room C1.04).
9.4. 13:30 - 14:20 Safety excursion - Nanofabrication lab Limit 5 people per excursion. Meeting point: in front of the CEITEC Nano User Office (room C1.04).
9.4. 14:25 - 14:55 Safety excursion - StAn lab Limit 10 people per excursion. Meeting point: in front of the CEITEC Nano User Office (room C1.04).