Friday 16.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
ML3-BABY
MIRA-STAN
RIE-FLUORINE
AMBER
FTIR
TITAN
R2-PECVD
HELIOS
EVAPORATOR
UHV-SPM
WOOLLAM-RC2
FTIR-CHEMLAB
UHV-XPS
CHEMLAB-B1.14
VERIOS
SNOM-NANONICS
WOOLLAM-VIS
FUMEHOOD-HF
ULTRACENTRIFUGE
LYRA
UHV-DEPOSITION
WITEC-RAMAN
UHV-LEEM
CRYOGENIC
NANOCALC
ICON-SPM
VNA-MPI
WIRE-BONDER
KERR-MICROSCOPE
RIGAKU3
VACUUM-OVEN-B1…
BET-ANAMET
NANO-ONE-2PP
LEICACOAT-STAN
ZWICK
IS-NOVOCONTROL
LEICACOAT-NANO
MAGNETRON
UHV-PREPARATION
VERSALAB
CRYOMILL
LASER-DICER
SUMMIT
SHAKER-B1.18
LaserMIRA
SEE-SYSTEM
3D-PRUSA-BLACK
SIMS
PARYLENE-SCS
Q-LAB
ICON-SPM
PECVD
SAW-ACCUTOM
RTP
ACCURION_RSE
MIRKA
SUSS-RCD8
DIENER
RIE-CHLORINE
MIRA-EBL
MINIFLEX
nanoCT
SPINCOATER…
3D-PRUSA-ORANGE
nano-CT
RSA
TEM-SW
EBPG
STEMI
VACUUM_OVEN-C1…
UHV…
UHV…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
CITOVAC
UHV-PLD
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
RIGAKU9
microCT
ZETASIZER
UHV-CLUSTER
UHV-MBE
SW-BEAMER
Test školení
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID2
UHV-LEIS
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
3D-PRUSA-BLUE
WOOLLAM-MIR
ZEISS-NANO
SPONGEBOB
TIC3X
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
MINIEVAP
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CPD
LEXT
FUMEHOOD…
NANOWIZARD
3D-PRUSA-XL
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
ALD-FIJI
SW-COMSOL
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
FUMEHOOD…
FUMEHOOD…
NMR
SUSS-MA8
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
DEKTAK
LIBS-Discovery
LABOTOM5
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
LIBS-LabSys1
LIBS-FireFly
FUMEHOOD…
FRASCAN
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
NANOINDENTER
LAURELL-NANO
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Henzl, Tomáš
Martyniuk, Oleh
Polčák, Josef
Jadhao, Pranjali
Tantis, Iosif
Hu, Ying
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Henzl, Tomáš
Martyniuk, Oleh
Hu, Ying
Kalleshappa, Bindu
Rotter, Marek
Soldán, Marek
Martyniuk, Oleh
Kratochvílová, Ivana
T Iakoubovskii, Konstantin
Spousta, Jiří
Ščotková, Romana
Beliančínová, Beáta
B Michalička, Jan
S Michalička, Jan
Janů, Lucie
Bolouki, Nima
Bahadur, Fateh
U Man, Ondřej
T Prášek, Jan
Bajwa, Laiba Asad
David, Jiří
D'Angelo, Elena
Nebojsa, Alois
Beliančínová, Beáta
Ramesh, Maneesha
B Lepcio, Petr
Molnár, Tomáš
D'Angelo, Elena
Hu, Ying
Surana, Karan Singh
Kepič, Peter
Dubroka, Adam
Bajwa, Laiba Asad
T Tmejová, Kateřina
Staňo, Michal
D'Angelo, Elena
T Spotz, Zdeněk
Polčák, Josef
Lukiienko, Iryna
Kratochvílová, Ivana
Hrdinová, Sára
Pribytova, Ekaterina
Papež, Nikola
Molnár, Tomáš
de Oliveira Santiago, Pedro Henrique
Hu, Ying
Tantis, Iosif
Dvořák, Vladislav
Gejdoš, Pavel
Fu, Hongbo
Danchuk, Viktor
Hu, Ying
U Prášek, Jan
David, Jiří
Lukiienko, Iryna
Pavliňák, David
Paré Estalella, Franc

Upcoming trainings

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Term Name Description Max. attendees
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 09:00 - 17:30 Amber EDS-EBSD training Attendees: Veronika Mazánová, Dinara Sobola 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Patricie Chýlková, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Patricie Chýlková, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
27.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský 3
29.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1