Sunday 6.7.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
TITAN
RIGAKU3
BET-ANAMET
VERIOS
WOOLLAM-VIS
R2-PECVD
LYRA
UHV-MBE
UHV-XPS
UHV-PREPARATION
UHV-SPM
LAKESHORE
VERSALAB
RAITH
RIGAKU9
BET-DEGASSER
KRATOS-XPS
BRILLOUIN
SAW-ACCUTOM
LaserMIRA
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
SUMMIT
SNOM-NANONICS
SHAKER…
MIRA-STAN
NANOCALC
ULTRACENTRIFUGE
STEMI
ZEISS-NANO
SW-BEAMER
TERS
MIRA-EBL
3D-PRUSA-BLUE
PARYLENE-DIENER
Q-LAB
RTP
ACCURION_RSE
MIRKA
PECVD
SUSS-RCD8
DIENER
3D-PRUSA-ORANGE
SPINCOATER…
RIE-FLUORINE
SW-LAB
3D-PRUSA-BLACK
RIE-CHLORINE
MINIFLEX
nanoCT
RSA
MPS150
Test O2
SW-TRACER
CITOVAC
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV-PLD
VUVAS
VISCOMETER
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ULTRAFAST-LASER
UHV-LEIS
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O1
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-LEEM
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-DEPOSITION
UHV-FTIR
NMR
MONOWAVE
NIRQUEST512
4-POINT
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
FTIRMAG
DIMPLING…
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
DAWN-HELEOS
DRYING_OVEN-B1…
DHR
TEGRAMIN
TUBE-FURNACE
APCVD
NANOWIZARD
ALD
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
DRIE
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CRYOMILL
SW-CT
GLOVEBOX
VNA-MPI
NANOSAM
SUSS-MA8
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
DEKTAK
LITESCOPE-MIRA…
MOCVD
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
ARES
CITOPRESS
NANOSCAN
SUSS-WETBENCH
LITESCOPE-LYRA
PECVD-NANOFAB
SCIA
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LIBS-LabSys1
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
ZETASIZER
S Michalička, Jan
B Roupcová, Pavla
E Tmejová, Kateřina
Mendoza Sandoval, Elizabeth
Mendoza Sandoval, Elizabeth
Blahová, Lucie
Kramář, Jan
S Danchuk, Viktor
Hrůza, Dominik
Varshney, Devanshu
Hrůza, Dominik
Holcman, Vladimír
Arregi Uribeetxebarria, Jon Ander
Mendoza Sandoval, Elizabeth
Varshney, Devanshu
E Tmejová, Kateřina
Tahsin, Muhammad
Delforge, Cyril

Upcoming trainings

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Term Name Description Max. attendees
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
9.7. 13:30 - 15:00 DRS basic training Training will give you knowledge about how to: Operate the measurement system confidently. Prepare appropriate samples for dielectric testing. Attendees: Bindu Kalleshappa, Hongbo Fu 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10