Wednesday 5.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
KRATOS-XPS
TITAN
WITEC-RAMAN
SUSS-WETBENCH
R2-PECVD
LITESCOPE-MIRA…
LVEM
WOOLLAM-RC2
SUSS-MA8
NANOSAM
RIE-FLUORINE
ICON-SPM
NANO-ONE-2PP
LYRA
UHV-DEPOSITION
UHV-LEEM
UHV-XPS
UHV-PLD
UHV-SPM
UHV-PREPARATION
VACUUM_OVEN-C1…
RIGAKU9
BET-ANAMET
ML3-BABY
TUBE-FURNACE
TIC3X
BAMBULAB
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
BET-DEGASSER
NANOCALC
STEMI
SW-BEAMER
PARYLENE-SCS
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
SIMS
SNOM-NANONICS
BRILLOUIN
RIGAKU3
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
Test školení
DIENER
TORNADO-M4
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
MIRA-EBL
TEST2
TEST-RFID2
3D-PRUSA-ORANGE
VISCOMETER
JAZ3-CHANNEL
APCVD-Diffusion
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
L450
DWL
WIRE-BONDER
ALD-BENEQ
XEF2
GLOVEBOX…
MPS150
microCT
ZWICK
ZETASIZER
JASCO
US-CUTTER
TEST-RFID4
ALD-FIJI
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
DISCO-DICING…
UHV-FTIR
UHV-LEIS
ULTRASONIC…
UHV-MBE
NANOWIZARD
APCVD
MAGNETRON-AJA
UHV-CLUSTER
UHV…
UHV…
ARES
ULTRAFAST-LASER
PARYLENE-DIENER
3D-PRUSA-BLACK
VERSALAB
DAWN-HELEOS
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
TEGRAMIN
FUMEHOOD…
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
MINIEVAP
NANOINDENTER
CHEMLAB-B1.14
FUMEHOOD…
FUMEHOOD…
CHEMLAB-B1.18
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
FUMEHOOD-HF
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
CPD
4-POINT
FTIRMAG
FUMEHOOD…
CHEMLAB-B1.16
IS-NOVOCONTROL
3D-PRUSA-BLUE
MONOWAVE
HENRY-MAGNET
MAGNETRON
CEITEC-NANO
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
CITOPRESS
CLR-ISO8-Lab…
NANOSCAN
MECHANICAL…
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
KERR-MICROSCOPE
PROTOMAT
ZEISS-STAN
LAURELL-NANO
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LEXT
LASER-DICER
LIBS-FireFly
CRYOGENIC
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
SW-COMSOL
LEICACOAT-STAN
LPCVD-polySi
LPCVD-SiN
LAKESHORE
UV-LASER
Žaloudková, Lucie
Ulč, Filip
Havlíková, Tereza
Mařák, Vojtěch
Tantis, Iosif
Kelarová, Štěpánka
Kelarová, Štěpánka
Kolíbal, Miroslav
Kolíbalová, Eva
S Michalička, Jan
Kalleshappa, Bindu
Bakhshikhah, Mahan
Liška, Jiří
Supalová, Linda
Bolouki, Nima
Ulč, Filip
Říhová, Martina
Beliančínová, Beáta
Supalová, Linda
S Danchuk, Viktor
Supalová, Linda
B Gablech, Evelína
T Sanna, Michela
S Šamořil, Tomáš
Endstrasser, Zdeněk
Endstrasser, Zdeněk
D'Angelo, Elena
Danchuk, Viktor
Hrůza, Dominik
Endstrasser, Zdeněk
Dey, Sharmistha
U Caha, Ondřej
Tantis, Iosif
Liška, Jiří
Kepič, Peter

Upcoming trainings

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Term Name Description Max. attendees
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS, Karel Škubník 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10