Tuesday 4.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIGAKU3
KRATOS-XPS
RIE-FLUORINE
SUSS-WETBENCH
RIGAKU9
VERIOS
WITEC-RAMAN
MIRA-STAN
NANOSAM
LYRA
TITAN
K70
UHV-DEPOSITION
UHV-LEEM
UHV-XPS
UHV-SPM
BET-ANAMET
SW-CT
UHV-PREPARATION
ML3-BABY
BET-DEGASSER
MPS150
NMR
SPINCOATER…
SEE-SYSTEM
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
SUMMIT
LaserMIRA
ULTRACENTRIFUGE
SHAKER-B1.18
WOOLLAM-VIS
NIRQUEST512
NANOCALC
STEMI
ZEISS-NANO
3D-PRUSA-BLUE
Q-LAB
TEM-SW
RTP
ACCURION_RSE
SAW-ACCUTOM
MIRKA
SUSS-RCD8
PECVD
SW-BEAMER
RSA
PARYLENE-DIENER
RIE-CHLORINE
3D-PRUSA-ORANGE
MINIFLEX
nanoCT
nano-CT
3D-PRUSA-BLACK
DIENER
Test Ondra 3
SW-LAB
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
NIKON-NANO
NANO-ONE-2PP
NANOSCAN
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
VERSALAB
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
CITOPRESS
KERR-MICROSCOPE
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
HENRY-MAGNET
LIBS-FireFly
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
LIBS-Discovery
LAURELL-NANO
CLARUS-680
NANOINDENTER
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
LASER-DICER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
R2-PECVD
UV-LASER
Šťastný, Přemysl
Vijithra, Vijithra
B Caha, Ondřej
Kelarová, Štěpánka
Daradkeh, Samer
Supalová, Linda
Supalová, Linda
T Hrdý, Radim
Supalová, Linda
Arregi Uribeetxebarria, Jon Ander
U Caha, Ondřej
T Kicmerova, Dina
Nghiem, Xuan Duc
Mikerásek, Vojtěch
Kotouček, Jan
Michlovská, Lenka
Paré Estalella, Franc
S Danchuk, Viktor
S Šamořil, Tomáš
S Michalička, Jan
Klusák, Radovan
Endstrasser, Zdeněk
Endstrasser, Zdeněk
D'Angelo, Elena
Hrůza, Dominik
Tantis, Iosif
Kareš, Martin
Endstrasser, Zdeněk
Supalová, Linda
Tantis, Iosif
T Hrdý, Radim
Kotásková, Lucie

Upcoming trainings

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Term Name Description Max. attendees
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS, Karel Škubník 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10