Thursday 6.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
TITAN
VERIOS
UHV-SPM
UHV-PREPARATION
VACUUM_OVEN-C1…
TUBE-FURNACE
UHV-LEEM
FTIR
R2-PECVD
SEE-SYSTEM
WOOLLAM-RC2
LYRA
UHV-PLD
NANOSAM
WITEC-RAMAN
WOOLLAM-MIR
UHV-XPS
MIRA-STAN
UHV-DEPOSITION
LITESCOPE-MIRA…
MINIFLEX
nanoCT
ICON-SPM
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
PARYLENE-SCS
SIMS
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
RIE-CHLORINE
NANO-ONE-2PP
RIE-FLUORINE
PARYLENE-DIENER
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
DIENER
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
STEMI
SUSS-RCD8
FISCHIONE-160
BET-ANAMET
VACUUM-OVEN-B1…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
SW-BEAMER
Test školení
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
AMBER
Test Ondra 3
Test O2
TEST2
TEST-RFID2
UHV-MBE
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
NIKON-NANO
ML3-BABY
NANOSCAN
EVAPORATOR
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
TIC3X
R4…
FLOWBOX
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
CITOPRESS
PROTOMAT
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
LASER-DICER
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
LAURELL-NANO
KEITHLEY-4200
FUMEHOOD…
LEICACOAT-NANO
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Pekárková, Jana
Procházková, Anna
Kolíbal, Miroslav
T Kolíbalová, Eva
Kuběna, Ivo
Devi Thongam, Debika
Hrůza, Dominik
Procházka, Pavel
Dey, Sharmistha
Kepič, Peter
Procházka, Pavel
E Dubroka, Adam
Bolouki, Nima
Bolouki, Nima
E Dubroka, Adam
S Šamořil, Tomáš
Danchuk, Viktor
S Danchuk, Viktor
Bakhshikhah, Mahan
E Dubroka, Adam
D'Angelo, Elena
Ulč, Filip
D'Angelo, Elena
Ulč, Filip

Upcoming trainings

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Term Name Description Max. attendees
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS, Karel Škubník 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10