Monday 15.12.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
LYRA
MIRA-STAN
WITEC-RAMAN
RAITH
MAGNETRON
VERIOS
UHV-DEPOSITION
ICON-SPM
UHV-LEEM
LEICACOAT-STAN
RIE-FLUORINE
UHV-PREPARATION
UHV-XPS
LITESCOPE-MIRA…
SUSS-WETBENCH
TITAN
R2-PECVD
EVAPORATOR
R4…
UHV-SPM
LVEM
RIGAKU3
FTIR
WOOLLAM-VIS
HELIOS
MIRA-EBL
SNOM-NANONICS
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
RSA
SHAKER…
NANOCALC
STEMI
nano-CT
MPS150
nanoCT
MIRKA
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
SAW-ACCUTOM
MINIFLEX
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-CHLORINE
BET-ANAMET
Test O2
SW-BEAMER
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VUVAS
UHV-PLD
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV-MBE
SW-LAB
TGA96
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-LEIS
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-FTIR
NMR
ML3-BABY
NIRQUEST512
FLOWBOX
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
4-POINT
VERSALAB
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
CRYOMILL
TIC3X
micro-CT-L240
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
Micromex
micro-CT-m300
NANOSAM
WOOLLAM-RC2
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
SUSS-MA8
LIBS-Discovery
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-LabSys1
LIBS-FireFly
DAWN-HELEOS
CHEMLAB-B1.16
GLOVEBOX
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LAURELL-NANO
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
UV-LASER
Polčák, Josef
Kalleshappa, Bindu
Souawda, Nada
Beliančínová, Beáta
Kovařík, Martin
Salamon, David
T Šamořil, Tomáš
Cao, Hoang-Anh
Ulč, Filip
Havlíková, Tereza
Varshney, Devanshu
Pavliňák, David
Liška, Jiří
Lišková, Zuzana
Citterberg, Daniel
U Prášek, Jan
Prášek, Jan
Saldan, Ivan
Šťastný, Jakub
Šebestová, Zuzana
Šebestová, Zuzana
Havelka, Tomáš
Mukherjee, Aniket
Šebestová, Zuzana
Šebestová, Zuzana
Cao, Hoang-Anh
U Holas, Jiří
Citterberg, Daniel
Supalová, Linda
Šebestová, Zuzana
Šebestová, Zuzana
Šebestová, Zuzana
Šebestová, Zuzana
Kovařík, Martin
Citterberg, Daniel
Michalička, Jan
Beliančínová, Beáta
Supalová, Linda
Eliáš, Marek
Šebestová, Zuzana
Gaizura, Filip
Kalleshappa, Bindu
Liška, Jiří
Kepič, Peter
Tran, Quynh Nhu Thi

Upcoming trainings

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Term Name Description Max. attendees
12.12. 09:00 - 10:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Grigory Mathew 1
12.12. 09:30 - 12:00 ALD-Fiji-training Attendees: Jozef Štálnik 3
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 09:30 - 12:00 SCIA-training Attendees: Jozef Štálnik, Jakub Vejrosta 3
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Andrej Juríček, Pedro Henrique de Oliveira Santiago 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Pedro Henrique de Oliveira Santiago 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Pedro Henrique de Oliveira Santiago 10
19.12. 13:00 - 16:00 Woollam RC2 Second part of Training Attendees: Ryan Raad 1
6.1. 09:30 - 12:00 DRIE-training Attendees: Kateřina Krajíčková 3
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4