Tuesday 16.12.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
SUSS-WETBENCH
KRATOS-XPS
LYRA
WITEC-RAMAN
R4…
HELIOS
ML3-BABY
UHV-PREPARATION
UHV-LEEM
LITESCOPE-MIRA…
SCIA
ICON-SPM
UHV-SPM
CHEMLAB-B1.18
WOOLLAM-VIS
CHEMLAB-B1.16
CHEMLAB-B1.14
MIRA-STAN
TITAN
UHV-PLD
UHV-LEIS
VERIOS
RIGAKU3
SUSS-RCD8
SUSS-MA8
MAGNETRON
FTIR
SUMMIT
SEE-SYSTEM
LaserMIRA
PECVD
PARYLENE-DIENER
SHAKER…
PARYLENE-SCS
3D-PRUSA-ORANGE
3D-PRUSA-BLACK
3D-PRUSA-BLUE
ULTRACENTRIFUGE
ZEISS-NANO
SIMS
DIENER
MIRKA
SNOM-NANONICS
SAW-ACCUTOM
RSA
nano-CT
nanoCT
MINIFLEX
RIE-CHLORINE
SPINCOATER…
NANOCALC
Q-LAB
RTP
ACCURION_RSE
MIRA-EBL
TENUPOL
STEMI
VACUUM_OVEN-B1…
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VUVAS
UHV-MBE
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV-XPS
UHV-FTIR
BET-ANAMET
Test školení
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID2
UHV-DEPOSITION
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
NMR
MPS150
NIRQUEST512
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUME_HOOD-B1.18
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
MINIEVAP
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUME_HOOD-B1.14
CLARUS-680
NANOSAM
HENRY-MAGNET
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
WOOLLAM-RC2
LIBS-Discovery
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-LabSys1
LIBS-FireFly
Micromex
FRASCAN
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
GLOVEBOX
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
LAURELL-NANO
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
Supalová, Linda
Supalová, Linda
Supalová, Linda
Weisz, Hugo
Supalová, Linda
Supalová, Linda
Kelarová, Štěpánka
Varaďa, Jan
Kalleshappa, Bindu
Kovařík, Martin
Očkovič, Adam
Weisz, Hugo
Mikerásek, Vojtěch
Eliáš, Marek
Bolouki, Nima
Foltýn, Michael
Bahadur, Fateh
Supalová, Linda
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Kovařík, Martin
T Eliáš, Marek
Weisz, Hugo
Jakub, Zdeněk
T Tmejová, Kateřina
Beliančínová, Beáta
T Tmejová, Kateřina
T Tmejová, Kateřina
Sevriugina, Veronika
Michalička, Jan
Danchuk, Viktor
Vaníčková, Elena
Pathak, Saurabh
Bednaříková, Vendula
Supalová, Linda
Supalová, Linda
Prášek, Jan
Beliančínová, Beáta

Upcoming trainings

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Term Name Description Max. attendees
12.12. 09:00 - 10:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Grigory Mathew 1
12.12. 09:30 - 12:00 ALD-Fiji-training Attendees: Jozef Štálnik 3
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 09:30 - 12:00 SCIA-training Attendees: Jozef Štálnik, Jakub Vejrosta 3
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Andrej Juríček, Pedro Henrique de Oliveira Santiago 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Pedro Henrique de Oliveira Santiago 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Pedro Henrique de Oliveira Santiago 10
19.12. 13:00 - 16:00 Woollam RC2 Second part of Training Attendees: Ryan Raad 1
6.1. 09:30 - 12:00 DRIE-training Attendees: Kateřina Krajíčková 3
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4