Sunday 14.12.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-LEEM
UHV-XPS
UHV-PREPARATION
NANOSAM
UHV-SPM
R2-PECVD
LYRA
R4…
UHV…
UHV…
UHV-DEPOSITION
UHV-FTIR
RAITH
UHV-PLD
UHV-MBE
WOOLLAM-VIS
WITEC-RAMAN
MAGNETRON
CRYOGENIC
MIRKA
NIRQUEST512
MINIFLEX
nanoCT
nano-CT
RSA
SNOM-NANONICS
MIRA-EBL
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER…
RIE-CHLORINE
NMR
RIE-FLUORINE
PARYLENE-DIENER
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
PECVD
3D-PRUSA-ORANGE
DIENER
NANOCALC
SUSS-RCD8
3D-PRUSA-BLACK
3D-PRUSA-BLUE
ULTRACENTRIFUGE
ZEISS-NANO
SAW-ACCUTOM
MIRA-STAN
MPS150
STEMI
VACUUM_OVEN-B1…
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
UHV-LEIS
BET-ANAMET
Test O2
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
NANOSCAN
TEST2
UHV-CLUSTER
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
Test Ondra 3
ML3-BABY
CITOPRESS
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
FLOWBOX
VERSALAB
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CRYOMILL
TIC3X
Micromex
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CLARUS-680
micro-CT-L240
MONOWAVE
PROTOMAT
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
LVEM
LAURELL-NANO
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
LIBS-FireFly
LASER-DICER
micro-CT-m300
NANOINDENTER
DAWN-HELEOS
GLOVEBOX
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.14
KEITHLEY-4200
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER
Polčák, Josef
Souawda, Nada
Šebestová, Zuzana
U Danchuk, Viktor
Šebestová, Zuzana
U Danchuk, Viktor
Šebestová, Zuzana
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Beliančínová, Beáta
Souawda, Nada
Eliáš, Marek
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Lišková, Zuzana
U Danchuk, Viktor
U Danchuk, Viktor
Kepič, Peter
Supalová, Linda
U Prášek, Jan
Sobola, Dinara

Upcoming trainings

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Term Name Description Max. attendees
12.12. 09:00 - 10:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Grigory Mathew 1
12.12. 09:30 - 12:00 ALD-Fiji-training Attendees: Jozef Štálnik 3
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 09:30 - 12:00 SCIA-training Attendees: Jozef Štálnik, Jakub Vejrosta 3
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Andrej Juríček, Pedro Henrique de Oliveira Santiago 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Pedro Henrique de Oliveira Santiago 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Pedro Henrique de Oliveira Santiago 10
19.12. 13:00 - 16:00 Woollam RC2 Second part of Training Attendees: Ryan Raad 1
6.1. 09:30 - 12:00 DRIE-training Attendees: Kateřina Krajíčková 3
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4