Friday 14.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
Supalová, Linda
Man, Ondřej
Stará, Veronika
Říhová, Martina
Burda, Daniel
Petruš, Josef
Valadi Palliyalil,…
Jakub, Zdeněk
Michalička, Jan
Pribytova, Ekaterina
Prášek, Jan
Danchuk, Viktor
Pišťák, Jan
Ščasnovič, Erik
Sanna, Carolina
Cuccu, Elisa
Kareš, Martin
Prajzler, Vladimír
Daradkeh, Samer
Tmejová, Kateřina
Sanna, Michela
Šamořil, Tomáš
Vaníčková, Elena
Rusnaková, Nicole
Přibyl, Roman
Žaloudková, Lucie
Mařák, Vojtěch
Skálová, Zdenka
Spousta, Jiří
Iakoubovskii,…
Lee, Hyesung
Fatima, Areej
Valiyev, Rasul
Surana, Karan Singh
Holas, Jiří
T FUMEHOOD-ETCHING
T FUMEHOOD-SOLVENTS-I
T FUMEHOOD-SOLVENTS-II
ALD-FIJI
T SUSS-MA8
U VERIOS
U HELIOS
HELIOS
UHV-XPS
UHV-LEEM
UHV-SPM
JASCO
CHEMLAB-B1.18
VERIOS
EVAPORATOR
B TGA-DISCOVERY
B DSC-DISCOVERY
RIGAKU3
LVEM
UHV-DEPOSITION
UHV-PREPARATION
TITAN
S TITAN
CRYOGENIC
U MAGNETRON
S NANOSAM
TEGRAMIN
MIRA-STAN
WITEC-RAMAN
ICON-SPM
SW-CT
SAW-ACCUTOM
VERSALAB
T BET-ANAMET
T NANO-ONE-2PP
S LYRA
UHV-LEIS
WOOLLAM-RC2
WOOLLAM-RC2
TGA-DISCOVERY
RIGAKU3
JASCO
AMBER
T AMBER
KRATOS-XPS
KRATOS-XPS
KRATOS-XPS
VERIOS
T LEICACOAT-STAN

Upcoming trainings

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Term Name Description Max. attendees
14.8. 13:00 - 13:45 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
14.8. 13:45 - 14:30 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3