Tuesday 13.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
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Bajwa, Laiba Asad
Dinis, Matej
Kepič, Peter
D'Angelo, Elena
paiva de araujo,…
Varga, Dominik
Pribytova, Ekaterina
Jewula, Pawel
Michalička, Jan
Formánek, Šimon
Danchuk, Viktor
Tantis, Iosif
Iakoubovskii,…
Šťastný, Jakub
Bednaříková, Vendula
Máčala, Jakub
Henzl, Tomáš
Allaham, Mohammad
Papež, Nikola
Beliančínová, Beáta
Kolář, David
Švarc, Vojtěch
Nebojsa, Alois
Lišková, Zuzana
Sevriugina, Veronika
Otýpka, Martin
Kostka, Marek
Slovák, Vojtěch
Kovařík, Martin
Dubroka, Adam
Mukherjee, Aniket
Novotná, Lenka
Yuan, Yunhuan
Dey, Sharmistha
Kotásková, Lucie
Lee, Hyesung
Kumar, Sanjay
Cao, Hoang-Anh
Čechal, Jan
Polčák, Josef
Žaloudková, Lucie
Michlovská, Lenka
Daradkeh, Samer
Eliáš, Marek
Šimůnková, Helena
Prášek, Jan
Kalleshappa, Bindu
Tmejová, Kateřina
SUSS-WETBENCH
SUSS-WETBENCH
SUSS-WETBENCH
ML3-BABY
ML3-BABY
EVAPORATOR
PARYLENE-SCS
NIKON-NANO
DIENER
NANOCALC
NANOCALC
LPCVD-polySi
APCVD
WITEC-RAMAN
UHV-PLD
SNOM-NANONICS
ALD-BENEQ
UHV-SPM
UHV-XPS
UHV-DEPOSITION
UHV-PREPARATION
WITEC-RAMAN
RIE-FLUORINE
MPS150
MECHANICAL-WORKSHOP
MECHANICAL-WORKSHOP
VNA-MPI
CRYOGENIC
U NMR
FUMEHOOD-ChemLab-I
TITAN
B TITAN
LEICACOAT-STAN
VERIOS
VERSALAB
VACUUM_OVEN-C1.38
BET-DEGASSER
BET-ANAMET
AMBER
AMBER
WITEC-RAMAN
ICON-SPM
RIGAKU3
LEICACOAT-STAN
T ICON-SPM
B ICON-SPM
SUSS-WETBENCH
ML3-BABY
JAZ3-CHANNEL
LASER-DICER
R2-PECVD
micro-CT-L240
T DEKTAK
T FTIR
RAITH
ZWICK
ALD-FIJI
WIRE-BONDER
L450
NANOSCAN
WOOLLAM-VIS
FUMEHOOD-ChemLab-III
RIGAKU3
LEICACOAT-NANO
WOOLLAM-RC2
NMR
BET-DEGASSER
RIGAKU3
VERIOS
KRATOS-XPS
S KRATOS-XPS
MIRA-STAN
MIRA-STAN
VERSALAB
T RIE-FLUORINE
EVAPORATOR
T EVAPORATOR
RIGAKU3
CRYOMILL

Upcoming trainings

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Term Name Description Max. attendees
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Eduard Jelínek, Marie Cmíralová, Marek Soldán 3
13.10. 10:30 - 11:30 DEKTAK training Attendees: Helena Šimůnková 1
13.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek 2
14.10. 09:00 - 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
14.10. 09:30 - 12:00 ALD-Fiji- training Attendees: Eduard Jelínek, Tomáš Henzl 3
14.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Zequn Zhang, Aneta Opluštilová, Lukáš Dokulil, Martin Kužílek 10
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Aneta Opluštilová 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1