| 12.10. 09:00 - 12:30 |
RAITH training basic 1/3
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RAITH basic training.
Introduction to the RAITH150 Two system and the Electron Optics software. Operation of ZEISS SEM and basic functions.
Attendees:
Marie
Cmíralová
|
1
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| 12.10. 09:30 - 11:00 |
Nikon Nano - optical microscope ISO 5
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Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Bring your typical sample.
Attendees:
Karel
Škubník
|
1
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| 12.10. 15:00 - 17:00 |
SUSS-MA8 training
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Attendees:
Marie
Cmíralová
|
---
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| 13.10. 09:00 - 13:30 |
ARES for DHR users - photorheology
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Initial photorheological training for users experienced with the DHR rheometer.
Attendees:
Ivana
Chamradová
|
2
|
| 13.10. 10:30 - 11:30 |
DEKTAK training
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Attendees:
Helena
Šimůnková
|
1
|
| 13.10. 10:30 - 12:00 |
RIE-flourine-training
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Attendees:
Eduard
Jelínek,
Marie
Cmíralová,
Marek
Soldán,
Sujan
Maity
|
3
|
| 14.10. 09:00 - 17:30 |
Amber
|
SEM-FIB training
Attendees:
Veronika
Mazánová,
Jan
Kramář
|
2
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| 14.10. 09:30 - 12:00 |
ALD-Fiji- training
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Attendees:
Eduard
Jelínek,
Tomáš
Henzl
|
3
|
| 14.10. 10:00 - 13:00 |
DLS-ZetaSizer Part 1
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This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer.
The session will cover:
-An overview of DLS principles, including light scattering and Brownian motion.
-Step-by-step guidance on preparing samples for size and zeta potential measurements.
-The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples.
Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface.
By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization.
Attendees:
Carolina
Sanna
|
3
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| 15.10. 09:00 - 12:30 |
Amber
|
SEM-FIB training
Attendees:
Mahan
Bakhshikhah,
Dinara
Sobola
|
2
|
| 15.10. 09:30 - 16:30 |
MIRA-STAN 1/2
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Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Tadeáš
Lesovský,
Sy Nguyen
Pham,
Sharmistha
Dey
|
4
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| 16.10. 09:00 - 13:00 |
KRATOS-XPS
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Basic training (session 1/2) - max 2 attendees.
In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz.
Attendees:
Tadeáš
Lesovský,
Rosmi
Vinson
|
2
|
| 16.10. 10:00 - 11:30 |
Ultracentrifuge training
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The introduction and manipulation with the ultracentrifuge and rotors
Attendees:
Maneesha
Ramesh
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2
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| 16.10. 13:30 - 16:30 |
Evaporator CZ
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Standard training in Czech
Attendees:
Tomáš
Janoušek,
Kristýna
Kupková
|
2
|
| 19.10. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
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This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6)
Meeting ID: 385 586 219 854 116
Access code: zt6FS25C
Attendees:
David
Neradilek
|
5
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| 20.10. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
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Attendees:
Dominik
Hrůza,
Bindu
Kalleshappa,
Tadeáš
Lesovský,
Tereza
Konečná,
Romana
Ščotková,
Miriama
Malček Šimunková
|
5
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| 20.10. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
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Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Vojtěch
Mikerásek,
David
Neradilek,
Martin
Kužílek
|
5
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| 20.10. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
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Attendees:
Tadeáš
Lesovský,
Karol
Križan,
Lukáš
Dokulil
|
10
|
| 20.10. 14:25 - 14:55 |
Safety excursion - Structural Analysis
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Attendees:
Romana
Ščotková,
Markéta
Šulcová,
Zequn
Zhang,
Aneta
Opluštilová,
Lukáš
Dokulil,
Martin
Kužílek
|
10
|
RIGAKU3
LITESCOPE-MIRA…
TEST2