Monday 12.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-PREPARATION
SUSS-WETBENCH
UHV-XPS
ML3-BABY
SUSS-MA8
RIGAKU3
RIE-FLUORINE
TITAN
MIRA-STAN
VERIOS
UHV-LEEM
UHV-PLD
NANOSAM
AMBER
BET-DEGASSER
CRYOGENIC
UHV-DEPOSITION
UHV-FTIR
LAURELL-NANO
NIKON-NANO
UHV-MBE
RAITH
R2-PECVD
UHV-SPM
UHV…
UHV…
FUMEHOOD…
TUBE-FURNACE
WOOLLAM-VIS
ICON-SPM
JASCO
WITEC-RAMAN
SNOM-NANONICS
IS-NOVOCONTROL
RIE-CHLORINE
MINIFLEX
nanoCT
MIRA-EBL
PARYLENE-SCS
nano-CT
ICON-SPM
RSA
RIGAKU9
SIMS
RTP
DIENER
ZETASIZER
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
microCT
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
LaserMIRA
ACCURION_RSE
ZWICK
SUSS-RCD8
SEE-SYSTEM
VACUUM-OVEN-B1…
SUMMIT
ULTRAFAST-LASER
UHV-MBE1
UHV-MBE2
L450
UHV-LEIS
VISCOMETER
VUVAS
UHV-CLUSTER
ULTRASONIC…
Heliscan
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
TGA-DISCOVERY
THEORY-SUPPORT
SHAKER-B1.18
SW-TRACER
XEF2
NANOCALC
STEMI
WIRE-BONDER
VACUUM-OVEN-B1…
SW-BEAMER
SW-LAB
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
BET-ANAMET
NANO-ONE-2PP
NIRQUEST512
EVAPORATOR
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
VERSALAB
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
NANOSCAN
KERR-MICROSCOPE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
LASER-DICER
MAGNETRON
WOOLLAM-RC2
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
LIBS-FireFly
KEITHLEY-4200
FUMEHOOD…
LEICACOAT-NANO
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Čechal, Jan
Burda, Daniel
Daradkeh, Samer
Fatima, Areej
U Danchuk, Viktor
Molnár, Tomáš
D'Angelo, Elena
Kratochvílová, Ivana
Bajwa, Laiba Asad
Tvrdoňová, Anna
U Danchuk, Viktor
Molnár, Tomáš
Molnár, Tomáš
Kratochvílová, Ivana
Bajwa, Laiba Asad
T Švarc, Vojtěch
Tvrdoňová, Anna
Šťastný, Přemysl
Nghiem, Xuan Duc
Kratochvílová, Ivana
Tvrdoňová, Anna
Kicmerova, Dina
S Michalička, Jan
Nghiem, Xuan Duc
Říhová, Martina
Janík, Filip
Štindl, Jáchym
U Danchuk, Viktor
U Polčák, Josef
U Danchuk, Viktor
Kepič, Peter
U Danchuk, Viktor
U Danchuk, Viktor
Iakoubovskii, Konstantin
Tantis, Iosif
Lukiienko, Iryna
U Danchuk, Viktor
U Danchuk, Viktor
Tvrdoňová, Anna
T Supalová, Linda
U Danchuk, Viktor
T Lišková, Zuzana
Beliančínová, Beáta
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Tvrdoňová, Anna
Kepič, Peter
Dubroka, Adam
B Máčala, Jakub
Cao, Hoang-Anh
Kepič, Peter
Kepič, Peter
Danchuk, Viktor

Upcoming trainings

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Term Name Description Max. attendees
12.10. 09:00 - 12:30 RAITH training basic 1/3 RAITH basic training. Introduction to the RAITH150 Two system and the Electron Optics software. Operation of ZEISS SEM and basic functions. Attendees: Marie Cmíralová 1
12.10. 15:00 - 17:00 SUSS-MA8 training Attendees: Marie Cmíralová ---
13.10. 09:00 - 14.10. 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
13.10. 09:00 - 13:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. 2
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Marie Cmíralová, Sujan Maity 3
13.10. 10:30 - 11:30 DEKTAK training Attendees: Helena Šimůnková 1
14.10. 09:30 - 12:00 ALD-Fiji- training Attendees: Tomáš Henzl 3
14.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek, Kristýna Kupková, Tomáš Henzl 3
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Aneta Opluštilová, Lukáš Dokulil, Martin Kužílek 10