CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
24.9. 09:30 - 12:00	RIE-chlorine-training	Attendees: David Jonathan Walcher	3
25.9. 09:00 - 12:00	Verios/Helios_EDS	Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek	3
25.9. 10:00 - 12:00	ML3-Baby	ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik	1
2.10. 10:00 - 12:00	Witec-Raman	in front of user office Attendees: Karan Singh Surana	4
6.10. 09:00 - 13:00	Verios_basic (1/2)	Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.	3
6.10. 10:00 - 17:00	NANO-ONE-2PP 2/2	Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák	2
7.10. 09:00 - 10:30	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.	1
7.10. 10:30 - 12:00	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.	1
7.10. 12:30 - 14:00	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.	1
19.10. 10:30 - 11:15	Nanofab interview - Meeting room C2.11 or C2.07	This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C	5
20.10. 12:15 - 12:50	Safety excursion - Advanced Chemical lab		5
20.10. 13:00 - 13:50	Safety excursion - Nanofabrication lab	Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).	5
20.10. 13:55 - 14:20	Safety excursion - Nanocharacterization lab		10
20.10. 14:25 - 14:55	Safety excursion - Structural Analysis		10

	0:00	1:00	2:00	3:00	4:00	5:00	6:00	7:00	8:00	9:00	10:00	11:00	12:00	13:00	14:00	15:00	16:00	17:00	18:00	19:00	20:00	21:00	22:00	23:00
KRATOS-XPS
SPONGEBOB
LVEM
FUMEHOOD…
K70
TITAN
EVAPORATOR
LYRA
WITEC-RAMAN
RAITH
LAURELL-NANO
WOOLLAM-VIS
MIRA-EBL
SIMS
ICON-SPM
SNOM-NANONICS
PARYLENE-SCS
NANO-ONE-2PP
SHAKER-B1.18
SEE-SYSTEM
LaserMIRA
SUMMIT
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
RSA
MINIFLEX
nano-CT
MIRKA
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
SAW-ACCUTOM
nanoCT
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
RIE-FLUORINE
RIE-CHLORINE
TENUPOL
LEICA-TXP
Test O2
FISCHIONE-160
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
AMBER
TGA-DISCOVERY
Test Ondra 3
NANOSAM
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV…
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
NIKON-NANO
WOOLLAM-MIR
NANOSCAN
ELECTROWORKSHOP
VERSALAB
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
R4…
CPD
FLOWBOX
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
CITOPRESS
KERR-MICROSCOPE
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
HENRY-MAGNET
LIBS-FireFly
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
ML3-BABY
DSC-DISCOVERY
MONOWAVE
LIBS-Discovery
LASER-DICER
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
R2-PECVD
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
UV-LASER