CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
24.9. 09:30 - 12:00	RIE-chlorine-training	Attendees: David Jonathan Walcher	3
25.9. 09:00 - 12:00	Verios/Helios_EDS	Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek	3
25.9. 10:00 - 12:00	ML3-Baby	ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik	1
2.10. 10:00 - 12:00	Witec-Raman	in front of user office Attendees: Karan Singh Surana	4
6.10. 09:00 - 13:00	Verios_basic (1/2)	Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.	3
6.10. 10:00 - 17:00	NANO-ONE-2PP 2/2	Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák	2
7.10. 09:00 - 10:30	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.	1
7.10. 10:30 - 12:00	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.	1
7.10. 12:30 - 14:00	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.	1
19.10. 10:30 - 11:15	Nanofab interview - Meeting room C2.11 or C2.07	This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C	5
20.10. 12:15 - 12:50	Safety excursion - Advanced Chemical lab		5
20.10. 13:00 - 13:50	Safety excursion - Nanofabrication lab	Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).	5
20.10. 13:55 - 14:20	Safety excursion - Nanocharacterization lab		10
20.10. 14:25 - 14:55	Safety excursion - Structural Analysis		10

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KRATOS-XPS
SUSS-WETBENCH
TITAN
SUSS-MA8
UHV-SPM
K70
NANOINDENTER
SPONGEBOB
RAITH
FUMEHOOD…
UHV-PREPARATION
RIE-FLUORINE
WOOLLAM-VIS
MIRA-EBL
RSA
nano-CT
SNOM-NANONICS
ICON-SPM
NANO-ONE-2PP
PARYLENE-SCS
SIMS
SEE-SYSTEM
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
LaserMIRA
RIE-CHLORINE
nanoCT
PECVD
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
MIRKA
MINIFLEX
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
SW-TRACER
SW-LAB
AMBER
LEICA-TXP
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
TENUPOL
THEORY-SUPPORT
FISCHIONE-160
NANOSCAN
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV-CLUSTER
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
NANOSAM
WOOLLAM-MIR
CITOPRESS
EVAPORATOR
VERSALAB
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
CPD
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
MONOWAVE
PROTOMAT
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
LASER-DICER
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
DEKTAK
LABOTOM5
3D-PRUSA-XL
ML3-BABY
DSC-DISCOVERY
LAURELL-NANO
R2-PECVD
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
LEICACOAT-NANO
KEITHLEY-4200
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER