Tuesday 25.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
FUMEHOOD…
FUMEHOOD…
KRATOS-XPS
ZEISS-NANO
FUMEHOOD…
SUSS-MA8
SUSS-WETBENCH
RIE-FLUORINE
UHV-DEPOSITION
UHV-XPS
PARYLENE-DIENER
UHV-PREPARATION
TITAN
DEKTAK
DIENER
EVAPORATOR
SNOM-NANONICS
MIRA-EBL
ICON-SPM
PARYLENE-SCS
SHAKER-B1.18
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
RSA
NANO-ONE-2PP
nano-CT
MIRKA
NIRQUEST512
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
SAW-ACCUTOM
nanoCT
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SW-TRACER
RIE-CHLORINE
MINIFLEX
SW-LAB
Test Ondra 3
LEICA-TXP
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
TENUPOL
THEORY-SUPPORT
FISCHIONE-160
AMBER
NANOSAM
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
UHV-CLUSTER
NIKON-NANO
ML3-BABY
NANOSCAN
LECTROPOL
VERSALAB
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
ELECTROWORKSHOP
CPD
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
CITOPRESS
PROTOMAT
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
LASER-DICER
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
LAURELL-NANO
R2-PECVD
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
KEITHLEY-4200
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Polčák, Josef
Polčák, Josef
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Jakub, Zdeněk
Jakub, Zdeněk
E Jakešová, Marie
Jakub, Zdeněk
T Kolíbalová, Eva
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie

Upcoming trainings

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Term Name Description Max. attendees
11.8. 15:00 - 7.8. 16:50 CRYOGENIC DCR CRYOGENIK DCR Attendees: Ekaterina Pribytova 1
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, DAVIDE MURTAS 4
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3