Monday 24.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-XPS
UHV-PREPARATION
UHV-DEPOSITION
TITAN
UHV…
UHV-PLD
UHV-MBE
UHV…
UHV-LEEM
UHV-FTIR
UHV-SPM
NANOSAM
PARYLENE-SCS
LaserMIRA
NANOCALC
MIRA-STAN
SHAKER-B1.18
RIE-FLUORINE
SUMMIT
SEE-SYSTEM
ICON-SPM
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
SIMS
SNOM-NANONICS
MIRA-EBL
NANO-ONE-2PP
DIENER
3D-PRUSA-ORANGE
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PARYLENE-DIENER
BET-ANAMET
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
STEMI
FISCHIONE-160
SW-BEAMER
VUVAS
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
US-CUTTER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
DWL
ULTRASONIC…
SW-LAB
Test školení
SW-TRACER
LEICA-TXP
TENUPOL
MONOWAVE
AMBER
Test Ondra 3
Test O2
TEST2
TEST-RFID2
ULTRAFAST-LASER
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-LEIS
UHV-CLUSTER
CITOPRESS
ML3-BABY
DSC-DISCOVERY
EVAPORATOR
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
TIC3X
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
3D-PRUSA-XL
LAKESHORE
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
R2-PECVD
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
LASER-DICER
KEITHLEY-4200
FUMEHOOD…
LEICACOAT-NANO
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
FRASCAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Janů, Lucie
Fatima, Areej
Polčák, Josef
Procházková, Anna
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Horák, Michal
Kolíbalová, Eva
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor

Upcoming trainings

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Term Name Description Max. attendees
11.8. 15:00 - 7.8. 16:50 CRYOGENIC DCR CRYOGENIK DCR Attendees: Ekaterina Pribytova 1
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, DAVIDE MURTAS 4
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3