Tuesday 18.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
TITAN
ICON-SPM
LYRA
PARYLENE-SCS
CRYOGENIC
UHV-XPS
UHV-DEPOSITION
EVAPORATOR
UHV-PREPARATION
HELIOS
MIRA-STAN
WITEC-RAMAN
DIENER
NMR
VERIOS
UHV-LEIS
MIRA-EBL
RSA
NANO-ONE-2PP
SIMS
SNOM-NANONICS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
STEMI
BET-ANAMET
nano-CT
RIE-FLUORINE
nanoCT
TEM-SW
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
MINIFLEX
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SW-LAB
RIE-CHLORINE
SW-BEAMER
Test Ondra 3
SW-TRACER
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
NANOSCAN
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-PLD
UHV-SPM
NANOSAM
ML3-BABY
CITOPRESS
ELECTROWORKSHOP
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
R4…
TIC3X
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
MONOWAVE
LVEM
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
LAURELL-NANO
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
LIBS-FireFly
LASER-DICER
CLARUS-680
NANOINDENTER
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
R2-PECVD
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Beliančínová, Beáta
Polášková, Kateřina
Fatima, Areej
Michalička, Jan
Huang, Yong
Fallahpour, Mojdeh
Fallahpour, Mojdeh
Klíma, Jan
E Jakešová, Marie
Pribytova, Ekaterina
Jakub, Zdeněk
Jakub, Zdeněk
Pribytova, Ekaterina
Jakub, Zdeněk
Vařeka, Karel
Vijithra, Vijithra
paiva de araujo, Estacio
E Jakešová, Marie
B Jewula, Pawel
T Kicmerova, Dina
Vaníčková, Elena

Upcoming trainings

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Term Name Description Max. attendees
6.8. 09:30 - 12:00 NMR training course Use of 60 MHz Magritec NMR spectrometer, preparation samples, basic NMR theory Attendees: Michela Sanna, Lucie Žaloudková 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Muhammad SAHIL, Iosif Tantis 2
7.8. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Attendees: Matej Dinis, Jiří Strnad 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3