Monday 17.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-PREPARATION
KRATOS-XPS
UHV-DEPOSITION
UHV-XPS
UHV-MBE
UHV…
DIENER
UHV-SPM
UHV-PLD
ML3-BABY
UHV-LEIS
LEICACOAT-STAN
UHV-FTIR
R2-PECVD
ICON-SPM
TITAN
MIRA-STAN
UHV-LEEM
UHV…
NMR
NANOSAM
SUSS-WETBENCH
SNOM-NANONICS
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
MIRA-EBL
SPINCOATER…
NIRQUEST512
SIMS
SEE-SYSTEM
NIKON-NANO
LaserMIRA
SUMMIT
SHAKER-B1.18
PARYLENE-SCS
WOOLLAM-VIS
RIE-FLUORINE
MIRKA
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SAW-ACCUTOM
STEMI
ZEISS-NANO
PECVD
TEM-SW
PARYLENE-DIENER
3D-PRUSA-ORANGE
3D-PRUSA-BLACK
3D-PRUSA-BLUE
ULTRACENTRIFUGE
NANOCALC
FISCHIONE-160
BET-ANAMET
VUVAS
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
US-CUTTER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
DWL
ULTRASONIC…
SW-BEAMER
TEST2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
CITOPRESS
AMBER
Test Ondra 3
Test O2
Test školení
ULTRAFAST-LASER
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-CLUSTER
NANOSCAN
NANO-ONE-2PP
MONOWAVE
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
VERSALAB
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CPD
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
DSC-DISCOVERY
CRYOGENIC
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KEITHLEY-4200
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
LASER-DICER
K70
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
LEICACOAT-NANO
IR-RAMAN
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
UV-LASER
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Polčák, Josef
Maity, Sujan
Fatima, Areej
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
U Danchuk, Viktor
paiva de araujo, Estacio
U Danchuk, Viktor
U Danchuk, Viktor
Pribytova, Ekaterina
Vaníčková, Elena
Natarajan, Senthil Nathan
U Danchuk, Viktor
Janů, Lucie
Fallahpour, Mojdeh
Huang, Yong
Natarajan, Senthil Nathan
U Danchuk, Viktor
U Danchuk, Viktor
B Jewula, Pawel
U Danchuk, Viktor
Pribytova, Ekaterina

Upcoming trainings

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Term Name Description Max. attendees
6.8. 09:30 - 12:00 NMR training course Use of 60 MHz Magritec NMR spectrometer, preparation samples, basic NMR theory Attendees: Michela Sanna, Lucie Žaloudková 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Muhammad SAHIL, Iosif Tantis 2
7.8. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Attendees: Matej Dinis, Jiří Strnad 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3