Wednesday 17.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
ML3-BABY
MIRA-STAN
TITAN
SUSS-WETBENCH
RIGAKU3
WITEC-RAMAN
RAITH
UHV-LEEM
LIBS-FireFly
UHV-XPS
UHV-PREPARATION
HELIOS
LAKESHORE
CRYOGENIC
LEICACOAT-STAN
ICON-SPM
UHV-DEPOSITION
FTIR
WOOLLAM-RC2
SUSS-MA8
RIGAKU9
WOOLLAM-MIR
ALD-FIJI
nanoCT
NANOCALC
SHAKER-B1.18
MINIFLEX
SUMMIT
nano-CT
SIMS
LaserMIRA
RSA
MIRA-EBL
SNOM-NANONICS
SEE-SYSTEM
PARYLENE-SCS
ACCURION_RSE
RIE-CHLORINE
TEM-SW
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
RIE-FLUORINE
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
BET-ANAMET
SUSS-RCD8
DIENER
STEMI
AMBER
SW-BEAMER
CITOVAC
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
NIRQUEST512
Test Ondra 3
Test O2
TEST2
Test školení
TGA96
UHV-SPM
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
WOOLLAM-VIS
NANO-ONE-2PP
NIKON-NANO
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
VERSALAB
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
BET-DEGASSER
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
NANOSAM
LVEM
LASER-DICER
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
PROTOMAT
KERR-MICROSCOPE
KEITHLEY-4200
HENRY-MAGNET
MAGNETRON
DEKTAK
LABOTOM5
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
R2-PECVD
K70
FUMEHOOD…
LEICACOAT-NANO
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
FRASCAN
IR-RAMAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
UV-LASER
Polčák, Josef
Procházková, Anna
Jadhao, Pranjali
Sobola, Dinara
T Piastek, Jakub
Supalová, Linda
Supalová, Linda
Žaloudková, Lucie
Havlíková, Tereza
Paredes Sánchez, Claudia
Štindl, Jáchym
T Kolíbalová, Eva
Supalová, Linda
Holobrádek, Jakub
Vijithra, Vijithra
Kalleshappa, Bindu
Ullattil, Sanjay Gopal
Raad, Ryan
Holobrádek, Jakub
Endstrasser, Zdeněk
Zikmundová, Eva
D'Angelo, Elena
Endstrasser, Zdeněk
Foltýn, Michael
Holcman, Vladimír
Slavíček, Radek
Paredes Sánchez, Claudia
Gablech, Evelína
Endstrasser, Zdeněk
E Dubroka, Adam
E Dubroka, Adam
Supalová, Linda
Varshney, Devanshu
E Dubroka, Adam
Supalová, Linda

Upcoming trainings

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Term Name Description Max. attendees
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2
15.6. 10:00 - 11:00 Nikon - optical microscope ISO 5 Training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Martin Otýpka, Kryštof Jasenský 2
16.6. 08:30 - 15:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Hasan Ali 3
17.6. 14:00 - 15:31 ML3-Baby ML3 Baby MicroWriter training Attendees: David Jonathan Walcher 1
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson, Sharmistha Dey 4
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2