Tuesday 16.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
MIRA-STAN
WOOLLAM-RC2
TITAN
VACUUM_OVEN-C1…
RIGAKU9
WITEC-RAMAN
ALD-FIJI
EVAPORATOR
WOOLLAM-VIS
UHV-PREPARATION
UHV-SPM
UHV-PLD
UHV-XPS
MIRA-EBL
UHV-LEEM
HELIOS
UHV-DEPOSITION
VERSALAB
ICON-SPM
CHEMLAB-B1.18
AMBER
SUSS-WETBENCH
RIGAKU3
LAKESHORE
CRYOGENIC
LEICACOAT-STAN
ALD-BENEQ
SEE-SYSTEM
3D-PRUSA-BLACK
SNOM-NANONICS
3D-PRUSA-BLUE
PARYLENE-SCS
SIMS
ULTRACENTRIFUGE
LaserMIRA
nano-CT
SUMMIT
SHAKER-B1.18
ZEISS-NANO
NMR
RSA
3D-PRUSA-ORANGE
nanoCT
SAW-ACCUTOM
ACCURION_RSE
Q-LAB
STEMI
SUSS-RCD8
DIENER
SPINCOATER…
MIRKA
RTP
PECVD
RIE-FLUORINE
RIE-CHLORINE
TEM-SW
PARYLENE-DIENER
MINIFLEX
NANOCALC
NANO-ONE-2PP
BET-ANAMET
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-BEAMER
Test školení
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
NIRQUEST512
TEST2
TEST-RFID2
UHV-CLUSTER
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
Test O2
ML3-BABY
NIKON-NANO
FLOWBOX
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
LYRA
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
FUMEHOOD…
BET-DEGASSER
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
CLARUS-680
NANOSAM
HENRY-MAGNET
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
MAGNETRON
LAURELL-NANO
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-FireFly
LASER-DICER
Micromex
NANOINDENTER
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
R2-PECVD
CHEMLAB-B1.16
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Kelarová, Štěpánka
Polčák, Josef
Jadhao, Pranjali
Sobola, Dinara
Oliver Urrutia, Carolina
Natarajan, Senthil Nathan
Valášek, Daniel
Raad, Ryan
Přibyl, Roman
Heczko, Milan
T Kolíbalová, Eva
Slavíček, Radek
Danchuk, Viktor
Slavíček, Radek
Varshney, Devanshu
Raad, Ryan
Konečný, Martin
Eliáš, Marek
Supalová, Linda
Burda, Daniel
Šimůnková, Helena
S Nebojsa, Alois
Endstrasser, Zdeněk
Hrůza, Dominik
Slavíček, Radek
D'Angelo, Elena
Davidková, Kristyna
Endstrasser, Zdeněk
T Man, Ondřej
Endstrasser, Zdeněk
Danchuk, Viktor
Slavíček, Radek
Danchuk, Viktor
Kolíbalová, Eva
Davidková, Kristyna
Natarajan, Senthil Nathan
Holcman, Vladimír
Slavíček, Radek
Natarajan, Senthil Nathan
Burda, Daniel

Upcoming trainings

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Term Name Description Max. attendees
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2
15.6. 10:00 - 11:00 Nikon - optical microscope ISO 5 Training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Martin Otýpka, Kryštof Jasenský 2
16.6. 08:30 - 15:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Hasan Ali 3
17.6. 14:00 - 15:31 ML3-Baby ML3 Baby MicroWriter training Attendees: David Jonathan Walcher 1
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson, Sharmistha Dey 4
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2