CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
2.3. 09:30 - 10:30	UV marking Laser	Training is focused on the basic operations of the 5W marking UV laser and the connected Lightburn software.	2
4.3. 09:00 - 16:00	GC-MS CLARUS-680 Training	GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová	2
6.3. 10:00 - 12:00	Witec-Raman	in front of user office Attendees: Petr Pazourek, Sujan Maity, Tomáš Janoušek	4
10.3. 09:00 - 12:00	Verios/Helios_EDS	Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak	3
13.3. 09:30 - 12:00	ICON-SPM basic training	Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek	3
17.3. 09:00 - 17:00	Helios_basic (1/2)	Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem	3
27.3. 09:30 - 16:30	MIRA-STAN 1/2	Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ondrej Kubinec	4

	0:00	1:00	2:00	3:00	4:00	5:00	6:00	7:00	8:00	9:00	10:00	11:00	12:00	13:00	14:00	15:00	16:00	17:00	18:00	19:00	20:00	21:00	22:00	23:00
KRATOS-XPS
LVEM
NANOINDENTER
LEICACOAT-STAN
MIRA-STAN
VERIOS
HELIOS
SUSS-WETBENCH
CRYOGENIC
VERSALAB
WOOLLAM-RC2
DEKTAK
RAITH
WITEC-RAMAN
VUVAS
BET-ANAMET
TITAN
WOOLLAM-VIS
ZWICK
CLARUS-680
ICON-SPM
TGA-DISCOVERY
UHV-DEPOSITION
UHV-LEEM
RIE-CHLORINE
UHV-XPS
RIE-FLUORINE
UHV-SPM
DIENER
RIGAKU9
SUSS-MA8
UHV-PREPARATION
RIGAKU3
MAGNETRON
BET-DEGASSER
3D-PRUSA-ORANGE
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
Q-LAB
SHAKER-B1.18
PECVD
SPINCOATER…
NANOCALC
STEMI
SAW-ACCUTOM
PARYLENE-SCS
MIRA-EBL
RTP
SNOM-NANONICS
SUSS-RCD8
RSA
nano-CT
nanoCT
MINIFLEX
TEM-SW
3D-PRUSA-BLACK
MIRKA
PARYLENE-DIENER
ACCURION_RSE
3D-PRUSA-XL
Test Ondra 3
SW-BEAMER
FTIR
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV…
VACUUM_OVEN-B1…
VACUUM_OVEN-B1…
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
SW-LAB
Test školení
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
ULTRACENTRIFUGE
Test O2
TEST2
TEST-RFID2
UHV-PLD
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
3D-PRUSA-BLUE
MONOWAVE
ZEISS-NANO
FLOWBOX
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
LYRA
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
Micromex
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
micro-CT-L240
NMR
LABOTOM5
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-MIR
LIBS-Discovery
ML3-BABY
DSC-DISCOVERY
MPS150
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
LIBS-LabSys1
LIBS-FireFly
micro-CT-m300
CHEMLAB-B1.18
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
IS_NOVOCONTROL
LAURELL-NANO
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER