Monday 2.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
RIGAKU3
UHV-XPS
MIRA-STAN
WITEC-RAMAN
RIE-FLUORINE
VERIOS
LEICACOAT-STAN
RAITH
UHV-PREPARATION
UHV-LEEM
RIE-CHLORINE
VERSALAB
UHV-DEPOSITION
UHV-SPM
CRYOGENIC
MIRA-EBL
ICON-SPM
RIGAKU9
HELIOS
SCIA
LYRA
HENRY-MAGNET
CHEMLAB-B1.18
LASER-DICER
FUMEHOOD…
NANOINDENTER
TITAN
UHV-FTIR
LIBS-FireFly
LVEM
TGA-DISCOVERY
UHV-MBE
VNA-MPI
UHV-PLD
DIENER
ZETASIZER
ULTRACENTRIFUGE
WOOLLAM-VIS
BET-DEGASSER
ML3-BABY
NANOSAM
JASCO
MAGNETRON
SPONGEBOB
UHV…
UHV…
SEE-SYSTEM
PECVD
SHAKER-B1.18
MIRKA
SUMMIT
SAW-ACCUTOM
LaserMIRA
SPINCOATER…
MINIFLEX
SIMS
PARYLENE-SCS
Q-LAB
STEMI
SNOM-NANONICS
RTP
ACCURION_RSE
RSA
SUSS-RCD8
nanoCT
nano-CT
NANOCALC
3D-PRUSA-XL
BET-ANAMET
VACUUM_OVEN-B1…
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
ULTRAFAST-LASER
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ULTRASONIC…
UHV-CLUSTER
SW-BEAMER
PARYLENE-DIENER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
UHV-LEIS
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
TEM-SW
MONOWAVE
3D-PRUSA-ORANGE
R4…
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
Micromex
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CLARUS-680
micro-CT-L240
3D-PRUSA-BLACK
WOOLLAM-MIR
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
DSC-DISCOVERY
LPCVD-polySi
MPS150
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
3D-PRUSA-BLUE
LPCVD-SiN
LITESCOPE-MIRA…
micro-CT-m300
ZEISS-STAN
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
IS_NOVOCONTROL
FISCHIONE-TEM…
LITESCOPE-LYRA
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Delforge, Cyril
Koňařík, Lukáš
Citterberg, Daniel
Štálnik, Jozef
Supalová, Linda
S Polčák, Josef
Jadhao, Pranjali
Polášková, Kateřina
Daradkeh, Samer
Mathew, Grigory
Gejdoš, Pavel
AL Soud, Ammar
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Valadi Palliyalil, Anjali
Mathew, Grigory
Tkachenko, Serhii
Konečný, Martin
Vymazal, Jan
paiva de araujo, Estacio
Koňařík, Lukáš
Citterberg, Daniel
Štálnik, Jozef
Kicmerova, Dina
Tran, Quynh Nhu Thi
Šárfy, Pavlína
Šárfy, Pavlína
Gejdoš, Pavel
Mathew, Grigory
Delforge, Cyril
Citterberg, Daniel
U Weisz, Hugo
U Danchuk, Viktor
U Weisz, Hugo
U Danchuk, Viktor
Idesová, Beáta
Kovařík, Martin
B Danchuk, Viktor
Lukiienko, Iryna
U Danchuk, Viktor
Cohl, Alexandr
U Danchuk, Viktor
Cohl, Alexandr
Arregi Uribeetxebarria, Jon Ander
Klíma, Jan
Štálnik, Jozef
Klíma, Jan
Bahadur, Fateh
Fallahpour, Mojdeh
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Šťastný, Přemysl
Idesová, Beáta
Staňo, Michal
Urbánek, Michal
Tkachenko, Serhii
Delforge, Cyril
Kovařík, Martin
Bensalem, Mohamed
Kolíbalová, Eva
U Danchuk, Viktor
Vozár, Tomáš
S Kolíbalová, Eva
B Petruš, Josef
U Danchuk, Viktor
Urbánek, Michal
U Danchuk, Viktor
Kovařík, Martin
Saldan, Ivan
Kalleshappa, Bindu
Franta, Daniel
Tkachenko, Serhii
Koňařík, Lukáš
U Danchuk, Viktor
U Tmejová, Kateřina
Arregi Uribeetxebarria, Jon Ander
Tvrdoňová, Anna
U Danchuk, Viktor
U Danchuk, Viktor

Upcoming trainings

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Term Name Description Max. attendees
2.3. 09:30 - 10:30 UV marking Laser Training is focused on the basic operations of the 5W marking UV laser and the connected Lightburn software. 2
4.3. 09:00 - 16:00 GC-MS CLARUS-680 Training GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová 2
6.3. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Petr Pazourek, Sujan Maity, Tomáš Janoušek 4
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ondrej Kubinec 4