Saturday 21.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
ICON-SPM
CRYOGENIC
RAITH
VERSALAB
WOOLLAM-VIS
KRATOS-XPS
UHV-XPS
WITEC-RAMAN
RSA
UHV-SPM
3D-PRUSA-XL
nanoCT
nano-CT
MIRA-EBL
SNOM-NANONICS
SEE-SYSTEM
PARYLENE-SCS
SIMS
LaserMIRA
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
MINIFLEX
SUSS-RCD8
RIE-CHLORINE
TEM-SW
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
RIE-FLUORINE
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SW-TRACER
DIENER
SW-LAB
AMBER
LEICA-TXP
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
TENUPOL
Heliscan
FISCHIONE-160
NANOSCAN
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV…
UHV-MBE2
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
NANOSAM
DSC-DISCOVERY
CITOPRESS
FLOWBOX
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
HELIOS
CRYOMILL
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
CLARUS-680
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
Micromex
MONOWAVE
LVEM
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
LAURELL-NANO
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
MPS150
LIBS-FireFly
LASER-DICER
micro-CT-L240
NANOINDENTER
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.14
R2-PECVD
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Weisz, Hugo
Wang, Yue
Lukiienko, Iryna
Idesová, Beáta
Niapos, Eleftherios
Franta, Daniel
Daradkeh, Samer
Hrůza, Dominik
Weisz, Hugo
Sevriugina, Veronika
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
19.2. 09:30 - 12:00 ICON-SPM basic training 3
20.2. 08:30 - 14:30 LYRA advanced training - FIB, GIS, nanomanipulator The training focused on FIB, GIS, and the nanomanipulator. We will meet in the LYRA lab. Attendees: Pavel Klok, Cyril Delforge, Ivana Kratochvílová, Elisa Cuccu 4
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Zuzana Košelová, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Michela Sanna, Ekaterina Pribytova, Sujan Maity 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Michela Sanna, Sujan Maity, Hasan Ali, Tomáš Janoušek, Jan Staněk 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Michela Sanna, Eduard Jelínek, Sujan Maity, Hasan Ali, Tomáš Janoušek 10
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning users Renewing the certificate for long-inactive users. Meeting point at the microscope. Attendees: Michela Sanna, Martin Kovařík 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 5
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4