Friday 20.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
SUSS-WETBENCH
UHV-SPM
UHV-XPS
RIE-FLUORINE
MIRA-STAN
VERSALAB
EVAPORATOR
FUMEHOOD…
ICON-SPM
RAITH
MIRA-EBL
CRYOGENIC
LYRA
ML3-BABY
VERIOS
WOOLLAM-VIS
KERR-MICROSCOPE
SCIA
HELIOS
RSA
ALD-FIJI
UHV-LEEM
UHV-DEPOSITION
UHV-PREPARATION
WOOLLAM-RC2
FUMEHOOD…
ALD-BENEQ
CHEMLAB-B1.14
WITEC-RAMAN
WIRE-BONDER
TORNADO-M4
TITAN
NMR
R2-PECVD
LASER-DICER
FTIR
VNA-MPI
DIENER
JASCO
BET-ANAMET
SEE-SYSTEM
NANOCALC
LaserMIRA
SIMS
SUMMIT
STEMI
SHAKER-B1.18
3D-PRUSA-XL
PARYLENE-SCS
RTP
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
ACCURION_RSE
SNOM-NANONICS
RIGAKU3
SUSS-RCD8
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
SW-BEAMER
TEST2
SW-LAB
VACUUM_OVEN-B1…
ULTRAFAST-LASER
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
3D-PRUSA-ORANGE
Test školení
TGA96
UHV-PLD
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
PARYLENE-DIENER
DSC-DISCOVERY
3D-PRUSA-BLACK
FLOWBOX
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
4-POINT
SW-CT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DRIE
CRYOMILL
micro-CT-m300
BRILLOUIN
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
MECHANICAL…
TIC3X
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
micro-CT-L240
DAWN-HELEOS
3D-PRUSA-BLUE
WOOLLAM-MIR
PROTOMAT
LVEM
HENRY-MAGNET
MAGNETRON
SUSS-MA8
DEKTAK
LABOTOM5
MPS150
LPCVD-SiN
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
LAKESHORE
LPCVD-polySi
TEGRAMIN
FISCHIONE-TEM…
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
KAUFMAN
LITESCOPE-MIRA…
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Polčák, Josef
Kelarová, Štěpánka
Janů, Lucie
Daradkeh, Samer
Kunc, Jan
Štálnik, Jozef
Idesová, Beáta
Niapos, Eleftherios
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Kunc, Jan
Štálnik, Jozef
Krčma, Jakub
Paul, Dabosmita
Valášek, Daniel
Kalleshappa, Bindu
Niapos, Eleftherios
Lukiienko, Iryna
Hrdinová, Sára
Otýpka, Martin
Klíma, Jan
Polášková, Kateřina
Jewula, Pawel
Wang, Yue
Bakhshikhah, Mahan
Idesová, Beáta
Delforge, Cyril
Kunc, Jan
Štálnik, Jozef
Klíma, Jan
Lukiienko, Iryna
T Šamořil, Tomáš
Weisz, Hugo
Citterberg, Daniel
Niapos, Eleftherios
Valadi Palliyalil, Anjali
Lukiienko, Iryna
Franta, Daniel
Lukiienko, Iryna
Niapos, Eleftherios
Bahadur, Fateh
Sevriugina, Veronika
Niapos, Eleftherios
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Janů, Lucie
Jewula, Pawel
Idesová, Beáta
Polášková, Kateřina
paiva de araujo, Estacio
Kunc, Jan
Roupcová, Pavla
T Michalička, Jan
U Jewula, Pawel
Beliančínová, Beáta
Citterberg, Daniel
Janů, Lucie
Klíma, Jan
Idesová, Beáta
Polášková, Kateřina

Upcoming trainings

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Term Name Description Max. attendees
19.2. 09:30 - 12:00 ICON-SPM basic training 3
20.2. 08:30 - 14:30 LYRA advanced training - FIB, GIS, nanomanipulator The training focused on FIB, GIS, and the nanomanipulator. We will meet in the LYRA lab. Attendees: Pavel Klok, Cyril Delforge, Ivana Kratochvílová, Elisa Cuccu 4
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Zuzana Košelová, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Michela Sanna, Ekaterina Pribytova, Sujan Maity 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Michela Sanna, Sujan Maity, Hasan Ali, Tomáš Janoušek, Jan Staněk 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Michela Sanna, Eduard Jelínek, Sujan Maity, Hasan Ali, Tomáš Janoušek 10
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning users Renewing the certificate for long-inactive users. Meeting point at the microscope. Attendees: Michela Sanna, Martin Kovařík 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 5
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4