Friday 13.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
CRYOGENIC
KRATOS-XPS
MIRA-STAN
WITEC-RAMAN
TITAN
VERIOS
UHV-LEEM
RAITH
RIGAKU3
UHV-SPM
UHV-PREPARATION
UHV-DEPOSITION
EVAPORATOR
DIENER
LASER-DICER
VERSALAB
UHV-XPS
LEICACOAT-STAN
HELIOS
WOOLLAM-VIS
ALD-BENEQ
BET-ANAMET
RIGAKU9
BET-DEGASSER
SUMMIT
SHAKER-B1.18
LaserMIRA
SIMS
NANOCALC
STEMI
SNOM-NANONICS
SEE-SYSTEM
ICON-SPM
PARYLENE-SCS
SW-BEAMER
MIRA-EBL
3D-PRUSA-XL
RIE-CHLORINE
RSA
MIRKA
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
SAW-ACCUTOM
nano-CT
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
RIE-FLUORINE
MINIFLEX
nanoCT
SW-LAB
TEST2
SW-TRACER
VACUUM_OVEN-B1…
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
ULTRAFAST-LASER
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
US-CUTTER
UHV…
LEICA-TXP
THEORY-SUPPORT
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
Test školení
TEST-RFID2
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
NMR
DSC-DISCOVERY
NIRQUEST512
4-POINT
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DHR
SW-CT
micro-CT-m300
BRILLOUIN
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
micro-CT-L240
DAWN-HELEOS
NIKON-NANO
WOOLLAM-RC2
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LITESCOPE-MIRA…
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
MPS150
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
SUSS-WETBENCH
LITESCOPE-LYRA
TEGRAMIN
ZEISS-STAN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
SCIA
LIBS-LabSys1
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Klíma, Jan
Lukiienko, Iryna
Polčák, Josef
Fatima, Areej
Pavliňák, David
Tkachenko, Serhii
paiva de araujo, Estacio
Bakhshikhah, Mahan
Jambor, Michal
Kolíbalová, Eva
Bednaříková, Vendula
Jadhao, Pranjali
Šebestová, Zuzana
Krčma, Jakub
T Roupcová, Pavla
Cohl, Alexandr
Šebestová, Zuzana
Šebestová, Zuzana
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
T Kolář, Richard
Slavíček, Radek
Šebestová, Zuzana
Pavliňák, David
Huang, Yong
Franta, Daniel
BUI, Thanh Lam
AL Soud, Ammar
Malecot, Axel Fabien Benoit
AL Soud, Ammar

Upcoming trainings

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Term Name Description Max. attendees
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
12.2. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Martino Pistis, Elisa Cuccu 4
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1