Thursday 12.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
EVAPORATOR
VERIOS
KRATOS-XPS
SUSS-WETBENCH
CRYOGENIC
MIRA-STAN
WITEC-RAMAN
LEICACOAT-STAN
UHV-PREPARATION
DIENER
TITAN
RIE-CHLORINE
SPONGEBOB
HELIOS
UHV-XPS
RIGAKU3
UHV-LEEM
UHV-DEPOSITION
ICON-SPM
PARYLENE-SCS
BET-ANAMET
LEICACOAT-NANO
SUSS-RCD8
WOOLLAM-VIS
VERSALAB
NANOSAM
BET-DEGASSER
BRILLOUIN
RIGAKU9
ML3-BABY
SUSS-MA8
WOOLLAM-RC2
3D-PRUSA-BLACK
STEMI
3D-PRUSA-ORANGE
NANOCALC
SHAKER-B1.18
SW-BEAMER
SUMMIT
3D-PRUSA-BLUE
LaserMIRA
SEE-SYSTEM
SIMS
TEM-SW
PARYLENE-DIENER
SNOM-NANONICS
MIRA-EBL
ACCURION_RSE
RSA
nano-CT
nanoCT
PECVD
MINIFLEX
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
SW-LAB
3D-PRUSA-XL
SW-TRACER
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
ULTRACENTRIFUGE
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
Test O2
DSC-DISCOVERY
ZEISS-NANO
4-POINT
DIMPLING…
DRYING_OVEN-B1…
RAITH
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
SW-CT
micro-CT-L240
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
TORNADO-M4
CRYOMILL
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
Micromex
micro-CT-m300
NMR
MAGNETRON
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
DEKTAK
LIBS-LabSys1
LABOTOM5
WOOLLAM-MIR
MPS150
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
LITESCOPE-LYRA
LIBS-Discovery
DAWN-HELEOS
IS_NOVOCONTROL
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-FireFly
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
UV-LASER
Piastek, Jakub
Fanisaberi, Amirmohsen
Hrdý, Radim
Prášek, Jan
Fanisaberi, Amirmohsen
Hrdý, Radim
Pathak, Saurabh
Valadi Palliyalil, Anjali
Cuccu, Elisa
Vijithra, Vijithra
Fatima, Areej
Přibyl, Roman
Fanisaberi, Amirmohsen
Fanisaberi, Amirmohsen
Hrdý, Radim
Klíma, Jan
Andres Navarro Giraldo, Jorge
T Lepcio, Petr
Fecko, Peter
Mathew, Grigory
Valadi Palliyalil, Anjali
T Holas, Jiří
Bednaříková, Vendula
Šebestová, Zuzana
Idesová, Beáta
Huang, Yong
Idesová, Beáta
Tvrdoňová, Anna
Tran, Quynh Nhu Thi
S Polčák, Josef
Wirthová, Michaela
Šebestová, Zuzana
Šebestová, Zuzana
Slavíček, Radek
Fecko, Peter
AL Soud, Ammar
Yuan, Yunhuan
Hrdý, Radim
Franta, Daniel
Slavíček, Radek
T Danchuk, Viktor
AL Soud, Ammar
Delforge, Cyril
Malecot, Axel Fabien Benoit
Fanisaberi, Amirmohsen
Hrdý, Radim
Přibyl, Roman

Upcoming trainings

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Term Name Description Max. attendees
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
12.2. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Martino Pistis, Elisa Cuccu 4
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1