Monday 7.7.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-PREPARATION
RIGAKU9
UHV-SPM
RIE-FLUORINE
UHV-XPS
KRATOS-XPS
UHV-DEPOSITION
UHV-MBE
RAITH
SUSS-WETBENCH
BET-ANAMET
LYRA
NANOSAM
EVAPORATOR
DIENER
UHV-LEEM
HELIOS
R2-PECVD
UHV-FTIR
UHV…
UHV…
LASER-DICER
HENRY-MAGNET
LVEM
LAKESHORE
ICON-SPM
VERIOS
TITAN
MIRA-STAN
MIRA-EBL
MPS150
KEITHLEY-4200
NANOSCAN
BET-DEGASSER
WITEC-RAMAN
BRILLOUIN
NMR
UHV-PLD
LEICACOAT-STAN
KAUFMAN
RIGAKU3
MINIFLEX
ML3-BABY
VERSALAB
CRYOMILL
MIRKA
SAW-ACCUTOM
SPINCOATER…
nanoCT
SHAKER…
SUMMIT
LaserMIRA
SEE-SYSTEM
RIE-CHLORINE
SIMS
RSA
PARYLENE-SCS
Q-LAB
TERS
SNOM-NANONICS
SUSS-RCD8
ACCURION_RSE
RTP
Test O1
NANOCALC
FTIR
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV-LEIS
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
microCT
ZWICK
ULTRAFAST-LASER
UHV-CLUSTER
STEMI
Test O2
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
PARYLENE-DIENER
UHV-MBE1
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-MBE2
PECVD
MONOWAVE
3D-PRUSA-ORANGE
FUMEHOOD…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD-HF
DIMPLING…
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
DAWN-HELEOS
GLOVEBOX
DRYING_OVEN-B1…
DHR
VNA-MPI
CEITEC-NANO
APCVD
NANOWIZARD
ALD
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
MECHANICAL…
TUBE-FURNACE
DRIE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
SW-CT
TEGRAMIN
PECVD-NANOFAB
3D-PRUSA-BLACK
WOOLLAM-MIR
PROTOMAT
KERR-MICROSCOPE
MAGNETRON
SUSS-MA8
DEKTAK
MOCVD
LABOTOM5
DSC-DISCOVERY
LPCVD-SiN
ARES
CITOPRESS
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
CRYOGENIC
LPCVD-polySi
LEICACOAT-NANO
SCIA
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LITESCOPE-MIRA…
IR-RAMAN
K70
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
ZETASIZER
U Danchuk, Viktor
David, Jiří
David, Jiří
Varshney, Devanshu
Varshney, Devanshu
Varshney, Devanshu
Staňo, Michal
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Peña Espinoza, Francisco Javier
Peña Espinoza, Francisco Javier
Mendoza Sandoval, Elizabeth
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Kelarová, Štěpánka
Blahová, Lucie
Pavliňák, David
U Danchuk, Viktor
David, Jiří
U Danchuk, Viktor
S Danchuk, Viktor
Mendoza Sandoval, Elizabeth
Peña Espinoza, Francisco Javier
Peña Espinoza, Francisco Javier
Mendoza Sandoval, Elizabeth
E Tmejová, Kateřina
E Tmejová, Kateřina
Ju, Xiaohui
Kramář, Jan
U Danchuk, Viktor
Danchuk, Viktor
Bokaei Khelejan, Hatef
Peña Espinoza, Francisco Javier
Saadati, Arezoo
Mendoza Sandoval, Elizabeth
David, Jiří
David, Jiří
Burda, Daniel
Blahová, Lucie
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Arregi Uribeetxebarria, Jon Ander
Staňo, Michal
Říhová, Martina
Holcman, Vladimír
B Gablech, Evelína
Peña Espinoza, Francisco Javier
S Michalička, Jan
Havlíková, Tereza
Mendoza Sandoval, Elizabeth
Citterberg, Daniel
Citterberg, Daniel
Kovařík, Martin
E Tmejová, Kateřina
Mařák, Vojtěch
Delforge, Cyril
Jewula, Pawel
U Danchuk, Viktor
Havlíková, Tereza
Staňo, Michal
Bednaříková, Vendula
T Spotz, Zdeněk
Supalová, Linda
Molnár, Tomáš
Pavliňák, David

Upcoming trainings

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Term Name Description Max. attendees
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
9.7. 13:30 - 15:00 DRS basic training Training will give you knowledge about how to: Operate the measurement system confidently. Prepare appropriate samples for dielectric testing. Attendees: Bindu Kalleshappa, Hongbo Fu 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10