Sunday 6.7.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-PREPARATION
SUSS-WETBENCH
WOOLLAM-VIS
SUSS-MA8
BET-ANAMET
R2-PECVD
LYRA
LAKESHORE
EVAPORATOR
UHV-MBE
UHV-XPS
RIE-FLUORINE
UHV-SPM
RIGAKU3
VERSALAB
RAITH
TITAN
ML3-BABY
RIGAKU9
NANOSCAN
BET-DEGASSER
BRILLOUIN
KRATOS-XPS
DIENER
SNOM-NANONICS
3D-PRUSA-BLUE
STEMI
NANOCALC
MIRA-STAN
SHAKER…
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
3D-PRUSA-BLACK
PARYLENE-SCS
ICON-SPM
TERS
MIRA-EBL
SUSS-RCD8
RSA
nanoCT
SPINCOATER…
RTP
MINIFLEX
RIE-CHLORINE
ACCURION_RSE
SAW-ACCUTOM
3D-PRUSA-ORANGE
MIRKA
SW-BEAMER
PARYLENE-DIENER
PECVD
Q-LAB
MPS150
SW-LAB
FTIR
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV-LEIS
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
UHV-PLD
UHV-LEEM
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
ULTRACENTRIFUGE
Test O1
TEST2
Test školení
TGA96
UHV-FTIR
THEORY-SUPPORT
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-DEPOSITION
Test O2
MONOWAVE
ZEISS-NANO
4-POINT
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
FTIRMAG
DHR
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
DAWN-HELEOS
DIMPLING…
DRIE
TEGRAMIN
CEITEC-NANO
APCVD
NANOWIZARD
ALD
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
MECHANICAL…
TUBE-FURNACE
SW-CT
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CRYOMILL
GLOVEBOX
VNA-MPI
NMR
MAGNETRON
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
DEKTAK
LITESCOPE-LYRA
MOCVD
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
ARES
CITOPRESS
NANOSAM
NIRQUEST512
LITESCOPE-MIRA…
LIBS-LabSys1
VERIOS
ZEISS-STAN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
SCIA
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
ZETASIZER
Varshney, Devanshu
Varshney, Devanshu
Fecko, Peter
Supalová, Linda
Mendoza Sandoval, Elizabeth
Fecko, Peter
E Tmejová, Kateřina
Blahová, Lucie
Kramář, Jan
Holcman, Vladimír
Fecko, Peter
S Danchuk, Viktor
Hrůza, Dominik
Fecko, Peter
Hrůza, Dominik
B Roupcová, Pavla
Arregi Uribeetxebarria, Jon Ander
Mendoza Sandoval, Elizabeth
S Michalička, Jan
Supalová, Linda
Varshney, Devanshu
Kovařík, Martin
E Tmejová, Kateřina
Delforge, Cyril
Tahsin, Muhammad

Upcoming trainings

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Term Name Description Max. attendees
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
9.7. 13:30 - 15:00 DRS basic training Training will give you knowledge about how to: Operate the measurement system confidently. Prepare appropriate samples for dielectric testing. Attendees: Bindu Kalleshappa, Hongbo Fu 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10