T
Kicmerova, Dina
Lednický, Tomáš
Jadhao, Pranjali
Kicmerova, Dina
Bokaei Khelejan, Hatef
Mendoza Sandoval, Elizabeth
Koller, Philipp
Koller, Philipp
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Mendoza Sandoval, Elizabeth
Delforge, Cyril
Peña Espinoza, Francisco Javier
Mendoza Sandoval, Elizabeth
Peña Espinoza, Francisco Javier
Piastek, Jakub
Molnár, Tomáš
Niapos, Eleftherios
Lepcio, Petr
Sevriugina, Veronika
Mendoza Sandoval, Elizabeth
Panda, Jaganandha
Mazánová, Veronika
Huang, Yong
Wojewoda, Ondřej
Delforge, Cyril
Mendoza Sandoval, Elizabeth
Peña Espinoza, Francisco Javier
Varshney, Devanshu
Neradilek, David
Pavliňák, David
Mirdamadi Khouzani, Sayed Hossein
Pišťák, Jan
Jyoti, Jyoti
Putz, Stefan
Putz, Stefan
U
Jewula, Pawel
Sevriugina, Veronika
T
Zita, Jiří
Koller, Philipp
Putz, Stefan
S
Gablech, Evelína
Panda, Jaganandha
Koller, Philipp
Švarc, Vojtěch
Buršíková, Vilma
Jewula, Pawel
Arregi Uribeetxebarria, Jon Ander
Říhová, Martina
Arregi Uribeetxebarria, Jon Ander
Holcman, Vladimír
Staňo, Michal
Pišťák, Jan
Blahová, Lucie
Piastek, Jakub
Peña Espinoza, Francisco Javier
Klok, Pavel
Hrůza, Dominik
Supalová, Linda
Koller, Philipp
Bokaei Khelejan, Hatef
Bakhshikhah, Mahan
Wojewoda, Ondřej
Pavliňák, David
Fecko, Peter
Huang, Yong
Patil, Virendra
Danchuk, Viktor
Kramář, Jan
Mendoza Sandoval, Elizabeth
U
Jewula, Pawel
Hrůza, Dominik
S
Polčák, Josef
Danchuk, Viktor
U
Danchuk, Viktor
S
Danchuk, Viktor
Upcoming trainings
| Term |
Name |
Description |
Max. attendees |
| 4.7. 09:30 - 13:30 |
FTIR-CHEMLAB - Hyperion microscope
|
Training on the Hyperion microscope.
Attendees:
Sujit
Deshmukh,
Sanjay
Kumar
|
2
|
| 8.7. 09:30 - 17:00 |
RAITH training 2/4
|
Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay.
Attendees:
Martino
Pistis
|
2
|
| 8.7. 09:30 - 14:00 |
RAITH training 1/4
|
Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph.
Attendees:
Martino
Pistis
|
2
|
| 9.7. 09:00 - 13:30 |
DHR
|
Basic rheology training. Meeting point at the rheometer.
Attendees:
Hongbo
Fu
|
2
|
| 14.7. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Attendees:
Kajal
Sharma,
Sliusar
Iryna
|
5
|
| 15.7. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion.
Attendees:
Anna
Jančík Procházková,
Kajal
Sharma,
Helena
Šimůnková
|
5
|
| 15.7. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Kajal
Sharma,
Sliusar
Iryna
|
5
|
| 15.7. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Anna
Jančík Procházková,
Navaj
Shaikh
|
10
|
| 15.7. 14:25 - 14:55 |
Safety excursion - StAn lab
|
Attendees:
Anna
Jančík Procházková,
Daina Dayana
Arenas Buelvas
|
10
|
| 11.8. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
|
5
|
| 12.8. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion.
|
5
|
| 12.8. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
|
5
|
| 12.8. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
|
10
|
| 12.8. 14:25 - 14:55 |
Safety excursion - StAn lab
|
|
10
|
VERIOS
EVAPORATOR
ICON-SPM