Tuesday 1.7.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
MIRA-STAN
EVAPORATOR
DIENER
LEICACOAT-STAN
KRATOS-XPS
SPONGEBOB
UHV-PREPARATION
UHV-XPS
SUSS-MA8
DEKTAK
HELIOS
UHV-SPM
KAUFMAN
BRILLOUIN
RIE-FLUORINE
SUSS-RCD8
UHV-DEPOSITION
R2-PECVD
LAURELL-NANO
CHEMLAB-B1.18
CHEMLAB-B1.14
TITAN
STEMI
LITESCOPE-LYRA
ZETASIZER
LITESCOPE-MIRA…
SUSS-WETBENCH
CRYOGENIC
FUME_HOOD-B1.18
HENRY-MAGNET
MAGNETRON
ML3-BABY
ARES
NANOSAM
NMR
ULTRACENTRIFUGE
3D-PRUSA-ORANGE
RIGAKU3
SAW-ACCUTOM
LVEM
NANOINDENTER
FUME_HOOD-B1.14
WIRE-BONDER
UHV-LEEM
UHV-MBE
FTIR-CHEMLAB
VISCOMETER
LYRA
RAITH
ULTRAFAST-LASER
RIGAKU9
ALD
VERSALAB
VACUUM_OVEN-C1…
JAZ3-CHANNEL
SEE-SYSTEM
FTIR
SIMS
PARYLENE-SCS
ICON-SPM
CITOVAC
SNOM-NANONICS
TERS
VACUUM_OVEN-B1…
JASCO
MIRA-EBL
VUVAS
RSA
nanoCT
MINIFLEX
RIE-CHLORINE
WITEC-RAMAN
XEF2
microCT
ZWICK
LaserMIRA
DWL
SUMMIT
Test O1
UHV-MBE1
UHV-MBE2
TGA-DISCOVERY
THEORY-SUPPORT
TGA96
UHV…
TEST-RFID2
Test školení
TEST2
UHV…
RTP
UHV-FTIR
Test O2
SHAKER…
Test Ondra 3
FISCHIONE-160
TENUPOL
LEICA-TXP
SW-TRACER
SW-LAB
UHV-LEIS
SW-BEAMER
BET-ANAMET
NANOCALC
UHV-PLD
US-CUTTER
UHV-CLUSTER
ACCURION_RSE
MPS150
Q-LAB
4-POINT
DIMPLING…
DRYING_OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DAWN-HELEOS
DHR
SW-CT
TEGRAMIN
MECHANICAL…
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
VACUUM_OVEN…
CEITEC-NANO
CRYOMILL
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
GLOVEBOX
VNA-MPI
SPINCOATER…
NIRQUEST512
MOCVD
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
CITOPRESS
NANOSCAN
WOOLLAM-VIS
PROTOMAT
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PARYLENE-DIENER
PECVD
MIRKA
KERR-MICROSCOPE
LAKESHORE
PECVD-NANOFAB
FISCHIONE-TEM…
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.16
IS_NOVOCONTROL
ZEISS-STAN
SCIA
IR-RAMAN
LPCVD-SiN
K70
KEITHLEY-4200
LASER-DICER
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LPCVD-polySi
MONOWAVE
T Kicmerova, Dina
Valadi Palliyalil, Anjali
Lednický, Tomáš
Lednický, Tomáš
Vijithra, Vijithra
Izsák, Dávid
Poláková, Veronika
Patil, Virendra
Vijithra, Vijithra
Jyoti, Jyoti
Jakešová, Marie
Koller, Philipp
Bokaei Khelejan, Hatef
Citterberg, Daniel
Koller, Philipp
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Koller, Philipp
Lednický, Tomáš
T Holas, Jiří
Kicmerova, Dina
Jyoti, Jyoti
Kelarová, Štěpánka
Tahsin, Muhammad
Polčák, Josef
Jakešová, Marie
Jakešová, Marie
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Koller, Philipp
Putz, Stefan
Fecko, Peter
Fecko, Peter
Bahadur, Fateh
Bahadur, Fateh
Hrůza, Dominik
Hrůza, Dominik
Staňo, Michal
Staňo, Michal
Delforge, Cyril
Wojewoda, Ondřej
Citterberg, Daniel
Piastek, Jakub
Koller, Philipp
Putz, Stefan
Hrůza, Dominik
Hrůza, Dominik
Blahová, Lucie
Koller, Philipp
Lepcio, Petr
Saldan, Ivan
S Michalička, Jan
Man, Ondřej
Klok, Pavel
Lepcio, Petr
Kramář, Jan
Citterberg, Daniel
T Danchuk, Viktor
Pavliňák, David
Panda, Jaganandha
Lednický, Tomáš
Citterberg, Daniel
Lepcio, Petr
Danchuk, Viktor
U Jewula, Pawel
Saldan, Ivan
Wojewoda, Ondřej
Pišťák, Jan
Holas, Jiří
Říhová, Martina
Buršíková, Vilma
U Jewula, Pawel
Panda, Jaganandha
S Polčák, Josef
S Danchuk, Viktor
T Lepcio, Petr
Pavliňák, David
Kramář, Jan
Mendoza Sandoval, Elizabeth
Arregi Uribeetxebarria, Jon Ander
Varshney, Devanshu
Mirdamadi Khouzani, Sayed Hossein
Molnár, Tomáš

Upcoming trainings

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Term Name Description Max. attendees
4.7. 09:30 - 13:30 FTIR-CHEMLAB - Hyperion microscope Training on the Hyperion microscope. Attendees: Sujit Deshmukh, Sanjay Kumar 2
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10