Wednesday 14.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
TITAN
SUSS-WETBENCH
LASER-DICER
BET-DEGASSER
VERIOS
DEKTAK
FUMEHOOD…
MAGNETRON
MECHANICAL…
NIKON-NANO
VERSALAB
MIRA-STAN
VACUUM_OVEN-C1…
AMBER
WITEC-RAMAN
R2-PECVD
LYRA
CHEMLAB-B1.18
UHV-XPS
BET-ANAMET
FTIR-CHEMLAB
FUMEHOOD…
ML3-BABY
SNOM-NANONICS
UHV-LEEM
UHV-DEPOSITION
PARYLENE-SCS
FUMEHOOD…
FUMEHOOD…
CRYOGENIC
FUMEHOOD…
ICON-SPM
NANOCALC
IS-NOVOCONTROL
EVAPORATOR
UHV-SPM
SCIA
DIENER
ZETASIZER
KRATOS-XPS
ULTRACENTRIFUGE
ALD-FIJI
WOOLLAM-VIS
VUVAS
RAITH
RIGAKU3
SUSS-RCD8
LEICACOAT-STAN
NANOSAM
RIE-FLUORINE
SUSS-MA8
DHR
UHV-PREPARATION
WOOLLAM-RC2
nano-CT
SAW-ACCUTOM
SPINCOATER…
STEMI
RSA
Q-LAB
RTP
MIRA-EBL
ACCURION_RSE
ICON-SPM
SHAKER-B1.18
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
nanoCT
MINIFLEX
RIE-CHLORINE
SW-BEAMER
TEST-RFID2
SW-LAB
CITOVAC
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
UHV…
UHV-CLUSTER
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
PECVD
TGA96
UHV-PLD
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
MIRKA
NANO-ONE-2PP
TEM-SW
R4…
DRIE
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
HELIOS
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
SW-CT
TIC3X
micro-CT-L240
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
CPD
BRILLOUIN
TORNADO-M4
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
Micromex
micro-CT-m300
3D-PRUSA-ORANGE
3D-PRUSA-XL
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
LPCVD-polySi
MONOWAVE
CITOPRESS
NANOSCAN
NIRQUEST512
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LPCVD-SiN
LITESCOPE-MIRA…
DAWN-HELEOS
ZEISS-STAN
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
FISCHIONE-TEM…
LITESCOPE-LYRA
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
UV-LASER
U Michalička, Jan
Michalička, Jan
B Michalička, Jan
S Michalička, Jan
E Zita, Jiří
Otýpka, Martin
Liška, Jiří
T Potoček, Michal
Papež, Nikola
Paré Estalella, Franc
Lee, Hyesung
Tantis, Iosif
Šťastný, Jakub
Štindl, Jáchym
Kratochvílová, Ivana
Otýpka, Martin
Sanna, Michela
Sanna, Michela
Otýpka, Martin
U Prášek, Jan
Varga, Dominik
Varga, Dominik
E Zita, Jiří
Dinis, Matej
Dey, Sharmistha
Daradkeh, Samer
Žaloudková, Lucie
Žaloudková, Lucie
Dey, Sharmistha
Lukiienko, Iryna
Iakoubovskii, Konstantin
T Iakoubovskii, Konstantin
Dey, Sharmistha
paiva de araujo, Estacio
Beliančínová, Beáta
Bolouki, Nima
Řepa, Rostislav
Švarc, Vojtěch
Sanna, Michela
Sanna, Michela
Molnár, Tomáš
Molnár, Tomáš
Tantis, Iosif
Lee, Hyesung
Michlovská, Lenka
Michlovská, Lenka
E Zita, Jiří
Otýpka, Martin
Kepič, Peter
Molnár, Tomáš
D'Angelo, Elena
Bajwa, Laiba Asad
E Zita, Jiří
E Zita, Jiří
Lukiienko, Iryna
U Jewula, Pawel
Šťastný, Jakub
E Zita, Jiří
Danchuk, Viktor
Eliáš, Marek
D'Angelo, Elena
Otýpka, Martin
E Zita, Jiří
T Sanna, Michela
S Polčák, Josef
S Tmejová, Kateřina
T Eliáš, Marek
Dubroka, Adam
Franta, Daniel
Lišková, Zuzana
Kalleshappa, Bindu
E Zita, Jiří
Kalleshappa, Bindu
Staňo, Michal
Piastek, Jakub
E Zita, Jiří
Kreuzerová, Monika
Molnár, Tomáš
Franta, Daniel

Upcoming trainings

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Term Name Description Max. attendees
14.10. 09:00 - 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
14.10. 09:30 - 12:00 ALD-Fiji- training Attendees: Eduard Jelínek, Tomáš Henzl 3
14.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Patricie Chýlková, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Patricie Chýlková, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1