Wednesday 19.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
MIRA-STAN
SUSS-WETBENCH
VERIOS
NIKON-NANO
JASCO
3D-PRUSA-XL
KRATOS-XPS
EVAPORATOR
SUSS-MA8
FUMEHOOD…
ML3-BABY
FUMEHOOD…
FUMEHOOD…
DIENER
TEGRAMIN
LEICACOAT-NANO
TITAN
CHEMLAB-B1.14
ICON-SPM
LASER-DICER
LEICACOAT-STAN
RIGAKU3
WIRE-BONDER
ZEISS-NANO
MECHANICAL…
ULTRACENTRIFUGE
NMR
MAGNETRON
WITEC-RAMAN
UHV-DEPOSITION
KERR-MICROSCOPE
CRYOGENIC
PARYLENE-DIENER
ZWICK
GLOVEBOX…
MPS150
CHEMLAB-B1.16
NANOCALC
AMBER
LIBS-FireFly
LEICA-TXP
SUSS-RCD8
UHV-LEIS
BRILLOUIN
VACUUM-OVEN-B1…
ULTRASONIC…
SW-CT
RAITH
TIC3X
NANOSAM
UHV-PREPARATION
MINIFLEX
TORNADO-M4
R2-PECVD
MIRA-EBL
UHV-SPM
HELIOS
LYRA
DEKTAK
nanoCT
STEMI
RIE-CHLORINE
BET-ANAMET
SUMMIT
RTP
SHAKER-B1.18
nano-CT
ACCURION_RSE
SNOM-NANONICS
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
RSA
TEST-RFID4
SW-BEAMER
FTIR
UHV…
ULTRAFAST-LASER
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV-CLUSTER
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
RIGAKU9
microCT
ZETASIZER
UHV…
UHV-PLD
SW-LAB
SPINCOATER…
SW-TRACER
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
UHV-XPS
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-MBE
Q-LAB
NANO-ONE-2PP
SAW-ACCUTOM
4-POINT
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
DRIE
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
CRYOMILL
micro-CT-L240
DISCO-DICING…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
VERSALAB
BET-DEGASSER
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
micro-CT-m300
MIRKA
MONOWAVE
PROTOMAT
LVEM
HENRY-MAGNET
WOOLLAM-RC2
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
CITOPRESS
LPCVD-SiN
NANOSCAN
NIRQUEST512
WOOLLAM-VIS
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
LAKESHORE
LPCVD-polySi
DAWN-HELEOS
SCIA
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LITESCOPE-MIRA…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
E Jakešová, Marie
Supalová, Linda
Piastek, Jakub
Bakhshikhah, Mahan
Havlíková, Tereza
Pribytova, Ekaterina
Hu, Ying
Pribytova, Ekaterina
E Jakešová, Marie
E Jakešová, Marie
Bakhshikhah, Mahan
Bakhshikhah, Mahan
T Kicmerova, Dina
Man, Ondřej
U Kicmerova, Dina
U Kicmerova, Dina
Piastek, Jakub
MURTAS, DAVIDE
Piastek, Jakub
Říhová, Martina
Tvrdoňová, Anna
Iakoubovskii, Konstantin
Kumar, Sanjay
Kumar, Sanjay
Kumar, Sanjay
Polčák, Josef
Fatima, Areej
Allaham, Mohammad
E Jakešová, Marie
Supalová, Linda
Piastek, Jakub
E Jakešová, Marie
E Jakešová, Marie
Fecko, Peter
E Jakešová, Marie
E Jakešová, Marie
Piastek, Jakub
Fecko, Peter
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Jakešová, Marie
Paredes Sánchez, Claudia
Pišťák, Jan
Fu, Hongbo
Kumar, Sanjay
Michalička, Jan
U Michalička, Jan
Hu, Ying
Saldan, Ivan
Fallahpour, Mojdeh
Cuccu, Elisa
Danchuk, Viktor
Danchuk, Viktor
Havlíková, Tereza
Bednaříková, Vendula
Pišťák, Jan
Novotná, Lenka
Otýpka, Martin
Kostka, Marek
E Jakešová, Marie
E Jakešová, Marie
Varga, Dominik
Varga, Dominik
Hu, Ying
Saldan, Ivan
B Jewula, Pawel
Otýpka, Martin
paiva de araujo, Estacio
Jakub, Zdeněk
SAHIL, Muhammad
Pribytova, Ekaterina
E Jakešová, Marie
Sevriugina, Veronika
Saldan, Ivan
paiva de araujo, Estacio
Hu, Ying
Liška, Jiří
Iakoubovskii, Konstantin
Čechová, Ludmila
Man, Ondřej
Fecko, Peter
Vaníčková, Elena
Krčma, Jakub
Hu, Ying
Hu, Ying
Kareš, Martin
Lišková, Zuzana
Man, Ondřej
S Danchuk, Viktor
Jakub, Zdeněk
T Spotz, Zdeněk
Spotz, Zdeněk
Janů, Lucie
Supalová, Linda
Jakub, Zdeněk
Bahadur, Fateh
S Šamořil, Tomáš
E Jakešová, Marie

Upcoming trainings

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Term Name Description Max. attendees
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Andrej Juríček 1
20.8. 09:00 - 12:00 SEE SYSTEM training Training in contact angle measurements and surface free energy determination. Meeting point in front of the User office. Attendees: Jiří Strnad 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 10:15 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
21.8. 10:15 - 11:00 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Andrej Juríček, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil 3