Saturday 17.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERSALAB
MAGNETRON
TITAN
CRYOGENIC
UHV-PREPARATION
UHV-LEEM
IS-NOVOCONTROL
WOOLLAM-RC2
FTIR-CHEMLAB
AMBER
R2-PECVD
KRATOS-XPS
WOOLLAM-VIS
MIRA-STAN
UHV-SPM
UHV-XPS
RSA
MINIFLEX
nano-CT
nanoCT
MIRA-EBL
PARYLENE-SCS
SNOM-NANONICS
ICON-SPM
ICON-SPM
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
RIE-CHLORINE
EBPG
RIE-FLUORINE
TEM-SW
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PECVD
DIENER
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
BET-ANAMET
STEMI
TENUPOL
SW-BEAMER
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
TEST-RFID4
SW-TRACER
LEICA-TXP
NANOSCAN
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
NANOSAM
WOOLLAM-MIR
CITOPRESS
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
CPD
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
TIC3X
MINIEVAP
FUMEHOOD…
ALD-FIJI
3D-PRUSA-XL
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
LEXT
BAMBULAB
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
MONOWAVE
LPCVD-SiN
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LAKESHORE
K70
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
SUSS-MA8
DEKTAK
LABOTOM5
NANO-ONE-2PP
ML3-BABY
DSC-DISCOVERY
KEITHLEY-4200
IR-RAMAN
FUMEHOOD…
VNA-MPI
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VERIOS
KAUFMAN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
SCIA
FISCHIONE-TEM…
UV-LASER
Daradkeh, Samer
U Prášek, Jan
S Michalička, Jan
Lukiienko, Iryna
David, Jiří
David, Jiří
Danchuk, Viktor
Hekmat, Saleh
Hu, Ying
Spousta, Jiří
Janů, Lucie
Hu, Ying
Dubroka, Adam
Hu, Ying
David, Jiří
Molnár, Tomáš

Upcoming trainings

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Term Name Description Max. attendees
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera, Václav Bálka 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský, Tereza Konečná, Patricie Skoumalová, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Tadeáš Lesovský, Šimon Krútek, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Lukáš Dokulil, Martin Kužílek, Václav Bálka 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Patricie Skoumalová, Lukáš Dokulil, Martin Kužílek, Václav Bálka 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: David Neradilek, Marc Arvie Talavera, Václav Bálka 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
22.10. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Carolina Sanna 4
23.10. 09:00 - 17:30 Amber EDS-EBSD training Attendees: Veronika Mazánová, Dinara Sobola 2
27.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský 3
27.10. 10:00 - 12:00 DLS-ZetaSizer Part 2 Assisted hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer Ultra. Attendees: Carolina Sanna 1
29.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1