Tuesday 25.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
FUMEHOOD…
RIE-FLUORINE
RIGAKU3
FUMEHOOD…
SUSS-WETBENCH
FUMEHOOD…
DRIE
SEE-SYSTEM
WITEC-RAMAN
SUSS-MA8
VERIOS
MIRA-STAN
AMBER
TITAN
ZEISS-NANO
LEICACOAT-STAN
R4…
UHV-PREPARATION
EVAPORATOR
CRYOGENIC
NANO-ONE-2PP
UHV-XPS
LYRA
UHV-DEPOSITION
ICON-SPM
LAURELL-NANO
R2-PECVD
MAGNETRON
KERR-MICROSCOPE
WOOLLAM-RC2
DIENER
VERSALAB
BRILLOUIN
CITOVAC
RIGAKU9
ALD-BENEQ
FTIR
JASCO
DEKTAK
PARYLENE-DIENER
TIC3X
TEM-SW
SIMS
NANOCALC
SHAKER-B1.18
SUMMIT
LaserMIRA
STEMI
PECVD
MIRKA
SAW-ACCUTOM
Q-LAB
PARYLENE-SCS
SPINCOATER…
SNOM-NANONICS
MIRA-EBL
RTP
ACCURION_RSE
RSA
nano-CT
nanoCT
SUSS-RCD8
MINIFLEX
RIE-CHLORINE
SW-BEAMER
BET-ANAMET
TEST-RFID2
SW-LAB
VACUUM-OVEN-B1…
UHV…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
VACUUM-OVEN-B1…
UHV-CLUSTER
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-SPM
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
3D-PRUSA-BLACK
TGA96
UHV-PLD
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
3D-PRUSA-ORANGE
ML3-BABY
3D-PRUSA-BLUE
HELIOS
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
4-POINT
CRYOMILL
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
SW-CT
CPD
micro-CT-L240
DISCO-DICING…
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
Micromex
micro-CT-m300
ULTRACENTRIFUGE
3D-PRUSA-XL
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
LITESCOPE-LYRA
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
LITESCOPE-MIRA…
LIBS-LabSys1
DAWN-HELEOS
CHEMLAB-B1.18
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
IS-NOVOCONTROL
LIBS-Discovery
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LIBS-FireFly
UV-LASER
Polčák, Josef
Polčák, Josef
Kubinec, Ondrej
Maity, Sujan
E Jakešová, Marie
E Jakešová, Marie
Tvrdoňová, Anna
E Jakešová, Marie
Piastek, Jakub
Fecko, Peter
Novotná, Lenka
Šťastný, Přemysl
Wirthová, Michaela
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Jelínek, Eduard
Fecko, Peter
Valiyev, Rasul
Strnad, Jiří
paiva de araujo, Estacio
Mařák, Vojtěch
E Jakešová, Marie
E Jakešová, Marie
Šťastný, Přemysl
Šťastný, Jakub
Vinson, Rosmi
Fecko, Peter
Kratochvílová, Ivana
Jelínek, Eduard
T Kolíbalová, Eva
Kolíbalová, Eva
E Jakešová, Marie
E Jakešová, Marie
T Holas, Jiří
Gejdoš, Pavel
Polášková, Kateřina
Jakub, Zdeněk
E Jakešová, Marie
Pribytova, Ekaterina
T Sanna, Michela
Jakub, Zdeněk
S Šamořil, Tomáš
Jakub, Zdeněk
B Gablech, Evelína
Tvrdoňová, Anna
Bolouki, Nima
Otýpka, Martin
Otýpka, Martin
Cuccu, Elisa
E Jakešová, Marie
Danchuk, Viktor
Krčma, Jakub
T Holas, Jiří
Caha, Ondřej
Mirdamadi Khouzani, Sayed Hossein
Cuccu, Elisa
Skálová, Zdenka
E Jakešová, Marie
E Jakešová, Marie
Kramář, Jan

Upcoming trainings

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Term Name Description Max. attendees
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Hnilica Jan, Kristýna Kupková, Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Andrej Juríček, Kristýna Kupková, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3