Wednesday 30.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WITEC-RAMAN
KRATOS-XPS
KERR-MICROSCOPE
MIRA-STAN
LYRA
SUSS-WETBENCH
ML3-BABY
ICON-SPM
LVEM
SPONGEBOB
CRYOGENIC
UHV-XPS
HELIOS
UHV-LEEM
UHV-DEPOSITION
FUMEHOOD…
PARYLENE-SCS
ULTRAFAST-LASER
FUMEHOOD…
FUMEHOOD…
LAURELL-NANO
K70
TEGRAMIN
LEICACOAT-NANO
TITAN
NANOINDENTER
CHEMLAB-B1.14
UHV-PREPARATION
RAITH
RIGAKU3
VERSALAB
PECVD
NMR
ALD-BENEQ
MINIFLEX
WOOLLAM-VIS
VACUUM_OVEN-C1…
MAGNETRON
SPINCOATER…
FTIR-CHEMLAB
BRILLOUIN
MAGNETRON-AJA
TORNADO-M4
nano-CT
SHAKER-B1.18
STEMI
SAW-ACCUTOM
MIRKA
NANOCALC
BET-ANAMET
SW-BEAMER
SUMMIT
SIMS
Q-LAB
LaserMIRA
RTP
SEE-SYSTEM
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-FLUORINE
ICON-SPM
SNOM-NANONICS
MIRA-EBL
RIE-CHLORINE
SW-TRACER
RSA
nanoCT
SW-LAB
TEST-RFID2
LEICA-TXP
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
TENUPOL
TGA96
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
3D-PRUSA-ORANGE
TEST-RFID4
THEORY-SUPPORT
UHV-SPM
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
TEM-SW
NANO-ONE-2PP
3D-PRUSA-BLACK
R4…
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
Micromex
BAMBULAB
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CPD
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CLARUS-680
micro-CT-L240
3D-PRUSA-BLUE
3D-PRUSA-XL
LAKESHORE
PROTOMAT
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
LPCVD-polySi
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
LPCVD-SiN
LITESCOPE-MIRA…
micro-CT-m300
ZEISS-STAN
DAWN-HELEOS
VNA-MPI
VERIOS
PECVD-NANOFAB
FRASCAN
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
SCIA
LITESCOPE-LYRA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
R2-PECVD
LASER-DICER
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Havelka, Tomáš
Dey, Sharmistha
Šťastný, Jakub
Sobola, Dinara
Pavliňák, David
Pham, Sy Nguyen
Molnár, Tomáš
Arregi Uribeetxebarria, Jon Ander
Klok, Pavel
Hu, Ying
Staňo, Michal
Štálnik, Jozef
T Hrdý, Radim
Jelínek, Eduard
Bajwa, Laiba Asad
Šťastný, Jakub
Cao, Hoang-Anh
Tvrdoňová, Anna
Lukiienko, Iryna
D'Angelo, Elena
T Man, Ondřej
David, Jiří
D'Angelo, Elena
Tvrdoňová, Anna
Tvrdoňová, Anna
Arregi Uribeetxebarria, Jon Ander
Jewula, Pawel
Bajwa, Laiba Asad
Tvrdoňová, Anna
Klusák, Radovan
B Man, Ondřej
Hu, Ying
S Michalička, Jan
Máčala, Jakub
Jewula, Pawel
David, Jiří
S Lišková, Zuzana
E Spotz, Zdeněk
Dey, Sharmistha
Cuccu, Elisa
Kreuzerová, Monika
Mirdamadi Khouzani, Sayed Hossein
E Spotz, Zdeněk
Dubroka, Adam
Dey, Sharmistha
Staňo, Michal
Bajwa, Laiba Asad
Poláková, Veronika
Krčma, Jakub
Arregi Uribeetxebarria, Jon Ander
E Spotz, Zdeněk

Upcoming trainings

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Term Name Description Max. attendees
30.9. 14:00 - 15:00 Copy - Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Romana Ščotková, Josef Hynšt, Aneta Opluštilová 5
30.9. 14:00 - 15:00 Copy - Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Romana Ščotková, Josef Hynšt, Aneta Opluštilová 5
1.10. 09:30 - 12:00 Hysitron_basic Basic training on hysitron nanoindenter. Attendees: Rasul Valiyev, Štěpánka Kelarová 2
1.10. 09:30 - 13:00 FTIR Basic Training Attendees: Jiří Strnad 1
1.10. 09:30 - 12:00 RIE-flourine - training Attendees: Ganna Kharchenko 3
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
5.10. 09:30 - 21.7. 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Maneesha Ramesh 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jáchym Štindl, Tadeáš Lesovský, Filip Janík 3
6.10. 09:30 - 12:00 ICON-SPM basic training Attendees: Areej Fatima, Štěpánka Kelarová 3
6.10. 09:30 - 12:00 RIE-chlorine-training Attendees: Kryštof Jasenský 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tadeáš Lesovský 1
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sharmistha Dey 4
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský, Romana Ščotková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: David Neradilek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10