Wednesday 29.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
RIE-FLUORINE
MIRA-STAN
LEICACOAT-STAN
ICON-SPM
RIGAKU3
SUSS-WETBENCH
ML3-BABY
WITEC-RAMAN
TEGRAMIN
VERSALAB
TUBE-FURNACE
TITAN
KRATOS-XPS
BRILLOUIN
LEICA-TXP
CHEMLAB-B1.14
TEST-RFID2
AMBER
TGA-DISCOVERY
CHEMLAB-B1.18
IS_NOVOCONTROL
UHV-DEPOSITION
ZEISS-STAN
FUMEHOOD…
TENUPOL
LITESCOPE-LYRA
BET-ANAMET
LASER-DICER
STEMI
LIBS-FireFly
UHV-XPS
LITESCOPE-MIRA…
LAKESHORE
KERR-MICROSCOPE
WOOLLAM-RC2
SUSS-MA8
SNOM-NANONICS
CITOPRESS
NANOSAM
WOOLLAM-VIS
UHV-LEEM
DSC-DISCOVERY
TEM-SW
SW-CT
DIMPLING…
UHV-PREPARATION
R4…
ZWICK
DRIE
RAITH
ALD-BENEQ
HELIOS
ZETASIZER
CRYOMILL
VACUUM-OVEN-B1…
UHV-SPM
SIMS
SEE-SYSTEM
PARYLENE-SCS
VUVAS
VISCOMETER
L450
LaserMIRA
WIRE-BONDER
MIRA-EBL
nanoCT
RSA
XEF2
nano-CT
SUMMIT
RIGAKU9
MINIFLEX
RIE-CHLORINE
microCT
DIENER
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
VACUUM-OVEN-B1…
UHV-PLD
SHAKER-B1.18
Test O2
UHV-LEIS
UHV-FTIR
UHV-CLUSTER
UHV…
UHV-MBE2
UHV-MBE1
Heliscan
THEORY-SUPPORT
TGA96
UHV…
MIRKA
Test školení
TEST2
Test Ondra 3
CITOVAC
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
FISCHIONE-160
JASCO
SW-TRACER
SW-LAB
SW-BEAMER
JAZ3-CHANNEL
UHV-MBE
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
NANOCALC
3D-PRUSA-XL
PECVD
FUMEHOOD…
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD-HF
DRYING-OVEN-B1…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
SPONGEBOB
DHR
micro-CT-L240
BAMBULAB
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
micro-CT-m300
PARYLENE-DIENER
NanoOne250
HENRY-MAGNET
MAGNETRON
DEKTAK
LABOTOM5
WOOLLAM-MIR
MPS150
MONOWAVE
NANOSCAN
PROTOMAT
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
LVEM
CRYOGENIC
DAWN-HELEOS
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
SCIA
KAUFMAN
LPCVD-SiN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LPCVD-polySi
UV-LASER
Lednický, Tomáš
Šťastný, Jakub
Sharma, Kajal
Sharma, Kajal
Pišťák, Jan
Košelová, Zuzana
U Kicmerova, Dina
Asatryan, Heriknaz
Kratochvílová, Ivana
Bajwa, Laiba Asad
Piastek, Jakub
Bajwa, Laiba Asad
Kramář, Jan
Kalleshappa, Bindu
Oliver Urrutia, Carolina
Remešová, Michaela
Gejdoš, Pavel
Remešová, Michaela
Pišťák, Jan
Sharma, Kajal
T Gablech, Evelína
Weisz, Hugo
Varshney, Devanshu
Arenas Buelvas, Daina Dayana
de Oliveira Santiago, Pedro Henrique
Arenas Buelvas, Daina Dayana
Kratochvílová, Ivana
Bajwa, Laiba Asad
Piastek, Jakub
Piastek, Jakub
Kratochvílová, Ivana
Piastek, Jakub
Janoušek, Tomáš
Mikerásek, Vojtěch
Pazourek, Petr
E Man, Ondřej
Paredes Sánchez, Claudia
Pišťák, Jan
Hrdinová, Sára
Tichý, Martin
Hrdinová, Sára
Slovák, Radim
Kolíbalová, Eva
Tichý, Martin
De, Puja
Janůšová, Martina
Krčma, Jakub
Krčma, Jakub
E Man, Ondřej
U Tmejová, Kateřina
Spusta, Tomáš
E Man, Ondřej
Sevriugina, Veronika
Tkachenko, Serhii
Daradkeh, Samer
Endstrasser, Zdeněk
E Man, Ondřej
Jewula, Pawel
E Man, Ondřej
Klok, Pavel
Tkachenko, Serhii
Rovenská, Katarína
E Man, Ondřej
Vaňková, Karolína
Hrůza, Dominik
Kramář, Jan
Holcman, Vladimír
Lukiienko, Iryna
Arregi Uribeetxebarria, Jon Ander
Bajwa, Laiba Asad
Klok, Pavel
E Man, Ondřej
Danchuk, Viktor
Franta, Daniel
Endstrasser, Zdeněk
Sevriugina, Veronika
Tichý, Martin
Kareš, Martin
E Man, Ondřej
Endstrasser, Zdeněk
Janůšová, Martina
Sevriugina, Veronika
Asatryan, Heriknaz
Lišková, Zuzana
BUI, Thanh Lam
E Man, Ondřej
Kreuzerová, Monika
B Holas, Jiří
U Tmejová, Kateřina
D'Angelo, Elena

Upcoming trainings

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Term Name Description Max. attendees
4.5. 09:30 - 10:15 Solvent fumehood training - ISO 5 clean room Training for a solvent fume hood. Attendees: Šimon Krútek, Helena Šimůnková 2
4.5. 10:15 - 11:00 Etching Fumehood training - ISO5 cleanroom Training for Etching Fumehood. We will meet directly in ISO5 clean room. Attendees: Šimon Krútek, Helena Šimůnková 2
5.5. 09:00 - 17:30 Amber Meeting point at the microscope. Attendees: Jiří Spousta, Viktor Bajo 4
5.5. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Carolina Oliver Urrutia 4
5.5. 10:30 - 11:00 Viscometer training The introduction of Viscometer Attendees: Carolina Sanna 3
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta, Ying Hu 4
11.5. 09:00 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2
12.5. 10:00 - 12:00 Totnado-M4_XRF 3
14.5. 09:30 - 11:45 NMR training course Use of 60 MHz Magritec NMR spectrometer and samples preparation Attendees: Pawel Jewula, Carolina Sanna 3
14.5. 09:30 - 22.10. 12:30 MIRA-STAN for LYRA and returning users Meeting point at the Microscope. Attendees: Claudia Isabel Paredes Sánchez, Kajal Sharma, Yanzhen Song 4
15.5. 10:00 - 12:00 Witec-Raman Attendees: Puja De, Carolina Sanna, Sharmistha Dey 4
18.5. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/310295373414983?p=A06Vu2fman9ojWr9i0) Meeting ID: 310 295 373 414 983 Access code: Cw9Ff2yW Attendees: Sujan Maity 5
19.5. 12:15 - 12:50 Safety excursion Chem lab 5
19.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Sujan Maity 5
19.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
19.5. 14:25 - 14:55 Safety excursion - StAn lab 10
25.5. 09:30 - 12:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Claudia Isabel Paredes Sánchez 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2