| 4.8. 09:00 - 12:00 |
Verios/Helios_EDS
|
Practical demonstration of EDS analytical system at Verios and Helios.
Attendees:
Debika
Devi Thongam,
Kateřina
Polášková
|
3
|
| 4.8. 10:00 - 11:30 |
MPS 150 training
|
Training of the new user
Attendees:
Nikol
Kaděrová
|
2
|
| 4.8. 13:00 - 14:00 |
Dektak
|
Training for the Dektak profilometer.
Attendees:
Martin
Otýpka
|
2
|
| 4.8. 14:00 - 15:30 |
SUSS Wetbench training
|
Training of the new user
Attendees:
DAVIDE
MURTAS,
Karel
Škubník
|
2
|
| 5.8. 09:30 - 14:30 |
NANO-ONE-2PP Training Part 1
|
The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor).
Attendees:
Veronika
Sevriugina,
Michal
Slovák
|
3
|
| 5.8. 10:00 - 12:00 |
Tornado-M4
|
Attendees:
Vendula
Bednaříková
|
3
|
| 6.8. 09:30 - 12:00 |
NMR training course
|
Use of 60 MHz Magritec NMR spectrometer, preparation samples, basic NMR theory
Attendees:
Michela
Sanna,
Lucie
Žaloudková
|
3
|
| 7.8. 09:00 - 13:00 |
Basic-Rigaku3
|
Bring your typical sample
A1.15
You will not be admitted to the training without a completed "Request for training" in the booking system and an interview.
Follow up on the instructions:
[How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36)
Attendees:
Muhammad
SAHIL,
Iosif
Tantis
|
2
|
| 7.8. 10:00 - 10:45 |
Nikon Nano - optical microscope ISO 5
|
Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope.
Attendees:
Matej
Dinis,
Jiří
Strnad
|
2
|
| 18.8. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Nima
Bolouki,
Šimon
Formánek
|
3
|
| 19.8. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Šimon
Formánek
|
1
|
| 19.8. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Nima
Bolouki
|
1
|
| 19.8. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 21.8. 09:30 - 12:00 |
RIE-flourine - training
|
Attendees:
Nikol
Kaděrová
|
3
|
| 24.8. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV)
Meeting ID: 317 713 074 790 138
Access code: ya9A3E3C
|
5
|
| 25.8. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
|
Attendees:
Yue
Wang
|
5
|
| 25.8. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Yue
Wang
|
5
|
| 25.8. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
|
10
|
| 25.8. 14:25 - 14:55 |
Safety excursion - Structural Analysis
|
|
10
|
| 4.9. 10:00 - 13:00 |
Verios/Helios_EDS
|
Practical demonstration of EDS analytical system at Verios and Helios.
Attendees:
Sunny
Nandi
|
3
|
MIRA-STAN
RIE-FLUORINE
LYRA