CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
25.3. 09:00 - 10:30	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek	1
25.3. 10:30 - 12:00	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Radim Slovák	1
25.3. 12:30 - 14:00	Verios_basic (2/2)	Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma	1
27.3. 09:00 - 13:00	KRATOS-XPS	Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Grigory Mathew, Sujan Maity	2
27.3. 09:30 - 16:30	MIRA-STAN 1/2	Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Carolina Oliver Urrutia, Ondrej Kubinec	4
27.3. 10:00 - 12:00	Witec-Raman	in front of user office Attendees: Lucie Žaloudková	4
9.4. 09:00 - 12:00	Verios/Helios_EDS	Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Tomáš Janoušek	3
16.4. 09:30 - 11:30	MIRA-STAN - EDS detector	Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Aida Fazlič	4

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RIE-FLUORINE
WITEC-RAMAN
MIRA-STAN
KRATOS-XPS
VERIOS
UHV-PREPARATION
UHV-SPM
SUSS-WETBENCH
ML3-BABY
LYRA
ICON-SPM
EVAPORATOR
CRYOGENIC
UHV-LEEM
MIRA-EBL
UHV-DEPOSITION
UHV-XPS
CHEMLAB-B1.16
LEICACOAT-STAN
LVEM
BET-ANAMET
ALD-BENEQ
NMR
SCIA
RIGAKU9
HELIOS
TITAN
UHV-PLD
BET-DEGASSER
NANOSAM
R2-PECVD
TUBE-FURNACE
KERR-MICROSCOPE
VERSALAB
LITESCOPE-MIRA…
VACUUM_OVEN-C1…
RIGAKU3
NANOCALC
SHAKER-B1.18
SIMS
STEMI
SEE-SYSTEM
LaserMIRA
SNOM-NANONICS
SUMMIT
PARYLENE-SCS
3D-PRUSA-XL
RSA
Q-LAB
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
RTP
nano-CT
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-CHLORINE
MINIFLEX
SW-BEAMER
nanoCT
Test O2
SW-LAB
VACUUM_OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
3D-PRUSA-BLACK
TEST2
Test školení
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
3D-PRUSA-ORANGE
MONOWAVE
3D-PRUSA-BLUE
4-POINT
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
SW-CT
micro-CT-L240
BRILLOUIN
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
Micromex
micro-CT-m300
ULTRACENTRIFUGE
LABOTOM5
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
WOOLLAM-MIR
LITESCOPE-LYRA
DSC-DISCOVERY
MPS150
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
LPCVD-polySi
LIBS-LabSys1
DAWN-HELEOS
IS_NOVOCONTROL
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
ZEISS-STAN
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER