CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
15.12. 10:30 - 11:15	Nanofab interview - Meeting room C2.11 or C2.07	This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2	5
16.12. 09:30 - 12:00	SCIA-training	Attendees: Jozef Štálnik, Jakub Vejrosta	3
16.12. 12:15 - 12:50	Safety excursion Chem lab	The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Andrej Juríček, Pedro Henrique de Oliveira Santiago	5
16.12. 13:00 - 13:50	Safety excursion - Nanofabrication lab	Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).	5
16.12. 13:55 - 14:20	Safety excursion - Nanocharacterization lab	Attendees: Pedro Henrique de Oliveira Santiago	10
16.12. 14:25 - 14:55	Safety excursion - StAn lab	Attendees: Pedro Henrique de Oliveira Santiago	10
19.12. 13:00 - 16:00	Woollam RC2	Second part of Training Attendees: Ryan Raad	1
6.1. 09:30 - 12:00	DRIE-training	Attendees: Kateřina Krajíčková, Saurabh Pathak	3
23.1. 09:30 - 16:00	MIRA-STAN 1/2	Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti	4

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UHV-XPS
UHV-LEEM
UHV-PREPARATION
NANOSAM
SUSS-WETBENCH
NANOINDENTER
R2-PECVD
RIE-FLUORINE
R4…
UHV…
UHV…
UHV-DEPOSITION
UHV-FTIR
RAITH
UHV-PLD
UHV-SPM
UHV-MBE
WOOLLAM-VIS
KRATOS-XPS
MAGNETRON
VACUUM_OVEN-B1…
SNOM-NANONICS
MINIFLEX
nanoCT
nano-CT
RSA
MIRA-EBL
SPINCOATER…
RIE-CHLORINE
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
NIRQUEST512
SUMMIT
SHAKER…
ICON-SPM
DIENER
NMR
PARYLENE-DIENER
SAW-ACCUTOM
RTP
ACCURION_RSE
RIGAKU3
MIRKA
PECVD
NANOCALC
Q-LAB
SUSS-RCD8
3D-PRUSA-ORANGE
3D-PRUSA-BLACK
3D-PRUSA-BLUE
ULTRACENTRIFUGE
ZEISS-NANO
MIRA-STAN
MPS150
STEMI
VUVAS
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VISCOMETER
ULTRAFAST-LASER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
UHV-LEIS
BET-ANAMET
Test O2
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
NANOSCAN
Test Ondra 3
TEST2
UHV-CLUSTER
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
FISCHIONE-160
ML3-BABY
CITOPRESS
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
FLOWBOX
VERSALAB
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
CRYOMILL
TIC3X
CLARUS-680
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUME_HOOD-B1.18
Micromex
MONOWAVE
PROTOMAT
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
LAURELL-NANO
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
LIBS-FireFly
LASER-DICER
micro-CT-L240
TITAN
micro-CT-m300
DAWN-HELEOS
GLOVEBOX
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
KEITHLEY-4200
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER