Friday 17.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
MIRA-EBL
SUSS-WETBENCH
FUMEHOOD…
VERSALAB
ML3-BABY
KRATOS-XPS
ALD-FIJI
WITEC-RAMAN
LYRA
EVAPORATOR
TITAN
DEKTAK
FUMEHOOD…
ICON-SPM
VERIOS
HELIOS
RAITH
WIRE-BONDER
AMBER
TEM-SW
CRYOGENIC
FUMEHOOD…
UHV-LEIS
UHV-XPS
UHV-SPM
3D-PRUSA-XL
FUMEHOOD…
UHV-LEEM
UHV-DEPOSITION
SNOM-NANONICS
SAW-ACCUTOM
LVEM
TEST-RFID2
LAKESHORE
LITESCOPE-MIRA…
LITESCOPE-LYRA
LIBS-FireFly
KERR-MICROSCOPE
STEMI
MIRA-STAN
DIENER
ALD-BENEQ
ZWICK
PARYLENE-DIENER
RIGAKU9
BRILLOUIN
MECHANICAL…
RIGAKU3
NMR
FTIR
VACUUM-OVEN-B1…
NIKON-NANO
NANOSAM
ELECTROWORKSHOP
UHV-PREPARATION
ULTRAFAST-LASER
MPS150
RIE-CHLORINE
DRIE
ACCURION_RSE
MINIFLEX
SIMS
RTP
RSA
SEE-SYSTEM
Q-LAB
LaserMIRA
SUSS-RCD8
nanoCT
SUMMIT
SHAKER-B1.18
PARYLENE-SCS
nano-CT
THEORY-SUPPORT
NANOCALC
FTIR-CHEMLAB
UHV…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
CITOVAC
UHV-CLUSTER
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
microCT
ZETASIZER
UHV…
UHV-PLD
BET-ANAMET
Test O2
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
TEST2
UHV-MBE
Test školení
TGA96
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
SPINCOATER…
MONOWAVE
MIRKA
FTIRMAG
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
FLOWBOX
4-POINT
FUMEHOOD…
SW-CT
FUMEHOOD-HF
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
DHR
CRYOMILL
VNA-MPI
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
TORNADO-M4
TIC3X
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TEGRAMIN
PECVD-NANOFAB
PECVD
CITOPRESS
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
NANOSCAN
LPCVD-SiN
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PROTOMAT
LPCVD-polySi
LEICACOAT-NANO
SCIA
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LIBS-LabSys1
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-Discovery
UV-LASER
Kunc, Jan
Štálnik, Jozef
Kratochvílová, Ivana
Asatryan, Heriknaz
Lukiienko, Iryna
Kratochvílová, Ivana
Fecko, Peter
U Eliáš, Marek
Matějka, Kryštof
Slovák, Radim
Štálnik, Jozef
Weisz, Hugo
Matějka, Kryštof
Petrosyan, Derenik
Štálnik, Jozef
Asatryan, Heriknaz
Jasenský, Kryštof
S Zita, Jiří
Jasenský, Kryštof
Daradkeh, Samer
Klimek, Jan
Lukiienko, Iryna
Petrosyan, Derenik
Asatryan, Heriknaz
Petrosyan, Derenik
Polčák, Josef
Janů, Lucie
Polčák, Josef
Kunc, Jan
Eliáš, Marek
Eliáš, Marek
Havelka, Tomáš
Weisz, Hugo
Naseri Joda, Nasrollah
Weisz, Hugo
Šamořil, Tomáš
S Šamořil, Tomáš
Kunc, Jan
Prášek, Jan
Slovák, Radim
T Michalička, Jan
S Michalička, Jan
Michalička, Jan
Jasenský, Kryštof
Liška, Jiří
Jasenský, Kryštof
U Jewula, Pawel
Tmejová, Kateřina
Weisz, Hugo
Fallahpour, Mojdeh
Koňařík, Lukáš
Tkachenko, Serhii
Staňo, Michal
T Man, Ondřej
U Lišková, Zuzana
S Lišková, Zuzana
Matějka, Kryštof
Papež, Nikola
B Man, Ondřej
Iakoubovskii, Konstantin
Ali, Hasan
Ali, Hasan
Danchuk, Viktor
Danchuk, Viktor
Tmejová, Kateřina
Staněk, Jan
Šebestová, Zuzana
Šebestová, Zuzana
Spusta, Tomáš
Lukiienko, Iryna
Šebestová, Zuzana
Šebestová, Zuzana
Klok, Pavel
Rotter, Marek
Říhová, Martina
Spusta, Tomáš
Holcman, Vladimír
Ulč, Filip
Klok, Pavel
Zikmundová, Eva
Arregi Uribeetxebarria, Jon Ander
Šárfy, Pavlína
Ulč, Filip
paiva de araujo, Estacio
Štálnik, Jozef
Fu, Hongbo
U Fecko, Peter
Arregi Uribeetxebarria, Jon Ander
Krčma, Jakub
Varga, Dominik
Pišťák, Jan
U Jewula, Pawel
Bolouki, Nima
Lukiienko, Iryna
Kratochvílová, Ivana
S Danchuk, Viktor
Janků, Matěj
Šebestová, Zuzana
Arregi Uribeetxebarria, Jon Ander
paiva de araujo, Estacio
Eliáš, Marek
Arregi Uribeetxebarria, Jon Ander

Upcoming trainings

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Term Name Description Max. attendees
17.4. 13:30 - 16:00 EBSD Verios/Helios (2/2) EBSD Verios/Helios (2/2): practical demonstration @ Helios Attendees: Karel Vařeka, Adam Očkovič, Mohamed Bensalem 5
20.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/31245607839153?p=QX552nhoP9PxXCL4FX) Meeting ID: 312 456 078 391 53 Access code: i5xd7zL3 5
21.4. 09:30 - 12:00 ICON-SPM basic training Attendees: Viktor Danchuk 3
21.4. 10:00 - 10:45 Solvent fumehood training (ISO 5) Training for the solvent fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 10:45 - 11:30 Etching fumehood training (ISO 5) Training for the etching fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Petr Sysel, Ying Hu, Thông Thái Trần, Rosmi Vinson 5
21.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
21.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Ying Hu, Thông Thái Trần, Rosmi Vinson, Sharmistha Dey 10
21.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Carolina Oliver Urrutia, Ying Hu, Thông Thái Trần, Rosmi Vinson, Sharmistha Dey 10
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik, Sujan Maity 3
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
23.4. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Karan Singh Surana 1
24.4. 14:00 - 28.5. 16:00 LVEM_basic (2/2) Hands-on session Attendees: Karan Singh Surana 1
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1