Monday 15.12.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
KRATOS-XPS
LEICACOAT-STAN
EVAPORATOR
SUSS-WETBENCH
MIRA-EBL
WITEC-RAMAN
VNA-MPI
MIRA-STAN
ICON-SPM
MAGNETRON
LYRA
HELIOS
RAITH
RIE-FLUORINE
DEKTAK
BAMBULAB
VACUUM_OVEN-B1…
WIRE-BONDER
LEICA-TXP
CHEMLAB-B1.14
NANOINDENTER
R2-PECVD
TITAN
TEGRAMIN
L450
WOOLLAM-VIS
CRYOGENIC
LVEM
HENRY-MAGNET
NANOSCAN
UHV-DEPOSITION
WOOLLAM-RC2
UHV-LEEM
LITESCOPE-MIRA…
FTIR
UHV-SPM
VACUUM_OVEN-C1…
GLOVEBOX…
SUSS-RCD8
UHV-XPS
UHV-PREPARATION
RIGAKU3
UHV-PLD
LEXT
R4…
VERSALAB
DRIE
DIENER
nanoCT
SUMMIT
SHAKER…
SEE-SYSTEM
SAW-ACCUTOM
LaserMIRA
RIE-CHLORINE
SIMS
SPINCOATER…
PARYLENE-SCS
Q-LAB
RTP
SNOM-NANONICS
MINIFLEX
RSA
nano-CT
ACCURION_RSE
STEMI
NANOCALC
MPS150
BET-ANAMET
FTIR-CHEMLAB
UHV-LEIS
UHV-MBE
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
CITOVAC
UHV…
VUVAS
VISCOMETER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV-FTIR
UHV…
SW-BEAMER
PECVD
SW-LAB
SW-TRACER
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
UHV-CLUSTER
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
MIRKA
ML3-BABY
PARYLENE-DIENER
FTIRMAG
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
4-POINT
FUMEHOOD…
SW-CT
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
Micromex
DHR
CRYOMILL
micro-CT-m300
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
BRILLOUIN
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
CPD
micro-CT-L240
DAWN-HELEOS
3D-PRUSA-ORANGE
MONOWAVE
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
CITOPRESS
LPCVD-polySi
NANOSAM
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LPCVD-SiN
LITESCOPE-LYRA
GLOVEBOX…
SCIA
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LIBS-LabSys1
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Saldan, Ivan
Šťastný, Jakub
Iakoubovskii, Konstantin
U Kicmerova, Dina
Cuccu, Elisa
Polčák, Josef
Souawda, Nada
Beliančínová, Beáta
Thelappurath, Aiswarya Vijayakumar
Polčák, Josef
Cao, Hoang-Anh
U Holas, Jiří
Gejdoš, Pavel
Vijithra, Vijithra
Staňo, Michal
Supalová, Linda
Lukiienko, Iryna
Cmíralová, Marie
Citterberg, Daniel
Lukiienko, Iryna
U Hrdý, Radim
Jasenský, Kryštof
Lukiienko, Iryna
Lukiienko, Iryna
Pavliňák, David
Liška, Jiří
Varshney, Devanshu
Klíma, Jan
Klíma, Jan
Cao, Hoang-Anh
Ulč, Filip
Havelka, Tomáš
Mukherjee, Aniket
U Prášek, Jan
Prášek, Jan
Kovařík, Martin
Salamon, David
Tran, Quynh Nhu Thi
U Man, Ondřej
Lišková, Zuzana
Pistis, Martino
Citterberg, Daniel
Supalová, Linda
Fecko, Peter
Jasenský, Kryštof
Kolář, Richard
Kolář, Richard
Souawda, Nada
Lukiienko, Iryna
Kovařík, Martin
B Hrdý, Radim
Man, Ondřej
Souawda, Nada
Buršíková, Vilma
Beliančínová, Beáta
Michalička, Jan
Prajzler, Vladimír
Slovák, Vojtěch
Kepič, Peter
Klíma, Jan
Gaizura, Filip
Klíma, Jan
Kovařík, Martin
Šebestová, Zuzana
Franta, Daniel
Šebestová, Zuzana
Kovařík, Martin
Liška, Jiří
Šebestová, Zuzana
Klíma, Jan
Saldan, Ivan
Hrdý, Radim
Šebestová, Zuzana
Šebestová, Zuzana
Arenas Buelvas, Daina Dayana
Danchuk, Viktor
Bolouki, Nima
Eliáš, Marek
Lukiienko, Iryna
Pistis, Martino

Upcoming trainings

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Term Name Description Max. attendees
15.12. 10:00 - 11:30 MPS150 training Training of the new user Attendees: Tadeáš Lesovský 2
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 09:30 - 12:00 SCIA-training Attendees: Jozef Štálnik, Jakub Vejrosta 3
16.12. 09:30 - 11:30 FTIR Second part of training Attendees: Nima Bolouki 1
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Andrej Juríček, Pedro Henrique de Oliveira Santiago 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Pedro Henrique de Oliveira Santiago 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Pedro Henrique de Oliveira Santiago 10
19.12. 13:00 - 16:00 Woollam RC2 Second part of Training Attendees: Ryan Raad 1
6.1. 09:30 - 12:00 RIE flourine -training Attendees: Kateřina Krajíčková, Saurabh Pathak 3
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4