Monday 24.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-XPS
UHV-PREPARATION
UHV-DEPOSITION
SUSS-WETBENCH
ELECTROWORKSHOP
MIRA-STAN
VERIOS
KRATOS-XPS
TITAN
R2-PECVD
L450
WITEC-RAMAN
LEICACOAT-STAN
LVEM
VERSALAB
RIGAKU3
RIE-FLUORINE
DRIE
LASER-DICER
NANOSCAN
NANO-ONE-2PP
WOOLLAM-RC2
MAGNETRON
HENRY-MAGNET
KERR-MICROSCOPE
NANOSAM
ICON-SPM
NMR
MIRA-EBL
TEGRAMIN
AMBER
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-PLD
UHV-SPM
UHV…
UHV…
VACUUM_OVEN-C1…
VUVAS
RIGAKU9
VNA-MPI
ML3-BABY
HELIOS
LYRA
EVAPORATOR
BRILLOUIN
RAITH
FTIRMAG
FISCHIONE-160
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
Test O2
TUBE-FURNACE
Test Ondra 3
BET-ANAMET
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
SW-BEAMER
NANOCALC
STEMI
SNOM-NANONICS
MINIEVAP
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
LEXT
SW-COMSOL
Heliscan
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
CLR-ISO8-Lab…
THEORY-SUPPORT
UHV-MBE2
TGA-DISCOVERY
APCVD-Diffusion
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
ARES
VISCOMETER
WIRE-BONDER
MAGNETRON-AJA
ALD-BENEQ
XEF2
GLOVEBOX…
MPS150
microCT
ZWICK
ZETASIZER
FTIR-CHEMLAB
JAZ3-CHANNEL
UHV-MBE1
DISCO-DICING…
SUSS-RCD8
CEITEC-NANO
MECHANICAL…
TORNADO-M4
UHV-LEIS
BET-DEGASSER
BAMBULAB
UHV-CLUSTER
JASCO
ALD-FIJI
NANOWIZARD
APCVD
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
DIENER
RTP
CPD
KAUFMAN
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
IR-RAMAN
NANOINDENTER
K70
KEITHLEY-4200
R4…
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
CHEMLAB-B1.14
FLOWBOX
LITESCOPE-MIRA…
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
4-POINT
PECVD-NANOFAB
LEICACOAT-NANO
LITESCOPE-LYRA
LECTROPOL
ACCURION_RSE
3D-PRUSA-ORANGE
WOOLLAM-VIS
TIC3X
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PARYLENE-DIENER
NIKON-NANO
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
FUMEHOOD…
NIRQUEST512
CRYOMILL
LPCVD-polySi
DHR
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
SPONGEBOB
DRYING-OVEN-B1…
DIMPLING…
SUSS-MA8
SW-CT
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
UV-LASER
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Jasenský, Kryštof
Cuccu, Elisa
Pribytova, Ekaterina
Kumar, Sanjay
Kumar, Sanjay
Kumar, Sanjay
Ščasnovič, Erik
Havlíková, Tereza
Pavliňák, David
Šťastný, Přemysl
Saldan, Ivan
Nghiem, Xuan Duc
Fatima, Areej
Polčák, Josef
Procházková, Anna
Horák, Michal
Kolíbalová, Eva
Bolouki, Nima
Janů, Lucie
Slovák, Vojtěch
Slovák, Vojtěch
Vymazal, Jan
Spotz, Zdeněk
Bednaříková, Vendula
Pavliňák, David
Říhová, Martina
Říhová, Martina
Daradkeh, Samer
Molnár, Tomáš
Mařák, Vojtěch
Valadi Palliyalil, Anjali
Supalová, Linda
Fecko, Peter
Fecko, Peter
Fecko, Peter
Kumar, Sanjay
Kharchenko, Ganna
Kovařík, Martin
Sanna, Michela
Přibyl, Roman
Otýpka, Martin
Kharchenko, Ganna
SAHIL, Muhammad
U Danchuk, Viktor
Mukherjee, Aniket
de Oliveira Santiago, Pedro Henrique
Jasenský, Kryštof
Skálová, Zdenka
Wang, Yue
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Danchuk, Viktor
Přibyl, Roman
Caha, Ondřej
Kharchenko, Ganna
U Piastek, Jakub
Staňo, Michal
S Šamořil, Tomáš
Jasenský, Kryštof
Krčma, Jakub
Cuccu, Elisa

Upcoming trainings

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Term Name Description Max. attendees
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Hnilica Jan, Kristýna Kupková, Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Andrej Juríček, Kristýna Kupková, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3