Tuesday 11.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
ICON-SPM
VERSALAB
AMBER
WITEC-RAMAN
MONOWAVE
RIGAKU3
UHV-LEEM
UHV-PREPARATION
RIE-FLUORINE
DRYING-OVEN-B1…
SPONGEBOB
MIRA-EBL
ML3-BABY
HELIOS
LYRA
UHV-DEPOSITION
MIRA-STAN
FUMEHOOD…
NMR
CHEMLAB-B1.14
VERIOS
CRYOGENIC
LITESCOPE-MIRA…
TITAN
RIGAKU9
BET-DEGASSER
PECVD
WOOLLAM-RC2
NANOSAM
LEICACOAT-STAN
3D-PRUSA-BLUE
BET-ANAMET
STEMI
SIMS
NANOCALC
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
SHAKER-B1.18
SUMMIT
SW-BEAMER
ULTRACENTRIFUGE
LaserMIRA
SEE-SYSTEM
ACCURION_RSE
PARYLENE-SCS
MINIFLEX
RTP
DIENER
Q-LAB
RIE-CHLORINE
SW-LAB
SPINCOATER…
nanoCT
PARYLENE-DIENER
nano-CT
RSA
SAW-ACCUTOM
MIRKA
SNOM-NANONICS
SUSS-RCD8
TEM-SW
TEST2
SW-TRACER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
THEORY-SUPPORT
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV-CLUSTER
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
ZEISS-NANO
NANO-ONE-2PP
WOOLLAM-VIS
R4…
SW-CT
DRIE
DHR
DIMPLING…
RAITH
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
CLARUS-680
ALD-FIJI
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
MINIEVAP
BAMBULAB
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
FUMEHOOD…
Micromex
NIRQUEST512
HENRY-MAGNET
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
MAGNETRON
LIBS-Discovery
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
CITOPRESS
NANOSCAN
NIKON-NANO
LIBS-LabSys1
LIBS-FireFly
micro-CT-L240
CHEMLAB-B1.18
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
IS-NOVOCONTROL
LAURELL-NANO
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
Polčák, Josef
Jadhao, Pranjali
Dey, Sharmistha
Beliančínová, Beáta
Bakhshikhah, Mahan
Kubinec, Ondrej
Vijithra, Vijithra
Hrdinová, Sára
Staňo, Michal
Iakoubovskii, Konstantin
Havelka, Tomáš
Pavliňák, David
Ullattil, Sanjay Gopal
T Tmejová, Kateřina
Žaloudková, Lucie
Lee, Hyesung
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Supalová, Linda
Valadi Palliyalil, Anjali
Krútek, Šimon
Supalová, Linda
Pribytova, Ekaterina
Man, Ondřej
S Šamořil, Tomáš
Endstrasser, Zdeněk
Ulč, Filip
Valadi Palliyalil, Anjali
de Oliveira Santiago, Pedro Henrique
Fanisaberi, Amirmohsen
Devi Thongam, Debika
T Danchuk, Viktor
Ulč, Filip
S Michalička, Jan
Staňo, Michal
T Tmejová, Kateřina
Cuccu, Elisa
Dey, Sharmistha
S Danchuk, Viktor
U Holas, Jiří

Upcoming trainings

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Term Name Description Max. attendees
11.8. 09:30 - 10:00 Monowave training The training for the experienced users. Attendees: Anjali Valadi Palliyalil 2
11.8. 15:00 - 7.8. 16:50 CRYOGENIC DCR CRYOGENIK DCR Attendees: Ekaterina Pribytova 1
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, Rosmi Vinson, DAVIDE MURTAS 4
13.8. 09:00 - 14.8. 17:30 Amber SEM-FIB training Attendees: Yue Wang 2
14.8. 13:00 - 13:45 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
14.8. 13:45 - 14:30 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3