Wednesday 29.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
MIRA-STAN
RIE-FLUORINE
ML3-BABY
RIGAKU3
TITAN
LASER-DICER
AMBER
SUSS-WETBENCH
ICON-SPM
SPONGEBOB
LEICACOAT-STAN
EVAPORATOR
ACCURION_RSE
WITEC-RAMAN
GLOVEBOX…
NMR
BET-ANAMET
UHV-LEEM
micro-CT-L240
NANOSAM
UHV-DEPOSITION
LAKESHORE
FUMEHOOD…
TGA-DISCOVERY
SIMS
FUMEHOOD…
TEGRAMIN
UHV-LEIS
VNA-MPI
LAURELL-NANO
VACUUM-OVEN-B1…
ZETASIZER
R2-PECVD
CHEMLAB-B1.14
CHEMLAB-B1.18
ZEISS-STAN
LYRA
CRYOGENIC
UHV-PREPARATION
UHV-XPS
MIRA-EBL
KAUFMAN
UHV-SPM
DEKTAK
FTIR
RAITH
DSC-DISCOVERY
VERSALAB
MAGNETRON
WIRE-BONDER
DHR
MIRKA
SNOM-NANONICS
MINIFLEX
RIE-CHLORINE
STEMI
Q-LAB
NANOCALC
nano-CT
SAW-ACCUTOM
nanoCT
SHAKER-B1.18
SUMMIT
LaserMIRA
SEE-SYSTEM
SPINCOATER…
PARYLENE-SCS
RSA
DIENER
RTP
SUSS-RCD8
TEST2
SW-BEAMER
FTIR-CHEMLAB
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
CITOVAC
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
RIGAKU9
microCT
ZWICK
UHV…
UHV-CLUSTER
SW-LAB
Test školení
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEM-SW
TEST-RFID2
UHV-PLD
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-MBE
PECVD
NANO-ONE-2PP
PARYLENE-DIENER
R4…
CRYOMILL
SW-CT
DRIE
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CPD
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
FUMEHOOD…
CLARUS-680
3D-PRUSA-ORANGE
MONOWAVE
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
CITOPRESS
LPCVD-SiN
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PROTOMAT
LPCVD-polySi
Micromex
IS-NOVOCONTROL
micro-CT-m300
DAWN-HELEOS
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
SCIA
LITESCOPE-MIRA…
FISCHIONE-TEM…
IR-RAMAN
K70
KEITHLEY-4200
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
AL Soud, Ammar
Pavliňák, David
Mukherjee, Aniket
Fatima, Areej
Tantis, Iosif
T Lepcio, Petr
Oliver Urrutia, Carolina
Bednaříková, Vendula
Šamořil, Tomáš
Kumar, Sanjay
Supalová, Linda
Baeva, Maria
Otýpka, Martin
Otýpka, Martin
Fecko, Peter
Otýpka, Martin
Arenas Buelvas, Daina Dayana
Wirthová, Michaela
Kolíbalová, Eva
Horák, Michal
T Potoček, Michal
Kolář, Richard
Spousta, Jiří
Spousta, Jiří
Supalová, Linda
Otýpka, Martin
Dey, Sharmistha
Mukherjee, Aniket
Tvrdoňová, Anna
Krútek, Šimon
Rotter, Marek
Kumar, Sanjay
Baeva, Maria
Krútek, Šimon
Rusnaková, Nicole
Rusnaková, Nicole
paiva de araujo, Estacio
Bakhshikhah, Mahan
Saldan, Ivan
Pavliňák, David
Kreuzerová, Monika
Kotásková, Lucie
Tantis, Iosif
Tantis, Iosif
Hrůza, Dominik
Kolář, David
S Danchuk, Viktor
Hrůza, Dominik
Holcman, Vladimír
Tvrdoňová, Anna
Sanna, Carolina
Bábor, Petr
Kumar, Sanjay
Prajzler, Vladimír
Vaníčková, Elena
Klíma, Jan
Krútek, Šimon
Pavliňák, David
S Lehchenkova, Iryna
Janů, Lucie
Saldan, Ivan
Kumar, Sanjay
Mařák, Vojtěch
S Šamořil, Tomáš
Klíma, Jan
Hrůza, Dominik
Hrůza, Dominik
Supalová, Linda
Prášek, Jan
Hrůza, Dominik
Baeva, Maria
U Nebojsa, Alois
Lišková, Zuzana
S Lehchenkova, Iryna
Hrdinová, Sára
Staňo, Michal
Kostka, Marek
Kreuzerová, Monika

Upcoming trainings

Show more

Term Name Description Max. attendees
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 2
30.7. 09:00 - 18:30 Amber Introductory 1/2 training for basic operation of SEM and EDS Attendees: Sanjay Kumar 4
30.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Franc Paré Estalella 2
31.7. 15:30 - 17:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Sára Hrdinová 1
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10