Tuesday 21.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
MIRA-STAN
WITEC-RAMAN
ML3-BABY
SUSS-WETBENCH
UHV-PREPARATION
EVAPORATOR
UHV-LEEM
UHV-DEPOSITION
LYRA
KRATOS-XPS
RIE-FLUORINE
FUMEHOOD…
HELIOS
FUMEHOOD…
ALD-BENEQ
RIGAKU3
SEE-SYSTEM
DHR
ALD-FIJI
MAGNETRON
TEGRAMIN
FTIR
MECHANICAL…
MIRA-EBL
TITAN
CHEMLAB-B1.16
IS_NOVOCONTROL
UHV-XPS
FUMEHOOD…
AMBER
FUMEHOOD…
CRYOGENIC
DEKTAK
SUSS-MA8
CHEMLAB-B1.18
LEICACOAT-NANO
micro-CT-L240
R2-PECVD
WOOLLAM-RC2
CHEMLAB-B1.14
LAKESHORE
KERR-MICROSCOPE
NANOCALC
LITESCOPE-LYRA
FUMEHOOD…
SNOM-NANONICS
FUMEHOOD…
BRILLOUIN
3D-PRUSA-BLACK
LEICACOAT-STAN
R4…
ULTRAFAST-LASER
DIENER
RAITH
UHV-SPM
RIE-CHLORINE
ICON-SPM
VACUUM_OVEN-C1…
VERSALAB
TIC3X
SW-BEAMER
SW-LAB
SUSS-RCD8
SW-TRACER
ACCURION_RSE
BET-ANAMET
RSA
STEMI
MINIFLEX
nanoCT
nano-CT
PARYLENE-SCS
SIMS
LaserMIRA
SUMMIT
LEICA-TXP
SHAKER-B1.18
3D-PRUSA-XL
UHV-MBE1
TENUPOL
VUVAS
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
ULTRASONIC…
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
UHV…
FISCHIONE-160
Heliscan
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV…
UHV-MBE2
Q-LAB
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
RTP
DSC-DISCOVERY
SPINCOATER…
FUMEHOOD-HF
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
DRIE
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-m300
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
DIMPLING…
SW-CT
NANOINDENTER
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
FRASCAN
ZEISS-STAN
SAW-ACCUTOM
NMR
CITOPRESS
NanoOne250
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
MPS150
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
MONOWAVE
WOOLLAM-MIR
SCIA
LIBS-FireFly
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-Discovery
LABOTOM5
LIBS-LabSys1
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
HENRY-MAGNET
UV-LASER
Janoušek, Tomáš
Pathak, Saurabh
Ali, Hasan
Šťastný, Jakub
Koňařík, Lukáš
Lukiienko, Iryna
Drotárová, Lenka
Tkachenko, Serhii
Supalová, Linda
Fu, Hongbo
Lukiienko, Iryna
Lukiienko, Iryna
Janoušek, Tomáš
Havelka, Tomáš
Iakoubovskii, Konstantin
Ligmajer, Filip
Koňařík, Lukáš
Petrosyan, Derenik
Petrosyan, Derenik
Povey, Rhys Geoffrey
Štálnik, Jozef
U Hrdý, Radim
Supalová, Linda
Povey, Rhys Geoffrey
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Koller, Christian
Košelová, Zuzana
Prášek, Jan
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Jelínek, Eduard
S Šamořil, Tomáš
Liška, Jiří
Polčák, Josef
Jadhao, Pranjali
Pavliňák, David
Koňařík, Lukáš
Supalová, Linda
Lukiienko, Iryna
Figura, Daniel
Figura, Daniel
Očkovič, Adam
Kicmerova, Dina
U Lepcio, Petr
Lukiienko, Iryna
Mirdamadi Khouzani, Sayed Hossein
Štálnik, Jozef
Gejdoš, Pavel
Thelappurath, Aiswarya Vijayakumar
Polášková, Kateřina
Valiyev, Rasul
U Lepcio, Petr
Chamradová, Ivana
Supalová, Linda
Supalová, Linda
Papež, Nikola
U Prášek, Jan
Rotter, Marek
Pišťák, Jan
Liška, Jiří
Bolouki, Nima
Varga, Dominik
Varga, Dominik
Lukiienko, Iryna
Štálnik, Jozef
Heczko, Milan
S Michalička, Jan
T Tmejová, Kateřina
Tmejová, Kateřina
Patil, Virendra
Fu, Hongbo
Hrůza, Dominik
Tmejová, Kateřina
Iakoubovskii, Konstantin
U Lepcio, Petr
Danchuk, Viktor
Bajwa, Laiba Asad
Figura, Daniel
T Tmejová, Kateřina
Pišťák, Jan
Kareš, Martin
Bolouki, Nima
Přibyl, Roman
T Tmejová, Kateřina
Holcman, Vladimír
Arregi Uribeetxebarria, Jon Ander
Lukiienko, Iryna
Klok, Pavel
T Supalová, Linda
Klok, Pavel
T Supalová, Linda
Krčma, Jakub
Kumar, Sanjay
U Holas, Jiří
Janůšová, Martina
Arregi Uribeetxebarria, Jon Ander
Idesová, Beáta
S Lišková, Zuzana
Hrůza, Dominik
U Eliáš, Marek
T Gablech, Evelína
Zdeg, Ikram
Klimek, Jan
Kramář, Jan

Upcoming trainings

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Term Name Description Max. attendees
21.4. 09:30 - 12:00 ICON-SPM basic training Attendees: Viktor Danchuk 3
21.4. 10:00 - 10:45 Solvent fumehood training (ISO 5) Training for the solvent fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 10:45 - 11:30 Etching fumehood training (ISO 5) Training for the etching fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Petr Sysel, Ying Hu, Thông Thái Trần, Rosmi Vinson 5
21.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
21.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Ying Hu, Thông Thái Trần, Rosmi Vinson, Carolina Sanna, Sharmistha Dey, Šimon Krútek 10
21.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Carolina Oliver Urrutia, Ying Hu, Thông Thái Trần, Rosmi Vinson, Carolina Sanna, Sharmistha Dey 10
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik, Sujan Maity 3
22.4. 13:30 - 15:00 MPS150 training Training of the new user Attendees: Niko Plantak 1
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
23.4. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Karan Singh Surana 1
24.4. 09:30 - 12:00 DRIE-training Attendees: Rhys Geoffrey Povey, Heriknaz Asatryan 3
24.4. 14:00 - 28.5. 16:00 LVEM_basic (2/2) Hands-on session Attendees: Karan Singh Surana 1
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta, Ying Hu 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1