Tuesday 13.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIGAKU3
SUSS-WETBENCH
ML3-BABY
WITEC-RAMAN
ICON-SPM
EVAPORATOR
AMBER
MECHANICAL…
RIE-FLUORINE
NANOCALC
VERSALAB
MIRA-STAN
KRATOS-XPS
LEICACOAT-STAN
VERIOS
BET-DEGASSER
TITAN
NMR
VNA-MPI
WOOLLAM-RC2
UHV-SPM
UHV-PLD
LEICACOAT-NANO
UHV-XPS
UHV-DEPOSITION
CRYOGENIC
SNOM-NANONICS
PARYLENE-SCS
FUMEHOOD…
FUMEHOOD…
LASER-DICER
LPCVD-polySi
R2-PECVD
BET-ANAMET
micro-CT-L240
DEKTAK
UHV-PREPARATION
FTIR
MPS150
ALD-BENEQ
ZWICK
APCVD
ALD-FIJI
WIRE-BONDER
L450
WOOLLAM-VIS
RAITH
NANOSCAN
NIKON-NANO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
CRYOMILL
DIENER
SPINCOATER…
MINIFLEX
MIRKA
RIE-CHLORINE
SAW-ACCUTOM
SHAKER-B1.18
SUSS-RCD8
SUMMIT
ACCURION_RSE
LaserMIRA
ICON-SPM
nanoCT
SEE-SYSTEM
SIMS
nano-CT
RSA
Q-LAB
MIRA-EBL
RTP
STEMI
TEST-RFID4
SW-BEAMER
FTIR-CHEMLAB
UHV…
UHV…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
CITOVAC
UHV-MBE
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
XEF2
RIGAKU9
microCT
ZETASIZER
UHV-CLUSTER
UHV-LEIS
SW-LAB
Test školení
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID2
UHV-LEEM
TEM-SW
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
PECVD
NANO-ONE-2PP
3D-PRUSA-ORANGE
LYRA
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
4-POINT
PARYLENE-DIENER
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DIMPLING…
DHR
Micromex
TORNADO-M4
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
CEITEC-NANO
DRIE
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
SW-CT
CLARUS-680
micro-CT-m300
3D-PRUSA-BLACK
WOOLLAM-MIR
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LABOTOM5
3D-PRUSA-XL
LITESCOPE-MIRA…
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSAM
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LPCVD-SiN
LITESCOPE-LYRA
DAWN-HELEOS
ZEISS-STAN
TEGRAMIN
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
SCIA
LIBS-LabSys1
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Novotná, Lenka
Kumar, Sanjay
Bednaříková, Vendula
Kalleshappa, Bindu
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Henzl, Tomáš
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Henzl, Tomáš
Šťastný, Jakub
paiva de araujo, Estacio
Kepič, Peter
T Máčala, Jakub
Šťastný, Jakub
B Máčala, Jakub
Bajwa, Laiba Asad
T Prášek, Jan
Šimůnková, Helena
Iakoubovskii, Konstantin
Iakoubovskii, Konstantin
Varga, Dominik
Varga, Dominik
T Eliáš, Marek
paiva de araujo, Estacio
Dinis, Matej
Dinis, Matej
Danchuk, Viktor
Daradkeh, Samer
Michlovská, Lenka
Žaloudková, Lucie
S Polčák, Josef
Čechal, Jan
Formánek, Šimon
Bednaříková, Vendula
Formánek, Šimon
Cao, Hoang-Anh
Tantis, Iosif
Lee, Hyesung
Michalička, Jan
B Michalička, Jan
Kotásková, Lucie
U Jewula, Pawel
Pribytova, Ekaterina
Dey, Sharmistha
D'Angelo, Elena
Kepič, Peter
Yuan, Yunhuan
D'Angelo, Elena
D'Angelo, Elena
Pribytova, Ekaterina
Kepič, Peter
Bajwa, Laiba Asad
Jewula, Pawel
Mukherjee, Aniket
Papež, Nikola
Dinis, Matej
Beliančínová, Beáta
Tantis, Iosif
Kolář, David
T Švarc, Vojtěch
D'Angelo, Elena
T Nebojsa, Alois
paiva de araujo, Estacio
Kepič, Peter
Sevriugina, Veronika
Dinis, Matej
Otýpka, Martin
Kostka, Marek
Slovák, Vojtěch
Dubroka, Adam
Lišková, Zuzana
Kovařík, Martin
Bajwa, Laiba Asad
Allaham, Mohammad
Danchuk, Viktor
Tmejová, Kateřina
Bajwa, Laiba Asad

Upcoming trainings

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Term Name Description Max. attendees
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Eduard Jelínek, Marie Cmíralová, Marek Soldán 3
13.10. 10:30 - 11:30 DEKTAK training Attendees: Helena Šimůnková 1
13.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek 2
14.10. 09:00 - 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
14.10. 09:30 - 12:00 ALD-Fiji- training Attendees: Eduard Jelínek, Tomáš Henzl 3
14.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Zequn Zhang, Aneta Opluštilová, Lukáš Dokulil, Martin Kužílek 10
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Aneta Opluštilová 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1