Friday 24.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
MIRA-STAN
WITEC-RAMAN
DIENER
RIE-FLUORINE
LEICACOAT-STAN
CRYOGENIC
SUSS-WETBENCH
UHV-LEEM
UHV-XPS
VERSALAB
LASER-DICER
LYRA
UHV-PREPARATION
BAMBULAB
FUMEHOOD…
LVEM
KERR-MICROSCOPE
RAITH
KRATOS-XPS
LITESCOPE-MIRA…
LAKESHORE
3D-PRUSA-XL
LITESCOPE-LYRA
LAURELL-NANO
SUSS-MA8
R2-PECVD
SCIA
IS_NOVOCONTROL
CHEMLAB-B1.16
NANOINDENTER
TITAN
MAGNETRON
SPINCOATER…
ML3-BABY
UHV-LEIS
ZETASIZER
RIGAKU9
WIRE-BONDER
VACUUM-OVEN-B1…
VACUUM_OVEN-C1…
DWL
ULTRAFAST-LASER
UHV-SPM
AMBER
NANOSAM
SIMS
ICON-SPM
SNOM-NANONICS
RIGAKU3
TEGRAMIN
TEM-SW
3D-PRUSA-ORANGE
WOOLLAM-VIS
VNA-MPI
DSC-DISCOVERY
UV-LASER
MECHANICAL…
BRILLOUIN
FUMEHOOD…
LEXT
EVAPORATOR
TUBE-FURNACE
Heliscan
TGA-DISCOVERY
THEORY-SUPPORT
TENUPOL
TEST-RFID2
Test školení
TEST2
UHV-MBE2
Test O2
Test Ondra 3
CLR-ISO8-Lab…
FISCHIONE-160
TGA96
SW-TRACER
LEICA-TXP
LaserMIRA
RSA
MIRA-EBL
CPD
MINIEVAP
PARYLENE-SCS
SEE-SYSTEM
SUMMIT
SW-LAB
SHAKER-B1.18
SW-COMSOL
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
UHV-MBE1
UHV-FTIR
UHV-DEPOSITION
FTIR
GLOVEBOX…
ZWICK
microCT
ALD-BENEQ
APCVD-Diffusion
XEF2
ARES
APCVD
L450
VISCOMETER
VUVAS
NANOWIZARD
VACUUM-OVEN-B1…
CITOVAC
FTIR-CHEMLAB
nanoCT
ALD-FIJI
JAZ3-CHANNEL
JASCO
DISCO-DICING…
US-CUTTER
ULTRASONIC…
BET-DEGASSER
UHV…
UHV…
UHV-CLUSTER
TORNADO-M4
UHV-PLD
UHV-MBE
CEITEC-NANO
nano-CT
DAWN-HELEOS
MINIFLEX
FUMEHOOD…
FLOWBOX
PROTOMAT
HELIOS
4-POINT
LPCVD-SiN
LPCVD-polySi
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
LIBS-LabSys1
LIBS-Discovery
LIBS-FireFly
FUMEHOOD…
FUMEHOOD…
KEITHLEY-4200
HENRY-MAGNET
CHEMLAB-B1.14
micro-CT-L240
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
Micromex
CLARUS-680
CHEMLAB-B1.18
K70
FUMEHOOD…
ZEISS-STAN
FUMEHOOD…
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
R4…
ELECTROWORKSHOP
micro-CT-m300
DRIE
DIMPLING…
PARYLENE-DIENER
DHR
PECVD
MIRKA
SAW-ACCUTOM
Q-LAB
3D-PRUSA-BLUE
RTP
ACCURION_RSE
SW-CT
SUSS-RCD8
CRYOMILL
TIC3X
3D-PRUSA-BLACK
ULTRACENTRIFUGE
WOOLLAM-RC2
CITOPRESS
DEKTAK
LABOTOM5
WOOLLAM-MIR
LECTROPOL
MPS150
MONOWAVE
NanoOne250
ZEISS-NANO
NANOSCAN
SPONGEBOB
NIKON-NANO
NIRQUEST512
DRYING-OVEN-B1…
NMR
RIE-CHLORINE
Idesová, Beáta
Pišťák, Jan
Lukiienko, Iryna
Ali, Hasan
Kramář, Jan
Ščasnovič, Erik
Kumar, Sanjay
Žaloudková, Lucie
Havelka, Tomáš
Weisz, Hugo
S Spotz, Zdeněk
Iakoubovskii, Konstantin
Jakešová, Marie
Povey, Rhys Geoffrey
Jakešová, Marie
Štálnik, Jozef
Supalová, Linda
Lukiienko, Iryna
Štálnik, Jozef
Ščasnovič, Erik
Říhová, Martina
Gejdoš, Pavel
Pribytova, Ekaterina
Lukiienko, Iryna
Lukiienko, Iryna
Povey, Rhys Geoffrey
Supalová, Linda
Rovenská, Katarína
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Daradkeh, Samer
Lukiienko, Iryna
Rovenská, Katarína
Lukiienko, Iryna
Jelínek, Eduard
Štálnik, Jozef
Hrůza, Dominik
Hrůza, Dominik
Spusta, Tomáš
Fecko, Peter
Jewula, Pawel
Tmejová, Kateřina
T Kolíbalová, Eva
T Kolíbalová, Eva
Arregi Uribeetxebarria, Jon Ander
Lukiienko, Iryna
U Lišková, Zuzana
Lišková, Zuzana
Polčák, Josef
Polášková, Kateřina
Kramář, Jan
Kumar, Sanjay
Holcman, Vladimír
Spusta, Tomáš
Klok, Pavel
Tvrdoňová, Anna
Supalová, Linda
Bolouki, Nima
Štálnik, Jozef
Fu, Hongbo
Tmejová, Kateřina
Polášková, Kateřina
S Michalička, Jan
Povey, Rhys Geoffrey
Pathak, Saurabh
Povey, Rhys Geoffrey
Staněk, Jan
Kreuzerová, Monika
Slavíček, Radek
Otýpka, Martin
Fu, Hongbo
Zdeg, Ikram
Fecko, Peter
Arregi Uribeetxebarria, Jon Ander
Hrůza, Dominik
Iakoubovskii, Konstantin
Danchuk, Viktor
Bábor, Petr
paiva de araujo, Estacio
Klok, Pavel
Arenas Buelvas, Daina Dayana
Havlíková, Tereza
Ali, Hasan
Spusta, Tomáš
Franta, Daniel
Pribytova, Ekaterina
Pavliňák, David
Kumar, Sanjay
Varga, Dominik
Krčma, Jakub
Lukiienko, Iryna
Iakoubovskii, Konstantin
Jakešová, Marie
Havelka, Tomáš

Upcoming trainings

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Term Name Description Max. attendees
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Karan Singh Surana 1
24.4. 14:00 - 28.5. 16:00 LVEM_basic (2/2) Hands-on session Attendees: Karan Singh Surana 1
28.4. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Sharmistha Dey 2
28.4. 14:00 - 16:00 DRIE-training Attendees: Rhys Geoffrey Povey, Heriknaz Asatryan 3
5.5. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Carolina Oliver Urrutia 4
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta, Ying Hu 4
18.5. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/310295373414983?p=A06Vu2fman9ojWr9i0) Meeting ID: 310 295 373 414 983 Access code: Cw9Ff2yW Attendees: Sujan Maity 5
19.5. 12:15 - 12:50 Safety excursion Chem lab 5
19.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Sujan Maity 5
19.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
19.5. 14:25 - 14:55 Safety excursion - StAn lab 10
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1