Monday 7.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIGAKU3
SUSS-WETBENCH
UHV-DEPOSITION
UHV-PREPARATION
UHV-XPS
KRATOS-XPS
UHV-LEEM
VERIOS
VERSALAB
JASCO
RAITH
NANOSAM
BET-ANAMET
RIGAKU9
MAGNETRON-AJA
UHV-MBE
NANOCALC
TITAN
SEE-SYSTEM
EVAPORATOR
R2-PECVD
LITESCOPE-LYRA
HELIOS
LYRA
UHV-FTIR
TEGRAMIN
TGA-DISCOVERY
UHV-SPM
LITESCOPE-MIRA…
FUMEHOOD…
NANO-ONE-2PP
UHV-PLD
DIENER
LEICACOAT-STAN
NIKON-NANO
NANOSCAN
UHV…
ML3-BABY
VACUUM-OVEN-B1…
DEKTAK
BET-DEGASSER
VACUUM_OVEN-C1…
SUSS-RCD8
UHV…
LVEM
MIRA-STAN
MINIFLEX
TEM-SW
3D-PRUSA-BLACK
SHAKER-B1.18
SUMMIT
3D-PRUSA-ORANGE
LaserMIRA
RIE-FLUORINE
SIMS
SPINCOATER…
PARYLENE-SCS
PECVD
RTP
ICON-SPM
SNOM-NANONICS
Q-LAB
RSA
nano-CT
MIRKA
RIE-CHLORINE
ACCURION_RSE
SAW-ACCUTOM
nanoCT
MIRA-EBL
TEST2
STEMI
VUVAS
US-CUTTER
DWL
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VISCOMETER
ULTRAFAST-LASER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV-CLUSTER
SW-BEAMER
Test O2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
ULTRACENTRIFUGE
UHV-LEIS
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
3D-PRUSA-BLUE
WOOLLAM-MIR
ZEISS-NANO
R4…
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
CLARUS-680
NMR
MAGNETRON
LIBS-LabSys1
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LIBS-FireFly
SUSS-MA8
LABOTOM5
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NIRQUEST512
WOOLLAM-VIS
LIBS-Discovery
LAURELL-NANO
Micromex
CHEMLAB-B1.14
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
LASER-DICER
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Wang, Yue
Žaloudková, Lucie
Daradkeh, Samer
Žaloudková, Lucie
Bajwa, Laiba Asad
Holobrádek, Jakub
Holobrádek, Jakub
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Hrubá, Daniela
Polášková, Kateřina
Pavliňák, David
Allaham, Mohammad
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Rovenská, Katarína
U Kicmerova, Dina
Bolouki, Nima
Otýpka, Martin
S Danchuk, Viktor
E Tmejová, Kateřina
U Tmejová, Kateřina
Cuccu, Elisa
Fecko, Peter
U Danchuk, Viktor
Staňo, Michal
Tmejová, Kateřina
Tmejová, Kateřina
Varshney, Devanshu
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
U Danchuk, Viktor
Strnad, Jiří
S Michalička, Jan
Bolouki, Nima
Bajwa, Laiba Asad
Beliančínová, Beáta
Klok, Pavel
Bahadur, Fateh
S Šamořil, Tomáš
U Danchuk, Viktor
Havlíková, Tereza
Pavliňák, David
U Danchuk, Viktor
Ulč, Filip
Jewula, Pawel
Sanna, Michela
U Danchuk, Viktor
Bajwa, Laiba Asad
Bednaříková, Vendula
Strnad, Jiří
Kovařík, Martin
U Danchuk, Viktor
Bajwa, Laiba Asad
Pavliňák, David
Strnad, Jiří
Surana, Karan Singh
Otýpka, Martin
Fecko, Peter
U Danchuk, Viktor
Kolíbalová, Eva
Ulč, Filip

Upcoming trainings

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Term Name Description Max. attendees
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
11.9. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Iosif Tantis 4
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
17.9. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Maneesha Ramesh 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2