Friday 28.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
SUSS-WETBENCH
ML3-BABY
VERSALAB
FUMEHOOD…
MIRA-STAN
TITAN
RAITH
UHV-XPS
WOOLLAM-RC2
LAURELL-NANO
FUMEHOOD…
FUMEHOOD…
ICON-SPM
UHV-PREPARATION
R2-PECVD
UHV-DEPOSITION
KEITHLEY-4200
RIGAKU3
LEICACOAT-STAN
LYRA
SUSS-MA8
MPS150
ZWICK
RIGAKU9
VERIOS
AMBER
VUVAS
FTIR
ZEISS-NANO
DEKTAK
HELIOS
SUMMIT
PARYLENE-SCS
SHAKER-B1.18
LaserMIRA
NANOCALC
STEMI
SIMS
BET-ANAMET
SEE-SYSTEM
nanoCT
SNOM-NANONICS
SPINCOATER…
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
Q-LAB
MIRA-EBL
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-FLUORINE
RIE-CHLORINE
MINIFLEX
nano-CT
RSA
SW-BEAMER
Test školení
SW-LAB
CITOVAC
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
SW-TRACER
TGA96
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID2
TEST-RFID4
THEORY-SUPPORT
UHV-SPM
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
ULTRACENTRIFUGE
NANO-ONE-2PP
NMR
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
TIC3X
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
WOOLLAM-VIS
MAGNETRON
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
LABOTOM5
LITESCOPE-LYRA
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
LITESCOPE-MIRA…
LIBS-LabSys1
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LIBS-Discovery
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
LASER-DICER
LIBS-FireFly
UV-LASER
Polčák, Josef
Daradkeh, Samer
Přibyl, Roman
Cuccu, Elisa
E Jakešová, Marie
Piastek, Jakub
E Jakešová, Marie
Piastek, Jakub
Molnár, Tomáš
Danchuk, Viktor
Tvrdoňová, Anna
E Jakešová, Marie
Havlíková, Tereza
Ščasnovič, Erik
S Michalička, Jan
S Michalička, Jan
Cuccu, Elisa
MURTAS, DAVIDE
Jakub, Zdeněk
Přibyl, Roman
Tvrdoňová, Anna
E Jakešová, Marie
E Jakešová, Marie
Tsalagkas, Dimitrios
Jakub, Zdeněk
Janů, Lucie
Jakub, Zdeněk
Citterberg, Daniel
T Roupcová, Pavla
Havlíková, Tereza
S Šamořil, Tomáš
E Jakešová, Marie
Citterberg, Daniel
Sevriugina, Veronika
Caha, Ondřej
Nghiem, Xuan Duc
Spousta, Jiří
Přibyl, Roman
Přibyl, Roman
E Jakešová, Marie
E Jakešová, Marie
Staňo, Michal

Upcoming trainings

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Term Name Description Max. attendees
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10