Thursday 19.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
ML3-BABY
SUSS-WETBENCH
MIRA-STAN
RIE-FLUORINE
UHV-XPS
UHV-SPM
EVAPORATOR
VERIOS
LEICACOAT-STAN
DEKTAK
NANOCALC
PECVD
ALD-FIJI
WITEC-RAMAN
R2-PECVD
ALD-BENEQ
KRATOS-XPS
FUMEHOOD…
CRYOGENIC
MIRA-EBL
RAITH
TEGRAMIN
TITAN
RIGAKU3
VNA-MPI
FUMEHOOD…
NMR
LEICACOAT-NANO
RSA
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LAURELL-NANO
LIBS-FireFly
LITESCOPE-LYRA
WOOLLAM-VIS
UHV-DEPOSITION
MAGNETRON
ICON-SPM
CITOPRESS
SCIA
3D-PRUSA-XL
WIRE-BONDER
VERSALAB
ULTRAFAST-LASER
FTIR-CHEMLAB
DRYING_OVEN-B1…
DRIE
ZWICK
HELIOS
LYRA
LaserMIRA
SEE-SYSTEM
SIMS
SUMMIT
VACUUM_OVEN-B1…
PARYLENE-SCS
VACUUM_OVEN-B1…
VUVAS
SNOM-NANONICS
VISCOMETER
CITOVAC
SHAKER-B1.18
UHV-LEIS
nano-CT
L450
XEF2
nanoCT
MINIFLEX
RIE-CHLORINE
RIGAKU9
microCT
DIENER
SUSS-RCD8
ZETASIZER
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
FTIR
BET-ANAMET
VACUUM_OVEN-C1…
UHV-PREPARATION
UHV-FTIR
UHV-MBE
UHV-MBE1
UHV-MBE2
TGA-DISCOVERY
Heliscan
THEORY-SUPPORT
TGA96
UHV-PLD
UHV-CLUSTER
UHV…
SAW-ACCUTOM
UHV…
Test školení
TEST2
STEMI
Test O2
Test Ondra 3
US-CUTTER
AMBER
FISCHIONE-160
TENUPOL
LEICA-TXP
SW-TRACER
DWL
SW-LAB
JASCO
SW-BEAMER
UHV-LEEM
JAZ3-CHANNEL
TEST-RFID2
DSC-DISCOVERY
MIRKA
FLOWBOX
SW-CT
DHR
DIMPLING…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
4-POINT
TIC3X
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
CRYOMILL
CPD
micro-CT-L240
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
MINIEVAP
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
Micromex
micro-CT-m300
TEM-SW
NANOSAM
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
MPS150
MONOWAVE
NANOSCAN
NIKON-NANO
KERR-MICROSCOPE
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
HENRY-MAGNET
LVEM
DAWN-HELEOS
IR-RAMAN
PECVD-NANOFAB
FRASCAN
CHEMLAB-B1.16
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
K70
PROTOMAT
KEITHLEY-4200
LASER-DICER
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
UV-LASER
Jelínek, Eduard
Krajíčková, Kateřina
Koňařík, Lukáš
Otýpka, Martin
Niapos, Eleftherios
Jelínek, Eduard
Krajíčková, Kateřina
Citterberg, Daniel
Otýpka, Martin
Niapos, Eleftherios
Cao, Hoang-Anh
Havlíková, Tereza
Lukiienko, Iryna
Kalleshappa, Bindu
Kunc, Jan
Krajíčková, Kateřina
Piastek, Jakub
Koňařík, Lukáš
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Kunc, Jan
U Prášek, Jan
Prášek, Jan
Pišťák, Jan
Jadhao, Pranjali
Ronoh, Kipkurui
Cao, Hoang-Anh
Havlíková, Tereza
Bednaříková, Vendula
Citterberg, Daniel
Krajíčková, Kateřina
Fecko, Peter
Jelínek, Eduard
Jelínek, Eduard
Niapos, Eleftherios
Pistis, Martino
Pistis, Martino
Kunc, Jan
Niapos, Eleftherios
Bakhshikhah, Mahan
Sonigara, Kevalkumar Kishorbhai
Janů, Lucie
Beliančínová, Beáta
Kunc, Jan
Idesová, Beáta
Valadi Palliyalil, Anjali
Janů, Lucie
U Jewula, Pawel
Jewula, Pawel
Klíma, Jan
Lukiienko, Iryna
Kunc, Jan
Liška, Jiří
Delforge, Cyril
Delforge, Cyril
Skálová, Zdenka
T Michalička, Jan
Pišťák, Jan
Klíma, Jan
AL Soud, Ammar
Jewula, Pawel
Staňo, Michal
Sevriugina, Veronika
U Gablech, Evelína
U Jewula, Pawel
AL Soud, Ammar
Krajíčková, Kateřina
Zikmundová, Eva
T Dao, Radek
Franta, Daniel
Hrůza, Dominik
S Prášek, Jan
Wang, Yue
AL Soud, Ammar
Niapos, Eleftherios
Fecko, Peter
Piastek, Jakub
Lukiienko, Iryna
Arregi Uribeetxebarria, Jon Ander
Izsák, Dávid
AL Soud, Ammar
Citterberg, Daniel
Sevriugina, Veronika
Staňo, Michal
T Dao, Radek

Upcoming trainings

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Term Name Description Max. attendees
19.2. 09:30 - 12:00 ICON-SPM basic training 3
20.2. 08:30 - 14:30 LYRA advanced training - FIB, GIS, nanomanipulator The training focused on FIB, GIS, and the nanomanipulator. We will meet in the LYRA lab. Attendees: Pavel Klok, Cyril Delforge, Ivana Kratochvílová, Elisa Cuccu 4
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Zuzana Košelová, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Michela Sanna, Ekaterina Pribytova, Sujan Maity 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Michela Sanna, Sujan Maity, Hasan Ali, Jan Staněk 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Michela Sanna, Eduard Jelínek, Sujan Maity, Hasan Ali 10
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning users Renewing the certificate for long-inactive users. Meeting point at the microscope. Attendees: Michela Sanna, Martin Kovařík 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 5
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4