Wednesday 23.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
EVAPORATOR
ML3-BABY
RIGAKU3
FUMEHOOD-HF
VACUUM_OVEN-C1…
SUSS-MA8
AMBER
TITAN
3D-PRUSA-ORANGE
TEM-SW
ELECTROWORKSHOP
RIE-FLUORINE
UHV-XPS
HELIOS
LYRA
CRYOGENIC
R4…
FUMEHOOD…
IS-NOVOCONTROL
FUMEHOOD…
PARYLENE-SCS
UHV-DEPOSITION
MIRA-EBL
LITESCOPE-MIRA…
LAURELL-NANO
LASER-DICER
MIRA-STAN
NANOCALC
NANOINDENTER
CHEMLAB-B1.14
FUMEHOOD…
KERR-MICROSCOPE
BAMBULAB
3D-PRUSA-BLACK
DIENER
FTIR
ULTRACENTRIFUGE
LEICACOAT-STAN
TORNADO-M4
3D-PRUSA-XL
MPS150
NANOSAM
DEKTAK
DRIE
DHR
UHV-PREPARATION
NMR
WOOLLAM-VIS
ZEISS-NANO
RSA
STEMI
SHAKER-B1.18
BET-ANAMET
SW-BEAMER
RTP
SIMS
SUMMIT
LaserMIRA
SEE-SYSTEM
ACCURION_RSE
SW-LAB
SUSS-RCD8
ICON-SPM
RIE-CHLORINE
SNOM-NANONICS
MINIFLEX
nanoCT
nano-CT
NANO-ONE-2PP
TEST-RFID2
SW-TRACER
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
THEORY-SUPPORT
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
SPINCOATER…
TEST-RFID4
TGA96
Heliscan
UHV-CLUSTER
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
Q-LAB
WOOLLAM-MIR
SAW-ACCUTOM
LECTROPOL
CRYOMILL
SW-CT
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
Micromex
ALD-FIJI
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
MINIEVAP
BET-DEGASSER
BRILLOUIN
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
MIRKA
WOOLLAM-RC2
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
MAGNETRON
LABOTOM5
LIBS-LabSys1
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
3D-PRUSA-BLUE
PECVD
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.18
LIBS-FireFly
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER
Povey, Rhys Geoffrey
Matějka, Kryštof
Matějka, Kryštof
Jelínek, Eduard
Jakešová, Marie
Jakešová, Marie
Jelínek, Eduard
Tantis, Iosif
Polčák, Josef
Sobola, Dinara
Danchuk, Viktor
Povey, Rhys Geoffrey
Idesová, Beáta
Holobrádek, Jakub
Povey, Rhys Geoffrey
Jelínek, Eduard
T Piastek, Jakub
Žaloudková, Lucie
Novotná, Lenka
Žaloudková, Lucie
Jakešová, Marie
Jakešová, Marie
Lukiienko, Iryna
Lukiienko, Iryna
Jakešová, Marie
Jakešová, Marie
T Iakoubovskii, Konstantin
T Iakoubovskii, Konstantin
T Michalička, Jan
S Michalička, Jan
Kumar, Sanjay
Fecko, Peter
Duchoň, Jan
Huang, Yong
Kumar, Sanjay
Kumar, Sanjay
Matějka, Kryštof
Jakešová, Marie
D'Angelo, Elena
Ali, Hasan
Jelínek, Eduard
Lukiienko, Iryna
Eliáš, Marek
Jakešová, Marie
S Sobola, Dinara
Tvrdoňová, Anna
Jakešová, Marie
D'Angelo, Elena
Matějka, Kryštof
Ulč, Filip
Tvrdoňová, Anna
Jelínek, Eduard
Ulč, Filip
Jelínek, Eduard
B Máčala, Jakub
Saldan, Ivan
Jewula, Pawel
SAHIL, Muhammad
Spusta, Tomáš
Kumar, Sanjay
Povey, Rhys Geoffrey
Liška, Jiří
Saldan, Ivan
Gejdoš, Pavel
Pavliňák, David
Spusta, Tomáš
Liška, Jiří
S Danchuk, Viktor
Jelínek, Eduard
Jelínek, Eduard
Chamradová, Ivana
D'Angelo, Elena
U Jewula, Pawel
Dubroka, Adam
Holobrádek, Jakub

Upcoming trainings

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Term Name Description Max. attendees
23.9. 15:30 - 17:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Sujan Maity 1
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
25.9. 10:00 - 12:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik 1
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10