Monday 15.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
MIRA-STAN
MIRA-EBL
SUSS-WETBENCH
TITAN
CRYOGENIC
LAURELL-NANO
RIE-FLUORINE
WITEC-RAMAN
UHV-DEPOSITION
DHR
BET-ANAMET
UHV-SPM
SPONGEBOB
EVAPORATOR
UHV-LEEM
HELIOS
FUMEHOOD…
DIENER
PARYLENE-SCS
SIMS
WOOLLAM-VIS
AMBER
NIKON-NANO
TEGRAMIN
CHEMLAB-B1.14
RIGAKU9
UHV-XPS
UHV-PREPARATION
ALD-FIJI
LEICACOAT-STAN
SUSS-MA8
RIGAKU3
LAKESHORE
STEMI
NANOCALC
3D-PRUSA-ORANGE
PARYLENE-DIENER
ICON-SPM
TEM-SW
PECVD
SUMMIT
LaserMIRA
SEE-SYSTEM
MIRKA
SHAKER-B1.18
ZEISS-NANO
SAW-ACCUTOM
SNOM-NANONICS
SUSS-RCD8
RSA
ULTRACENTRIFUGE
SPINCOATER…
nano-CT
Q-LAB
nanoCT
MINIFLEX
RTP
3D-PRUSA-BLACK
ACCURION_RSE
RIE-CHLORINE
3D-PRUSA-BLUE
NANO-ONE-2PP
Test Ondra 3
SW-BEAMER
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
ULTRAFAST-LASER
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
SW-LAB
TGA96
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test O2
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV…
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
NMR
ML3-BABY
NIRQUEST512
R4…
CRYOMILL
SW-CT
DRIE
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
FUMEHOOD…
CLARUS-680
NANOSAM
HENRY-MAGNET
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
MAGNETRON
LIBS-FireFly
WOOLLAM-RC2
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-Discovery
LASER-DICER
Micromex
NANOINDENTER
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.16
R2-PECVD
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Kalleshappa, Bindu
Daradkeh, Samer
Sobola, Dinara
Polášková, Kateřina
Pavliňák, David
Sevriugina, Veronika
Mařák, Vojtěch
Říhová, Martina
Davidková, Kristyna
Supalová, Linda
Davidková, Kristyna
Bajwa, Laiba Asad
Davidková, Kristyna
Supalová, Linda
Kolíbalová, Eva
Kolíbalová, Eva
Slavíček, Radek
Daradkeh, Samer
Tvrdoňová, Anna
Bajwa, Laiba Asad
Supalová, Linda
Supalová, Linda
Chamradová, Ivana
Ullattil, Sanjay Gopal
D'Angelo, Elena
T Lepcio, Petr
E Tmejová, Kateřina
Hrůza, Dominik
Tvrdoňová, Anna
Tvrdoňová, Anna
Molnár, Tomáš
Bahadur, Fateh
Bajwa, Laiba Asad
Šimůnková, Helena
Bajwa, Laiba Asad
Bábor, Petr
Duchaň, Marek
Spousta, Jiří
T Supalová, Linda
Paredes Sánchez, Claudia
T Lepcio, Petr
Slavíček, Radek
Molnár, Tomáš
Molnár, Tomáš
Eliáš, Marek
Sevriugina, Veronika
Bajwa, Laiba Asad
Pišťák, Jan
Holcman, Vladimír

Upcoming trainings

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Term Name Description Max. attendees
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2
15.6. 10:00 - 11:00 Nikon - optical microscope ISO 5 Training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Martin Otýpka, Kryštof Jasenský 2
16.6. 08:30 - 15:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Hasan Ali 3
17.6. 14:00 - 15:31 ML3-Baby ML3 Baby MicroWriter training Attendees: David Jonathan Walcher 1
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson, Sharmistha Dey 4
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2