| 13.8. 09:00 - 14.8. 17:30 |
Amber
|
SEM-FIB training
Attendees:
Yue
Wang,
Peter
Fecko
|
2
|
| 14.8. 13:00 - 13:45 |
Solvent fumehood - ISO 5
|
Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom.
Attendees:
Ganna
Kharchenko,
Sujan
Maity
|
2
|
| 14.8. 13:45 - 14:30 |
Etching fumehood - ISO 5
|
Training for the etching fumehoods in Nanofabrication.
Attendees:
Ganna
Kharchenko,
Sujan
Maity
|
2
|
| 18.8. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Nima
Bolouki,
Šimon
Formánek
|
3
|
| 19.8. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Šimon
Formánek
|
1
|
| 19.8. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Nima
Bolouki
|
1
|
| 19.8. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 20.8. 09:00 - 13:00 |
Rigaku3-hands on
|
Rigaku3-hands on
Attendees:
Muhammad
SAHIL
|
1
|
| 20.8. 13:00 - 17:00 |
Rigaku3-hands on
|
Rigaku3-hands on Sharmistha
Attendees:
Sharmistha
Dey
|
1
|
| 21.8. 09:30 - 12:00 |
RIE-flourine - training
|
Attendees:
Nikol
Kaděrová,
DAVIDE
MURTAS,
Karel
Škubník
|
3
|
| 24.8. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV)
Meeting ID: 317 713 074 790 138
Access code: ya9A3E3C
Attendees:
Philipp
Jäger
|
5
|
| 25.8. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
|
Attendees:
Yue
Wang
|
5
|
| 25.8. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Yue
Wang,
Philipp
Jäger
|
5
|
| 25.8. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Philipp
Jäger
|
10
|
| 25.8. 14:25 - 14:55 |
Safety excursion - Structural Analysis
|
Attendees:
Philipp
Jäger
|
10
|
| 26.8. 09:30 - 14:30 |
NANO-ONE-2PP 1/2
|
The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training.
Attendees:
Martina
Triebelová
|
3
|
| 27.8. 09:00 - 13:00 |
Rigaku3-hands on
|
Rigaku3-hands on Iosif Tantis
Attendees:
Iosif
Tantis
|
1
|
| 27.8. 13:00 - 15:00 |
LVEM_EDS (3)
|
Attendees:
Anjali
Valadi Palliyalil,
Karan Singh
Surana
|
2
|
| 4.9. 10:00 - 13:00 |
Verios/Helios_EDS
|
Practical demonstration of EDS analytical system at Verios and Helios.
Attendees:
Sunny
Nandi
|
3
|
ML3-BABY
RIE-FLUORINE
LYRA