Friday 19.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
WITEC-RAMAN
AMBER
SUSS-WETBENCH
RIE-FLUORINE
TEST-RFID4
EVAPORATOR
MIRA-EBL
MIRA-STAN
ML3-BABY
CRYOGENIC
DHR
UHV-PREPARATION
RAITH
SCIA
UHV-XPS
LAKESHORE
HELIOS
TEGRAMIN
LIBS-FireFly
UHV-LEIS
UHV-LEEM
FUMEHOOD-HF
ICON-SPM
LITESCOPE-MIRA…
FUMEHOOD…
DRIE
VERSALAB
WOOLLAM-RC2
VERIOS
ZEISS-NANO
NMR
WOOLLAM-VIS
ALD-FIJI
TITAN
NANOSCAN
CLARUS-680
TGA-DISCOVERY
FTIR
TUBE-FURNACE
DIENER
LEICACOAT-STAN
WOOLLAM-MIR
DEKTAK
CPD
NANOCALC
LaserMIRA
SUMMIT
STEMI
SEE-SYSTEM
BET-ANAMET
SHAKER-B1.18
nano-CT
SIMS
PARYLENE-SCS
SNOM-NANONICS
RSA
nanoCT
MINIFLEX
RIE-CHLORINE
SUSS-RCD8
RIGAKU3
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
SW-BEAMER
TEST-RFID2
SW-LAB
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
SW-TRACER
TGA96
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEM-SW
THEORY-SUPPORT
UHV…
Heliscan
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-SPM
UHV-CLUSTER
PECVD
NANO-ONE-2PP
PARYLENE-DIENER
LYRA
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
CRYOMILL
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
micro-CT-L240
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
LEXT
Micromex
micro-CT-m300
3D-PRUSA-ORANGE
3D-PRUSA-XL
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LABOTOM5
DSC-DISCOVERY
LITESCOPE-LYRA
MONOWAVE
CITOPRESS
NANOSAM
NIKON-NANO
NIRQUEST512
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LPCVD-polySi
LIBS-LabSys1
DAWN-HELEOS
IS-NOVOCONTROL
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
UV-LASER
Polčák, Josef
Valiyev, Rasul
Šárfy, Pavlína
Daradkeh, Samer
Liška, Jiří
Iakoubovskii, Konstantin
Daradkeh, Samer
Iakoubovskii, Konstantin
Kolíbalová, Eva
Iakoubovskii, Konstantin
Davidková, Kristyna
Petrosyan, Derenik
Petrosyan, Derenik
Fecko, Peter
Spusta, Tomáš
Kolář, Richard
Davidková, Kristyna
Petrosyan, Derenik
Davidková, Kristyna
Davidková, Kristyna
Dao, Radek
Surana, Karan Singh
Petrosyan, Derenik
Lukiienko, Iryna
T Lepcio, Petr
Stará, Veronika
Holobrádek, Jakub
Davidková, Kristyna
Stará, Veronika
Holcman, Vladimír
Ali, Hasan
Paredes Sánchez, Claudia
Zikmundová, Eva
Průša, Stanislav
Stará, Veronika
Fecko, Peter
Kubinec, Ondrej
Dao, Radek
Jewula, Pawel
T Eliáš, Marek
Klimek, Jan
Franta, Daniel
Vijithra, Vijithra
Holobrádek, Jakub
U Jewula, Pawel
Franta, Daniel
Eliáš, Marek
Huang, Yong
Kovařík, Martin
U Sanna, Michela
Žaloudková, Lucie
Franta, Daniel
Havelka, Tomáš
Kovařík, Martin
Vijithra, Vijithra
Franta, Daniel
Petrosyan, Derenik
Fecko, Peter

Upcoming trainings

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Term Name Description Max. attendees
19.6. 09:30 - 12:00 DRIE-training Attendees: Matej Dinis, Jiří Strnad 3
19.6. 13:00 - 15:30 DHR 2/2 Finish the basic rheology training with a hands-on session. Attendees: Amirmohsen Fanisaberi 1
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Hyesung Lee, Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 09:30 - 12:00 DHR 2/2 Finish the basic rheology training with a hands-on session. Attendees: Carolina Sanna 1
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Šimon Krútek, Debika Devi Thongam 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Debika Devi Thongam, DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Debika Devi Thongam 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson 4
24.6. 10:00 - 11:30 JASCO training Description of holders and software, basic measurement Attendees: Martina Říhová, David Pavliňák 2
24.6. 13:00 - 15:00 Leicacoat-NANO training Attendees: Michela Sanna, Samer Daradkeh 2
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2
30.6. 10:00 - 12:00 ICON-SPM basic training Attendees: Elisa Cuccu, Dimitrios Tsalagkas, Sharmistha Dey 3
2.7. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Nikol Kaděrová, Ying Hu 2
22.7. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Sharmistha Dey 4
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh 3
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kateřina Polášková 3