Saturday 7.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WOOLLAM-VIS
BET-DEGASSER
UHV-LEIS
VERSALAB
RAITH
IS_NOVOCONTROL
FUMEHOOD…
CRYOGENIC
CHEMLAB-B1.14
ALD-FIJI
RIGAKU9
KRATOS-XPS
BET-ANAMET
PARYLENE-SCS
ICON-SPM
MIRA-EBL
RSA
SNOM-NANONICS
MIRA-STAN
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER…
NANOCALC
STEMI
SW-BEAMER
SW-LAB
nano-CT
RIE-FLUORINE
nanoCT
MIRKA
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
SAW-ACCUTOM
MINIFLEX
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
LEICA-TXP
RIE-CHLORINE
SW-TRACER
MPS150
TENUPOL
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
TGA-DISCOVERY
AMBER
Test Ondra 3
NIRQUEST512
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV…
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
Test O2
MONOWAVE
NIKON-NANO
HELIOS
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
DRIE
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DHR
SW-CT
micro-CT-m300
TORNADO-M4
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
micro-CT-L240
DAWN-HELEOS
NANOSAM
MAGNETRON
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LITESCOPE-LYRA
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
GLOVEBOX…
CITOPRESS
NANOSCAN
LITESCOPE-MIRA…
LIBS-LabSys1
TEGRAMIN
ZEISS-STAN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
SCIA
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Knoblochová, Alžběta
AL Soud, Ammar
Vaníčková, Elena
Daradkeh, Samer
Lišková, Zuzana
Daradkeh, Samer
U Jewula, Pawel
Lukiienko, Iryna
Daradkeh, Samer
Niapos, Eleftherios
Malecot, Axel Fabien Benoit
Polčák, Josef
AL Soud, Ammar

Upcoming trainings

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Term Name Description Max. attendees
9.2. 09:30 - 12:30 DLS-ZetaSizer Part 1+2 This training will provide hands-on practice with basic methods for measuring particle size using the DLS technique. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Michela Sanna, Ammar AL Soud, Monika Kreuzerová 3
9.2. 09:30 - 11:00 RIE-flourine- training Attendees: Franz Vilsmeier, Fabian Majcen, Kryštof Matějka 3
9.2. 15:00 - 16:00 SUSS-MA8 training Attendees: Laiba Bajwa 1
10.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Kryštof Jasenský 3
10.2. 09:30 - 12:00 RIE-flourine-training Attendees: Jakub Krčma, Ekaterina Pribytova, Laiba Bajwa 3
10.2. 14:00 - 14:45 Vacuum Oven C 1.38 Basic training for the Vacuum Oven C 1.38 Attendees: Sára Hrdinová 4
10.2. 14:00 - 15:00 DIENER-training Attendees: Laiba Bajwa 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
13.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
13.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
13.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10