Saturday 31.1.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WOOLLAM-VIS
RAITH
EVAPORATOR
KEITHLEY-4200
RIGAKU3
VERSALAB
SUSS-WETBENCH
DWL
CRYOGENIC
KERR-MICROSCOPE
CHEMLAB-B1.14
RIGAKU9
KRATOS-XPS
ML3-BABY
SIMS
SHAKER…
PARYLENE-SCS
ICON-SPM
MIRA-STAN
SNOM-NANONICS
SUMMIT
MIRA-EBL
RSA
SEE-SYSTEM
LaserMIRA
NANOCALC
STEMI
BET-ANAMET
nano-CT
nanoCT
SUSS-RCD8
MINIFLEX
PECVD
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
RIE-CHLORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SW-LAB
DIENER
RIE-FLUORINE
SW-BEAMER
MPS150
SW-TRACER
CITOVAC
UHV…
UHV-PREPARATION
ULTRAFAST-LASER
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV-CLUSTER
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-SPM
LEICA-TXP
THEORY-SUPPORT
TENUPOL
NIRQUEST512
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
Heliscan
UHV-PLD
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
FISCHIONE-160
DSC-DISCOVERY
NIKON-NANO
R4…
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
CRYOMILL
CPD
CLARUS-680
BET-DEGASSER
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUME_HOOD-B1.18
Micromex
NANOSAM
HENRY-MAGNET
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
MAGNETRON
LIBS-FireFly
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-Discovery
LAURELL-NANO
micro-CT-L240
NANOINDENTER
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.16
LASER-DICER
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
R2-PECVD
UV-LASER
Knoblochová, Alžběta
Lišková, Zuzana
S Prášek, Jan
Patil, Virendra
Daradkeh, Samer
Daradkeh, Samer
Niapos, Eleftherios
B Fecko, Peter
S Danchuk, Viktor
Arregi Uribeetxebarria, Jon Ander
Daradkeh, Samer
Caha, Ondřej
Daradkeh, Samer
Niapos, Eleftherios

Upcoming trainings

Show more

Term Name Description Max. attendees
2.2. 08:30 - 11:00 Woollam RC2 First part of training Attendees: Nima Bolouki 1
2.2. 15:00 - 17:00 SUSS Wetbench training Training of the new user Attendees: Laiba Bajwa 2
3.2. 10:00 - 13:00 Tornado-M4 Attendees: Konstantin Iakoubovskii 3
3.2. 13:30 - 16:30 Evaporator EN Standard training in English Attendees: Radim Slovák, Laiba Bajwa 2
4.2. 13:00 - 15:00 Laser Dicer training Attendees: Iryna Lukiienko, Jozef Štálnik, Radim Slovák 3
5.2. 09:30 - 13:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 3
5.2. 13:00 - 15:30 MIRA-STAN for returning and Lyra users Renewal training for returning users. Attendees: Ekaterina Pribytova, Eduard Jelínek 2
6.2. 08:30 - 11:00 LYRA advanced training - EDS analysis The training focused on the elemental analysis by EDS. We will meet in the LYRA lab. Attendees: Kryštof Jasenský, Marek Eliáš 3
9.2. 09:30 - 11:00 RIE-flourine- training Attendees: Ekaterina Pribytova, Franz Vilsmeier, Fabian Majcen, Kryštof Matějka 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh 4
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab 10