Sunday 19.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WITEC-RAMAN
MIRA-STAN
FUMEHOOD…
VERSALAB
CRYOGENIC
LAKESHORE
SCIA
ML3-BABY
LYRA
BRILLOUIN
SUSS-WETBENCH
RIE-CHLORINE
RAITH
ALD-FIJI
RIGAKU9
LITESCOPE-MIRA…
CHEMLAB-B1.14
HELIOS
ALD-BENEQ
TITAN
RIE-FLUORINE
SIMS
SEE-SYSTEM
3D-PRUSA-XL
LaserMIRA
SUMMIT
SHAKER-B1.18
ICON-SPM
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
PARYLENE-SCS
nanoCT
SNOM-NANONICS
Q-LAB
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
RTP
MIRA-EBL
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
MINIFLEX
TENUPOL
nano-CT
RSA
LEICA-TXP
Test školení
FISCHIONE-160
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
KRATOS-XPS
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
AMBER
UHV-MBE2
Test Ondra 3
Test O2
TEST2
ULTRACENTRIFUGE
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV…
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
3D-PRUSA-BLUE
MONOWAVE
ZEISS-NANO
4-POINT
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DHR
SW-CT
micro-CT-m300
TORNADO-M4
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
micro-CT-L240
DAWN-HELEOS
NMR
DEKTAK
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
LITESCOPE-LYRA
WOOLLAM-MIR
DSC-DISCOVERY
MPS150
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
LPCVD-polySi
LIBS-LabSys1
TEGRAMIN
IS_NOVOCONTROL
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
paiva de araujo, Estacio
Naseri Joda, Nasrollah
Ulč, Filip
Fu, Hongbo
Tmejová, Kateřina
Daradkeh, Samer
Danchuk, Viktor
Holcman, Vladimír
Štálnik, Jozef
Fecko, Peter
S Šamořil, Tomáš
Krčma, Jakub
Fecko, Peter
Fecko, Peter
S Lišková, Zuzana
Eliáš, Marek
Arregi Uribeetxebarria, Jon Ander
Ulč, Filip
Daradkeh, Samer
Vařeka, Karel
Štálnik, Jozef
Ali, Hasan
U Eliáš, Marek

Upcoming trainings

Show more

Term Name Description Max. attendees
20.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/31245607839153?p=QX552nhoP9PxXCL4FX) Meeting ID: 312 456 078 391 53 Access code: i5xd7zL3 5
21.4. 09:30 - 12:00 ICON-SPM basic training Attendees: Viktor Danchuk 3
21.4. 10:00 - 10:45 Solvent fumehood training (ISO 5) Training for the solvent fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 10:45 - 11:30 Etching fumehood training (ISO 5) Training for the etching fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Petr Sysel, Ying Hu, Thông Thái Trần, Rosmi Vinson 5
21.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
21.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Ying Hu, Thông Thái Trần, Rosmi Vinson, Sharmistha Dey 10
21.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Carolina Oliver Urrutia, Ying Hu, Thông Thái Trần, Rosmi Vinson, Sharmistha Dey 10
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik, Sujan Maity 3
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
23.4. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Karan Singh Surana 1
24.4. 14:00 - 28.5. 16:00 LVEM_basic (2/2) Hands-on session Attendees: Karan Singh Surana 1
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1