Friday 14.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
HELIOS
TITAN
AMBER
VERIOS
JASCO
TGA-DISCOVERY
WOOLLAM-RC2
NANO-ONE-2PP
UHV-PREPARATION
CHEMLAB-B1.18
UHV-XPS
EVAPORATOR
UHV-LEIS
UHV-LEEM
FUMEHOOD…
LYRA
UHV-DEPOSITION
CRYOGENIC
FUMEHOOD…
FUMEHOOD…
ICON-SPM
MIRA-STAN
TEGRAMIN
BET-ANAMET
SW-CT
UHV-SPM
VERSALAB
LEICACOAT-STAN
NANOSAM
WITEC-RAMAN
ALD-FIJI
SUSS-MA8
MAGNETRON
DSC-DISCOVERY
LVEM
RIGAKU3
PARYLENE-SCS
3D-PRUSA-ORANGE
PARYLENE-DIENER
STEMI
TEM-SW
NANOCALC
PECVD
RIE-FLUORINE
SHAKER-B1.18
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
MIRKA
nanoCT
RIE-CHLORINE
SNOM-NANONICS
SAW-ACCUTOM
DIENER
MIRA-EBL
SPINCOATER…
Q-LAB
RSA
RTP
ACCURION_RSE
MINIFLEX
SUSS-RCD8
nano-CT
SW-BEAMER
Test školení
SW-LAB
VACUUM-OVEN-B1…
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
3D-PRUSA-BLUE
TEST-RFID2
TGA96
UHV…
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-CLUSTER
3D-PRUSA-BLACK
ML3-BABY
ULTRACENTRIFUGE
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
ZEISS-NANO
DEKTAK
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
LABOTOM5
LIBS-LabSys1
WOOLLAM-MIR
3D-PRUSA-XL
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-m300
IS-NOVOCONTROL
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
LIBS-FireFly
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
UV-LASER
Valiyev, Rasul
Fatima, Areej
Lee, Hyesung
U Man, Ondřej
Man, Ondřej
B Michalička, Jan
S Michalička, Jan
T Iakoubovskii, Konstantin
Spousta, Jiří
U Man, Ondřej
Burda, Daniel
Říhová, Martina
Skálová, Zdenka
Žaloudková, Lucie
B Petruš, Josef
Přibyl, Roman
Rusnaková, Nicole
T Sanna, Michela
Jakub, Zdeněk
Říhová, Martina
Stará, Veronika
Burda, Daniel
Vaníčková, Elena
Stará, Veronika
T Supalová, Linda
S Šamořil, Tomáš
Jakub, Zdeněk
Pribytova, Ekaterina
T Supalová, Linda
T Supalová, Linda
Cuccu, Elisa
Ščasnovič, Erik
Pišťák, Jan
T Tmejová, Kateřina
Kareš, Martin
Stará, Veronika
Daradkeh, Samer
T Holas, Jiří
S Danchuk, Viktor
Sanna, Carolina
Supalová, Linda
T Supalová, Linda
U Prášek, Jan
B Petruš, Josef
Valadi Palliyalil, Anjali
Valadi Palliyalil, Anjali

Upcoming trainings

Show more

Term Name Description Max. attendees
14.8. 13:00 - 13:45 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
14.8. 13:45 - 14:30 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3