Wednesday 2.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-XPS
VERIOS
LEICACOAT-STAN
TEGRAMIN
LITESCOPE-MIRA…
SUSS-WETBENCH
CRYOGENIC
MIRA-EBL
VERSALAB
MIRA-STAN
RIGAKU9
LEICACOAT-NANO
PECVD
KERR-MICROSCOPE
ZWICK
TITAN
K70
UHV-LEEM
UHV-PREPARATION
ALD-BENEQ
ICON-SPM
RIE-FLUORINE
R2-PECVD
VNA-MPI
LASER-DICER
WOOLLAM-RC2
WITEC-RAMAN
RIGAKU3
UHV-LEIS
LYRA
AMBER
4-POINT
BET-ANAMET
BET-DEGASSER
PARYLENE-SCS
NANO-ONE-2PP
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
NANOCALC
STEMI
SW-BEAMER
SHAKER-B1.18
nano-CT
SNOM-NANONICS
SPINCOATER…
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
SAW-ACCUTOM
Q-LAB
RSA
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-CHLORINE
MINIFLEX
nanoCT
SW-LAB
Test Ondra 3
SW-TRACER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
ULTRACENTRIFUGE
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-SPM
3D-PRUSA-BLUE
ML3-BABY
ZEISS-NANO
ELECTROWORKSHOP
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
CRYOMILL
FLOWBOX
HELIOS
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
NMR
LABOTOM5
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
MAGNETRON
SUSS-MA8
DEKTAK
WOOLLAM-MIR
LITESCOPE-LYRA
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
LPCVD-polySi
LIBS-LabSys1
CLARUS-680
CHEMLAB-B1.16
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LIBS-Discovery
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
UV-LASER
Kelarová, Štěpánka
Bolouki, Nima
Allaham, Mohammad
U Polčák, Josef
Molnár, Tomáš
Jakub, Zdeněk
T Kicmerova, Dina
Surana, Karan Singh
Šťastný, Přemysl
Surana, Karan Singh
T Holas, Jiří
Bednaříková, Vendula
Skálová, Zdenka
Skálová, Zdenka
Kramář, Jan
Ulč, Filip
Matějka, Kryštof
Matějka, Kryštof
T Danchuk, Viktor
Pribytova, Ekaterina
Matějka, Kryštof
Matějka, Kryštof
Danchuk, Viktor
Daradkeh, Samer
Kramář, Jan
Ulč, Filip
Varshney, Devanshu
Arregi Uribeetxebarria, Jon Ander
T Švarc, Vojtěch
Yuan, Yunhuan
Cuccu, Elisa
Arregi Uribeetxebarria, Jon Ander
Fu, Hongbo
S Michalička, Jan
Kolář, Richard
Molnár, Tomáš
Molnár, Tomáš
Matějka, Kryštof
B Máčala, Jakub
Matějka, Kryštof
Bolouki, Nima
Pribytova, Ekaterina
Přibyl, Roman
Přibyl, Roman
Kotouček, Jan
Hrdinová, Sára
Vaníčková, Elena
S Šamořil, Tomáš
Spousta, Jiří
Šimůnková, Helena
Tmejová, Kateřina
Tmejová, Kateřina
Bajwa, Laiba Asad

Upcoming trainings

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Term Name Description Max. attendees
2.9. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Šimon Formánek 4
2.9. 13:00 - 15:00 Leicacoat-NANO training Attendees: Mohammad Allaham, Ying Hu 3
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10