CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
3.9. 09:00 - 11:30	BET training: Degassing (1/2)	Degassing of the sample (1/2) Attendees: Debika Devi Thongam	3
3.9. 13:20 - 15:00	BET training: measurement (2/2)	Standard measurement Attendees: Debika Devi Thongam	3
4.9. 09:00 - 11:00	NANO-ONE-2PP 2/2	Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka	1
4.9. 09:00 - 13:00	Rigaku 3 - Basic	Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam	2
4.9. 09:00 - 13:00	KRATOS-XPS	Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš	2
4.9. 10:00 - 13:00	Verios/Helios_EDS	Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana	3
14.9. 10:00 - 12:00	NANO-ONE-2PP 2/2	Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová	1
17.9. 09:30 - 12:00	RIE-chlorine-training	Attendees: David Jonathan Walcher	3
21.9. 10:30 - 11:15	Nanofab interview - Meeting room C2.11 or C2.07	This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48	5
22.9. 12:15 - 12:50	Safety excursion - Advanced Chemical lab		5
22.9. 13:00 - 13:50	Safety excursion - Nanofabrication lab	Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).	5
22.9. 13:55 - 14:20	Safety excursion - Nanocharacterization lab		10
22.9. 14:25 - 14:55	Safety excursion - Structural Analysis		10

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AMBER
MAGNETRON-AJA
TITAN
LYRA
K70
R2-PECVD
VERSALAB
KRATOS-XPS
NIRQUEST512
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
NMR
WOOLLAM-VIS
NIKON-NANO
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
SUMMIT
nanoCT
ZEISS-NANO
SAW-ACCUTOM
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SPINCOATER…
MINIFLEX
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
RIE-FLUORINE
LEICA-TXP
RIE-CHLORINE
NANO-ONE-2PP
Test Ondra 3
TENUPOL
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
TGA-DISCOVERY
NANOSCAN
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV…
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
NANOSAM
ML3-BABY
CITOPRESS
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUMEHOOD…
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
MONOWAVE
LVEM
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
LIBS-FireFly
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
LIBS-Discovery
LAURELL-NANO
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
LASER-DICER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
UV-LASER