Thursday 26.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
MIRA-STAN
RAITH
RIGAKU3
ML3-BABY
MIRA-EBL
SEE-SYSTEM
VERIOS
TGA-DISCOVERY
ICON-SPM
CRYOGENIC
WOOLLAM-RC2
WITEC-RAMAN
EVAPORATOR
RIGAKU9
KRATOS-XPS
RIE-FLUORINE
TITAN
CHEMLAB-B1.18
FUMEHOOD…
FUMEHOOD…
CLARUS-680
UHV-DEPOSITION
FUMEHOOD…
PECVD
IS_NOVOCONTROL
BET-ANAMET
R2-PECVD
LASER-DICER
LIBS-FireFly
LYRA
HENRY-MAGNET
MAGNETRON
WOOLLAM-MIR
RIE-CHLORINE
NANOSCAN
WOOLLAM-VIS
UHV-LEEM
VNA-MPI
HELIOS
ZETASIZER
ULTRAFAST-LASER
ALD-FIJI
VUVAS
ALD-BENEQ
UHV-PREPARATION
UHV-SPM
JASCO
UHV-PLD
UHV-XPS
LEICACOAT-STAN
PARYLENE-SCS
CITOVAC
nano-CT
SNOM-NANONICS
VACUUM_OVEN-B1…
RSA
SIMS
VISCOMETER
L450
VACUUM_OVEN-B1…
WIRE-BONDER
nanoCT
MINIFLEX
LaserMIRA
XEF2
microCT
DIENER
ZWICK
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
FTIR
VACUUM_OVEN-C1…
SUMMIT
Test O2
UHV-FTIR
UHV-MBE
UHV-MBE1
UHV-MBE2
UHV-CLUSTER
UHV…
Heliscan
THEORY-SUPPORT
TGA96
TEST-RFID2
Test školení
TEM-SW
UHV…
TEST2
Test Ondra 3
SHAKER-B1.18
AMBER
FISCHIONE-160
TENUPOL
US-CUTTER
LEICA-TXP
SW-TRACER
SW-LAB
SW-BEAMER
DWL
STEMI
NANOCALC
JAZ3-CHANNEL
UHV-LEIS
FTIR-CHEMLAB
3D-PRUSA-XL
DSC-DISCOVERY
PARYLENE-DIENER
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
VERSALAB
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
Micromex
CRYOMILL
TIC3X
micro-CT-m300
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
micro-CT-L240
DAWN-HELEOS
3D-PRUSA-ORANGE
MONOWAVE
PROTOMAT
LVEM
KERR-MICROSCOPE
SUSS-MA8
DEKTAK
LABOTOM5
MPS150
CITOPRESS
LPCVD-SiN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LAKESHORE
LPCVD-polySi
TEGRAMIN
SCIA
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
FISCHIONE-TEM…
LITESCOPE-MIRA…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Jasenský, Kryštof
Piastek, Jakub
Liška, Jiří
Citterberg, Daniel
Poláková, Veronika
Konečná, Gabriela
Kramář, Jan
Kramář, Jan
Citterberg, Daniel
Delforge, Cyril
Lišková, Zuzana
Valadi Palliyalil, Anjali
Žaloudková, Lucie
AL Soud, Ammar
Supalová, Linda
Piastek, Jakub
Koňařík, Lukáš
Jasenský, Kryštof
Liška, Jiří
Kepič, Peter
Polášková, Kateřina
Bolouki, Nima
S Kicmerova, Dina
Koňařík, Lukáš
U Petruš, Josef
Sevriugina, Veronika
paiva de araujo, Estacio
Fallahpour, Mojdeh
Lukiienko, Iryna
S Danchuk, Viktor
Přibyl, Roman
Přibyl, Roman
Sonigara, Kevalkumar Kishorbhai
Konečný, Martin
Bajo, Viktor
Citterberg, Daniel
Slavíček, Radek
Arregi Uribeetxebarria, Jon Ander
Varaďa, Jan
Sobola, Dinara
Citterberg, Daniel
Lukiienko, Iryna
T Michalička, Jan
Horák, Michal
B Dolejšová, Eliška
U Jewula, Pawel
T Zita, Jiří
Sanna, Michela
Endstrasser, Zdeněk
T Zita, Jiří
Eliáš, Marek
Daradkeh, Samer
Bednaříková, Vendula
Bolouki, Nima
Liška, Jiří
Zikmundová, Eva
Jelínek, Eduard
Urbánek, Michal
Prášek, Jan
Franta, Daniel
Eliáš, Marek
Kovařík, Martin
Franta, Daniel
Endstrasser, Zdeněk
Urbánek, Michal
S Kicmerova, Dina
Saldan, Ivan
Arregi Uribeetxebarria, Jon Ander
Idesová, Beáta
Přibyl, Roman
Eliáš, Marek
Endstrasser, Zdeněk
Hrůza, Dominik
Dolejšová, Eliška
Kepič, Peter
Hrůza, Dominik
U Holas, Jiří

Upcoming trainings

Show more

Term Name Description Max. attendees
26.2. 10:10 - 10:45 Solvent fumehood training - ISO 5 clean room Training for a solvent fume hood. Attendees: Derenik Petrosyan, Heriknaz Asatryan 2
26.2. 10:45 - 23.2. 11:30 Etching Fumehood training - ISO5 cleanroom Training for Etching Fumehood. We will meet directly in ISO5 clean room. Attendees: Derenik Petrosyan, Heriknaz Asatryan 2
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning and Lyra users Renewing the certificate for long-inactive users. Retraining Lyra users. Meeting point at the microscope. Attendees: Michela Sanna, Linda Supalová, Martin Kovařík 3
27.2. 09:30 - 12:00 TGA Discovery Basic training for practical operation on TGA Discovery. At the training day meeting point is in the ChemLab (B1.15) in the building B. Attendees: Lucie Žaloudková 1
27.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Zuzana Košelová 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
2.3. 09:30 - 10:30 UV marking Laser Training is focused on the basic operations of the 5W marking UV laser and the connected Lightburn software. 2
2.3. 10:00 - 25.2. 12:30 CRYOGENIC VSM CRYOGENIC VSM basic training Attendees: Radek Slavíček 1
4.3. 09:00 - 16:00 GC-MS CLARUS-680 Training GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová 2
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4