Thursday 12.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
EVAPORATOR
ML3-BABY
LEICACOAT-STAN
DIENER
VERIOS
RIE-FLUORINE
KRATOS-XPS
MIRA-STAN
CRYOGENIC
MIRA-EBL
FUMEHOOD-HF
LEICACOAT-NANO
WITEC-RAMAN
HELIOS
ZWICK
UHV-PREPARATION
RAITH
RIE-CHLORINE
BET-ANAMET
WOOLLAM-VIS
LYRA
UHV-XPS
PARYLENE-SCS
UHV-LEEM
UHV-DEPOSITION
WOOLLAM-RC2
DRIE
SUSS-MA8
SUSS-RCD8
DISCO-DICING…
NANOINDENTER
BET-DEGASSER
BRILLOUIN
TITAN
NANOSAM
RIGAKU9
JAZ3-CHANNEL
RIGAKU3
ICON-SPM
VERSALAB
STEMI
SEE-SYSTEM
NANOCALC
LaserMIRA
SIMS
SHAKER-B1.18
SUMMIT
3D-PRUSA-XL
SNOM-NANONICS
RSA
nano-CT
nanoCT
MINIFLEX
SW-LAB
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
PECVD
TEM-SW
PARYLENE-DIENER
SW-BEAMER
Test školení
SW-TRACER
CITOVAC
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
3D-PRUSA-BLACK
TEST-RFID2
THEORY-SUPPORT
UHV-SPM
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
3D-PRUSA-ORANGE
DSC-DISCOVERY
3D-PRUSA-BLUE
FTIRMAG
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FUMEHOOD…
DHR
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
DIMPLING…
SW-CT
DAWN-HELEOS
TORNADO-M4
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
micro-CT-m300
TEGRAMIN
ULTRACENTRIFUGE
LABOTOM5
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
DEKTAK
WOOLLAM-MIR
LITESCOPE-MIRA…
MPS150
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
LPCVD-polySi
LITESCOPE-LYRA
VNA-MPI
FISCHIONE-TEM…
PECVD-NANOFAB
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
KAUFMAN
LIBS-LabSys1
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Fanisaberi, Amirmohsen
Fanisaberi, Amirmohsen
Hrdý, Radim
Krčma, Jakub
Jakešová, Marie
Jakešová, Marie
Jakešová, Marie
Jakešová, Marie
Prášek, Jan
Fanisaberi, Amirmohsen
Hrdý, Radim
Slovák, Radim
Fanisaberi, Amirmohsen
Jakešová, Marie
Jakešová, Marie
Jakešová, Marie
T Holas, Jiří
Bednaříková, Vendula
Gejdoš, Pavel
Idesová, Beáta
Jakešová, Marie
Jakešová, Marie
Pathak, Saurabh
Valadi Palliyalil, Anjali
Cuccu, Elisa
Piastek, Jakub
Fanisaberi, Amirmohsen
Hrdý, Radim
Vijithra, Vijithra
Přibyl, Roman
Fatima, Areej
Fecko, Peter
Surana, Karan Singh
Klíma, Jan
Andres Navarro Giraldo, Jorge
Štálnik, Jozef
Majcen, Fabian
Jakešová, Marie
Jakešová, Marie
Yuan, Yunhuan
Staňo, Michal
Mathew, Grigory
Valadi Palliyalil, Anjali
Tran, Quynh Nhu Thi
Bahadur, Fateh
Sevriugina, Veronika
Šebestová, Zuzana
Delforge, Cyril
Idesová, Beáta
AL Soud, Ammar
Franta, Daniel
Staňo, Michal
S Polčák, Josef
Fecko, Peter
Šebestová, Zuzana
Šebestová, Zuzana
Přibyl, Roman
Citterberg, Daniel
Hrdý, Radim
Hrdý, Radim
Zita, Jiří
B Gablech, Evelína
AL Soud, Ammar
Delforge, Cyril
Huang, Yong
T Danchuk, Viktor
Malecot, Axel Fabien Benoit
Nebojsa, Alois
Wirthová, Michaela
Slavíček, Radek
Slavíček, Radek

Upcoming trainings

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Term Name Description Max. attendees
12.2. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Veronika Sevriugina, Martino Pistis, Elisa Cuccu 4
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
18.2. 08:30 - 12:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Amirmohsen Fanisaberi 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1