Sunday 8.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
LVEM
MAGNETRON
WOOLLAM-VIS
LYRA
UHV-LEIS
RIGAKU9
CLARUS-680
IS_NOVOCONTROL
VERSALAB
SCIA
RIGAKU3
3D-PRUSA-XL
SIMS
PARYLENE-SCS
SNOM-NANONICS
ICON-SPM
SUMMIT
SEE-SYSTEM
LaserMIRA
RSA
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
MIRA-EBL
RIE-FLUORINE
nano-CT
MIRKA
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
SAW-ACCUTOM
nanoCT
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
LEICA-TXP
RIE-CHLORINE
MINIFLEX
SW-TRACER
Test Ondra 3
TENUPOL
VACUUM_OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
TGA-DISCOVERY
AMBER
NIKON-NANO
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV…
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
NIRQUEST512
MONOWAVE
NANOSAM
ELECTROWORKSHOP
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
CRYOMILL
FLOWBOX
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUMEHOOD…
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
Micromex
NANOSCAN
KERR-MICROSCOPE
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
HENRY-MAGNET
LIBS-FireFly
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
MPS150
CITOPRESS
LIBS-Discovery
LAURELL-NANO
micro-CT-L240
NANOINDENTER
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.14
LASER-DICER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER
Souawda, Nada
Fatima, Areej
S Kolíbalová, Eva
U Prášek, Jan
Franta, Daniel
S Šamořil, Tomáš
S Průša, Stanislav
Arregi Uribeetxebarria, Jon Ander
T Sanna, Michela
Daradkeh, Samer
Daradkeh, Samer
Niapos, Eleftherios
Daradkeh, Samer

Upcoming trainings

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Term Name Description Max. attendees
9.3. 09:00 - 16:00 GC-MS CLARUS-680 Training GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová 2
9.3. 09:00 - 14:00 RAITH training 3/3 Hands-on session Attendees: Elisa Cuccu 1
10.3. 08:30 - 17:30 Amber Meeting point at the microscope. Attendees: Eduard Jelínek 4
10.3. 10:30 - 12:00 RIE-training Attendees: Elisa Cuccu 3
11.3. 09:00 - 10:30 JASCO training Description of holders and software, basic measurement Attendees: Daina Dayana Arenas Buelvas, Karan Singh Surana, Pedro Henrique de Oliveira Santiago 3
12.3. 10:00 - 10:30 Electroworkshop - basics Basic & safety training for entering the electroworkshop. It is a prerequisite for all subsequent trainings (3d printers, soldering, laser) for instruments located in the electroworkshop. Attendees: Konstantin Iakoubovskii 3
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
18.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
19.3. 09:00 - 16:00 Helios_basic (2/2) Helios_basic (2/2): Hands-on session for attendees of Helios_basic (1/2). Attendees: Mohamed Bensalem 1
20.3. 13:30 - 15:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Saurabh Pathak 2
23.3. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 341 031 483 654 Přístupový kód: hz6gW67Y Attendees: Šimon Formánek 5
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Tomáš Janoušek 3
24.3. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Šimon Formánek 5
24.3. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Petr Pazourek, Šimon Formánek 5
24.3. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Petr Pazourek 10
24.3. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Petr Pazourek, Šimon Formánek 10
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Radim Slovák 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Carolina Oliver Urrutia, Ondrej Kubinec 4