Wednesday 26.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
MIRA-STAN
KRATOS-XPS
EVAPORATOR
TITAN
CRYOGENIC
LVEM
KERR-MICROSCOPE
VERSALAB
SEE-SYSTEM
ML3-BABY
BAMBULAB
JASCO
WITEC-RAMAN
FTIR-CHEMLAB
VERIOS
BET-ANAMET
MAGNETRON
ZWICK
CHEMLAB-B1.14
CHEMLAB-B1.18
ZEISS-STAN
KEITHLEY-4200
R2-PECVD
LITESCOPE-MIRA…
RIGAKU9
UHV-XPS
WIRE-BONDER
VACUUM-OVEN-B1…
UHV-DEPOSITION
DEKTAK
STEMI
NIKON-NANO
UHV-PREPARATION
ULTRACENTRIFUGE
TEM-SW
AMBER
RIGAKU3
DIENER
TEGRAMIN
MIRA-EBL
ICON-SPM
ULTRASONIC…
ULTRAFAST-LASER
NMR
NANO-ONE-2PP
TIC3X
BRILLOUIN
BET-DEGASSER
HELIOS
LYRA
MPS150
R4…
RAITH
TEST-RFID4
TEST-RFID2
Test školení
TGA96
SW-TRACER
Test O2
Test Ondra 3
MECHANICAL…
FISCHIONE-160
TENUPOL
LEICA-TXP
TEST2
SW-BEAMER
SW-LAB
PARYLENE-SCS
MINIFLEX
nanoCT
nano-CT
RSA
LEXT
SNOM-NANONICS
SW-COMSOL
SIMS
Heliscan
LEICACOAT-STAN
LaserMIRA
SUMMIT
SHAKER-B1.18
CLR-ISO8-Lab…
NANOCALC
TUBE-FURNACE
CEITEC-NANO
THEORY-SUPPORT
TORNADO-M4
TGA-DISCOVERY
L450
FTIR
CITOVAC
VACUUM-OVEN-B1…
MAGNETRON-AJA
VUVAS
VISCOMETER
ARES
VACUUM_OVEN-C1…
APCVD-Diffusion
XEF2
ALD-BENEQ
GLOVEBOX…
microCT
ZETASIZER
APCVD
JAZ3-CHANNEL
UHV-MBE1
UHV-PLD
UHV-MBE2
MINIEVAP
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-SPM
NANOWIZARD
UHV-CLUSTER
UHV…
UHV…
DISCO-DICING…
ALD-FIJI
US-CUTTER
DWL
RIE-CHLORINE
FUMEHOOD…
CPD
K70
4-POINT
IS-NOVOCONTROL
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
FLOWBOX
FTIRMAG
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
ELECTROWORKSHOP
CHEMLAB-B1.16
NANOINDENTER
LPCVD-SiN
micro-CT-L240
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-m300
FUMEHOOD…
DAWN-HELEOS
FUMEHOOD…
VNA-MPI
FUMEHOOD-HF
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
LPCVD-polySi
LAKESHORE
SUSS-RCD8
CRYOMILL
ZEISS-NANO
SW-CT
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
WOOLLAM-VIS
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
FUMEHOOD…
DRIE
NIRQUEST512
LECTROPOL
DIMPLING…
PROTOMAT
SPONGEBOB
HENRY-MAGNET
DRYING-OVEN-B1…
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
DHR
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
UV-LASER
Baeva, Maria
Baeva, Maria
Baeva, Maria
Baeva, Maria
Jelínek, Eduard
Cuccu, Elisa
Cuccu, Elisa
MURTAS, DAVIDE
Jasenský, Kryštof
Fecko, Peter
Citterberg, Daniel
Piastek, Jakub
Kramář, Jan
Vinson, Rosmi
Vinson, Rosmi
Bolouki, Nima
Polášková, Kateřina
Pham, Sy Nguyen
Baeva, Maria
Martyniuk, Oleh
Otýpka, Martin
Ali, Hasan
Horák, Michal
T Danchuk, Viktor
Pribytova, Ekaterina
Kolíbalová, Eva
U Kolíbalová, Eva
Molnár, Tomáš
SAHIL, Muhammad
Danchuk, Viktor
Daradkeh, Samer
Bolouki, Nima
Strnad, Jiří
Baeva, Maria
Baeva, Maria
Spusta, Tomáš
Fecko, Peter
Říhová, Martina
Říhová, Martina
T Spotz, Zdeněk
Liška, Jiří
Sevriugina, Veronika
Hu, Ying
Ali, Hasan
Šťastný, Jakub
Pavliňák, David
Otýpka, Martin
Sevriugina, Veronika
Hu, Ying
Hu, Ying
S Lehchenkova, Iryna
Citterberg, Daniel
Bolouki, Nima
Kramář, Jan
Caha, Ondřej
Jakub, Zdeněk
Kostka, Marek
Hu, Ying
Jakub, Zdeněk
Danchuk, Viktor
S Lehchenkova, Iryna
Supalová, Linda
Jakub, Zdeněk
Hu, Ying
Kolíbalová, Eva
Spousta, Jiří
Kalleshappa, Bindu
Strnad, Jiří
Bahadur, Fateh
Jasenský, Kryštof
Tsalagkas, Dimitrios
Hu, Ying
Jasenský, Kryštof
Michlovská, Lenka
T Sanna, Michela
Kramář, Jan
Krčma, Jakub
Pavliňák, David
Bahadur, Fateh
S Šamořil, Tomáš
Citterberg, Daniel
Polášková, Kateřina
Cuccu, Elisa

Upcoming trainings

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Term Name Description Max. attendees
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 10:00 - 26.8. 11:00 VACUUM_OVEN -C1.38 Vacuum Drying Oven 1.38 basic training. Attendees: Martin Otýpka 4
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10