Monday 2.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
ML3-BABY
EVAPORATOR
VERIOS
RAITH
WITEC-RAMAN
VERSALAB
UHV-XPS
NMR
ICON-SPM
LYRA
TEGRAMIN
LEICACOAT-STAN
UHV-LEEM
UHV-PREPARATION
MIRA-EBL
DEKTAK
LEXT
TITAN
AMBER
KRATOS-XPS
CRYOGENIC
ALD-FIJI
DIENER
CHEMLAB-B1.14
FUMEHOOD-HF
MIRA-STAN
UHV-MBE
GLOVEBOX…
R2-PECVD
FUME_HOOD-B1.14
CHEMLAB-B1.16
SCIA
FUME_HOOD-B1.18
MAGNETRON
UHV-FTIR
UHV-DEPOSITION
LVEM
KAUFMAN
DSC-DISCOVERY
HELIOS
UHV-PLD
WOOLLAM-VIS
ZWICK
RIGAKU9
BET-DEGASSER
3D-PRUSA-ORANGE
TORNADO-M4
MECHANICAL…
TUBE-FURNACE
UHV-SPM
VACUUM_OVEN-B1…
RIE-CHLORINE
UHV…
LIBS-LabSys1
JASCO
NANOSAM
NANOSCAN
UHV…
ELECTROWORKSHOP
nanoCT
ACCURION_RSE
NANOCALC
RIGAKU3
SHAKER…
SUSS-RCD8
RSA
SUMMIT
SNOM-NANONICS
LaserMIRA
SEE-SYSTEM
RIE-FLUORINE
SIMS
PARYLENE-SCS
nano-CT
MINIFLEX
STEMI
THEORY-SUPPORT
BET-ANAMET
CITOVAC
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VUVAS
UHV-CLUSTER
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV-LEIS
SW-BEAMER
Test O2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
TEST2
UHV-MBE1
Test školení
TEST-RFID2
TGA96
Q-LAB
Heliscan
TGA-DISCOVERY
UHV-MBE2
RTP
MPS150
SPINCOATER…
FTIRMAG
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
FLOWBOX
4-POINT
FUMEHOOD…
DHR
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
DIMPLING…
DRIE
PECVD-NANOFAB
VACUUM_OVEN…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
SW-CT
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
CPD
TIC3X
CRYOMILL
VNA-MPI
LEICACOAT-NANO
SAW-ACCUTOM
NIRQUEST512
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
MONOWAVE
CITOPRESS
NIKON-NANO
ZEISS-NANO
KERR-MICROSCOPE
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
HENRY-MAGNET
PROTOMAT
FRASCAN
KEITHLEY-4200
NANOINDENTER
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
IR-RAMAN
K70
LASER-DICER
LAKESHORE
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
UV-LASER
Idesová, Beáta
Otýpka, Martin
T Hrdý, Radim
Niapos, Eleftherios
Slovák, Radim
Niapos, Eleftherios
Otýpka, Martin
Niapos, Eleftherios
Niapos, Eleftherios
S Prášek, Jan
Cmíralová, Marie
S Prášek, Jan
T Kicmerova, Dina
Lednický, Tomáš
Lukiienko, Iryna
Lišková, Zuzana
Idesová, Beáta
Delforge, Cyril
Pavliňák, David
Vymazal, Jan
Havelka, Tomáš
Daradkeh, Samer
Lukiienko, Iryna
Molnár, Tomáš
U Danchuk, Viktor
Michlovská, Lenka
Kotásková, Lucie
Fallahpour, Mojdeh
Hrdinová, Sára
Delforge, Cyril
Jelínek, Eduard
Prajzler, Vladimír
Prajzler, Vladimír
Pišťák, Jan
Lednický, Tomáš
Molnár, Tomáš
U Danchuk, Viktor
Molnár, Tomáš
U Danchuk, Viktor
Bajo, Viktor
Slovák, Radim
Liška, Jiří
Citterberg, Daniel
Mukherjee, Aniket
U Gablech, Evelína
Michalička, Jan
B Michalička, Jan
S Iakoubovskii, Konstantin
U Iakoubovskii, Konstantin
Polčák, Josef
Souawda, Nada
Lukiienko, Iryna
Lukiienko, Iryna
Niapos, Eleftherios
Niapos, Eleftherios
Idesová, Beáta
Cmíralová, Marie
Polášková, Kateřina
Lukiienko, Iryna
Tkachenko, Serhii
U Danchuk, Viktor
Pavliňák, David
Bolouki, Nima
Polášková, Kateřina
Mukherjee, Aniket
Niapos, Eleftherios
Valadi Palliyalil, Anjali
S Prášek, Jan
U Danchuk, Viktor
U Danchuk, Viktor
Říhová, Martina
Prášek, Jan
T Petruš, Josef
Bahadur, Fateh
U Danchuk, Viktor
Knoblochová, Alžběta
Sevriugina, Veronika
Caha, Ondřej
Pavliňák, David
Pavelka, Dominik
Spotz, Zdeněk
Varga, Dominik
Havelka, Tomáš
U Danchuk, Viktor
Lukiienko, Iryna
Eliáš, Marek
U Danchuk, Viktor
Buday, Jakub
Polášková, Kateřina
U Danchuk, Viktor
Kovařík, Martin
U Danchuk, Viktor
Spusta, Tomáš

Upcoming trainings

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Term Name Description Max. attendees
2.2. 15:00 - 17:00 SUSS Wetbench training Training of the new user Attendees: Laiba Bajwa 2
3.2. 08:30 - 16:00 Nanoindenter training The meeting point is directly in the SPM laboratory. Attendees: Hongbo Fu, Tomáš Havelka 4
3.2. 09:00 - 2.2. 10:30 Dektak-training Attendees: Cyril Delforge, Laiba Bajwa ---
3.2. 10:00 - 13:00 Tornado-M4 Attendees: Samer Daradkeh, Konstantin Iakoubovskii 3
3.2. 13:30 - 16:30 Evaporator EN Standard training in English Attendees: Radim Slovák, Laiba Bajwa 2
4.2. 13:00 - 15:00 Laser Dicer training Attendees: Iryna Lukiienko, Jozef Štálnik, Radim Slovák 3
5.2. 08:30 - 11:00 Woollam RC2 First part of training Attendees: Nima Bolouki 1
5.2. 09:30 - 13:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 3
5.2. 13:00 - 15:30 MIRA-STAN for returning and Lyra users Renewal training for returning users. Attendees: Ekaterina Pribytova, Eduard Jelínek, Kryštof Jasenský 3
6.2. 08:30 - 11:00 LYRA advanced training - EDS analysis The training focused on the elemental analysis by EDS. We will meet in the LYRA lab. Attendees: Linda Supalová, Kryštof Jasenský, Marek Eliáš 3
9.2. 09:30 - 12:30 DLS-ZetaSizer Part 1+2 This training will provide hands-on practice with basic methods for measuring particle size using the DLS technique. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Michela Sanna, Ammar AL Soud, Monika Kreuzerová 3
9.2. 09:30 - 11:00 RIE-flourine- training Attendees: Ekaterina Pribytova, Franz Vilsmeier, Fabian Majcen, Kryštof Matějka 3
10.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Kryštof Jasenský 3
11.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh 4
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab 10