Monday 17.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
UHV-PREPARATION
UHV-XPS
KRATOS-XPS
UHV-DEPOSITION
LEICACOAT-STAN
VERIOS
HELIOS
AMBER
UHV-LEEM
MAGNETRON
NANOSAM
TEGRAMIN
SUSS-WETBENCH
WIRE-BONDER
WITEC-RAMAN
ICON-SPM
FUMEHOOD…
UHV-MBE
PECVD
LYRA
UHV-LEIS
STEMI
UHV-FTIR
LIBS-FireFly
CHEMLAB-B1.18
WOOLLAM-RC2
TITAN
FUMEHOOD…
HENRY-MAGNET
3D-PRUSA-ORANGE
ELECTROWORKSHOP
VNA-MPI
CHEMLAB-B1.14
R2-PECVD
ML3-BABY
EVAPORATOR
NMR
L450
TUBE-FURNACE
FTIR
UHV-PLD
VACUUM_OVEN-C1…
JAZ3-CHANNEL
VACUUM-OVEN-B1…
JASCO
VERSALAB
UHV…
UHV-SPM
DIENER
UHV…
TORNADO-M4
MPS150
WOOLLAM-MIR
3D-PRUSA-XL
SEE-SYSTEM
SIMS
MIRKA
SAW-ACCUTOM
LaserMIRA
SUMMIT
SPINCOATER…
Q-LAB
PARYLENE-SCS
RSA
SNOM-NANONICS
MIRA-EBL
RTP
ACCURION_RSE
nano-CT
nanoCT
MINIFLEX
RIGAKU3
RIE-CHLORINE
RIE-FLUORINE
SUSS-RCD8
TEM-SW
TEST2
SHAKER-B1.18
VACUUM-OVEN-B1…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
FTIR-CHEMLAB
CITOVAC
VUVAS
UHV-MBE2
VISCOMETER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV-CLUSTER
UHV-MBE1
NANOCALC
FISCHIONE-160
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
Test Ondra 3
TGA-DISCOVERY
Test O2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
PARYLENE-DIENER
NANO-ONE-2PP
3D-PRUSA-BLACK
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
CLARUS-680
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CPD
BET-DEGASSER
BRILLOUIN
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
Micromex
3D-PRUSA-BLUE
LABOTOM5
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
SUSS-MA8
DEKTAK
DSC-DISCOVERY
LITESCOPE-MIRA…
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
LPCVD-polySi
LITESCOPE-LYRA
micro-CT-L240
ZEISS-STAN
micro-CT-m300
DAWN-HELEOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
IS-NOVOCONTROL
SCIA
LIBS-LabSys1
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-Discovery
UV-LASER
Natarajan, Senthil Nathan
Vinson, Rosmi
Havlíková, Tereza
Šamořil, Tomáš
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Molnár, Tomáš
U Danchuk, Viktor
Jakub, Zdeněk
Molnár, Tomáš
S Danchuk, Viktor
Polčák, Josef
Maity, Sujan
Fatima, Areej
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Natarajan, Senthil Nathan
Havlíková, Tereza
Remešová, Michaela
Natarajan, Senthil Nathan
Pišťák, Jan
U Kicmerova, Dina
Man, Ondřej
Man, Ondřej
Fecko, Peter
Iakoubovskii, Konstantin
U Danchuk, Viktor
Jakub, Zdeněk
U Prášek, Jan
Otýpka, Martin
U Danchuk, Viktor
S Danchuk, Viktor
Rotter, Marek
Ščasnovič, Erik
Pribytova, Ekaterina
MURTAS, DAVIDE
Supalová, Linda
Martyniuk, Oleh
paiva de araujo, Estacio
Bakhshikhah, Mahan
Fallahpour, Mojdeh
Bajwa, Laiba Asad
U Danchuk, Viktor
Cuccu, Elisa
S Šamořil, Tomáš
Vaníčková, Elena
Virágová, Eliška
U Danchuk, Viktor
Čechová, Ludmila
U Tmejová, Kateřina
T Franta, Daniel
Huang, Yong
Říhová, Martina
S Lehchenkova, Iryna
Kumar, Sanjay
Kumar, Sanjay
S Lehchenkova, Iryna
U Tmejová, Kateřina
Janů, Lucie
Pribytova, Ekaterina
Fecko, Peter
B Jewula, Pawel
Slovák, Vojtěch
T Ligmajer, Filip
T Franta, Daniel
U Danchuk, Viktor
Klimek, Jan
Iakoubovskii, Konstantin
U Tmejová, Kateřina
Říhová, Martina
Klimek, Jan
U Danchuk, Viktor
U Danchuk, Viktor
paiva de araujo, Estacio
U Danchuk, Viktor
Kicmerova, Dina
paiva de araujo, Estacio
Cuccu, Elisa
Kumar, Sanjay

Upcoming trainings

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Term Name Description Max. attendees
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Andrej Juríček, Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Andrej Juríček 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 09:00 - 12:00 SEE SYSTEM training Training in contact angle measurements and surface free energy determination. Meeting point in front of the User office. Attendees: Jiří Strnad 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3