Monday 7.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
RIGAKU3
UHV-DEPOSITION
KRATOS-XPS
UHV-XPS
SUSS-WETBENCH
UHV-LEEM
UHV-PREPARATION
JASCO
VERSALAB
DIENER
BET-ANAMET
SEE-SYSTEM
NANOSAM
NIKON-NANO
MAGNETRON-AJA
RIGAKU9
RAITH
DEKTAK
LYRA
UHV-FTIR
HELIOS
LVEM
UHV-MBE
NANO-ONE-2PP
FUMEHOOD…
TGA-DISCOVERY
FUMEHOOD…
LITESCOPE-MIRA…
LITESCOPE-LYRA
TEGRAMIN
PARYLENE-SCS
TITAN
R2-PECVD
CHEMLAB-B1.18
MIRA-STAN
FUMEHOOD…
UHV-PLD
EVAPORATOR
LEICACOAT-STAN
NMR
NANOSCAN
SPINCOATER…
BET-DEGASSER
MECHANICAL…
UHV-SPM
ML3-BABY
VACUUM-OVEN-B1…
NANOCALC
UHV…
SUSS-RCD8
RIE-FLUORINE
UHV…
VACUUM_OVEN-C1…
PECVD
MINIFLEX
SHAKER-B1.18
SUMMIT
MIRKA
SAW-ACCUTOM
LaserMIRA
nano-CT
SIMS
Q-LAB
ICON-SPM
RTP
SNOM-NANONICS
nanoCT
MIRA-EBL
ACCURION_RSE
RSA
RIE-CHLORINE
TEST-RFID2
STEMI
VUVAS
US-CUTTER
DWL
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VISCOMETER
ULTRAFAST-LASER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV-CLUSTER
SW-BEAMER
Test O2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
TEST2
UHV-LEIS
Test školení
3D-PRUSA-ORANGE
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
TEM-SW
WOOLLAM-MIR
3D-PRUSA-BLACK
R4…
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CPD
BRILLOUIN
TORNADO-M4
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CLARUS-680
micro-CT-L240
3D-PRUSA-BLUE
SUSS-MA8
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
LIBS-LabSys1
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
LPCVD-polySi
LIBS-Discovery
micro-CT-m300
IS-NOVOCONTROL
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
LIBS-FireFly
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
UV-LASER
Rovenská, Katarína
U Kicmerova, Dina
Bolouki, Nima
Šťastný, Jakub
Wang, Yue
Žaloudková, Lucie
Daradkeh, Samer
Žaloudková, Lucie
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Polášková, Kateřina
Pavliňák, David
Allaham, Mohammad
U Danchuk, Viktor
Jakub, Zdeněk
Hrubá, Daniela
Bajwa, Laiba Asad
Holobrádek, Jakub
Holobrádek, Jakub
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
E Tmejová, Kateřina
U Tmejová, Kateřina
Otýpka, Martin
S Danchuk, Viktor
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Tmejová, Kateřina
Tmejová, Kateřina
Bolouki, Nima
Bolouki, Nima
U Danchuk, Viktor
Staňo, Michal
Strnad, Jiří
Jasenský, Kryštof
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Varshney, Devanshu
Arregi Uribeetxebarria, Jon Ander
Cuccu, Elisa
Fecko, Peter
Strnad, Jiří
Jasenský, Kryštof
S Šamořil, Tomáš
U Danchuk, Viktor
Bahadur, Fateh
Kolíbalová, Eva
U Danchuk, Viktor
Sanna, Michela
Bajwa, Laiba Asad
Pavliňák, David
Jewula, Pawel
Ulč, Filip
Klok, Pavel
Havlíková, Tereza
Bajwa, Laiba Asad
S Michalička, Jan
Beliančínová, Beáta
Fanisaberi, Amirmohsen
Ulč, Filip
Fanisaberi, Amirmohsen
U Danchuk, Viktor
Bajwa, Laiba Asad
Bednaříková, Vendula
U Jewula, Pawel
Kovařík, Martin
Fanisaberi, Amirmohsen
Surana, Karan Singh
Varga, Dominik
U Danchuk, Viktor
Bajwa, Laiba Asad
Pavliňák, David
Strnad, Jiří
U Danchuk, Viktor
Fecko, Peter
Jasenský, Kryštof
U Danchuk, Viktor
Otýpka, Martin

Upcoming trainings

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Term Name Description Max. attendees
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
10.9. 14:19 - 15:19 Rigaku 3 - special Bring your typical sample. A 1.15 Attendees: Ivan Saldan 1
11.9. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Iosif Tantis 4
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
17.9. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Maneesha Ramesh 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2