Monday 24.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-DEPOSITION
SUSS-WETBENCH
UHV-XPS
UHV-PREPARATION
VERIOS
RIE-FLUORINE
RIGAKU3
R2-PECVD
TITAN
WITEC-RAMAN
CHEMLAB-B1.14
VNA-MPI
LASER-DICER
LAURELL-NANO
TEGRAMIN
LVEM
HENRY-MAGNET
MAGNETRON
NANOSAM
NANO-ONE-2PP
ICON-SPM
NMR
MIRA-EBL
HELIOS
MIRA-STAN
AMBER
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-PLD
UHV-SPM
UHV…
UHV…
VACUUM_OVEN-C1…
RIGAKU9
LYRA
ML3-BABY
VERSALAB
EVAPORATOR
BRILLOUIN
RAITH
R4…
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
MECHANICAL…
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
NANOCALC
CEITEC-NANO
THEORY-SUPPORT
nano-CT
SW-COMSOL
SUSS-RCD8
DIENER
LEICACOAT-STAN
RIE-CHLORINE
MINIFLEX
nanoCT
RSA
SHAKER-B1.18
CLR-ISO8-Lab…
SNOM-NANONICS
TUBE-FURNACE
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
TGA96
TGA-DISCOVERY
Heliscan
L450
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
JAZ3-CHANNEL
ALD-BENEQ
XEF2
GLOVEBOX…
MPS150
microCT
ZWICK
ZETASIZER
APCVD-Diffusion
JASCO
RTP
ALD-FIJI
UHV-MBE1
UHV-MBE2
TORNADO-M4
BET-DEGASSER
UHV-LEIS
BAMBULAB
DISCO-DICING…
NANOWIZARD
DWL
UHV-CLUSTER
APCVD
MAGNETRON-AJA
ARES
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
ACCURION_RSE
SAW-ACCUTOM
Q-LAB
IS-NOVOCONTROL
LEICACOAT-NANO
FRASCAN
DRYING-OVEN-B1…
NANOINDENTER
DIMPLING…
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
SPONGEBOB
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
DHR
PECVD-NANOFAB
LECTROPOL
SW-CT
FUMEHOOD…
ELECTROWORKSHOP
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DAWN-HELEOS
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DRIE
LIBS-FireFly
SPINCOATER…
ULTRACENTRIFUGE
NANOSCAN
MINIEVAP
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
LEXT
ZEISS-NANO
3D-PRUSA-BLUE
MONOWAVE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
FLOWBOX
CITOPRESS
DSC-DISCOVERY
LIBS-Discovery
CRYOGENIC
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
CRYOMILL
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
3D-PRUSA-XL
KERR-MICROSCOPE
TIC3X
CPD
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
UV-LASER
Fatima, Areej
Polčák, Josef
Procházková, Anna
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Jasenský, Kryštof
Cuccu, Elisa
Pribytova, Ekaterina
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Šťastný, Přemysl
Saldan, Ivan
Nghiem, Xuan Duc
Supalová, Linda
Fecko, Peter
Mařák, Vojtěch
Valadi Palliyalil, Anjali
Bolouki, Nima
Janů, Lucie
Horák, Michal
Kolíbalová, Eva
Vymazal, Jan
Spotz, Zdeněk
Michlovská, Lenka
Kharchenko, Ganna
Kumar, Sanjay
Tvrdoňová, Anna
Skálová, Zdenka
Říhová, Martina
Kharchenko, Ganna
Otýpka, Martin
U Danchuk, Viktor
Sanna, Michela
Mukherjee, Aniket
Michlovská, Lenka
Jasenský, Kryštof
Staňo, Michal
Ščasnovič, Erik
Wang, Yue
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Danchuk, Viktor
Caha, Ondřej
S Šamořil, Tomáš
U Piastek, Jakub
Daradkeh, Samer
Jasenský, Kryštof
Krčma, Jakub
Cuccu, Elisa

Upcoming trainings

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Term Name Description Max. attendees
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Hnilica Jan, Kristýna Kupková, Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Kristýna Kupková, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3