Saturday 26.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
AMBER
TITAN
WOOLLAM-VIS
K70
BRILLOUIN
TORNADO-M4
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
nanoCT
RIE-FLUORINE
MINIFLEX
TEM-SW
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PECVD
RIE-CHLORINE
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
TENUPOL
LEICA-TXP
NANO-ONE-2PP
FISCHIONE-160
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
CITOPRESS
TGA-DISCOVERY
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV…
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
NANOSCAN
ML3-BABY
MONOWAVE
ELECTROWORKSHOP
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
CRYOMILL
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
VERSALAB
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
TIC3X
BET-DEGASSER
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
FUMEHOOD…
DSC-DISCOVERY
CRYOGENIC
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LASER-DICER
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
LAURELL-NANO
R2-PECVD
FUMEHOOD…
LEICACOAT-NANO
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
FRASCAN
KEITHLEY-4200
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Pham, Sy Nguyen
Tahsin, Muhammad
Spousta, Jiří
Ali, Hasan
Dubroka, Adam
Klusák, Radovan
Wojewoda, Ondřej
Daradkeh, Samer

Upcoming trainings

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Term Name Description Max. attendees
29.9. 09:00 - 09:45 Solvent fumehood training - ISO 5 clean room Training for a solvent fume hood. Attendees: Tomáš Henzl 2
29.9. 09:30 - 25.9. 12:00 ALD-Fiji -training Attendees: Morteza AFSHAR 3
29.9. 09:45 - 10:30 Etching Fumehood training - ISO5 cleanroom Training for Etching Fumehood. We will meet directly in ISO5 clean room. Attendees: Tomáš Henzl 2
30.9. 14:00 - 15:00 Copy - Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Josef Hynšt, Aneta Opluštilová 5
30.9. 14:00 - 15:00 Copy - Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Josef Hynšt, Aneta Opluštilová 5
1.10. 09:30 - 13:00 FTIR Basic Training Attendees: Jiří Strnad 1
1.10. 09:30 - 12:00 Hysitron_basic Basic training on hysitron nanoindenter. Attendees: Rasul Valiyev, Štěpánka Kelarová 2
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
5.10. 09:30 - 21.7. 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Maneesha Ramesh 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jáchym Štindl, Tadeáš Lesovský, Filip Janík 3
6.10. 09:30 - 12:00 ICON-SPM basic training Attendees: Areej Fatima, Štěpánka Kelarová 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tadeáš Lesovský 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10