Thursday 15.1.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
VERIOS
EVAPORATOR
RIGAKU3
RAITH
ML3-BABY
DWL
HELIOS
MAGNETRON
VERSALAB
MIRA-EBL
WITEC-RAMAN
LASER-DICER
KRATOS-XPS
VNA-MPI
MIRA-STAN
SUSS-MA8
SCIA
LIBS-FireFly
LYRA
SNOM-NANONICS
FUMEHOOD-HF
TITAN
CRYOGENIC
UHV-MBE
LITESCOPE-LYRA
UHV-LEIS
UHV-LEEM
FUME_HOOD-B1.18
LITESCOPE-MIRA…
UHV-DEPOSITION
KERR-MICROSCOPE
RSA
ULTRACENTRIFUGE
BRILLOUIN
L450
RIGAKU9
UHV-PREPARATION
ALD-FIJI
WOOLLAM-VIS
SUSS-RCD8
LEICACOAT-STAN
DIENER
LEXT
RIE-CHLORINE
ZWICK
SW-CT
DRIE
DHR
SPINCOATER…
NANOCALC
STEMI
Q-LAB
SHAKER…
SW-BEAMER
ACCURION_RSE
RTP
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
MINIFLEX
ICON-SPM
nanoCT
nano-CT
BET-ANAMET
MPS150
SW-LAB
FTIR-CHEMLAB
UHV…
UHV…
ULTRAFAST-LASER
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
UHV-SPM
CITOVAC
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
microCT
ZETASIZER
UHV-CLUSTER
UHV-PLD
SW-TRACER
Test školení
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
TEST-RFID2
UHV-XPS
TGA96
MIRKA
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
SAW-ACCUTOM
DSC-DISCOVERY
PECVD
FUMEHOOD…
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
DRYING_OVEN-B1…
FUME_HOOD-B1.14
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
GLOVEBOX…
SPONGEBOB
DIMPLING…
PECVD-NANOFAB
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
TORNADO-M4
CRYOMILL
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
CPD
TIC3X
TEGRAMIN
LEICACOAT-NANO
PARYLENE-DIENER
NANOSCAN
WOOLLAM-RC2
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
MONOWAVE
CITOPRESS
NANOSAM
LVEM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
HENRY-MAGNET
PROTOMAT
FRASCAN
KAUFMAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
IR-RAMAN
LAKESHORE
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LPCVD-polySi
LPCVD-SiN
UV-LASER
Davidková, Kristyna
Povey, Rhys Geoffrey
Weisz, Hugo
Kovařík, Martin
Supalová, Linda
Putz, Stefan
Pradhan, Gyandeep
Supalová, Linda
Citterberg, Daniel
Davidková, Kristyna
Supalová, Linda
Pradhan, Gyandeep
Pradhan, Gyandeep
Burda, Daniel
Surana, Karan Singh
Prajzler, Vladimír
Pišťák, Jan
T Prášek, Jan
Davidková, Kristyna
Pradhan, Gyandeep
Wirthová, Michaela
Roupcová, Pavla
Šťastný, Přemysl
Pistis, Martino
Pradhan, Gyandeep
Talíř, Marek
Povey, Rhys Geoffrey
Gablech, Imrich
Supalová, Linda
Foltýn, Michael
Bahadur, Fateh
Talíř, Marek
Povey, Rhys Geoffrey
Daradkeh, Samer
Daradkeh, Samer
Davidková, Kristyna
Kovařík, Martin
Kotouček, Jan
Vymazal, Jan
Koller, Philipp
Arregi Uribeetxebarria, Jon Ander
Polčák, Josef
Mappoli, Shidhin
Klíma, Jan
Ulč, Filip
Koller, Philipp
Davidková, Kristyna
Zikmundová, Eva
Danylchenko, Petro
Klok, Pavel
Citterberg, Daniel
T Michalička, Jan
Klíma, Jan
U Danchuk, Viktor
Klok, Pavel
Vaníčková, Elena
Endstrasser, Zdeněk
Poláková, Veronika
Ulč, Filip
Endstrasser, Zdeněk
Arregi Uribeetxebarria, Jon Ander
Chamradová, Ivana
Saldan, Ivan
Krčma, Jakub
Kareš, Martin
Varshney, Devanshu
Endstrasser, Zdeněk
Juríček, Andrej
Kepič, Peter
Koller, Philipp
T Holas, Jiří
Povey, Rhys Geoffrey
T Gablech, Evelína
T Eliáš, Marek
Lepcio, Petr
Kareš, Martin
Koller, Philipp
Chamradová, Ivana
T Tmejová, Kateřina

Upcoming trainings

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Term Name Description Max. attendees
15.1. 09:30 - 12:00 RIE-chlorine- training Attendees: Cyril Delforge, Rhys Geoffrey Povey 3
15.1. 10:30 - 11:45 LEXT training Attendees: Nada Souawda, Aniket Mukherjee 3
15.1. 13:15 - 16:15 Evaprator CZ Standard training in the Czech language Attendees: Kryštof Jasenský, Jakub Piastek 2
15.1. 16:00 - 16:30 Spincoater Laurell-ChemLab Short introduction of the Spincoater in the ChemLab Attendees: Saurabh Pathak 3
16.1. 09:00 - 13:00 Rigaku 3-Basic Bring your typical sample A1.15 Attendees: Saurabh Pathak, Pedro Henrique de Oliveira Santiago 2
19.1. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 388 937 741 186 64 Přístupový kód: eS6dM7MD Attendees: Laiba Bajwa 5
20.1. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Lukáš Koňařík, Mohamed Bensalem 3
20.1. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Ondrej Kubinec 5
20.1. 13:00 - 17:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Nicole Rusnaková, Kryštof Matějka, Areej Fatima 2
20.1. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Laiba Bajwa 5
20.1. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Areej Fatima, Laiba Bajwa 10
20.1. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Laiba Bajwa 10
21.1. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jiří Spousta 1
21.1. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Mohamed Bensalem 1
21.1. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Lukáš Koňařík 1
23.1. 08:30 - 15:00 LYRA basic training - SEM part The training is focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Cyril Delforge, Elisa Cuccu, Jakub Piastek 4
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 4
27.1. 09:30 - 12:00 ALD-Beneq-training Attendees: Thanh Lam BUI, Kryštof Matějka, Jan Kunc 3
4.2. 09:30 - 13:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2
5.2. 09:30 - 13:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2