Friday 13.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
SUSS-WETBENCH
LEICACOAT-STAN
RAITH
ICON-SPM
WITEC-RAMAN
RIE-FLUORINE
RIGAKU3
ALD-BENEQ
ML3-BABY
KRATOS-XPS
CRYOGENIC
MIRA-STAN
FUMEHOOD-HF
VNA-MPI
UHV-SPM
LYRA
HELIOS
R4…
UHV-XPS
UHV-DEPOSITION
UHV-LEEM
FUMEHOOD…
PARYLENE-DIENER
LIBS-FireFly
TITAN
NANOINDENTER
CHEMLAB-B1.14
LASER-DICER
BET-ANAMET
MIRA-EBL
EVAPORATOR
SPONGEBOB
RIGAKU9
WOOLLAM-VIS
BRILLOUIN
BET-DEGASSER
NANOSCAN
DIENER
VERSALAB
UHV-PREPARATION
ZWICK
DRYING_OVEN-B1…
MIRKA
STEMI
SUMMIT
SAW-ACCUTOM
SPINCOATER…
PECVD
NANOCALC
SW-BEAMER
SHAKER-B1.18
SEE-SYSTEM
Q-LAB
LaserMIRA
RSA
RTP
SIMS
ACCURION_RSE
SUSS-RCD8
PARYLENE-SCS
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
SNOM-NANONICS
SW-TRACER
SW-LAB
3D-PRUSA-XL
LEICA-TXP
CITOVAC
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
TENUPOL
TGA96
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
TEM-SW
DSC-DISCOVERY
3D-PRUSA-ORANGE
FUMEHOOD…
DHR
DIMPLING…
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
SW-CT
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
DRIE
CRYOMILL
PECVD-NANOFAB
BAMBULAB
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TEGRAMIN
LEICACOAT-NANO
3D-PRUSA-BLACK
MPS150
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
MONOWAVE
LVEM
CITOPRESS
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
KERR-MICROSCOPE
PROTOMAT
FRASCAN
K70
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
LAKESHORE
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
UV-LASER
Jadhao, Pranjali
Cao, Hoang-Anh
Koňařík, Lukáš
Burda, Daniel
Idesová, Beáta
Jakešová, Marie
Jakešová, Marie
Jakešová, Marie
Idesová, Beáta
Delforge, Cyril
Pavliňák, David
T Holas, Jiří
T Holas, Jiří
Rotter, Marek
Krčma, Jakub
Delforge, Cyril
Idesová, Beáta
Jadhao, Pranjali
Fallahpour, Mojdeh
T Gablech, Evelína
paiva de araujo, Estacio
Vymazal, Jan
U Spotz, Zdeněk
Jakešová, Marie
Jakešová, Marie
Fanisaberi, Amirmohsen
T Roupcová, Pavla
Bednaříková, Vendula
BUI, Thanh Lam
Mirdamadi Khouzani, Sayed Hossein
Jakešová, Marie
Jakešová, Marie
Polčák, Josef
Kolíbal, Miroslav
Klíma, Jan
Lukiienko, Iryna
Pavliňák, David
Tkachenko, Serhii
Jakešová, Marie
Klíma, Jan
Cohl, Alexandr
Staňo, Michal
Huang, Yong
Janů, Lucie
Šebestová, Zuzana
Šebestová, Zuzana
Šebestová, Zuzana
Foltýn, Michael
Jakešová, Marie
Čechová, Ludmila
Jambor, Michal
U Gablech, Evelína
Foltýn, Michael
T Kolář, Richard
AL Soud, Ammar
Liška, Jiří
Fanisaberi, Amirmohsen
Jakešová, Marie
Malecot, Axel Fabien Benoit
Franta, Daniel
Delforge, Cyril
AL Soud, Ammar
Kovařík, Martin
Idesová, Beáta
Slavíček, Radek
Šebestová, Zuzana
Fanisaberi, Amirmohsen
Foltýn, Michael

Upcoming trainings

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Term Name Description Max. attendees
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
16.2. 10:00 - 13:00 Tornado-M4 Attendees: Jon Ander Arregi Uribeetxebarria 3
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
18.2. 08:30 - 12:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Amirmohsen Fanisaberi 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Hasan Ali 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek, Hasan Ali 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1