Sunday 8.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIGAKU9
CRYOGENIC
WOOLLAM-VIS
LEICACOAT-STAN
BET-ANAMET
MIRA-STAN
FUMEHOOD…
UHV-LEIS
RAITH
VERSALAB
SUSS-WETBENCH
KRATOS-XPS
BET-DEGASSER
WITEC-RAMAN
ML3-BABY
NMR
LaserMIRA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
SUMMIT
STEMI
SW-LAB
RSA
ULTRACENTRIFUGE
SHAKER…
ZEISS-NANO
NANOCALC
SW-BEAMER
3D-PRUSA-BLACK
MINIFLEX
nano-CT
RTP
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
ACCURION_RSE
nanoCT
RIGAKU3
SUSS-RCD8
LEICA-TXP
DIENER
RIE-FLUORINE
3D-PRUSA-BLUE
RIE-CHLORINE
3D-PRUSA-ORANGE
SW-TRACER
MPS150
TENUPOL
CITOVAC
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV-PREPARATION
UHV…
FISCHIONE-160
Heliscan
AMBER
Test Ondra 3
NIRQUEST512
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-CLUSTER
UHV-MBE2
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
Test O2
MONOWAVE
NIKON-NANO
HELIOS
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
DRIE
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DHR
SW-CT
micro-CT-m300
BRILLOUIN
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
micro-CT-L240
DAWN-HELEOS
NANOSAM
HENRY-MAGNET
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
MAGNETRON
LIBS-Discovery
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
GLOVEBOX…
CITOPRESS
NANOSCAN
LIBS-LabSys1
LIBS-FireFly
TEGRAMIN
CHEMLAB-B1.18
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
IS_NOVOCONTROL
LAURELL-NANO
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
Malecot, Axel Fabien Benoit
Varshney, Devanshu
Lukiienko, Iryna
Lukiienko, Iryna
Knoblochová, Alžběta
Remešová, Michaela
AL Soud, Ammar
Remešová, Michaela
U Jewula, Pawel
Vaníčková, Elena
Lišková, Zuzana
Daradkeh, Samer
Niapos, Eleftherios
B Polčák, Josef
AL Soud, Ammar
Švarc, Vojtěch
Niapos, Eleftherios

Upcoming trainings

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Term Name Description Max. attendees
9.2. 09:30 - 12:30 DLS-ZetaSizer Part 1+2 This training will provide hands-on practice with basic methods for measuring particle size using the DLS technique. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Michela Sanna, Ammar AL Soud, Monika Kreuzerová 3
9.2. 09:30 - 11:00 RIE-flourine- training Attendees: Franz Vilsmeier, Fabian Majcen, Kryštof Matějka 3
9.2. 15:00 - 16:00 SUSS-MA8 training Attendees: Laiba Bajwa 1
10.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Kryštof Jasenský 3
10.2. 09:30 - 12:00 RIE-flourine-training Attendees: Jakub Krčma, Ekaterina Pribytova, Laiba Bajwa 3
10.2. 14:00 - 14:45 Vacuum Oven C 1.38 Basic training for the Vacuum Oven C 1.38 Attendees: Sára Hrdinová 4
10.2. 14:00 - 15:00 DIENER-training Attendees: Laiba Bajwa 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
13.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
13.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
13.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10