Monday 15.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
SUSS-WETBENCH
MIRA-STAN
RIE-FLUORINE
MIRA-EBL
TITAN
RIGAKU3
WITEC-RAMAN
LEICACOAT-STAN
CRYOGENIC
WOOLLAM-VIS
LAKESHORE
CHEMLAB-B1.14
SPONGEBOB
EVAPORATOR
UHV-XPS
UHV-DEPOSITION
HELIOS
UHV-LEEM
4-POINT
SIMS
CLARUS-680
AMBER
TEGRAMIN
VERIOS
BET-ANAMET
DHR
UHV-SPM
UHV-PREPARATION
SUSS-MA8
DIENER
ALD-FIJI
RIGAKU9
FTIR-CHEMLAB
NIKON-NANO
WOOLLAM-RC2
LEXT
ZWICK
NANOCALC
PARYLENE-SCS
STEMI
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
SHAKER-B1.18
SUMMIT
LaserMIRA
SEE-SYSTEM
3D-PRUSA-BLUE
PARYLENE-DIENER
TEM-SW
ICON-SPM
SNOM-NANONICS
RSA
nano-CT
PECVD
nanoCT
MIRKA
SAW-ACCUTOM
SPINCOATER…
MINIFLEX
Q-LAB
RIE-CHLORINE
RTP
ACCURION_RSE
SUSS-RCD8
SW-BEAMER
NANO-ONE-2PP
SW-LAB
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TGA96
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
ULTRACENTRIFUGE
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
TEST2
ML3-BABY
ZEISS-NANO
FLOWBOX
SW-CT
DRIE
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
ELECTROWORKSHOP
R4…
LYRA
VERSALAB
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
CPD
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
FUMEHOOD…
Micromex
NMR
MAGNETRON
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
DEKTAK
LIBS-Discovery
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIRQUEST512
LIBS-LabSys1
LIBS-FireFly
micro-CT-L240
CHEMLAB-B1.18
micro-CT-m300
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
IS-NOVOCONTROL
LAURELL-NANO
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
Kalleshappa, Bindu
Daradkeh, Samer
Sobola, Dinara
Polášková, Kateřina
Pavliňák, David
Bajwa, Laiba Asad
Davidková, Kristyna
Supalová, Linda
Sevriugina, Veronika
Mařák, Vojtěch
Říhová, Martina
Supalová, Linda
Supalová, Linda
Bajwa, Laiba Asad
Davidková, Kristyna
Supalová, Linda
Davidková, Kristyna
Kolíbalová, Eva
Kolíbalová, Eva
Pišťák, Jan
Bednaříková, Vendula
Chamradová, Ivana
Ullattil, Sanjay Gopal
Sevriugina, Veronika
Říhová, Martina
Slavíček, Radek
Daradkeh, Samer
Duchaň, Marek
Holcman, Vladimír
T Lepcio, Petr
Tvrdoňová, Anna
Tvrdoňová, Anna
Molnár, Tomáš
D'Angelo, Elena
Bahadur, Fateh
Molnár, Tomáš
Šimůnková, Helena
Bábor, Petr
Brtníková, Jana
Spousta, Jiří
Paredes Sánchez, Claudia
U Kicmerova, Dina
E Tmejová, Kateřina
T Lepcio, Petr
Hrůza, Dominik
Molnár, Tomáš
Bajwa, Laiba Asad
Šimůnková, Helena
Eliáš, Marek
Slavíček, Radek
Tantis, Iosif
T Supalová, Linda
Franta, Daniel
Valiyev, Rasul
Fu, Hongbo

Upcoming trainings

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Term Name Description Max. attendees
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2
15.6. 10:00 - 11:00 Nikon - optical microscope ISO 5 Training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Martin Otýpka, Kryštof Jasenský 2
16.6. 08:30 - 15:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Hasan Ali 3
17.6. 14:00 - 15:31 ML3-Baby ML3 Baby MicroWriter training Attendees: David Jonathan Walcher 1
18.6. 09:30 - 11:00 PECVD - training Attendees: Elisa Cuccu 3
19.6. 09:30 - 12:00 DRIE-training Attendees: Matej Dinis, Jiří Strnad 3
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson, Sharmistha Dey 4
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2
9.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh 3
10.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
10.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
10.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1