Wednesday 21.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
EVAPORATOR
MIRA-STAN
DIENER
SUSS-WETBENCH
BET-ANAMET
ICON-SPM
ML3-BABY
RIGAKU3
BET-DEGASSER
MAGNETRON
VERIOS
LASER-DICER
AMBER
PARYLENE-SCS
UHV-SPM
NANOCALC
UHV-PLD
UHV-XPS
HELIOS
CHEMLAB-B1.14
LYRA
FUMEHOOD…
UHV-LEEM
FUMEHOOD-HF
TITAN
FUMEHOOD…
FUMEHOOD…
CRYOGENIC
RAITH
FUMEHOOD…
LPCVD-polySi
UHV-DEPOSITION
SPONGEBOB
WIRE-BONDER
ZEISS-NANO
APCVD
NIKON-NANO
RIGAKU9
LEICACOAT-STAN
ARES
WITEC-RAMAN
VACUUM_OVEN-C1…
NANO-ONE-2PP
VERSALAB
ZWICK
RIE-FLUORINE
3D-PRUSA-XL
UHV-PREPARATION
PECVD
SHAKER-B1.18
SUMMIT
STEMI
LaserMIRA
SEE-SYSTEM
SIMS
nano-CT
SNOM-NANONICS
MIRKA
SAW-ACCUTOM
ICON-SPM
nanoCT
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
MIRA-EBL
RSA
RIE-CHLORINE
MINIFLEX
SW-BEAMER
EBPG
THEORY-SUPPORT
SW-LAB
FTIR
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
CITOVAC
UHV…
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID4
UHV-MBE
TGA96
3D-PRUSA-ORANGE
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
TEM-SW
WOOLLAM-MIR
3D-PRUSA-BLACK
FLOWBOX
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
R4…
4-POINT
CRYOMILL
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
SW-CT
TIC3X
DAWN-HELEOS
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
MAGNETRON-AJA
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
micro-CT-m300
TEGRAMIN
3D-PRUSA-BLUE
LABOTOM5
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
DSC-DISCOVERY
LITESCOPE-MIRA…
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIRQUEST512
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
LPCVD-SiN
LITESCOPE-LYRA
VNA-MPI
SCIA
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LIBS-LabSys1
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Čechal, Jan
Fatima, Areej
Kubinec, Ondrej
Papež, Nikola
Kupková, Kristýna
Janoušek, Tomáš
Jakešová, Marie
Jakešová, Marie
Pavliňák, David
Žaloudková, Lucie
Vijithra, Vijithra
E Zita, Jiří
T Eliáš, Marek
Bajwa, Laiba Asad
Citterberg, Daniel
Kalousková, Petra
Štálnik, Jozef
Lee, Hyesung
Lee, Hyesung
Máčala, Jakub
Šťastný, Jakub
Citterberg, Daniel
Martyniuk, Oleh
Wirthová, Michaela
Bednaříková, Vendula
Lee, Hyesung
Lee, Hyesung
Bajwa, Laiba Asad
Molnár, Tomáš
T Kicmerova, Dina
Šťastný, Jakub
Kumar, Sanjay
Štálnik, Jozef
Iakoubovskii, Konstantin
Wang, Yue
Bajwa, Laiba Asad
Hrůza, Dominik
E Zita, Jiří
Dey, Sharmistha
Hrůza, Dominik
B Man, Ondřej
Fanisaberi, Amirmohsen
Řepa, Rostislav
E Zita, Jiří
Hrůza, Dominik
E Zita, Jiří
T Michalička, Jan
E Zita, Jiří
E Zita, Jiří
Lukiienko, Iryna
Kalousková, Petra
Fanisaberi, Amirmohsen
Dinis, Matej
Hrůza, Dominik
Jakešová, Marie
Otýpka, Martin
E Zita, Jiří
Dinis, Matej
E Zita, Jiří
Staňo, Michal
Pavliňák, David
T Lepcio, Petr
Havelka, Tomáš
Dey, Sharmistha
Slovák, Michal
Danchuk, Viktor
Sevriugina, Veronika
Bajwa, Laiba Asad
Fecko, Peter
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
22.10. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Michael Foltýn, Carolina Sanna 4
23.10. 09:00 - 17:30 Amber EDS-EBSD training Attendees: Veronika Mazánová, Dinara Sobola 2
25.10. 10:30 - 12:00 Novocontrol-Basic training DRS spectroscopy 2
27.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský 3
27.10. 10:00 - 12:00 DLS-ZetaSizer Part 2 Assisted hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer Ultra. Attendees: Carolina Sanna 1
29.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
30.10. 10:00 - 12:00 NANO-ONE-2PP Advance Training Advanced NANO-ONE-2PP training for printing with optically transparent resins. Attendees: Vladislav Dvořák, Michal Slovák 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Ying Hu, Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1