Sunday 22.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
DIENER
MAGNETRON
UHV-XPS
EVAPORATOR
VERSALAB
RSA
LITESCOPE-MIRA…
CRYOGENIC
UHV-SPM
RAITH
BAMBULAB
MIRA-STAN
WOOLLAM-VIS
KRATOS-XPS
MIRA-EBL
nanoCT
SW-LAB
nano-CT
SW-BEAMER
BET-ANAMET
SNOM-NANONICS
SHAKER-B1.18
ICON-SPM
PARYLENE-SCS
STEMI
SIMS
NANOCALC
LaserMIRA
SUMMIT
SEE-SYSTEM
3D-PRUSA-XL
MINIFLEX
PECVD
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
RIE-CHLORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
LEICA-TXP
RIE-FLUORINE
SW-TRACER
Test Ondra 3
TENUPOL
VACUUM_OVEN-B1…
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
UHV-PREPARATION
FISCHIONE-160
TGA-DISCOVERY
AMBER
NIKON-NANO
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV…
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
UHV…
NIRQUEST512
DSC-DISCOVERY
NANOSAM
HELIOS
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
Micromex
BRILLOUIN
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
CLARUS-680
micro-CT-L240
NANOSCAN
KERR-MICROSCOPE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
LAURELL-NANO
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
MPS150
MONOWAVE
CITOPRESS
LIBS-FireFly
LASER-DICER
micro-CT-m300
CHEMLAB-B1.14
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.16
R2-PECVD
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Bokaei Khelejan, Hatef
U Prášek, Jan
Hrůza, Dominik
Bokaei Khelejan, Hatef
Niapos, Eleftherios
Sevriugina, Veronika
Ulč, Filip
Lukiienko, Iryna
Hrůza, Dominik
Idesová, Beáta
Kolář, Richard
Ulč, Filip
Franta, Daniel
Daradkeh, Samer

Upcoming trainings

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Term Name Description Max. attendees
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jakub Krčma, Zuzana Košelová, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Michela Sanna, Ekaterina Pribytova, Sujan Maity 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Michela Sanna, Sujan Maity, Hasan Ali, Tomáš Janoušek, Jan Staněk 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Michela Sanna, Eduard Jelínek, Sujan Maity, Hasan Ali, Tomáš Janoušek 10
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning users Renewing the certificate for long-inactive users. Meeting point at the microscope. Attendees: Michela Sanna, Martin Kovařík 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 5
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4