| 20.4. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/31245607839153?p=QX552nhoP9PxXCL4FX)
Meeting ID: 312 456 078 391 53
Access code: i5xd7zL3
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5
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| 21.4. 09:30 - 12:00 |
ICON-SPM basic training
|
Attendees:
Viktor
Danchuk
|
3
|
| 21.4. 10:00 - 10:45 |
Solvent fumehood training (ISO 5)
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Training for the solvent fume hood in nanofabrication. Meeting point is inside the lab.
Attendees:
David Jonathan
Walcher
|
2
|
| 21.4. 10:45 - 11:30 |
Etching fumehood training (ISO 5)
|
Training for the etching fume hood in nanofabrication. Meeting point is inside the lab.
Attendees:
David Jonathan
Walcher
|
2
|
| 21.4. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion.
Attendees:
Petr
Sysel,
Ying
Hu,
Thông Thái
Trần,
Rosmi
Vinson
|
5
|
| 21.4. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
|
5
|
| 21.4. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Ying
Hu,
Thông Thái
Trần,
Rosmi
Vinson,
Sharmistha
Dey
|
10
|
| 21.4. 14:25 - 14:55 |
Safety excursion - StAn lab
|
Attendees:
Carolina
Oliver Urrutia,
Ying
Hu,
Thông Thái
Trần,
Rosmi
Vinson,
Sharmistha
Dey
|
10
|
| 22.4. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jozef
Štálnik,
Sujan
Maity
|
3
|
| 23.4. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Jozef
Štálnik
|
1
|
| 23.4. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 23.4. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 24.4. 09:00 - 13:00 |
LVEM_basic (1/2)
|
Attendees:
Muhammad
Tahsin,
Karan Singh
Surana
|
1
|
| 24.4. 14:00 - 28.5. 16:00 |
LVEM_basic (2/2)
|
Hands-on session
Attendees:
Karan Singh
Surana
|
1
|
| 6.5. 09:30 - 16:30 |
MIRA-STAN 1/2
|
Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Jiří
Spousta
|
4
|
| 27.5. 09:00 - 24.4. 14:00 |
LVEM_basic (1/2)
|
Attendees:
Muhammad
Tahsin,
Anjali
Valadi Palliyalil
|
2
|
| 28.5. 09:00 - 11:00 |
LVEM_basic (2/2)
|
Hands-on session
Attendees:
Anjali
Valadi Palliyalil
|
1
|
| 28.5. 13:00 - 15:00 |
LVEM_basic (2/2)
|
Hands-on session
|
1
|
UHV-PREPARATION
UHV-LEEM
RAITH