Thursday 11.12.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WITEC-RAMAN
LYRA
VERIOS
MPS150
RIE-FLUORINE
LEICACOAT-STAN
R2-PECVD
KEITHLEY-4200
RIGAKU3
TITAN
MIRA-STAN
SUSS-WETBENCH
TEGRAMIN
RAITH
KRATOS-XPS
NANOINDENTER
VNA-MPI
SCIA
LITESCOPE-MIRA…
WOOLLAM-RC2
CRYOGENIC
MAGNETRON
R4…
WOOLLAM-VIS
ULTRACENTRIFUGE
ICON-SPM
UHV-DEPOSITION
UHV-LEEM
UHV-LEIS
UHV-XPS
UHV-PREPARATION
JAZ3-CHANNEL
HELIOS
ML3-BABY
EVAPORATOR
VERSALAB
ALD-BENEQ
ALD-FIJI
SW-LAB
VACUUM_OVEN…
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
LEICA-TXP
SW-TRACER
SUMMIT
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
SHAKER…
ELECTROWORKSHOP
TEST-RFID2
MINIFLEX
RTP
ACCURION_RSE
MECHANICAL…
SUSS-RCD8
DIENER
TORNADO-M4
RIE-CHLORINE
nanoCT
SEE-SYSTEM
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
BRILLOUIN
PARYLENE-SCS
SIMS
LaserMIRA
Heliscan
TGA96
VISCOMETER
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
VUVAS
L450
JASCO
WIRE-BONDER
ARES
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
APCVD
DWL
THEORY-SUPPORT
BET-DEGASSER
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-FTIR
US-CUTTER
BAMBULAB
DISCO-DICING…
UHV-MBE
NANOWIZARD
UHV-PLD
UHV-SPM
ULTRAFAST-LASER
Q-LAB
SAW-ACCUTOM
SPINCOATER…
CHEMLAB-B1.16
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
DRIE
SW-CT
CHEMLAB-B1.14
CHEMLAB-B1.18
DIMPLING…
IS_NOVOCONTROL
ZEISS-STAN
CRYOMILL
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
DHR
DRYING_OVEN-B1…
LASER-DICER
FUMEHOOD…
FLOWBOX
LECTROPOL
SPONGEBOB
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
GLOVEBOX
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TIC3X
LAURELL-NANO
MIRKA
TUBE-FURNACE
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIRQUEST512
NMR
WOOLLAM-MIR
ZEISS-NANO
CEITEC-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
GLOVEBOX…
LABOTOM5
LIBS-FireFly
LAKESHORE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
CPD
MINIEVAP
LPCVD-polySi
LPCVD-SiN
LEXT
DEKTAK
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
SW-COMSOL
CLR-ISO8-Lab…
SUSS-MA8
UV-LASER
Valero, Astolfo
Raad, Ryan
Vymazal, Jan
paiva de araujo, Estacio
Varshney, Devanshu
E Zita, Jiří
E Zita, Jiří
T Šamořil, Tomáš
Souawda, Nada
Lukiienko, Iryna
Šťastný, Přemysl
Jadhao, Pranjali
Kumar, Sanjay
E Zita, Jiří
E Zita, Jiří
Švarc, Vojtěch
Lukiienko, Iryna
Šťastný, Přemysl
Gejdoš, Pavel
Polášková, Kateřina
Beliančínová, Beáta
E Zita, Jiří
E Zita, Jiří
T Roupcová, Pavla
B Roupcová, Pavla
Michalička, Jan
Michalička, Jan
Ulč, Filip
Očkovič, Adam
Gheorghe, Andrei
Švarc, Vojtěch
Paredes Sánchez, Claudia
Paredes Sánchez, Claudia
Krčma, Jakub
Pistis, Martino
Procházková, Anna
Polčák, Josef
Buršíková, Vilma
Pribytova, Ekaterina
Vejrosta, Jakub
Ulč, Filip
T Franta, Daniel
Lukiienko, Iryna
U Prášek, Jan
Eliáš, Marek
Kepič, Peter
Saldan, Ivan
Staňo, Michal
Jakub, Zdeněk
Jabeen, Ayesha
Vaníčková, Elena
Jakub, Zdeněk
Jakub, Zdeněk
T Nebojsa, Alois
Očkovič, Adam
Gheorghe, Andrei
Danylchenko, Petro
Daradkeh, Samer
T Eliáš, Marek
Juríček, Andrej

Upcoming trainings

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Term Name Description Max. attendees
11.12. 09:30 - 12:00 ALD-Beneq-training Attendees: Daniel Burda, Ondřej Červinka, Beáta Idesová 3
11.12. 13:00 - 16:00 Woollam RC2 First part of training. Attendees: Ryan Raad 1
11.12. 13:00 - 17:00 Rigaku 3 - hands on Attendees: Lucie Žaloudková 1
12.12. 09:00 - 10:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Grigory Mathew 1
12.12. 09:30 - 12:00 ALD-Fiji-training Attendees: Jozef Štálnik 3
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 09:30 - 12:00 SCIA-training Attendees: Jozef Štálnik 3
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Pedro Henrique de Oliveira Santiago 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Pedro Henrique de Oliveira Santiago 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Pedro Henrique de Oliveira Santiago 10
18.12. 09:30 - 12:00 DRIE-training Attendees: Kateřina Krajíčková 3
19.12. 13:00 - 16:00 Woollam RC2 Second part of Training Attendees: Ryan Raad 1
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4