Monday 17.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-PREPARATION
MIRA-STAN
UHV-XPS
KRATOS-XPS
LEICACOAT-STAN
UHV-DEPOSITION
NANOSAM
EVAPORATOR
UHV-LEEM
UHV-LEIS
UHV…
UHV…
UHV-SPM
UHV-PLD
UHV-MBE
ML3-BABY
HELIOS
LYRA
DIENER
SUSS-WETBENCH
NMR
R2-PECVD
ICON-SPM
AMBER
VERIOS
TITAN
UHV-FTIR
BET-ANAMET
WIRE-BONDER
PECVD
MPS150
WITEC-RAMAN
L450
LEXT
MAGNETRON
WOOLLAM-RC2
TUBE-FURNACE
TORNADO-M4
3D-PRUSA-ORANGE
PARYLENE-SCS
3D-PRUSA-BLACK
SIMS
SUSS-RCD8
SEE-SYSTEM
SNOM-NANONICS
LaserMIRA
SUMMIT
SHAKER-B1.18
ULTRACENTRIFUGE
3D-PRUSA-BLUE
MINIFLEX
MIRA-EBL
RSA
nano-CT
nanoCT
RIGAKU3
RIE-CHLORINE
PARYLENE-DIENER
TEM-SW
MIRKA
SAW-ACCUTOM
SPINCOATER…
NANOCALC
Q-LAB
RTP
ACCURION_RSE
RIE-FLUORINE
Test školení
STEMI
VACUUM-OVEN-B1…
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
ULTRASONIC…
VUVAS
VISCOMETER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
ULTRAFAST-LASER
SW-BEAMER
TEST2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST-RFID2
UHV-CLUSTER
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
ZEISS-NANO
NANO-ONE-2PP
WOOLLAM-VIS
4-POINT
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
SW-CT
Micromex
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CRYOMILL
BRILLOUIN
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
CPD
TIC3X
VERSALAB
CLARUS-680
micro-CT-L240
NIRQUEST512
HENRY-MAGNET
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
SUSS-MA8
LIBS-LabSys1
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-m300
CHEMLAB-B1.18
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
IS-NOVOCONTROL
LIBS-FireFly
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
UV-LASER
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Molnár, Tomáš
Natarajan, Senthil Nathan
Vinson, Rosmi
Havlíková, Tereza
Šamořil, Tomáš
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
Molnár, Tomáš
Polčák, Josef
Maity, Sujan
Fatima, Areej
Natarajan, Senthil Nathan
Havlíková, Tereza
Remešová, Michaela
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Danchuk, Viktor
S Danchuk, Viktor
Pribytova, Ekaterina
Fecko, Peter
U Danchuk, Viktor
Jakub, Zdeněk
Vaníčková, Elena
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Pribytova, Ekaterina
Man, Ondřej
S Šamořil, Tomáš
paiva de araujo, Estacio
Pribytova, Ekaterina
B Jewula, Pawel
Janů, Lucie
Fallahpour, Mojdeh
Fecko, Peter
Natarajan, Senthil Nathan
Huang, Yong
U Danchuk, Viktor
Surana, Karan Singh
Supalová, Linda
Cuccu, Elisa
paiva de araujo, Estacio
paiva de araujo, Estacio
Slovák, Vojtěch
Gablech, Evelína
U Prášek, Jan
T Franta, Daniel
T Ligmajer, Filip
Kicmerova, Dina

Upcoming trainings

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Term Name Description Max. attendees
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Andrej Juríček, Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Andrej Juríček 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3