Sunday 20.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
DRYING-OVEN-B1…
LYRA
TUBE-FURNACE
UHV-DEPOSITION
R2-PECVD
BRILLOUIN
KERR-MICROSCOPE
LITESCOPE-MIRA…
MIRA-STAN
WITEC-RAMAN
WOOLLAM-VIS
MPS150
FTIR
SNOM-NANONICS
MIRA-EBL
ICON-SPM
RSA
nano-CT
nanoCT
PARYLENE-SCS
NANO-ONE-2PP
SIMS
SEE-SYSTEM
SUMMIT
SHAKER-B1.18
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
LaserMIRA
SUSS-RCD8
MINIFLEX
PECVD
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
MIRKA
RIE-CHLORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
LEICA-TXP
DIENER
RIE-FLUORINE
SW-TRACER
Test O2
TENUPOL
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV-PREPARATION
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
KRATOS-XPS
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
Heliscan
AMBER
Test Ondra 3
NANOSCAN
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV…
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
NANOSAM
WOOLLAM-MIR
CITOPRESS
R4…
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
VERSALAB
FUMEHOOD…
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
FUMEHOOD…
MONOWAVE
PROTOMAT
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
LASER-DICER
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
ML3-BABY
DSC-DISCOVERY
LAURELL-NANO
KEITHLEY-4200
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
TITAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Štindl, Jáchym
S Šamořil, Tomáš
Kepič, Peter
U Danchuk, Viktor
Polášková, Kateřina
Wojewoda, Ondřej
SAHIL, Muhammad
Ulč, Filip
Ulč, Filip
Liška, Jiří
Duchaň, Marek
Liška, Jiří
Liška, Jiří

Upcoming trainings

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Term Name Description Max. attendees
21.9. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Daniel Burda, Vladislav Dvořák, Nikola Papež 3
21.9. 12:30 - 13:00 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Jakub Máčala, Saleh Hekmat Saleh Fawaeer, Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh, Tomáš Henzl, Filip Janík 10
22.9. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: Sujan Maity, Matthias Knopf, Stefan Schultschik 2
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Jakub Máčala, Maneesha Ramesh, Filip Janík 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10