Tuesday 11.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
VERIOS
RIGAKU3
VERSALAB
3D-PRUSA-XL
AMBER
FUMEHOOD…
EVAPORATOR
TGA-DISCOVERY
SUSS-MA8
MONOWAVE
ICON-SPM
CHEMLAB-B1.18
RIE-FLUORINE
GLOVEBOX…
SAW-ACCUTOM
WITEC-RAMAN
CHEMLAB-B1.14
KAUFMAN
ML3-BABY
TITAN
PECVD
UHV-DEPOSITION
FUMEHOOD…
FUMEHOOD-HF
BET-ANAMET
SUSS-WETBENCH
MIRA-STAN
LAURELL-NANO
SEE-SYSTEM
LITESCOPE-MIRA…
UHV-LEIS
PARYLENE-SCS
CRYOGENIC
LVEM
KERR-MICROSCOPE
MIRA-EBL
WOOLLAM-RC2
WOOLLAM-MIR
NANOSCAN
NANOSAM
UHV-LEEM
TEGRAMIN
JASCO
FTIR
BET-DEGASSER
WIRE-BONDER
SPONGEBOB
VACUUM-OVEN-B1…
RIGAKU9
UHV-PREPARATION
DRYING-OVEN-B1…
CLR-ISO8-Lab…
LEICACOAT-STAN
LYRA
UHV-XPS
HELIOS
SNOM-NANONICS
VACUUM-OVEN-B1…
SIMS
FTIR-CHEMLAB
RSA
VUVAS
nano-CT
CITOVAC
L450
nanoCT
VISCOMETER
JAZ3-CHANNEL
MINIFLEX
RIE-CHLORINE
XEF2
microCT
DIENER
SUSS-RCD8
ZWICK
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
ZETASIZER
VACUUM_OVEN-C1…
UHV-MBE
LaserMIRA
Test O2
UHV-FTIR
UHV-PLD
UHV-MBE2
UHV-MBE1
UHV-SPM
UHV-CLUSTER
Heliscan
THEORY-SUPPORT
TGA96
TEST-RFID4
TEST-RFID2
Test školení
UHV…
TEST2
Test Ondra 3
SUMMIT
UHV…
FISCHIONE-160
ULTRAFAST-LASER
TENUPOL
LEICA-TXP
SW-TRACER
SW-LAB
ULTRASONIC…
SW-BEAMER
US-CUTTER
STEMI
NANOCALC
DWL
SHAKER-B1.18
MIRKA
NANO-ONE-2PP
TEM-SW
R4…
SW-CT
DRIE
DHR
DIMPLING…
RAITH
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
ALD-FIJI
MPS150
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
MINIEVAP
BAMBULAB
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
PARYLENE-DIENER
CITOPRESS
LAKESHORE
PROTOMAT
HENRY-MAGNET
MAGNETRON
DEKTAK
LABOTOM5
DSC-DISCOVERY
NIKON-NANO
LPCVD-polySi
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
LPCVD-SiN
LITESCOPE-LYRA
micro-CT-m300
ZEISS-STAN
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
IS-NOVOCONTROL
SCIA
LIBS-LabSys1
FISCHIONE-TEM…
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LIBS-FireFly
LIBS-Discovery
UV-LASER
Polčák, Josef
Jadhao, Pranjali
Dey, Sharmistha
Beliančínová, Beáta
Devi Thongam, Debika
Mirdamadi Khouzani, Sayed Hossein
Surana, Karan Singh
Žaloudková, Lucie
Lee, Hyesung
Gejdoš, Pavel
Hrdinová, Sára
Natarajan, Senthil Nathan
Daradkeh, Samer
Spusta, Tomáš
Kumar, Sanjay
Staňo, Michal
Iakoubovskii, Konstantin
Valadi Palliyalil, Anjali
Říhová, Martina
Krútek, Šimon
Fecko, Peter
Pavliňák, David
Sanna, Carolina
Figura, Daniel
Figura, Daniel
Ullattil, Sanjay Gopal
T Tmejová, Kateřina
Bakhshikhah, Mahan
Kubinec, Ondrej
Tmejová, Kateřina
Tmejová, Kateřina
Supalová, Linda
Krútek, Šimon
Saldan, Ivan
Saldan, Ivan
Prajzler, Vladimír
Prajzler, Vladimír
Havelka, Tomáš
Pavliňák, David
Fanisaberi, Amirmohsen
Prášek, Jan
Piastek, Jakub
S Michalička, Jan
Cuccu, Elisa
Endstrasser, Zdeněk
Figura, Daniel
Hrdý, Radim
T Tmejová, Kateřina
Hrdý, Radim
Ulč, Filip
Figura, Daniel
Bolouki, Nima
Ulč, Filip
Vaníčková, Elena
Krútek, Šimon
T Danchuk, Viktor
Říhová, Martina
SAHIL, Muhammad
Supalová, Linda
Dey, Sharmistha
Franta, Daniel
Staňo, Michal
S Danchuk, Viktor
Endstrasser, Zdeněk
Rotter, Marek
Říhová, Martina
Franta, Daniel
T Tmejová, Kateřina
Piastek, Jakub
Krútek, Šimon
Jewula, Pawel
Staňo, Michal
Endstrasser, Zdeněk
Valadi Palliyalil, Anjali
Figura, Daniel
U Holas, Jiří
S Šamořil, Tomáš
Molnár, Tomáš
Man, Ondřej

Upcoming trainings

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Term Name Description Max. attendees
11.8. 09:30 - 10:00 Monowave training The training for the experienced users. Attendees: Anjali Valadi Palliyalil 2
11.8. 15:00 - 7.8. 16:50 CRYOGENIC DCR CRYOGENIK DCR Attendees: Ekaterina Pribytova 1
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, Rosmi Vinson, DAVIDE MURTAS 4
13.8. 09:00 - 14.8. 17:30 Amber SEM-FIB training Attendees: Yue Wang 2
14.8. 13:00 - 13:45 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
14.8. 13:45 - 14:30 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3