Tuesday 16.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WITEC-RAMAN
KRATOS-XPS
MIRA-EBL
ULTRASONIC…
ICON-SPM
EVAPORATOR
RIE-FLUORINE
VERSALAB
WOOLLAM-RC2
MIRA-STAN
ALD-FIJI
RIGAKU3
TITAN
RIGAKU9
ALD-BENEQ
CHEMLAB-B1.16
VACUUM_OVEN-C1…
BET-ANAMET
CLARUS-680
UHV-PREPARATION
CHEMLAB-B1.18
ELECTROWORKSHOP
UHV-SPM
UHV-PLD
HELIOS
UHV-XPS
LAKESHORE
PARYLENE-SCS
UHV-DEPOSITION
SUSS-WETBENCH
CRYOGENIC
SUSS-MA8
DRIE
TEGRAMIN
CHEMLAB-B1.14
BET-DEGASSER
AMBER
VACUUM-OVEN-B1…
TIC3X
LEICACOAT-STAN
ULTRACENTRIFUGE
LITESCOPE-MIRA…
LaserMIRA
SIMS
SUMMIT
SEE-SYSTEM
SHAKER-B1.18
NANOCALC
STEMI
NANO-ONE-2PP
SNOM-NANONICS
SPINCOATER…
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
Q-LAB
RSA
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-CHLORINE
nanoCT
nano-CT
MINIFLEX
Test školení
SW-BEAMER
CITOVAC
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TGA96
UHV-MBE
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
3D-PRUSA-BLUE
ML3-BABY
ZEISS-NANO
4-POINT
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
R4…
FLOWBOX
LYRA
FTIRMAG
SW-CT
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
CRYOMILL
Micromex
BAMBULAB
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
micro-CT-L240
NMR
WOOLLAM-MIR
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
DEKTAK
LABOTOM5
3D-PRUSA-XL
LITESCOPE-LYRA
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
LPCVD-polySi
LIBS-LabSys1
micro-CT-m300
ZEISS-STAN
DAWN-HELEOS
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
IS-NOVOCONTROL
SCIA
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Raad, Ryan
Konečný, Martin
Liška, Jiří
Spotz, Zdeněk
Kelarová, Štěpánka
Polčák, Josef
Jadhao, Pranjali
Davidková, Kristyna
Davidková, Kristyna
Supalová, Linda
Hu, Ying
Hu, Ying
Slavíček, Radek
Kubinec, Ondrej
Burda, Daniel
Šimůnková, Helena
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Danchuk, Viktor
Lukiienko, Iryna
Raad, Ryan
Přibyl, Roman
Oliver Urrutia, Carolina
Natarajan, Senthil Nathan
Eliáš, Marek
Supalová, Linda
Natarajan, Senthil Nathan
Bednaříková, Vendula
Heczko, Milan
T Kolíbalová, Eva
Slavíček, Radek
Varshney, Devanshu
Burda, Daniel
U Eliáš, Marek
Hu, Ying
Hu, Ying
Slavíček, Radek
Danchuk, Viktor
Tantis, Iosif
Brtníková, Jana
D'Angelo, Elena
Danchuk, Viktor
Fanisaberi, Amirmohsen
Hrůza, Dominik
Slavíček, Radek
T Man, Ondřej
D'Angelo, Elena
Holcman, Vladimír
Bajwa, Laiba Asad
D'Angelo, Elena
Bajwa, Laiba Asad
Slavíček, Radek
Bajwa, Laiba Asad
Fecko, Peter
Paredes Sánchez, Claudia
Hu, Ying
Tantis, Iosif
Spousta, Jiří
Hu, Ying
Kramář, Jan
Natarajan, Senthil Nathan
Hu, Ying
Dao, Radek

Upcoming trainings

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Term Name Description Max. attendees
16.6. 08:30 - 15:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Hasan Ali 3
17.6. 14:00 - 15:31 ML3-Baby ML3 Baby MicroWriter training Attendees: David Jonathan Walcher 1
18.6. 09:06 - 12:00 Woollam RC2 Basic training Attendees: Mojdeh Fallahpour, Sharmistha Dey 2
18.6. 09:30 - 11:00 PECVD - training Attendees: Elisa Cuccu 3
19.6. 09:30 - 12:00 DRIE-training Attendees: Matej Dinis, Jiří Strnad 3
19.6. 13:00 - 15:30 DHR 2/2 Finish the basic rheology training with a hands-on session. Attendees: Amirmohsen Fanisaberi 1
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Hyesung Lee, Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 09:30 - 12:00 DHR 2/2 Finish the basic rheology training with a hands-on session. Attendees: Carolina Sanna 1
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Debika Devi Thongam 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Debika Devi Thongam, DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Debika Devi Thongam 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson, Sharmistha Dey 4
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2
9.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh 3
10.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
10.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
10.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1