Friday 14.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
TEGRAMIN
CHEMLAB-B1.18
TGA-DISCOVERY
WITEC-RAMAN
MECHANICAL…
DSC-DISCOVERY
RIGAKU3
SUSS-MA8
WOOLLAM-RC2
HELIOS
JASCO
SAW-ACCUTOM
AMBER
TITAN
FUMEHOOD…
LYRA
UHV-LEIS
UHV-DEPOSITION
CRYOGENIC
UHV-LEEM
NANO-ONE-2PP
FUMEHOOD…
FUMEHOOD…
BET-ANAMET
SUSS-WETBENCH
FUMEHOOD…
ICON-SPM
3D-PRUSA-ORANGE
SEE-SYSTEM
LASER-DICER
MIRA-STAN
EVAPORATOR
UHV-XPS
ALD-FIJI
ZWICK
NANOSAM
KRATOS-XPS
UHV-SPM
3D-PRUSA-XL
LEICACOAT-STAN
L450
WOOLLAM-MIR
DIENER
MAGNETRON
SW-CT
UHV-PREPARATION
RIE-FLUORINE
LVEM
TEM-SW
SHAKER-B1.18
SUMMIT
PECVD
LaserMIRA
NANOCALC
MIRKA
SPINCOATER…
MINIFLEX
RTP
SIMS
Q-LAB
PARYLENE-SCS
SNOM-NANONICS
MIRA-EBL
ACCURION_RSE
RSA
nano-CT
SUSS-RCD8
nanoCT
RIE-CHLORINE
STEMI
Test školení
SW-BEAMER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID4
UHV-CLUSTER
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-MBE
UHV-PLD
PARYLENE-DIENER
ML3-BABY
3D-PRUSA-BLACK
ELECTROWORKSHOP
CRYOMILL
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
R4…
TIC3X
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
3D-PRUSA-BLUE
LABOTOM5
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
DEKTAK
MONOWAVE
LIBS-LabSys1
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-m300
IS-NOVOCONTROL
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
LIBS-FireFly
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
UV-LASER
U Man, Ondřej
Burda, Daniel
Surana, Karan Singh
Staňo, Michal
Pišťák, Jan
Skálová, Zdenka
Pišťák, Jan
Říhová, Martina
Lepcio, Petr
Fanisaberi, Amirmohsen
Žaloudková, Lucie
B Petruš, Josef
S Lehchenkova, Iryna
Sanna, Carolina
Sobola, Dinara
Sobola, Dinara
Varga, Dominik
Varga, Dominik
B Petruš, Josef
S Lehchenkova, Iryna
Valadi Palliyalil, Anjali
Mařák, Vojtěch
Supalová, Linda
T Supalová, Linda
Přibyl, Roman
Rusnaková, Nicole
U Man, Ondřej
Man, Ondřej
Říhová, Martina
Skálová, Zdenka
Prajzler, Vladimír
Prajzler, Vladimír
T Iakoubovskii, Konstantin
Spousta, Jiří
Michalička, Jan
S Michalička, Jan
T Supalová, Linda
S Šamořil, Tomáš
Vaníčková, Elena
Jakub, Zdeněk
Pribytova, Ekaterina
Stará, Veronika
T Sanna, Michela
T Supalová, Linda
T Supalová, Linda
T Tmejová, Kateřina
Supalová, Linda
Říhová, Martina
Cuccu, Elisa
Fecko, Peter
Sobola, Dinara
Papež, Nikola
Ščasnovič, Erik
Burda, Daniel
Stará, Veronika
Supalová, Linda
Lepcio, Petr
S Danchuk, Viktor
Lee, Hyesung
Stará, Veronika
Kumar, Sanjay
T Holas, Jiří
Slovák, Vojtěch
T Franta, Daniel
Papež, Nikola
U Prášek, Jan
Kareš, Martin
Jakub, Zdeněk
Supalová, Linda
Valadi Palliyalil, Anjali

Upcoming trainings

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Term Name Description Max. attendees
14.8. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Roshan Velluvakandy 1
14.8. 13:00 - 13:45 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
14.8. 13:45 - 14:30 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Andrej Juríček, Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Andrej Juríček 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3