Thursday 29.1.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
ML3-BABY
VERIOS
KRATOS-XPS
ICON-SPM
ZETASIZER
WITEC-RAMAN
TITAN
RIE-FLUORINE
JASCO
WOOLLAM-RC2
RIGAKU3
PECVD
CHEMLAB-B1.14
MIRA-STAN
R2-PECVD
UHV-LEEM
UHV-DEPOSITION
DEKTAK
SUSS-MA8
FUME_HOOD-B1.14
BET-ANAMET
FUME_HOOD-B1.18
LITESCOPE-MIRA…
CHEMLAB-B1.16
MAGNETRON
micro-CT-L240
ZEISS-STAN
LVEM
AMBER
TEGRAMIN
UHV-PLD
CRYOGENIC
LEICACOAT-NANO
HELIOS
UHV-XPS
UHV-SPM
FTIR-CHEMLAB
SAW-ACCUTOM
APCVD
ALD-FIJI
RIGAKU9
L450
TORNADO-M4
MECHANICAL…
TUBE-FURNACE
ZEISS-NANO
VACUUM_OVEN-B1…
WOOLLAM-VIS
LASER-DICER
RAITH
EVAPORATOR
VERSALAB
DWL
RIE-CHLORINE
UHV-PREPARATION
LaserMIRA
SPINCOATER…
nano-CT
SHAKER…
SUMMIT
RSA
nanoCT
Q-LAB
SUSS-RCD8
RTP
MIRA-EBL
SNOM-NANONICS
SEE-SYSTEM
MINIFLEX
SIMS
ACCURION_RSE
NANOCALC
DIENER
PARYLENE-SCS
MPS150
STEMI
VACUUM_OVEN-C1…
UHV-CLUSTER
UHV…
UHV…
ULTRAFAST-LASER
US-CUTTER
JAZ3-CHANNEL
FTIR
UHV-LEIS
CITOVAC
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
microCT
ZWICK
UHV-MBE
UHV-FTIR
SW-BEAMER
Test O2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
TEST2
UHV-MBE1
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
MIRKA
DSC-DISCOVERY
TEM-SW
FLOWBOX
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
LYRA
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DRIE
CRYOMILL
micro-CT-m300
VACUUM_OVEN…
ALD-BENEQ
APCVD-Diffusion
ARES
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
TIC3X
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
DAWN-HELEOS
PARYLENE-DIENER
NANOSCAN
KERR-MICROSCOPE
HENRY-MAGNET
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
MONOWAVE
CITOPRESS
NANOSAM
LAKESHORE
NIKON-NANO
NIRQUEST512
NMR
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PROTOMAT
LPCVD-SiN
ISOLATION-BOX
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.18
IS_NOVOCONTROL
SCIA
KAUFMAN
LPCVD-polySi
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Citterberg, Daniel
Fecko, Peter
Otýpka, Martin
Supalová, Linda
Citterberg, Daniel
Jasenský, Kryštof
T Fecko, Peter
Supalová, Linda
Citterberg, Daniel
Supalová, Linda
Otýpka, Martin
Jadhao, Pranjali
Kepič, Peter
Velluvakandy, Roshan
Cuccu, Elisa
Polčák, Josef
Daradkeh, Samer
Polášková, Kateřina
Pavliňák, David
Weisz, Hugo
Kovařík, Martin
Jadhao, Pranjali
Jadhao, Pranjali
Mukherjee, Aniket
Mukherjee, Aniket
Mukherjee, Aniket
paiva de araujo, Estacio
Raad, Ryan
Supalová, Linda
Tichý, Martin
Kuběna, Ivo
Lukiienko, Iryna
Citterberg, Daniel
Polášková, Kateřina
U Tmejová, Kateřina
Slovák, Radim
T Franta, Daniel
Tkachenko, Serhii
Daradkeh, Samer
Šik, Ondřej
Eliáš, Marek
Polášková, Kateřina
U Tmejová, Kateřina
Michlovská, Lenka
Kumar, Sanjay
Janů, Lucie
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Citterberg, Daniel
Supalová, Linda
Polášková, Kateřina
Lee, Hyesung
Mukherjee, Aniket
Kumar, Sanjay
Mukherjee, Aniket
S Prášek, Jan
Holeňa, Vít
T Holas, Jiří
U Kolíbalová, Eva
Kicmerova, Dina
Valášek, Daniel
Kepič, Peter
U Danchuk, Viktor
Yuan, Yunhuan
Bahadur, Fateh
Jakub, Zdeněk
Jakub, Zdeněk
Sonigara, Kevalkumar Kishorbhai
Valášek, Daniel
Hrdý, Radim
Štálnik, Jozef
Caha, Ondřej
Holeňa, Vít
Caha, Ondřej
Varga, Dominik
Kepič, Peter
Lukiienko, Iryna
U Tmejová, Kateřina
Dubroka, Adam
S Kolář, Richard
Lišková, Zuzana
S Prášek, Jan
Lukiienko, Iryna
B Fecko, Peter
Kovařík, Martin
Endstrasser, Zdeněk

Upcoming trainings

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Term Name Description Max. attendees
29.1. 10:00 - 11:30 Zeiss StAn microscope Meeting point: in front of the room A1.04 Attendees: Lenka Novotná 1
29.1. 10:30 - 12:00 ML3 Baby ML3 training basics, with sample demonstration Attendees: Eduard Jelínek 2
30.1. 11:00 - 12:00 ISOLATION BOX Basic operations with the ISOLATION BOX Attendees: Viktor Danchuk, Marek Eliáš 2
30.1. 13:30 - 16:30 Rigaku - Basic Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an INTERVIEW. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Viktor Danchuk 2
3.2. 13:30 - 16:30 Evaporator EN Standard training in English Attendees: Radim Slovák, Laiba Bajwa 2
4.2. 13:00 - 15:00 Laser Dicer training Attendees: Iryna Lukiienko, Jozef Štálnik, Radim Slovák 3
5.2. 09:30 - 13:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 3
5.2. 13:00 - 15:30 MIRA-STAN for returning and Lyra users Renewal training for returning users. Attendees: Ekaterina Pribytova, Eduard Jelínek 2
6.2. 08:30 - 11:00 LYRA advanced training - EDS analysis The training focused on the elemental analysis by EDS. We will meet in the LYRA lab. Attendees: Kryštof Jasenský, Marek Eliáš 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh 4
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab 10