Tuesday 10.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
KRATOS-XPS
EVAPORATOR
ML3-BABY
MIRA-STAN
RAITH
RIGAKU9
DIENER
WITEC-RAMAN
NANOSAM
LYRA
MIRA-EBL
ICON-SPM
PARYLENE-SCS
VERIOS
CRYOGENIC
NANOCALC
ALD-BENEQ
SCIA
LEICACOAT-STAN
TEGRAMIN
TITAN
NANOINDENTER
UHV-LEEM
LVEM
FUMEHOOD…
HELIOS
CHEMLAB-B1.14
BET-ANAMET
AMBER
UHV-SPM
UHV-DEPOSITION
FUMEHOOD…
UHV-PREPARATION
TORNADO-M4
VERSALAB
WOOLLAM-VIS
BRILLOUIN
BET-DEGASSER
ALD-FIJI
NANOSCAN
GLOVEBOX…
FTIR-CHEMLAB
VACUUM_OVEN-C1…
DRYING_OVEN-B1…
ULTRAFAST-LASER
SHAKER…
STEMI
Q-LAB
SW-BEAMER
RTP
SPINCOATER…
SAW-ACCUTOM
nanoCT
SEE-SYSTEM
SUMMIT
ACCURION_RSE
LaserMIRA
nano-CT
SIMS
RIGAKU3
SUSS-RCD8
RIE-CHLORINE
SNOM-NANONICS
MINIFLEX
RSA
SW-TRACER
SW-LAB
MPS150
LEICA-TXP
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR
CITOVAC
VACUUM_OVEN-B1…
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
TENUPOL
THEORY-SUPPORT
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
PECVD
UHV-PLD
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
MIRKA
MONOWAVE
TEM-SW
FUMEHOOD-HF
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
DIMPLING…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
VNA-MPI
SPONGEBOB
DHR
LEICACOAT-NANO
CEITEC-NANO
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
MECHANICAL…
TUBE-FURNACE
DRIE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CRYOMILL
SW-CT
PECVD-NANOFAB
FRASCAN
PARYLENE-DIENER
DSC-DISCOVERY
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
CITOPRESS
PROTOMAT
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
KERR-MICROSCOPE
LAKESHORE
CHEMLAB-B1.16
KEITHLEY-4200
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
R2-PECVD
LPCVD-SiN
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
UV-LASER
Tvrdoňová, Anna
Supalová, Linda
Citterberg, Daniel
Martyniuk, Oleh
Niapos, Eleftherios
Pistis, Martino
Supalová, Linda
Klíma, Jan
Supalová, Linda
Eliáš, Marek
Pistis, Martino
Kelarová, Štěpánka
Varaďa, Jan
Varaďa, Jan
Wang, Yue
Prášek, Jan
Tvrdoňová, Anna
Klíma, Jan
Niapos, Eleftherios
Tvrdoňová, Anna
Supalová, Linda
Citterberg, Daniel
Niapos, Eleftherios
Očkovič, Adam
Kramář, Jan
Pavliňák, David
Wang, Yue
Delforge, Cyril
Idesová, Beáta
Pistis, Martino
Caha, Ondřej
Varshney, Devanshu
Varshney, Devanshu
Tvrdoňová, Anna
Citterberg, Daniel
Idesová, Beáta
paiva de araujo, Estacio
Konečný, Martin
Havelka, Tomáš
T Danchuk, Viktor
T Danchuk, Viktor
Jelínek, Eduard
Supalová, Linda
Supalová, Linda
Majcen, Fabian
Bahadur, Fateh
Wang, Yue
Bajwa, Laiba Asad
Fecko, Peter
Bensalem, Mohamed
Jadhao, Pranjali
U Danchuk, Viktor
T Danchuk, Viktor
T Švarc, Vojtěch
Supalová, Linda
Idesová, Beáta
Mirdamadi Khouzani, Sayed Hossein
Idesová, Beáta
Niapos, Eleftherios
Pavliňák, David
Sobola, Dinara
Skálová, Zdenka
Skálová, Zdenka
S Michalička, Jan
S Michalička, Jan
Bensalem, Mohamed
Danchuk, Viktor
Gaizura, Filip
Foltýn, Michael
Foltýn, Michael
Foltýn, Michael
AL Soud, Ammar
S Iakoubovskii, Konstantin
Hrubá, Daniela
Hrubá, Daniela
Tvrdoňová, Anna
Danchuk, Viktor
T Spotz, Zdeněk
Niapos, Eleftherios
Franta, Daniel
Delforge, Cyril
Daradkeh, Samer
Štálnik, Jozef
Kovařík, Martin
Saldan, Ivan
Izsák, Dávid
T Danchuk, Viktor
Foltýn, Michael
Arregi Uribeetxebarria, Jon Ander

Upcoming trainings

Show more

Term Name Description Max. attendees
10.2. 09:30 - 12:00 RIE-flourine-training Attendees: Jakub Krčma, Ekaterina Pribytova, Laiba Bajwa 3
10.2. 13:30 - 15:00 Nanocalc-training Attendees: Iryna Lukiienko 1
10.2. 14:00 - 14:45 Vacuum Oven C 1.38 Basic training for the Vacuum Oven C 1.38 Attendees: Sára Hrdinová 4
10.2. 14:00 - 15:00 DIENER-training Attendees: Laiba Bajwa 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
12.2. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Martino Pistis, Elisa Cuccu 4
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1