Friday 21.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
WOOLLAM-RC2
MIRA-STAN
AMBER
RIGAKU3
LITESCOPE-MIRA…
VERSALAB
TEGRAMIN
RIE-FLUORINE
VERIOS
FUMEHOOD…
TITAN
HELIOS
LYRA
EVAPORATOR
SPONGEBOB
CHEMLAB-B1.14
R2-PECVD
UHV-PREPARATION
ICON-SPM
FUMEHOOD…
ULTRACENTRIFUGE
NANO-ONE-2PP
FUMEHOOD…
VACUUM-OVEN-B1…
NMR
NANOSAM
WITEC-RAMAN
PECVD
VUVAS
BRILLOUIN
BET-DEGASSER
3D-PRUSA-XL
BET-ANAMET
WOOLLAM-MIR
LEICACOAT-STAN
UHV-DEPOSITION
SUMMIT
SHAKER-B1.18
NANOCALC
LaserMIRA
SEE-SYSTEM
SW-BEAMER
SIMS
SW-LAB
STEMI
nano-CT
PARYLENE-SCS
RTP
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
ACCURION_RSE
SNOM-NANONICS
SUSS-RCD8
DIENER
RIE-CHLORINE
MINIFLEX
nanoCT
RSA
MIRA-EBL
SW-TRACER
TEST-RFID2
LEICA-TXP
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
TENUPOL
Heliscan
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID4
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-CLUSTER
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
3D-PRUSA-BLACK
ML3-BABY
3D-PRUSA-BLUE
FLOWBOX
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
ELECTROWORKSHOP
R4…
4-POINT
CRYOMILL
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
SW-CT
TIC3X
micro-CT-L240
ALD-FIJI
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
CPD
BAMBULAB
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
Micromex
micro-CT-m300
ZEISS-NANO
SUSS-MA8
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
DEKTAK
SUSS-WETBENCH
LABOTOM5
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
LPCVD-polySi
LITESCOPE-LYRA
DAWN-HELEOS
ZEISS-STAN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
SCIA
LIBS-LabSys1
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Polčák, Josef
Fatima, Areej
Bahadur, Fateh
Beliančínová, Beáta
Janů, Lucie
Přibyl, Roman
T Franta, Daniel
Ščasnovič, Erik
Ulč, Filip
Ulč, Filip
Kratochvílová, Ivana
Iakoubovskii, Konstantin
Iakoubovskii, Konstantin
Bednaříková, Vendula
Hrdinová, Sára
Kalleshappa, Bindu
Ulč, Filip
Ulč, Filip
Daradkeh, Samer
Molnár, Tomáš
Skálová, Zdenka
Havlíková, Tereza
T Eliáš, Marek
Tvrdoňová, Anna
Nghiem, Xuan Duc
Kubinec, Ondrej
Tvrdoňová, Anna
T Supalová, Linda
Ali, Hasan
Kuběna, Ivo
Kicmerova, Dina
S Šamořil, Tomáš
Piastek, Jakub
Tvrdoňová, Anna
Saldan, Ivan
Janů, Lucie
Jakub, Zdeněk
Dey, Sharmistha
T Supalová, Linda
Saldan, Ivan
T Sanna, Michela
T Supalová, Linda
E Tmejová, Kateřina
de Oliveira Santiago, Pedro Henrique
S Danchuk, Viktor
Bakhshikhah, Mahan
Cuccu, Elisa
Přibyl, Roman
Krčma, Jakub
Surana, Karan Singh
Kumar, Sanjay
Surana, Karan Singh
Cuccu, Elisa
Ščasnovič, Erik
Jakub, Zdeněk

Upcoming trainings

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Term Name Description Max. attendees
21.8. 09:30 - 10:15 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko 2
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
21.8. 10:15 - 11:00 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko 2
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Andrej Juríček, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3