Friday 2.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
WITEC-RAMAN
VERSALAB
MPS150
RIE-FLUORINE
TITAN
VACUUM_OVEN-C1…
MIRA-STAN
KERR-MICROSCOPE
VERIOS
CHEMLAB-B1.18
LVEM
KEITHLEY-4200
ULTRAFAST-LASER
UHV-PREPARATION
RAITH
UHV-SPM
UHV-PLD
WOOLLAM-RC2
CRYOGENIC
HELIOS
LYRA
UHV-LEEM
MIRA-EBL
FUMEHOOD-HF
SUSS-WETBENCH
micro-CT-L240
DEKTAK
K70
BET-DEGASSER
BET-ANAMET
SCIA
WOOLLAM-VIS
APCVD
ALD-FIJI
FUMEHOOD…
WIRE-BONDER
BRILLOUIN
NIKON-NANO
NANOCALC
AMBER
RIGAKU3
DIENER
WOOLLAM-MIR
SUMMIT
STEMI
SHAKER-B1.18
LaserMIRA
SEE-SYSTEM
SIMS
NANO-ONE-2PP
PARYLENE-SCS
ACCURION_RSE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
SUSS-RCD8
ICON-SPM
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
SNOM-NANONICS
ICON-SPM
SW-BEAMER
Test školení
SW-LAB
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
3D-PRUSA-ORANGE
TEST-RFID2
TGA96
UHV-XPS
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEIS
UHV-MBE
TEM-SW
ML3-BABY
3D-PRUSA-BLACK
R4…
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
CLARUS-680
TORNADO-M4
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
NANOWIZARD
DISCO-DICING…
BAMBULAB
MECHANICAL…
TIC3X
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
Micromex
3D-PRUSA-BLUE
3D-PRUSA-XL
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LABOTOM5
DSC-DISCOVERY
LITESCOPE-LYRA
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
LITESCOPE-MIRA…
LIBS-LabSys1
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
IS-NOVOCONTROL
LIBS-Discovery
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Polčák, Josef
Hu, Ying
Polčák, Josef
Daradkeh, Samer
T Spotz, Zdeněk
Liška, Jiří
Liška, Jiří
Sobola, Dinara
Danchuk, Viktor
Citterberg, Daniel
Liška, Jiří
Supalová, Linda
Citterberg, Daniel
T Kolíbalová, Eva
S Michalička, Jan
Dey, Sharmistha
Dey, Sharmistha
Oliver Urrutia, Carolina
Nghiem, Xuan Duc
Arregi Uribeetxebarria, Jon Ander
Staňo, Michal
Nghiem, Xuan Duc
Mirdamadi Khouzani, Sayed Hossein
Tmejová, Kateřina
Tmejová, Kateřina
Cao, Hoang-Anh
Citterberg, Daniel
Arregi Uribeetxebarria, Jon Ander
David, Jiří
S Lišková, Zuzana
David, Jiří
Dey, Sharmistha
Mirdamadi Khouzani, Sayed Hossein
Lukiienko, Iryna
U Man, Ondřej
Fecko, Peter
U Polčák, Josef
Baeva, Maria
Citterberg, Daniel
Cmíralová, Marie
Jelínek, Adam
Strnad, Jiří
Klusák, Radovan
Tmejová, Kateřina
Tmejová, Kateřina
Otýpka, Martin
Dubroka, Adam
Hrdý, Radim
Supalová, Linda
Jewula, Pawel
Kunc, Jan
Krčma, Jakub
Strnad, Jiří
Strnad, Jiří
Spousta, Jiří
Nghiem, Xuan Duc
Krútek, Šimon
Cuccu, Elisa

Upcoming trainings

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Term Name Description Max. attendees
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
5.10. 09:30 - 21.7. 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Maneesha Ramesh 3
5.10. 10:00 - 11:30 ML3-Baby ML3 Baby MicroWriter training Attendees: Tomáš Henzl 1
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jáchym Štindl, Tadeáš Lesovský, Filip Janík 3
6.10. 09:30 - 12:00 ICON-SPM basic training Attendees: Areej Fatima, Štěpánka Kelarová 3
6.10. 09:30 - 12:00 RIE-chlorine-training Attendees: Kryštof Jasenský 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
6.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Yanzhen Song 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tadeáš Lesovský 1
8.10. 09:30 - 12:00 ALD-Beneq-training Attendees: Andrej Juríček, David Neradilek, Peter Kepič 3
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sharmistha Dey 4
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský, Romana Ščotková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: David Neradilek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Lukáš Dokulil 10