Tuesday 8.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
RAITH
MIRA-STAN
RIE-FLUORINE
VERSALAB
EVAPORATOR
SUSS-WETBENCH
UHV-DEPOSITION
UHV-SPM
WITEC-RAMAN
ALD-BENEQ
BET-ANAMET
RIGAKU9
FUMEHOOD…
HELIOS
UHV-XPS
TITAN
PARYLENE-SCS
ICON-SPM
VERIOS
UHV-LEEM
LYRA
MIRA-EBL
LITESCOPE-MIRA…
R2-PECVD
FUMEHOOD…
LITESCOPE-LYRA
FUMEHOOD…
CRYOGENIC
FUMEHOOD…
NANO-ONE-2PP
DEKTAK
ML3-BABY
UHV-PREPARATION
WOOLLAM-VIS
RIE-CHLORINE
BET-DEGASSER
SUSS-RCD8
WOOLLAM-RC2
SUSS-MA8
LEICACOAT-STAN
RIGAKU3
VACUUM-OVEN-B1…
LaserMIRA
SUMMIT
SHAKER-B1.18
MINIFLEX
PECVD
TEM-SW
MIRKA
NANOCALC
STEMI
3D-PRUSA-ORANGE
SEE-SYSTEM
Q-LAB
SIMS
SAW-ACCUTOM
SPINCOATER…
SNOM-NANONICS
nanoCT
RTP
ACCURION_RSE
RSA
DIENER
nano-CT
SW-LAB
SW-BEAMER
TEST-RFID2
SW-TRACER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
TEST-RFID4
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
3D-PRUSA-BLUE
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
3D-PRUSA-BLACK
WOOLLAM-MIR
ULTRACENTRIFUGE
ELECTROWORKSHOP
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
TIC3X
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
ZEISS-NANO
LABOTOM5
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
3D-PRUSA-XL
LIBS-Discovery
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
LIBS-LabSys1
LIBS-FireFly
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LAURELL-NANO
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
UV-LASER
U Polčák, Josef
Maity, Sujan
Pham, Sy Nguyen
Allaham, Mohammad
Holobrádek, Jakub
Fecko, Peter
Holobrádek, Jakub
Žaloudková, Lucie
Kramář, Jan
Říhová, Martina
T Eliáš, Marek
Matějka, Kryštof
Pham, Sy Nguyen
Daradkeh, Samer
E Prášek, Jan
Matějka, Kryštof
Matějka, Kryštof
Hrdý, Radim
Endstrasser, Zdeněk
Jakub, Zdeněk
Hrůza, Dominik
Hrůza, Dominik
Pavliňák, David
Spotz, Zdeněk
Matějka, Kryštof
Eliáš, Marek
Surana, Karan Singh
Tmejová, Kateřina
Staňo, Michal
Arregi Uribeetxebarria, Jon Ander
Jewula, Pawel
Kicmerova, Dina
Jakub, Zdeněk
S Michalička, Jan
Bajwa, Laiba Asad
B Máčala, Jakub
Mirdamadi Khouzani, Sayed Hossein
Endstrasser, Zdeněk
S Šamořil, Tomáš
Matějka, Kryštof
Kramář, Jan
Beliančínová, Beáta
Hrdý, Radim
Klok, Pavel
Hrdý, Radim
Lukiienko, Iryna
Hrdý, Radim
Sanna, Michela
Burda, Daniel
Hrdý, Radim
Endstrasser, Zdeněk
Duchaň, Marek
Burda, Daniel
Surana, Karan Singh
Hrdý, Radim
Mirdamadi Khouzani, Sayed Hossein
Hrdý, Radim
Formánek, Šimon
Spotz, Zdeněk
Valiyev, Rasul

Upcoming trainings

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Term Name Description Max. attendees
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
10.9. 14:19 - 15:19 Rigaku 3 - special Bring your typical sample. A 1.15 Attendees: Ivan Saldan 1
11.9. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Iosif Tantis 4
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
17.9. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Maneesha Ramesh 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský 3