Wednesday 18.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
VERIOS
DEKTAK
RIGAKU3
LASER-DICER
MIRA-STAN
LEICACOAT-STAN
UHV-XPS
LYRA
UHV-SPM
DRIE
ML3-BABY
VERSALAB
MIRA-EBL
KRATOS-XPS
NMR
micro-CT-L240
FUMEHOOD…
DAWN-HELEOS
CRYOGENIC
UHV-DEPOSITION
TEGRAMIN
UHV-LEEM
LITESCOPE-MIRA…
WOOLLAM-VIS
ALD-BENEQ
3D-PRUSA-BLACK
LEICACOAT-NANO
WOOLLAM-RC2
UHV-PREPARATION
SPONGEBOB
RAITH
TEST2
R2-PECVD
ZETASIZER
BET-ANAMET
NANOSAM
RIE-FLUORINE
CHEMLAB-B1.18
LIBS-FireFly
BET-DEGASSER
DRYING_OVEN-B1…
WITEC-RAMAN
NANOINDENTER
TITAN
RSA
ALD-FIJI
PARYLENE-DIENER
NANOCALC
STEMI
PARYLENE-SCS
SHAKER-B1.18
nano-CT
SUSS-RCD8
DIENER
ACCURION_RSE
RIE-CHLORINE
MINIFLEX
nanoCT
RTP
SUMMIT
SW-LAB
SNOM-NANONICS
ICON-SPM
Q-LAB
SIMS
SEE-SYSTEM
LaserMIRA
SW-BEAMER
3D-PRUSA-XL
SW-TRACER
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ULTRAFAST-LASER
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
Test školení
TEST-RFID2
SAW-ACCUTOM
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
SPINCOATER…
DSC-DISCOVERY
MIRKA
4-POINT
DIMPLING…
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
FTIRMAG
SW-CT
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
CRYOMILL
micro-CT-m300
BRILLOUIN
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
VNA-MPI
PECVD
CITOPRESS
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
MPS150
MONOWAVE
NANOSCAN
LVEM
NIKON-NANO
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
TEM-SW
KERR-MICROSCOPE
PROTOMAT
PECVD-NANOFAB
KAUFMAN
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
IR-RAMAN
LAKESHORE
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
UV-LASER
Kunc, Jan
Koňařík, Lukáš
Fecko, Peter
Delforge, Cyril
Delforge, Cyril
Otýpka, Martin
Pišťák, Jan
Šťastný, Jakub
Cao, Hoang-Anh
Ronoh, Kipkurui
Jadhao, Pranjali
Delforge, Cyril
Niapos, Eleftherios
Citterberg, Daniel
Niapos, Eleftherios
Naseri Joda, Nasrollah
Bednaříková, Vendula
Žaloudková, Lucie
Červinka, Ondřej
Patil, Virendra
Piastek, Jakub
Dao, Radek
Sevriugina, Veronika
Naseri Joda, Nasrollah
Sevriugina, Veronika
Naseri Joda, Nasrollah
Pišťák, Jan
Hrůza, Dominik
Hrůza, Dominik
Jasenský, Kryštof
Staňo, Michal
Hrůza, Dominik
Hrůza, Dominik
Fecko, Peter
Citterberg, Daniel
Koňařík, Lukáš
Otýpka, Martin
Sobola, Dinara
Daradkeh, Samer
Kunc, Jan
Štálnik, Jozef
S Polčák, Josef
Fu, Jialin
Natarajan, Senthil Nathan
Jelínek, Adam
Valadi Palliyalil, Anjali
Kreuzerová, Monika
Lukiienko, Iryna
Endstrasser, Zdeněk
Skálová, Zdenka
Endstrasser, Zdeněk
Dao, Radek
Franta, Daniel
Mirdamadi Khouzani, Sayed Hossein
Kumar, Sanjay
Yuan, Yunhuan
T Franta, Daniel
Endstrasser, Zdeněk
Tvrdoňová, Anna
Delforge, Cyril
Zbranková, Miroslava
Janů, Lucie
Kotouček, Jan
AL Soud, Ammar
Danchuk, Viktor
Fecko, Peter
Kalleshappa, Bindu
Vaňková, Karolína
AL Soud, Ammar
Valadi Palliyalil, Anjali
Chamradová, Ivana
U Gablech, Evelína
T Michalička, Jan
Sevriugina, Veronika
Niapos, Eleftherios
Fecko, Peter

Upcoming trainings

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Term Name Description Max. attendees
18.2. 09:00 - 12:00 Woollam RC2 Training - second part Attendees: Sayed Hossein Mirdamadi Khouzani, Nima Bolouki 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
20.2. 08:30 - 14:30 LYRA advanced training - FIB, GIS, nanomanipulator The training focused on FIB, GIS, and the nanomanipulator. We will meet in the LYRA lab. Attendees: Pavel Klok, Cyril Delforge, Ivana Kratochvílová, Elisa Cuccu 4
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Michela Sanna, Ekaterina Pribytova, Sujan Maity 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Michela Sanna, Sujan Maity, Hasan Ali 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Michela Sanna, Eduard Jelínek, Sujan Maity, Hasan Ali 10
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning users Renewing the certificate for long-inactive users. Meeting point at the microscope. Attendees: Michela Sanna, Martin Kovařík 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4