Tuesday 1.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
DEKTAK
KRATOS-XPS
TITAN
NANOCALC
VERSALAB
VNA-MPI
LYRA
ULTRASONIC…
KERR-MICROSCOPE
NANOINDENTER
CHEMLAB-B1.14
CRYOGENIC
UHV-XPS
SUSS-WETBENCH
LITESCOPE-MIRA…
ICON-SPM
VERIOS
PARYLENE-SCS
TGA-DISCOVERY
DRIE
R2-PECVD
K70
MIRA-STAN
CHEMLAB-B1.18
BET-ANAMET
AMBER
LASER-DICER
ULTRACENTRIFUGE
BET-DEGASSER
NANOSAM
DWL
WITEC-RAMAN
TORNADO-M4
RIGAKU3
MAGNETRON-AJA
LEICACOAT-STAN
PECVD
ALD-BENEQ
SUSS-MA8
RIE-CHLORINE
SW-BEAMER
TEM-SW
SW-LAB
MIRKA
STEMI
SAW-ACCUTOM
PARYLENE-DIENER
SHAKER-B1.18
MINIFLEX
LaserMIRA
SUMMIT
SPINCOATER…
Q-LAB
SEE-SYSTEM
SIMS
RTP
ACCURION_RSE
SUSS-RCD8
SNOM-NANONICS
MIRA-EBL
RSA
DIENER
nano-CT
RIE-FLUORINE
nanoCT
NANO-ONE-2PP
SW-TRACER
VACUUM-OVEN-B1…
ULTRAFAST-LASER
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV-PREPARATION
UHV…
LEICA-TXP
THEORY-SUPPORT
TENUPOL
FISCHIONE-160
3D-PRUSA-ORANGE
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV-CLUSTER
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
Test Ondra 3
ML3-BABY
3D-PRUSA-BLACK
FLOWBOX
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
HELIOS
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
CRYOMILL
FUMEHOOD…
BAMBULAB
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
FUMEHOOD…
3D-PRUSA-BLUE
3D-PRUSA-XL
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
LPCVD-polySi
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
LPCVD-SiN
LITESCOPE-LYRA
CLARUS-680
CHEMLAB-B1.16
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
IS-NOVOCONTROL
LIBS-LabSys1
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
T Švarc, Vojtěch
Burda, Daniel
Jelínek, Eduard
Polčák, Josef
Dey, Sharmistha
Allaham, Mohammad
S Michalička, Jan
S Michalička, Jan
T Švarc, Vojtěch
Jelínek, Eduard
Danchuk, Viktor
Jasenský, Kryštof
Pribytova, Ekaterina
S Šamořil, Tomáš
Hu, Ying
Arregi Uribeetxebarria, Jon Ander
Polášková, Kateřina
Hu, Ying
Pribytova, Ekaterina
Jakub, Zdeněk
Jelínek, Eduard
Kramář, Jan
B Gablech, Evelína
Pišťák, Jan
Bajwa, Laiba Asad
Žaloudková, Lucie
Jelínek, Eduard
Bolouki, Nima
Kolář, Richard
Kramář, Jan
Hu, Ying
Surana, Karan Singh
Spousta, Jiří
Arregi Uribeetxebarria, Jon Ander
Hu, Ying
Surana, Karan Singh
Danchuk, Viktor
T Fecko, Peter
Kotouček, Jan
Daradkeh, Samer
Mařák, Vojtěch
B Jasenský, Kryštof
Pišťák, Jan
Cuccu, Elisa
T Eliáš, Marek
T Švarc, Vojtěch
Burda, Daniel

Upcoming trainings

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Term Name Description Max. attendees
1.9. 09:00 - 12:30 DWL Attendees: Eduard Jelínek 1
1.9. 09:30 - 10:00 nanocalc-training Attendees: Matej Dinis, Jiří Strnad 2
1.9. 10:00 - 10:30 DEKTAK-training Attendees: Matej Dinis, Jiří Strnad 2
1.9. 10:30 - 11:30 SUSS-MA8 training Attendees: Matej Dinis, Jiří Strnad 2
2.9. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Šimon Formánek 4
2.9. 13:00 - 15:00 Leicacoat-NANO training Attendees: Mohammad Allaham, Ying Hu 3
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10