Thursday 3.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
ML3-BABY
MIRA-STAN
CHEMLAB-B1.18
UHV-XPS
BET-ANAMET
KRATOS-XPS
BET-DEGASSER
SUSS-WETBENCH
LEICACOAT-STAN
VERSALAB
UHV-SPM
RIGAKU3
VERIOS
AMBER
EVAPORATOR
RAITH
HELIOS
ICON-SPM
LYRA
UHV-LEIS
UHV-LEEM
CRYOGENIC
PARYLENE-SCS
SEE-SYSTEM
R2-PECVD
FUMEHOOD…
FUMEHOOD…
UHV-PREPARATION
TITAN
MONOWAVE
VACUUM_OVEN-C1…
LVEM
SPINCOATER…
MAGNETRON-AJA
SUSS-RCD8
RIGAKU9
MAGNETRON
ALD-BENEQ
KERR-MICROSCOPE
TEM-SW
PECVD
PARYLENE-DIENER
NANOCALC
SHAKER-B1.18
SUMMIT
LaserMIRA
SW-BEAMER
3D-PRUSA-ORANGE
STEMI
RIE-CHLORINE
MIRKA
SAW-ACCUTOM
SIMS
SNOM-NANONICS
MIRA-EBL
Q-LAB
RTP
ACCURION_RSE
RSA
DIENER
RIE-FLUORINE
nano-CT
SW-LAB
MINIFLEX
nanoCT
TEST-RFID2
SW-TRACER
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
3D-PRUSA-BLUE
TEST-RFID4
THEORY-SUPPORT
UHV…
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-CLUSTER
3D-PRUSA-BLACK
NANO-ONE-2PP
ULTRACENTRIFUGE
4-POINT
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
SW-CT
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DRIE
CRYOMILL
micro-CT-L240
BAMBULAB
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
micro-CT-m300
ZEISS-NANO
LABOTOM5
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
WOOLLAM-MIR
LITESCOPE-LYRA
3D-PRUSA-XL
DSC-DISCOVERY
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
LITESCOPE-MIRA…
LIBS-LabSys1
DAWN-HELEOS
IS-NOVOCONTROL
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
LIBS-Discovery
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Bajwa, Laiba Asad
Jelínek, Eduard
Piastek, Jakub
Bajwa, Laiba Asad
Paredes Sánchez, Claudia
Pavliňák, David
Staňo, Michal
Fu, Hongbo
Tmejová, Kateřina
T Tmejová, Kateřina
Bajwa, Laiba Asad
Molnár, Tomáš
Molnár, Tomáš
Molnár, Tomáš
Tmejová, Kateřina
U Tmejová, Kateřina
T Tmejová, Kateřina
Polášková, Kateřina
Kelarová, Štěpánka
Danchuk, Viktor
T Tmejová, Kateřina
Tmejová, Kateřina
T Tmejová, Kateřina
Bajwa, Laiba Asad
Hrdý, Radim
Paredes Sánchez, Claudia
Pavliňák, David
Pham, Sy Nguyen
Daradkeh, Samer
Jakub, Zdeněk
Jakub, Zdeněk
Nghiem, Xuan Duc
Nandi, Sunny
U Kicmerova, Dina
Cao, Hoang-Anh
Kumar, Sanjay
Spousta, Jiří
Matějka, Kryštof
Holobrádek, Jakub
Bahadur, Fateh
B Máčala, Jakub
S Šamořil, Tomáš
Vaníčková, Elena
Molnár, Tomáš
T Danchuk, Viktor
Bajwa, Laiba Asad
Bolouki, Nima
Bolouki, Nima
Valadi Palliyalil, Anjali
Bajwa, Laiba Asad
Molnár, Tomáš
S Michalička, Jan
Valadi Palliyalil, Anjali
Danchuk, Viktor
Surana, Karan Singh
Bajwa, Laiba Asad
U Jasenský, Kryštof
Hrdý, Radim
Varshney, Devanshu
Prášek, Jan
Formánek, Šimon
Arregi Uribeetxebarria, Jon Ander

Upcoming trainings

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Term Name Description Max. attendees
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Elisa Cuccu, Kristýna Kupková 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10