Tuesday 1.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
SUSS-WETBENCH
VERSALAB
TITAN
CHEMLAB-B1.18
DEKTAK
LEICACOAT-STAN
NANOCALC
CHEMLAB-B1.14
VERIOS
TEGRAMIN
DRIE
VNA-MPI
ULTRASONIC…
SUSS-MA8
KEITHLEY-4200
ML3-BABY
R2-PECVD
KERR-MICROSCOPE
LVEM
LYRA
4-POINT
CRYOGENIC
ICON-SPM
MIRA-STAN
LITESCOPE-MIRA…
UHV-XPS
RIE-CHLORINE
DWL
WITEC-RAMAN
MPS150
3D-PRUSA-BLACK
ALD-BENEQ
ULTRACENTRIFUGE
MAGNETRON-AJA
RIGAKU9
BET-ANAMET
BET-DEGASSER
NANOINDENTER
TORNADO-M4
NIKON-NANO
VACUUM-OVEN-B1…
NANOSAM
RIGAKU3
STEMI
AMBER
K70
TGA-DISCOVERY
SUMMIT
SHAKER-B1.18
RSA
LaserMIRA
RIE-FLUORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
MINIFLEX
SEE-SYSTEM
nanoCT
nano-CT
SW-LAB
MIRA-EBL
SNOM-NANONICS
PARYLENE-SCS
SIMS
SW-BEAMER
Test O2
SW-TRACER
CITOVAC
UHV-PREPARATION
ULTRAFAST-LASER
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
Test Ondra 3
PECVD
TEST2
Test školení
TEST-RFID2
TEST-RFID4
THEORY-SUPPORT
UHV-SPM
Heliscan
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
MIRKA
NANO-ONE-2PP
TEM-SW
FLOWBOX
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
HELIOS
DHR
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DIMPLING…
SW-CT
FUMEHOOD…
BRILLOUIN
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
FUMEHOOD…
CLARUS-680
PARYLENE-DIENER
DSC-DISCOVERY
PROTOMAT
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
MONOWAVE
LPCVD-SiN
CITOPRESS
NANOSCAN
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
LAKESHORE
LPCVD-polySi
Micromex
ZEISS-STAN
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.16
IS-NOVOCONTROL
SCIA
LITESCOPE-LYRA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Polčák, Josef
Dey, Sharmistha
Allaham, Mohammad
Allaham, Mohammad
Jelínek, Eduard
Jelínek, Eduard
Cuccu, Elisa
Danchuk, Viktor
Jasenský, Kryštof
S Michalička, Jan
S Michalička, Jan
Hu, Ying
U Tmejová, Kateřina
T Švarc, Vojtěch
Burda, Daniel
Pišťák, Jan
T Holas, Jiří
T Švarc, Vojtěch
Jelínek, Eduard
Hu, Ying
U Tmejová, Kateřina
Pišťák, Jan
Burda, Daniel
Mařák, Vojtěch
Paredes Sánchez, Claudia
Jelínek, Eduard
Pribytova, Ekaterina
Hu, Ying
T Švarc, Vojtěch
Šimůnková, Helena
Jelínek, Eduard
Bolouki, Nima
Arregi Uribeetxebarria, Jon Ander
Říhová, Martina
S Šamořil, Tomáš
Šimůnková, Helena
Pribytova, Ekaterina
B Gablech, Evelína
Kramář, Jan
Kramář, Jan
Jakub, Zdeněk
Burda, Daniel
T Fecko, Peter
Kotouček, Jan
Šimůnková, Helena
Kicmerova, Dina
T Eliáš, Marek
Hu, Ying
B Jasenský, Kryštof
Arregi Uribeetxebarria, Jon Ander
Surana, Karan Singh
Surana, Karan Singh
Polášková, Kateřina
Daradkeh, Samer
Cuccu, Elisa
U Tmejová, Kateřina
S Danchuk, Viktor
Mařák, Vojtěch
Prajzler, Vladimír
Spousta, Jiří
Kolář, Richard
Žaloudková, Lucie

Upcoming trainings

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Term Name Description Max. attendees
1.9. 09:00 - 12:30 DWL Attendees: Eduard Jelínek 1
1.9. 09:30 - 10:00 nanocalc-training Attendees: Matej Dinis, Jiří Strnad 2
1.9. 10:00 - 10:30 DEKTAK-training Attendees: Matej Dinis, Jiří Strnad 2
1.9. 10:30 - 11:30 SUSS-MA8 training Attendees: Matej Dinis, Jiří Strnad 2
2.9. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Šimon Formánek 4
2.9. 13:00 - 15:00 Leicacoat-NANO training Attendees: Mohammad Allaham, Ying Hu 3
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10