Friday 6.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
LYRA
RIGAKU3
KRATOS-XPS
RAITH
EVAPORATOR
ML3-BABY
RIE-CHLORINE
MIRA-EBL
WITEC-RAMAN
FUME_HOOD-B1.14
CRYOGENIC
VERIOS
VERSALAB
HELIOS
IS_NOVOCONTROL
FUMEHOOD-HF
UHV-LEIS
WOOLLAM-RC2
PARYLENE-SCS
MIRA-STAN
AMBER
TITAN
BET-ANAMET
CHEMLAB-B1.14
DIENER
SCIA
SUSS-MA8
NANOSAM
ZWICK
RIGAKU9
WIRE-BONDER
BET-DEGASSER
DEKTAK
BRILLOUIN
WOOLLAM-VIS
JASCO
LEICACOAT-STAN
GLOVEBOX…
RTP
SUMMIT
SW-BEAMER
TEM-SW
SUSS-RCD8
PECVD
STEMI
NANOCALC
MIRKA
SHAKER…
SEE-SYSTEM
LaserMIRA
Q-LAB
SIMS
MINIFLEX
ICON-SPM
ACCURION_RSE
SNOM-NANONICS
nanoCT
SAW-ACCUTOM
SPINCOATER…
RSA
nano-CT
MPS150
Test O2
SW-LAB
FTIR-CHEMLAB
UHV…
UHV…
UHV-PREPARATION
ULTRAFAST-LASER
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
UHV-SPM
CITOVAC
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
microCT
ZETASIZER
UHV-CLUSTER
UHV-PLD
SW-TRACER
TGA96
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
3D-PRUSA-ORANGE
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-XPS
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-MBE
PARYLENE-DIENER
DSC-DISCOVERY
3D-PRUSA-BLACK
R4…
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.18
CLARUS-680
Micromex
SW-CT
TIC3X
micro-CT-m300
BAMBULAB
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
VACUUM_OVEN…
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
micro-CT-L240
DAWN-HELEOS
3D-PRUSA-BLUE
LABOTOM5
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-MIR
LITESCOPE-MIRA…
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
LPCVD-polySi
LITESCOPE-LYRA
TEGRAMIN
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
KAUFMAN
LIBS-LabSys1
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Jakešová, Marie
Niapos, Eleftherios
Niapos, Eleftherios
Citterberg, Daniel
Kunc, Jan
Jakešová, Marie
Supalová, Linda
T Šamořil, Tomáš
Kunc, Jan
Bajo, Viktor
Ščasnovič, Erik
Spotz, Zdeněk
Tkachenko, Serhii
Fatima, Areej
Polčák, Josef
S Polčák, Josef
Krčma, Jakub
Lišková, Zuzana
Delforge, Cyril
Liška, Jiří
Niapos, Eleftherios
Slovák, Radim
Supalová, Linda
Niapos, Eleftherios
Citterberg, Daniel
Slovák, Radim
Delforge, Cyril
Jasenský, Kryštof
Kunc, Jan
U Spotz, Zdeněk
Raad, Ryan
Polášková, Kateřina
U Jewula, Pawel
Lukiienko, Iryna
Lukiienko, Iryna
Pišťák, Jan
Idesová, Beáta
Hrdinová, Sára
Daradkeh, Samer
Man, Ondřej
B Man, Ondřej
Daradkeh, Samer
Jakešová, Marie
Vaníčková, Elena
Raad, Ryan
T Jakešová, Marie
Sevriugina, Veronika
U Iakoubovskii, Konstantin
Virágová, Eliška
AL Soud, Ammar
Polášková, Kateřina
Citterberg, Daniel
Niapos, Eleftherios
Jakešová, Marie
T Danchuk, Viktor
Fanisaberi, Amirmohsen
Malecot, Axel Fabien Benoit
Kunc, Jan
AL Soud, Ammar
Delforge, Cyril
Delforge, Cyril
Knoblochová, Alžběta
Polášková, Kateřina
Lepcio, Petr
Saldan, Ivan

Upcoming trainings

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Term Name Description Max. attendees
6.2. 08:30 - 11:00 LYRA advanced training - EDS analysis The training focused on the elemental analysis by EDS. We will meet in the LYRA lab. Attendees: Linda Supalová, Kryštof Jasenský, Marek Eliáš 3
9.2. 09:30 - 12:30 DLS-ZetaSizer Part 1+2 This training will provide hands-on practice with basic methods for measuring particle size using the DLS technique. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Michela Sanna, Ammar AL Soud, Monika Kreuzerová 3
9.2. 09:30 - 11:00 RIE-flourine- training Attendees: Ekaterina Pribytova, Franz Vilsmeier, Fabian Majcen, Kryštof Matějka 3
9.2. 15:00 - 16:00 SUSS-MA8 training Attendees: Laiba Bajwa 1
10.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Kryštof Jasenský 3
10.2. 09:30 - 12:00 RIE-flourine-training Attendees: Jakub Krčma, Laiba Bajwa 3
10.2. 14:00 - 14:45 Vacuum Oven C 1.38 Basic training for the Vacuum Oven C 1.38 Attendees: Sára Hrdinová 4
10.2. 14:00 - 15:00 DIENER-training Attendees: Laiba Bajwa 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
13.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
13.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
13.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10