Thursday 8.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
EVAPORATOR
KRATOS-XPS
SUSS-WETBENCH
RIE-FLUORINE
MPS150
TITAN
MIRA-STAN
KEITHLEY-4200
R2-PECVD
ML3-BABY
RIGAKU3
SPONGEBOB
DEKTAK
LEICA-TXP
UHV-SPM
UHV-PLD
HELIOS
UHV-LEEM
FUMEHOOD…
VNA-MPI
VERIOS
AMBER
ULTRACENTRIFUGE
SCIA
SUSS-MA8
RIE-CHLORINE
WOOLLAM-VIS
NIKON-NANO
LASER-DICER
LITESCOPE-MIRA…
NANOSAM
SNOM-NANONICS
CRYOGENIC
LVEM
KERR-MICROSCOPE
NMR
TEST2
VACUUM_OVEN-C1…
UHV-PREPARATION
LEICACOAT-STAN
WITEC-RAMAN
ALD-FIJI
VERSALAB
DHR
ALD-BENEQ
RAITH
SIMS
PARYLENE-SCS
ICON-SPM
FTIR
VISCOMETER
CITOVAC
ICON-SPM
VACUUM-OVEN-B1…
MIRA-EBL
SEE-SYSTEM
LaserMIRA
VACUUM-OVEN-B1…
RSA
VUVAS
UHV-CLUSTER
nano-CT
RIGAKU9
SAW-ACCUTOM
ZETASIZER
SPINCOATER…
ZWICK
Q-LAB
microCT
RTP
nanoCT
ACCURION_RSE
XEF2
SUSS-RCD8
DIENER
WIRE-BONDER
MINIFLEX
L450
SUMMIT
FTIR-CHEMLAB
UHV-MBE2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-DEPOSITION
Test školení
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV…
UHV-XPS
UHV…
TEST-RFID2
PECVD
SHAKER-B1.18
SW-LAB
JAZ3-CHANNEL
NANOCALC
JASCO
STEMI
BET-ANAMET
SW-BEAMER
SW-TRACER
Test O2
DWL
TENUPOL
FISCHIONE-160
US-CUTTER
ULTRASONIC…
ULTRAFAST-LASER
Test Ondra 3
MIRKA
NANO-ONE-2PP
TEM-SW
FLOWBOX
DRIE
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
R4…
LYRA
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUMEHOOD…
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
CLARUS-680
3D-PRUSA-ORANGE
WOOLLAM-MIR
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
3D-PRUSA-XL
LIBS-LabSys1
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIRQUEST512
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LITESCOPE-LYRA
LIBS-Discovery
Micromex
CHEMLAB-B1.14
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
LIBS-FireFly
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
LAURELL-NANO
UV-LASER
Tvrdoňová, Anna
Kharchenko, Ganna
Martyniuk, Oleh
Supalová, Linda
Kelarová, Štěpánka
Maity, Sujan
Ondračka, Pavel
Kumar, Sanjay
Tvrdoňová, Anna
Henzl, Tomáš
Kalousková, Petra
Tvrdoňová, Anna
Kharchenko, Ganna
Supalová, Linda
Šimůnková, Helena
Šimůnková, Helena
Otýpka, Martin
Ali, Hasan
S Michalička, Jan
Kolíbalová, Eva
Kumar, Sanjay
Kramář, Jan
Říhová, Martina
Šimůnková, Helena
Šimůnková, Helena
Otýpka, Martin
Bolouki, Nima
U Janů, Lucie
Henzl, Tomáš
Kharchenko, Ganna
Kumar, Sanjay
Kalleshappa, Bindu
Tvrdoňová, Anna
Tvrdoňová, Anna
Burda, Daniel
B Man, Ondřej
David, Jiří
Kepič, Peter
Bahadur, Fateh
U Polčák, Josef
Tvrdoňová, Anna
Pribytova, Ekaterina
Pišťák, Jan
Spousta, Jiří
S Tmejová, Kateřina
Otýpka, Martin
Tvrdoňová, Anna
Burda, Daniel
Dubroka, Adam
T Supalová, Linda
Arregi Uribeetxebarria, Jon Ander
Kramář, Jan
U Staňo, Michal
Kepič, Peter
Pribytova, Ekaterina
Surana, Karan Singh
Arregi Uribeetxebarria, Jon Ander
Sanna, Carolina
Pokusová, Mirka
Dey, Sharmistha
David, Jiří
Pišťák, Jan
Havelka, Tomáš
Otýpka, Martin
Dey, Sharmistha
Kreuzerová, Monika
T Eliáš, Marek
T Lišková, Zuzana

Upcoming trainings

Show more

Term Name Description Max. attendees
8.10. 09:30 - 12:00 ALD-Beneq-training Attendees: Andrej Juríček, David Neradilek, Ondřej Šik, Peter Kepič 3
8.10. 14:00 - 15:00 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Bring your typical sample. Attendees: Ganna Kharchenko 2
9.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
12.10. 09:00 - 12:30 RAITH training basic 1/3 RAITH basic training. Introduction to the RAITH150 Two system and the Electron Optics software. Operation of ZEISS SEM and basic functions. Attendees: Marie Cmíralová 1
12.10. 15:00 - 17:00 SUSS-MA8 training Attendees: Marie Cmíralová ---
13.10. 09:00 - 14.10. 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Marie Cmíralová 3
13.10. 10:30 - 11:30 DEKTAK training Attendees: Helena Šimůnková 1
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek, Kristýna Kupková 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Lukáš Dokulil, Martin Kužílek 10