Thursday 23.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
BRILLOUIN
EVAPORATOR
DIENER
MIRA-STAN
RIGAKU3
VERIOS
WITEC-RAMAN
ALD-FIJI
TITAN
WOOLLAM-RC2
LVEM
UHV-PREPARATION
DRYING-OVEN-B1…
RAITH
IS-NOVOCONTROL
KERR-MICROSCOPE
LAKESHORE
HELIOS
LYRA
UHV-XPS
UHV-LEIS
UHV-LEEM
MIRA-EBL
UHV-DEPOSITION
FUMEHOOD…
LITESCOPE-MIRA…
MAGNETRON
ICON-SPM
R2-PECVD
NANOSAM
ULTRACENTRIFUGE
ZWICK
RIGAKU9
MAGNETRON-AJA
NMR
NANOINDENTER
BET-DEGASSER
BET-ANAMET
NANOSCAN
TUBE-FURNACE
PARYLENE-SCS
VERSALAB
SEE-SYSTEM
SUMMIT
LaserMIRA
SIMS
STEMI
NANOCALC
SW-BEAMER
SHAKER-B1.18
NANO-ONE-2PP
SNOM-NANONICS
RSA
nano-CT
nanoCT
MINIFLEX
RIE-CHLORINE
RIE-FLUORINE
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
PECVD
SW-LAB
TEST-RFID2
SW-TRACER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
TEST-RFID4
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
PARYLENE-DIENER
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-SPM
TEM-SW
ML3-BABY
3D-PRUSA-ORANGE
FTIRMAG
DHR
DIMPLING…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FUMEHOOD…
SW-CT
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DRIE
CRYOMILL
micro-CT-L240
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
micro-CT-m300
3D-PRUSA-BLACK
WOOLLAM-MIR
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
PROTOMAT
HENRY-MAGNET
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
LITESCOPE-LYRA
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
3D-PRUSA-BLUE
SUSS-WETBENCH
LIBS-LabSys1
DAWN-HELEOS
ZEISS-STAN
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
SCIA
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Polčák, Josef
Dey, Sharmistha
Polášková, Kateřina
Kovařík, Martin
Lee, Hyesung
Krčma, Jakub
Pavelka, Dominik
Burda, Daniel
Supalová, Linda
Supalová, Linda
Supalová, Linda
Ulč, Filip
AL Soud, Ammar
Procházková, Anna
Daradkeh, Samer
T Kicmerova, Dina
Saldan, Ivan
Kepič, Peter
Kalleshappa, Bindu
Song, Yanzhen
Supalová, Linda
Kolíbalová, Eva
Řepa, Rostislav
T Franta, Daniel
Rusnaková, Nicole
Surana, Karan Singh
Říhová, Martina
Endstrasser, Zdeněk
Štindl, Jáchym
Bakhshikhah, Mahan
AL Soud, Ammar
Arregi Uribeetxebarria, Jon Ander
Holcman, Vladimír
Bahadur, Fateh
S Šamořil, Tomáš
Jakub, Zdeněk
Bábor, Petr
Endstrasser, Zdeněk
Liška, Jiří
Endstrasser, Zdeněk
Mukherjee, Aniket
Ulč, Filip
Papež, Nikola
Hrdinová, Sára
Mukherjee, Aniket
S Danchuk, Viktor
Saldan, Ivan
Fu, Hongbo
Arregi Uribeetxebarria, Jon Ander
U Klíma, Jan
Kotásková, Lucie
B Gablech, Evelína
AL Soud, Ammar
AL Soud, Ammar
Kovařík, Martin
Rovenská, Katarína
Jakešová, Marie
Hrdinová, Sára

Upcoming trainings

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Term Name Description Max. attendees
23.7. 09:00 - 11:00 RC2 The first part of the training Attendees: Sharmistha Dey 1
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh, Ondrej Kubinec, Debika Devi Thongam 3
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 09:30 - 13:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. Attendees: Lukáš Zezulka, Roshan Velluvakandy, Vladislav Dvořák 3
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Debika Devi Thongam 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ondrej Kubinec 1
27.7. 09:30 - 13:30 ZWICK Meeting point is in front of the Advanced Chemical laboratory. Obligatory prerequisites 1. Pass the Chemical laboratory safety excursion in Moodle (https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=173): 2. Answer the ZWICK applicant questionnaire 3. Read the ZWICK rules (mark the activity as complete with ✔️) 4. Bring your own sample Recommended prerequisites 5. Get familiar with the Layout for ZWICK basic training (mark the activity as complete with ✔️) Attendees: Rasul Valiyev 2
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 2
30.7. 09:00 - 13:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Ivan Saldan, Sára Hrdinová, Debika Devi Thongam 1
30.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Franc Paré Estalella 2
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1