Wednesday 7.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
EVAPORATOR
SUSS-WETBENCH
KRATOS-XPS
WITEC-RAMAN
KERR-MICROSCOPE
LYRA
FTIR-CHEMLAB
ICON-SPM
R2-PECVD
ML3-BABY
VERIOS
MIRA-STAN
MPS150
RIE-FLUORINE
HELIOS
CRYOGENIC
SNOM-NANONICS
UHV-LEEM
UHV-PLD
UHV-SPM
LITESCOPE-MIRA…
FUMEHOOD…
FUMEHOOD…
UHV-DEPOSITION
PARYLENE-SCS
LAURELL-NANO
KEITHLEY-4200
VNA-MPI
AMBER
TITAN
STEMI
LEICA-TXP
RAITH
LVEM
UHV-PREPARATION
WOOLLAM-VIS
NANOSAM
BAMBULAB
RIGAKU3
LEICACOAT-STAN
RIE-CHLORINE
VACUUM_OVEN-C1…
BRILLOUIN
APCVD
DEKTAK
VERSALAB
SUSS-MA8
DRIE
SPINCOATER…
SHAKER-B1.18
Q-LAB
NANOCALC
RTP
SAW-ACCUTOM
MIRKA
SUMMIT
ACCURION_RSE
LaserMIRA
SEE-SYSTEM
SIMS
SW-BEAMER
SUSS-RCD8
DIENER
MINIFLEX
ICON-SPM
nanoCT
nano-CT
RSA
MIRA-EBL
BET-ANAMET
TEST-RFID2
SW-LAB
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TGA96
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEM-SW
TEST-RFID4
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
PECVD
NANO-ONE-2PP
3D-PRUSA-ORANGE
4-POINT
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
SW-CT
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
CRYOMILL
micro-CT-L240
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
NANOWIZARD
ALD-FIJI
DISCO-DICING…
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
micro-CT-m300
3D-PRUSA-BLACK
DSC-DISCOVERY
LAKESHORE
PROTOMAT
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
MONOWAVE
LPCVD-polySi
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LPCVD-SiN
LITESCOPE-LYRA
DAWN-HELEOS
IS-NOVOCONTROL
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-LabSys1
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
LASER-DICER
LIBS-FireFly
LIBS-Discovery
UV-LASER
Krútek, Šimon
Burda, Daniel
T Prášek, Jan
Kharchenko, Ganna
Kepič, Peter
Supalová, Linda
Kupková, Kristýna
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Otýpka, Martin
Kharchenko, Ganna
Polčák, Josef
Ondračka, Pavel
Tantis, Iosif
Pavliňák, David
Spotz, Zdeněk
Dey, Sharmistha
Wang, Yue
Arregi Uribeetxebarria, Jon Ander
Molnár, Tomáš
Jan, Hnilica
Jelínek, Eduard
Kovařík, Martin
Allaham, Mohammad
Sanna, Carolina
Michlovská, Lenka
B Máčala, Jakub
Staňo, Michal
Bolouki, Nima
U Janů, Lucie
Bajwa, Laiba Asad
Otýpka, Martin
T Kicmerova, Dina
Cao, Hoang-Anh
Kramář, Jan
Surana, Karan Singh
Šimůnková, Helena
Otýpka, Martin
Bajwa, Laiba Asad
Supalová, Linda
Ali, Hasan
Pribytova, Ekaterina
Kepič, Peter
U Polčák, Josef
Kepič, Peter
D'Angelo, Elena
Kramář, Jan
Krútek, Šimon
Burda, Daniel
Endstrasser, Zdeněk
Bajwa, Laiba Asad
Krútek, Šimon
Šimůnková, Helena
Pribytova, Ekaterina
Wang, Yue
S Michalička, Jan
Pišťák, Jan
B Man, Ondřej
Lišková, Zuzana
Cao, Hoang-Anh
Endstrasser, Zdeněk
Dubroka, Adam
U Staňo, Michal
Piastek, Jakub
Žaloudková, Lucie
Surana, Karan Singh
Burda, Daniel
Otýpka, Martin
Krčma, Jakub
Hrdý, Radim
Potoček, Michal
Otýpka, Martin
Bajwa, Laiba Asad
Jelínek, Eduard

Upcoming trainings

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Term Name Description Max. attendees
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tadeáš Lesovský 1
8.10. 09:30 - 12:00 ALD-Beneq-training Attendees: Andrej Juríček, David Neradilek, Peter Kepič 3
9.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
12.10. 09:00 - 12:30 RAITH training basic 1/3 RAITH basic training. Introduction to the RAITH150 Two system and the Electron Optics software. Operation of ZEISS SEM and basic functions. Attendees: Marie Cmíralová 1
13.10. 09:00 - 14.10. 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Marie Cmíralová 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek, Kristýna Kupková 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Lukáš Dokulil, Martin Kužílek 10