Monday 11.5.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
SUSS-WETBENCH
ICON-SPM
KRATOS-XPS
WITEC-RAMAN
BET-ANAMET
DEKTAK
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-XPS
UHV-PLD
UHV…
UHV…
UHV-PREPARATION
UHV-SPM
NIKON-NANO
NMR
NANOSAM
MECHANICAL…
3D-PRUSA-XL
VERIOS
MIRA-EBL
CRYOGENIC
LAKESHORE
LITESCOPE-MIRA…
AMBER
WOOLLAM-VIS
LEICACOAT-NANO
SEE-SYSTEM
TITAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
LIBS-FireFly
ZEISS-STAN
GLOVEBOX…
FUMEHOOD-HF
FUMEHOOD…
NANOSCAN
ULTRAFAST-LASER
RIE-FLUORINE
DIENER
VERSALAB
RAITH
EVAPORATOR
JAZ3-CHANNEL
VACUUM_OVEN-C1…
ML3-BABY
LEXT
BET-DEGASSER
LYRA
SUMMIT
SHAKER-B1.18
SUSS-RCD8
LaserMIRA
RTP
Q-LAB
RIE-CHLORINE
SIMS
nanoCT
MIRKA
PARYLENE-SCS
SAW-ACCUTOM
SNOM-NANONICS
MINIFLEX
RSA
nano-CT
SPINCOATER…
RIGAKU3
NANOCALC
ACCURION_RSE
Test O2
STEMI
VUVAS
DWL
JASCO
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
ULTRASONIC…
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
UHV-CLUSTER
SW-BEAMER
TEST2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
TEM-SW
Test školení
UHV-LEIS
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
PECVD
DSC-DISCOVERY
PARYLENE-DIENER
HELIOS
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
DRIE
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
SW-CT
Micromex
BRILLOUIN
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
MINIEVAP
CPD
TIC3X
CLARUS-680
micro-CT-L240
3D-PRUSA-ORANGE
WOOLLAM-MIR
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
MPS150
LPCVD-SiN
MONOWAVE
CITOPRESS
NanoOne250
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PROTOMAT
LPCVD-polySi
micro-CT-m300
FISCHIONE-TEM…
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
IS_NOVOCONTROL
SCIA
KAUFMAN
LITESCOPE-LYRA
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
UV-LASER
T Lepcio, Petr
Sevriugina, Veronika
Kovařík, Martin
Sanna, Michela
Jakešová, Marie
Jakešová, Marie
Supalová, Linda
Bajwa, Laiba Asad
Janoušek, Tomáš
U Staňo, Michal
Janoušek, Tomáš
S Polčák, Josef
B Polčák, Josef
Pavliňák, David
Janoušek, Tomáš
paiva de araujo, Estacio
U Spotz, Zdeněk
Tkachenko, Serhii
Tkachenko, Serhii
Fecko, Peter
Jakešová, Marie
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
U Danchuk, Viktor
B Danchuk, Viktor
T Supalová, Linda
Supalová, Linda
U Tmejová, Kateřina
U Jewula, Pawel
U Danchuk, Viktor
B Danchuk, Viktor
Varga, Dominik
Varga, Dominik
Fecko, Peter
Šťastný, Jakub
B Švarc, Vojtěch
B Danchuk, Viktor
Holcman, Vladimír
Kovařík, Martin
T Iakoubovskii, Konstantin
Franta, Daniel
Velluvakandy, Roshan
E Polášková, Kateřina
S Michalička, Jan
U Tmejová, Kateřina
U Tmejová, Kateřina
U Tmejová, Kateřina
Zikmundová, Eva
S Holas, Jiří
U Tmejová, Kateřina
Jakešová, Marie
Bajwa, Laiba Asad
U Staňo, Michal
B Arregi Uribeetxebarria, Jon Ander
Supalová, Linda
Bajwa, Laiba Asad
B Danchuk, Viktor
U Lišková, Zuzana
Bajwa, Laiba Asad
Iakoubovskii, Konstantin
Zdeg, Ikram
Jakešová, Marie
Potoček, Michal
Tkachenko, Serhii
B Švarc, Vojtěch

Upcoming trainings

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Term Name Description Max. attendees
11.5. 09:00 - 17:30 Amber Meeting point at the microscope. Attendees: Jiří Spousta, Viktor Bajo 2
11.5. 09:00 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ying Hu 2
11.5. 10:30 - 11:00 Nikon Nano training Nikon optical microscope training for operators. Attendees: Linda Supalová, Peter Fecko, Jiří Zita, Vojtěch Švarc, Marek Eliáš, Radim Hrdý, Zuzana Lišková, Jan Prášek, Jakub Piastek ---
12.5. 10:00 - 10:30 Nikon Nano - optical microscope Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Marie Jakešová, Anna Tvrdoňová, Laiba Asad Bajwa 3
12.5. 10:00 - 12:00 Totnado-M4_XRF Attendees: David Pavliňák 3
14.5. 09:00 - 12:00 SEE SYSTEM training Training in contact angle measurements and surface free energy determination. Meeting point in front of the User office. Attendees: Kajal Sharma 1
14.5. 09:30 - 12:30 MIRA-STAN for LYRA and returning users Meeting point at the Microscope. Attendees: Claudia Isabel Paredes Sánchez, Kajal Sharma, Yanzhen Song 4
14.5. 09:30 - 11:45 NMR training course Use of 60 MHz Magritec NMR spectrometer and samples preparation Attendees: Pawel Jewula, Pedro Henrique de Oliveira Santiago, Carolina Sanna 3
15.5. 09:00 - 13:00 Rigaku 3 - hands-on Hand-on Kajal Sharma Attendees: Fateh Bahadur, Kajal Sharma ---
15.5. 09:30 - 11:00 LEXT training Attendees: Martina Janůšová, Keval Sonigara, Viktor Danchuk, Rasul Valiyev 4
15.5. 10:00 - 12:00 Witec-Raman Attendees: Puja De, Sujan Maity, Carolina Sanna, Sharmistha Dey, Ondřej Šik 4
18.5. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/310295373414983?p=A06Vu2fman9ojWr9i0) Meeting ID: 310 295 373 414 983 Access code: Cw9Ff2yW Attendees: Ryan Raad, Sujan Maity 5
19.5. 09:30 - 12:00 RIE-flourine - training Attendees: Šimon Krútek 3
19.5. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Matej Dinis, Jiří Strnad, Debika Devi Thongam 5
19.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Ryan Raad, Matej Dinis, Jiří Strnad, Sujan Maity, Debika Devi Thongam 5
19.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Matej Dinis, Jiří Strnad, Dimitrios Tsalagkas, Debika Devi Thongam 10
19.5. 14:00 - 15:00 DIENER-training Attendees: Šimon Krútek 3
19.5. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Matej Dinis, Jiří Strnad, Debika Devi Thongam 10
25.5. 09:30 - 12:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Carolina Oliver Urrutia, Claudia Isabel Paredes Sánchez, Ondrej Kubinec, Ying Hu 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1
3.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Lucie Žaloudková, Ying Hu, Carolina Sanna 3
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2