| 10.3. 08:30 - 17:30 |
Amber
|
Meeting point at the microscope.
Attendees:
Eduard
Jelínek
|
4
|
| 10.3. 09:30 - 12:00 |
RIE-training
|
Attendees:
Elisa
Cuccu,
Derenik
Petrosyan,
Heriknaz
Asatryan
|
3
|
| 11.3. 09:00 - 10:30 |
JASCO training
|
Description of holders and software, basic measurement
Attendees:
Daina Dayana
Arenas Buelvas,
Karan Singh
Surana,
Pedro Henrique
de Oliveira Santiago
|
3
|
| 12.3. 10:00 - 10:30 |
Electroworkshop - basics
|
Basic & safety training for entering the electroworkshop. It is a prerequisite for all subsequent trainings (3d printers, soldering, laser) for instruments located in the electroworkshop.
Attendees:
Karan Singh
Surana,
Konstantin
Iakoubovskii
|
3
|
| 12.3. 11:30 - 17:30 |
Amber
|
Meeting point at the microscope.
Attendees:
Adam
Očkovič
|
4
|
| 13.3. 09:30 - 12:00 |
ICON-SPM basic training
|
Attendees:
Martina
Janůšová,
Ondrej
Kubinec,
Tomáš
Janoušek
|
3
|
| 17.3. 09:00 - 17:00 |
Helios_basic (1/2)
|
Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jiří
Spousta,
Jan
Pišťák,
Mohamed
Bensalem
|
3
|
| 18.3. 09:00 - 12:00 |
Verios/Helios_EDS
|
Practical demonstration of EDS analytical system at Verios and Helios.
Attendees:
Karan Singh
Surana,
Saurabh
Pathak
|
3
|
| 19.3. 09:00 - 16:00 |
Helios_basic (2/2)
|
Helios_basic (2/2): Hands-on session for attendees of Helios_basic (1/2).
Attendees:
Mohamed
Bensalem
|
1
|
| 20.3. 13:30 - 15:30 |
FTIR-CHEMLAB
|
Meeting point in Chemlab.
Attendees:
Saurabh
Pathak
|
2
|
| 23.3. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
ID schůzky: 341 031 483 654
Přístupový kód: hz6gW67Y
Attendees:
Šimon
Formánek
|
5
|
| 24.3. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jan
Klíma,
Radim
Slovák,
Tomáš
Janoušek
|
3
|
| 24.3. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion.
Attendees:
Šimon
Formánek
|
5
|
| 24.3. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Petr
Pazourek,
Šimon
Formánek
|
5
|
| 24.3. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Petr
Pazourek
|
10
|
| 24.3. 14:25 - 14:55 |
Safety excursion - StAn lab
|
Attendees:
Petr
Pazourek,
Šimon
Formánek
|
10
|
| 25.3. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Tomáš
Janoušek
|
1
|
| 25.3. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Radim
Slovák
|
1
|
| 25.3. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 27.3. 09:30 - 16:30 |
MIRA-STAN 1/2
|
Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Carolina
Oliver Urrutia,
Ondrej
Kubinec
|
4
|
SUSS-WETBENCH
LVEM
SEE-SYSTEM