Tuesday 21.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
WITEC-RAMAN
ML3-BABY
SUSS-WETBENCH
MIRA-STAN
UHV-XPS
LEICACOAT-NANO
TITAN
3D-PRUSA-ORANGE
RIGAKU3
micro-CT-L240
RIE-FLUORINE
ICON-SPM
BET-ANAMET
TGA-DISCOVERY
VERSALAB
TORNADO-M4
WIRE-BONDER
KRATOS-XPS
BET-DEGASSER
JASCO
LAKESHORE
LITESCOPE-MIRA…
LASER-DICER
R2-PECVD
KEITHLEY-4200
IS-NOVOCONTROL
ZEISS-STAN
LVEM
CHEMLAB-B1.18
CHEMLAB-B1.14
ZWICK
ZETASIZER
VERIOS
VNA-MPI
CRYOGENIC
MAGNETRON
KERR-MICROSCOPE
SUSS-RCD8
UHV-LEEM
UHV-DEPOSITION
AMBER
UHV-PREPARATION
FTIR-CHEMLAB
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
UHV-PLD
PECVD
RIGAKU9
NIKON-NANO
NANOSAM
DEKTAK
WOOLLAM-RC2
TEGRAMIN
UV-LASER
TUBE-FURNACE
MPS150
GLOVEBOX…
FUMEHOOD…
LEICACOAT-STAN
CLARUS-680
SPONGEBOB
EVAPORATOR
ALD-FIJI
LYRA
BRILLOUIN
HELIOS
FUMEHOOD-HF
TEST2
Test Ondra 3
Test O2
TEST-RFID4
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
CLR-ISO8-Lab…
FISCHIONE-160
Micromex
TENUPOL
SUMMIT
SNOM-NANONICS
MINIEVAP
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SHAKER-B1.18
LEICA-TXP
LEXT
NANOCALC
STEMI
SW-COMSOL
SW-BEAMER
UHV-MBE1
SW-TRACER
SW-LAB
UHV-LEIS
UHV-MBE2
VACUUM_OVEN-C1…
microCT
ALD-BENEQ
APCVD-Diffusion
XEF2
ARES
MAGNETRON-AJA
L450
VISCOMETER
VUVAS
APCVD
NANOWIZARD
CITOVAC
FTIR
JAZ3-CHANNEL
UHV-FTIR
DISCO-DICING…
DWL
US-CUTTER
ULTRASONIC…
ULTRAFAST-LASER
BAMBULAB
UHV…
UHV…
UHV-CLUSTER
UHV-SPM
MECHANICAL…
UHV-MBE
RSA
CEITEC-NANO
MIRA-EBL
CPD
nano-CT
IR-RAMAN
PROTOMAT
ELECTROWORKSHOP
R4…
LPCVD-SiN
LPCVD-polySi
FLOWBOX
LITESCOPE-LYRA
LIBS-LabSys1
LIBS-Discovery
LIBS-FireFly
LAURELL-NANO
4-POINT
FTIRMAG
K70
KAUFMAN
HENRY-MAGNET
FRASCAN
micro-CT-m300
DAWN-HELEOS
FUMEHOOD…
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
FUMEHOOD…
FISCHIONE-TEM…
NANOINDENTER
FUMEHOOD…
CHEMLAB-B1.16
FUMEHOOD…
FUMEHOOD…
SCIA
LECTROPOL
RAITH
nanoCT
Q-LAB
PARYLENE-DIENER
TEM-SW
SW-CT
MIRKA
SAW-ACCUTOM
SPINCOATER…
RTP
3D-PRUSA-BLACK
ACCURION_RSE
CRYOMILL
TIC3X
DIENER
RIE-CHLORINE
MINIFLEX
DRIE
3D-PRUSA-BLUE
SUSS-MA8
CITOPRESS
DRYING-OVEN-B1…
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
NANOSCAN
ULTRACENTRIFUGE
DIMPLING…
DHR
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
NANO-ONE-2PP
Bakhshikhah, Mahan
Šťastný, Jakub
Mikerásek, Vojtěch
Liška, Jiří
Povey, Rhys Geoffrey
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Povey, Rhys Geoffrey
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Jelínek, Eduard
Šamořil, Tomáš
Fu, Hongbo
Molnár, Tomáš
Molnár, Tomáš
T Švarc, Vojtěch
Yuan, Yunhuan
T Kolíbalová, Eva
Michalička, Jan
Klíma, Jan
Klíma, Jan
Žaloudková, Lucie
Daradkeh, Samer
Kolář, David
Kolář, David
Fecko, Peter
Fecko, Peter
T Gablech, Evelína
Šťastný, Jakub
Valadi Palliyalil, Anjali
Fanisaberi, Amirmohsen
AL Soud, Ammar
AL Soud, Ammar
Klimek, Jan
Lukiienko, Iryna
T Spotz, Zdeněk
Arregi Uribeetxebarria, Jon Ander
Kostka, Marek
Zdeg, Ikram
Šárfy, Pavlína
Fatima, Areej
Valadi Palliyalil, Anjali
AL Soud, Ammar
E Tmejová, Kateřina
AL Soud, Ammar
Holcman, Vladimír
Jelínek, Eduard
Lukiienko, Iryna
Bolouki, Nima
Patil, Virendra
AL Soud, Ammar
Havlíková, Tereza
U Kolíbalová, Eva
Tmejová, Kateřina
U Tmejová, Kateřina
Fu, Hongbo
Kreuzerová, Monika
Šťastný, Jakub
Klíma, Jan
Klíma, Jan
Povey, Rhys Geoffrey
Arregi Uribeetxebarria, Jon Ander
Povey, Rhys Geoffrey
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Kratochvílová, Ivana
Endstrasser, Zdeněk
T Lepcio, Petr
U Tmejová, Kateřina
Bednaříková, Vendula
Kepič, Peter
Cuccu, Elisa
Arregi Uribeetxebarria, Jon Ander
Supalová, Linda
S Danchuk, Viktor
Švarc, Vojtěch
Rusnaková, Nicole
Havlíková, Tereza
Spusta, Tomáš
Kepič, Peter
Citterberg, Daniel
Saldan, Ivan
Mukherjee, Aniket
Kalleshappa, Bindu
U Sanna, Michela
Krútek, Šimon
T Prášek, Jan
Song, Yanzhen
S Šamořil, Tomáš
Krčma, Jakub
Huang, Yong
Fecko, Peter

Upcoming trainings

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Term Name Description Max. attendees
21.7. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Petr Sysel, Debika Devi Thongam 3
21.7. 10:00 - 11:30 Leicacoat-Nano training Attendees: Hongbo Fu, Rosmi Vinson 4
21.7. 10:00 - 12:00 Tornado-M4 in front of entrance to STAN Attendees: Ammar AL Soud 3
21.7. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Laiba Asad Bajwa, Jana Burdíková 5
21.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Nikol Kaděrová, Redzic Milica, Cimolato Andrea, Le Thien, Karel Škubník 5
21.7. 13:30 - 16:30 Evaporator EN Standard training in the English or the Czech language Attendees: Ganna Kharchenko 2
21.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Vladislav Dvořák, Muhammad SAHIL, Redzic Milica, Cimolato Andrea, Le Thien, Jana Burdíková, Laura Búšová, Michal Slovák 10
21.7. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Nima Bolouki, Muhammad SAHIL 10
22.7. 09:00 - 10:30 JASCO training- CZ Description of holders and software, basic measurement Attendees: Marie Jakešová, Anna Tvrdoňová, Šimon Krútek 3
22.7. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
22.7. 10:30 - 12:00 JASCO training - EN Description of holders and software, basic measurement Attendees: Laiba Asad Bajwa, Rosmi Vinson 2
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh, Ondrej Kubinec, Debika Devi Thongam 3
23.7. 09:00 - 11:00 RC2 The first part of the training Attendees: Sharmistha Dey 1
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 09:30 - 13:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. Attendees: Lukáš Zezulka, Roshan Velluvakandy, Vladislav Dvořák 3
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Debika Devi Thongam 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ondrej Kubinec 1
27.7. 09:30 - 13:30 ZWICK Meeting point is in front of the Advanced Chemical laboratory. Obligatory prerequisites 1. Pass the Chemical laboratory safety excursion in Moodle (https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=173): 2. Answer the ZWICK applicant questionnaire 3. Read the ZWICK rules (mark the activity as complete with ✔️) 4. Bring your own sample Recommended prerequisites 5. Get familiar with the Layout for ZWICK basic training (mark the activity as complete with ✔️) Attendees: Rasul Valiyev 2
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 2
30.7. 09:00 - 13:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Sára Hrdinová, Debika Devi Thongam 1
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1