Thursday 5.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
MIRA-STAN
TGA-DISCOVERY
WITEC-RAMAN
VERIOS
EVAPORATOR
MAGNETRON
UHV-XPS
ML3-BABY
VERSALAB
MIRA-EBL
CRYOGENIC
LEICACOAT-STAN
ICON-SPM
SUSS-WETBENCH
ALD-FIJI
WOOLLAM-RC2
TITAN
UHV-LEEM
UHV-SPM
HELIOS
IS_NOVOCONTROL
LVEM
UHV-LEIS
LITESCOPE-MIRA…
LASER-DICER
SEE-SYSTEM
UHV-DEPOSITION
FUMEHOOD…
AMBER
LIBS-FireFly
PARYLENE-DIENER
NANOINDENTER
VNA-MPI
BET-ANAMET
DIENER
BET-DEGASSER
VUVAS
RIGAKU9
NANOSAM
ZWICK
FTIR
RIGAKU3
RIE-FLUORINE
RIE-CHLORINE
ALD-BENEQ
UHV-PREPARATION
RAITH
WOOLLAM-VIS
SHAKER-B1.18
LaserMIRA
SUMMIT
PECVD
MIRKA
NANOCALC
SAW-ACCUTOM
RTP
SPINCOATER…
Q-LAB
SIMS
nano-CT
PARYLENE-SCS
ACCURION_RSE
SNOM-NANONICS
SUSS-RCD8
MINIFLEX
nanoCT
RSA
STEMI
3D-PRUSA-XL
SW-BEAMER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
Test školení
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEST-RFID2
UHV-CLUSTER
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-MBE
UHV-PLD
TEM-SW
MONOWAVE
3D-PRUSA-ORANGE
LYRA
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
DRIE
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
SW-CT
micro-CT-L240
TORNADO-M4
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BRILLOUIN
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
Micromex
micro-CT-m300
3D-PRUSA-BLACK
DSC-DISCOVERY
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
MPS150
LPCVD-SiN
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LAKESHORE
LPCVD-polySi
DAWN-HELEOS
SCIA
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
FISCHIONE-TEM…
LITESCOPE-LYRA
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Kelarová, Štěpánka
Bolouki, Nima
Souawda, Nada
Ulč, Filip
Valášek, Daniel
Kalleshappa, Bindu
B Petruš, Josef
S Petruš, Josef
B Petruš, Josef
Mathew, Grigory
paiva de araujo, Estacio
Havelka, Tomáš
Velluvakandy, Roshan
Pišťák, Jan
Krčma, Jakub
Cmíralová, Marie
S Prášek, Jan
Arregi Uribeetxebarria, Jon Ander
U Prášek, Jan
Šebestová, Zuzana
Hrůza, Dominik
T Piastek, Jakub
Otýpka, Martin
Tichý, Martin
Hrdinová, Sára
Slovák, Radim
Štálnik, Jozef
Klíma, Jan
Klíma, Jan
Pišťák, Jan
Kalleshappa, Bindu
S Gablech, Evelína
B Gablech, Evelína
Otýpka, Martin
Liška, Jiří
Štálnik, Jozef
Eliáš, Marek
Nebojsa, Alois
Přibyl, Roman
Michalička, Jan
S Michalička, Jan
Šebestová, Zuzana
Šebestová, Zuzana
Bahadur, Fateh
Daradkeh, Samer
S Kolíbalová, Eva
Průša, Stanislav
Ulč, Filip
Liška, Jiří
S Lehchenkova, Iryna
U Polčák, Josef
Tmejová, Kateřina
T Iakoubovskii, Konstantin
Vozár, Tomáš
Bajwa, Laiba Asad
Havelka, Tomáš
Klíma, Jan
Tkachenko, Serhii
Cmíralová, Marie
Tkachenko, Serhii
Přibyl, Roman
Slavíček, Radek
Kumar, Sanjay
Lepcio, Petr
Nebojsa, Alois
Kalleshappa, Bindu
Bajwa, Laiba Asad
Slovák, Radim
Fecko, Peter
Šebestová, Zuzana
S Lišková, Zuzana
Franta, Daniel

Upcoming trainings

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Term Name Description Max. attendees
5.3. 10:00 - 4.3. 11:30 ML3-Baby ML3 Baby MicroWriter training Attendees: Jiří Liška 1
6.3. 10:00 - 13:01 CRYOGENIC VSM Basic CRYOGENIC VSM Attendees: Radek Slavíček 2
6.3. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Petr Pazourek, Ondrej Kubinec, Sujan Maity, Tomáš Janoušek 4
9.3. 09:00 - 16:00 GC-MS CLARUS-680 Training GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová 2
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
11.3. 09:00 - 10:30 JASCO training Description of holders and software, basic measurement Attendees: Daina Dayana Arenas Buelvas, Karan Singh Surana, Pedro Henrique de Oliveira Santiago 3
12.3. 10:00 - 10:30 Electroworkshop - basics Basic & safety training for entering the electroworkshop. It is a prerequisite for all subsequent trainings (3d printers, soldering, laser) for instruments located in the electroworkshop. Attendees: Konstantin Iakoubovskii 3
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Tomáš Janoušek 3
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ondrej Kubinec 4