Thursday 27.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
LVEM
NIKON-NANO
DEKTAK
ML3-BABY
FUMEHOOD…
VERSALAB
RIE-FLUORINE
AMBER
VERIOS
CHEMLAB-B1.14
BAMBULAB
ULTRACENTRIFUGE
RIGAKU9
WITEC-RAMAN
LYRA
FUMEHOOD…
KERR-MICROSCOPE
UHV-XPS
UHV-DEPOSITION
EVAPORATOR
FUMEHOOD…
BET-ANAMET
MIRA-EBL
WOOLLAM-RC2
TGA-DISCOVERY
RAITH
SUSS-MA8
LITESCOPE-MIRA…
UHV-PREPARATION
NANOSCAN
CHEMLAB-B1.18
ZEISS-NANO
NMR
KEITHLEY-4200
MPS150
ULTRAFAST-LASER
MIRA-STAN
TITAN
RIGAKU3
LEICACOAT-STAN
VACUUM_OVEN-C1…
LEICACOAT-NANO
TIC3X
micro-CT-L240
ULTRASONIC…
ZWICK
SIMS
SUMMIT
NANOCALC
SEE-SYSTEM
LaserMIRA
SHAKER-B1.18
MINIFLEX
PARYLENE-SCS
ICON-SPM
SNOM-NANONICS
RSA
nano-CT
nanoCT
RIE-CHLORINE
DIENER
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
STEMI
Test školení
SW-BEAMER
CITOVAC
UHV…
UHV…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV-SPM
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
UHV-CLUSTER
UHV-PLD
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
TEM-SW
TEST-RFID4
UHV-MBE
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
PECVD
NANO-ONE-2PP
PARYLENE-DIENER
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
HELIOS
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
CPD
CLARUS-680
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BET-DEGASSER
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
FUMEHOOD…
Micromex
3D-PRUSA-ORANGE
WOOLLAM-MIR
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
HENRY-MAGNET
MAGNETRON
LABOTOM5
3D-PRUSA-XL
LITESCOPE-LYRA
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSAM
NIRQUEST512
WOOLLAM-VIS
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LPCVD-polySi
LIBS-LabSys1
micro-CT-m300
ZEISS-STAN
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
IS-NOVOCONTROL
SCIA
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
E Jakešová, Marie
Baeva, Maria
Baeva, Maria
MURTAS, DAVIDE
Přibyl, Roman
Pham, Sy Nguyen
Beliančínová, Beáta
T Kolíbalová, Eva
Říhová, Martina
U Kolíbalová, Eva
Cuccu, Elisa
Jasenský, Kryštof
Jasenský, Kryštof
E Jakešová, Marie
Baeva, Maria
U Švarc, Vojtěch
E Jakešová, Marie
Baeva, Maria
E Jakešová, Marie
Jasenský, Kryštof
Daradkeh, Samer
Molnár, Tomáš
Baeva, Maria
Jasenský, Kryštof
Spousta, Jiří
Spousta, Jiří
T Kicmerova, Dina
Cao, Hoang-Anh
Hu, Ying
Saldan, Ivan
Piastek, Jakub
Roupcová, Pavla
Hu, Ying
Saldan, Ivan
Caha, Ondřej
Caha, Ondřej
Kumar, Sanjay
Pavliňák, David
S Šamořil, Tomáš
E Jakešová, Marie
Molnár, Tomáš
Jakub, Zdeněk
Jakub, Zdeněk
Martyniuk, Oleh
E Jakešová, Marie
Pavliňák, David
Jasenský, Kryštof
Cuccu, Elisa
Pavliňák, David
MURTAS, DAVIDE
E Jakešová, Marie
Kramář, Jan
Jakub, Zdeněk
Kovařík, Martin
Hu, Ying
E Jakešová, Marie
Michlovská, Lenka
Hrdý, Radim
Hrdý, Radim
Jasenský, Kryštof
Kramář, Jan
S Michalička, Jan
T Roupcová, Pavla
Michlovská, Lenka
T Danchuk, Viktor
Yuan, Yunhuan
Kramář, Jan
Kolář, David
Hu, Ying
Lepcio, Petr

Upcoming trainings

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Term Name Description Max. attendees
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 10:00 - 26.8. 11:00 VACUUM_OVEN -C1.38 Vacuum Drying Oven 1.38 basic training. Attendees: Martin Otýpka 4
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10