| 23.3. 10:00 - 11:30 |
JASCO training
|
Description of holders and software, basic measurement
Attendees:
Daina Dayana
Arenas Buelvas,
Pedro Henrique
de Oliveira Santiago
|
3
|
| 23.3. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
ID schůzky: 341 031 483 654
Přístupový kód: hz6gW67Y
Attendees:
Šimon
Formánek,
David Jonathan
Walcher
|
5
|
| 24.3. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jan
Klíma,
Radim
Slovák,
Hasan
Ali,
Tomáš
Janoušek
|
3
|
| 24.3. 09:00 - 17:30 |
Amber
|
Meeting point at the microscope.
Attendees:
Adam
Očkovič
|
4
|
| 24.3. 09:30 - 12:00 |
ALD-Beneq-training
|
Attendees:
Jozef
Štálnik,
Derenik
Petrosyan,
Heriknaz
Asatryan
|
3
|
| 24.3. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion.
Attendees:
Areej
Fatima,
Šimon
Formánek,
Rasul
Valiyev,
David Jonathan
Walcher
|
5
|
| 24.3. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Šimon
Formánek,
David Jonathan
Walcher
|
5
|
| 24.3. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Petr
Pazourek,
Rasul
Valiyev,
David Jonathan
Walcher
|
10
|
| 24.3. 14:25 - 14:55 |
Safety excursion - StAn lab
|
Attendees:
Petr
Pazourek,
Šimon
Formánek,
David Jonathan
Walcher
|
10
|
| 24.3. 15:00 - 17:00 |
Woollam RC2
|
Second part of training
Attendees:
Beáta
Kavcová
|
1
|
| 25.3. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Tomáš
Janoušek
|
1
|
| 25.3. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Radim
Slovák
|
1
|
| 25.3. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Jan
Klíma
|
1
|
| 27.3. 09:00 - 13:00 |
KRATOS-XPS
|
Basic training (session 1/2) - max 2 attendees.
In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz.
Attendees:
Grigory
Mathew,
Sujan
Maity
|
2
|
| 27.3. 09:30 - 16:30 |
MIRA-STAN 1/2
|
Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Carolina
Oliver Urrutia,
Ondrej
Kubinec
|
4
|
| 27.3. 10:00 - 16.3. 12:00 |
Witec-Raman
|
in front of user office
Attendees:
Saurabh
Pathak
|
4
|
| 16.4. 09:30 - 11:30 |
MIRA-STAN - EDS detector
|
Only for users with an active MIRA-STAN certificate. Meeting point at the microscope.
Attendees:
Aida
Fazlič
|
4
|
HENRY-MAGNET
WOOLLAM-VIS
DWL