Wednesday 19.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
KRATOS-XPS
MIRA-STAN
ML3-BABY
TIC3X
EVAPORATOR
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CHEMLAB-B1.14
TITAN
LEICACOAT-STAN
ICON-SPM
SUSS-WETBENCH
RIE-FLUORINE
SUSS-MA8
ZEISS-NANO
JASCO
ULTRACENTRIFUGE
LIBS-FireFly
RAITH
VACUUM-OVEN-B1…
UHV-DEPOSITION
DEKTAK
LYRA
HELIOS
LEICA-TXP
UHV-LEIS
DIENER
3D-PRUSA-XL
UHV-XPS
ZWICK
UHV-SPM
AMBER
WITEC-RAMAN
CHEMLAB-B1.16
MIRA-EBL
UHV-PREPARATION
NANOSAM
ULTRASONIC…
CRYOGENIC
PARYLENE-DIENER
MINIFLEX
NMR
MPS150
VACUUM_OVEN-C1…
PARYLENE-SCS
SNOM-NANONICS
RIGAKU9
microCT
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
RSA
ZETASIZER
nano-CT
nanoCT
RIE-CHLORINE
SUSS-RCD8
RIGAKU3
ACCURION_RSE
XEF2
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
PECVD
TEM-SW
3D-PRUSA-ORANGE
SHAKER-B1.18
SW-TRACER
NANOCALC
UHV-CLUSTER
VUVAS
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-MBE
VACUUM-OVEN-B1…
UHV-PLD
UHV…
UHV-MBE1
UHV…
ULTRAFAST-LASER
CITOVAC
US-CUTTER
DWL
FTIR
JAZ3-CHANNEL
VISCOMETER
TGA-DISCOVERY
STEMI
L450
BET-ANAMET
SW-BEAMER
SW-LAB
FTIR-CHEMLAB
WIRE-BONDER
TENUPOL
FISCHIONE-160
Test Ondra 3
Heliscan
Test O2
3D-PRUSA-BLACK
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
TEST2
NANO-ONE-2PP
3D-PRUSA-BLUE
ELECTROWORKSHOP
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
CPD
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
VERSALAB
MINIEVAP
CLARUS-680
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
FUMEHOOD…
Micromex
WOOLLAM-VIS
MAGNETRON
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LIBS-LabSys1
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-L240
CHEMLAB-B1.18
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
IS-NOVOCONTROL
LAURELL-NANO
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
T Kicmerova, Dina
Man, Ondřej
U Kicmerova, Dina
U Kicmerova, Dina
Polčák, Josef
Fatima, Areej
Allaham, Mohammad
Havlíková, Tereza
Pribytova, Ekaterina
Hu, Ying
Piastek, Jakub
Fecko, Peter
Man, Ondřej
Kramář, Jan
E Jakešová, Marie
Supalová, Linda
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Hu, Ying
Saldan, Ivan
Michalička, Jan
Michalička, Jan
Havlíková, Tereza
Bednaříková, Vendula
Fallahpour, Mojdeh
Cuccu, Elisa
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Supalová, Linda
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
E Jakešová, Marie
Říhová, Martina
Tvrdoňová, Anna
Hu, Ying
Saldan, Ivan
Čechová, Ludmila
Lišková, Zuzana
Hu, Ying
Jakub, Zdeněk
E Jakešová, Marie
S Šamořil, Tomáš
Bahadur, Fateh
Man, Ondřej
Vaníčková, Elena
E Jakešová, Marie
Kumar, Sanjay
Jakub, Zdeněk
Sevriugina, Veronika
Jakub, Zdeněk
Iakoubovskii, Konstantin
paiva de araujo, Estacio
Hu, Ying
Supalová, Linda
Jakub, Zdeněk
S Danchuk, Viktor
Hu, Ying
Pribytova, Ekaterina
E Jakešová, Marie
T Spotz, Zdeněk
B Jewula, Pawel
paiva de araujo, Estacio

Upcoming trainings

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Term Name Description Max. attendees
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Andrej Juríček 1
20.8. 09:00 - 12:00 SEE SYSTEM training Training in contact angle measurements and surface free energy determination. Meeting point in front of the User office. Attendees: Jiří Strnad 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3