Friday 12.12.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
KRATOS-XPS
MIRA-STAN
ML3-BABY
RAITH
SUSS-WETBENCH
WITEC-RAMAN
MIRA-EBL
WOOLLAM-VIS
RIGAKU3
SUSS-MA8
CRYOGENIC
ICON-SPM
NANOCALC
VERIOS
LYRA
TEGRAMIN
LEICACOAT-STAN
micro-CT-m300
FUMEHOOD…
SUSS-RCD8
MAGNETRON
ALD-FIJI
KERR-MICROSCOPE
LVEM
RIE-CHLORINE
UHV-DEPOSITION
RIGAKU9
3D-PRUSA-ORANGE
LEICA-TXP
NANOINDENTER
L450
LIBS-FireFly
R2-PECVD
HELIOS
DEKTAK
R4…
UHV-LEIS
ULTRACENTRIFUGE
ZEISS-NANO
DWL
SAW-ACCUTOM
UHV-PREPARATION
NANOSCAN
FTIR
UHV-SPM
SEE-SYSTEM
UHV-LEEM
EVAPORATOR
ZETASIZER
RTP
SIMS
PARYLENE-SCS
ACCURION_RSE
PECVD
SNOM-NANONICS
WIRE-BONDER
ZWICK
DIENER
RSA
microCT
nano-CT
nanoCT
MINIFLEX
MIRKA
Q-LAB
LaserMIRA
SPINCOATER…
XEF2
SW-LAB
SUMMIT
UHV-FTIR
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
CITOVAC
UHV-MBE
Heliscan
UHV-XPS
UHV-PLD
ULTRAFAST-LASER
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
TGA-DISCOVERY
THEORY-SUPPORT
SHAKER…
SW-TRACER
VISCOMETER
VUVAS
STEMI
BET-ANAMET
SW-BEAMER
FTIR-CHEMLAB
TENUPOL
TGA96
FISCHIONE-160
Test Ondra 3
VACUUM_OVEN-B1…
Test O2
TEST2
Test školení
TEST-RFID2
PARYLENE-DIENER
MPS150
3D-PRUSA-BLACK
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
FLOWBOX
VERSALAB
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CRYOMILL
TIC3X
Micromex
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CLARUS-680
micro-CT-L240
3D-PRUSA-BLUE
WOOLLAM-RC2
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
LABOTOM5
LIBS-Discovery
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSAM
NIRQUEST512
NMR
LIBS-LabSys1
LAURELL-NANO
DAWN-HELEOS
CHEMLAB-B1.16
GLOVEBOX
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.14
CHEMLAB-B1.18
LASER-DICER
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Supalová, Linda
Supalová, Linda
Lukiienko, Iryna
Lukiienko, Iryna
Polčák, Josef
Polčák, Josef
Polčák, Josef
Danchuk, Viktor
Havlíková, Tereza
Lukiienko, Iryna
Lukiienko, Iryna
Sonigara, Kevalkumar Kishorbhai
Supalová, Linda
Fecko, Peter
Hrdý, Radim
Lišková, Zuzana
Citterberg, Daniel
Švarc, Vojtěch
Weisz, Hugo
Supalová, Linda
Supalová, Linda
Valero, Astolfo
paiva de araujo, Estacio
U Spotz, Zdeněk
Lukiienko, Iryna
Slovák, Radim
Weisz, Hugo
Kepič, Peter
Kepič, Peter
Mukherjee, Aniket
Procházková, Anna
Supalová, Linda
Supalová, Linda
Lukiienko, Iryna
Lukiienko, Iryna
T Gablech, Evelína
Staňo, Michal
Supalová, Linda
Supalová, Linda
Pathak, Saurabh
U Kicmerova, Dina
Šamořil, Tomáš
Matějka, Kryštof
Paredes Sánchez, Claudia
Paredes Sánchez, Claudia
Havlíková, Tereza
Bednaříková, Vendula
Slovák, Vojtěch
Kovařík, Martin
Hrdý, Radim
U Prášek, Jan
T Eliáš, Marek
Staňo, Michal
Kumar, Sanjay
Fecko, Peter
Cohl, Alexandr
Čekal, Josef
Klíma, Jan
Man, Ondřej
Buršíková, Vilma
Slovák, Vojtěch
Buday, Jakub
Beliančínová, Beáta
Man, Ondřej
Supalová, Linda
Eliáš, Marek
Vaníčková, Elena
Saldan, Ivan
Lukiienko, Iryna
Fecko, Peter
Prajzler, Vladimír
Cohl, Alexandr
Kovařík, Martin
Sobola, Dinara
Cohl, Alexandr
T Polášková, Kateřina
Cohl, Alexandr
Matějka, Kryštof

Upcoming trainings

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Term Name Description Max. attendees
12.12. 09:00 - 10:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Grigory Mathew 1
12.12. 09:30 - 12:00 ALD-Fiji-training Attendees: Jozef Štálnik 3
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 09:30 - 12:00 SCIA-training Attendees: Jozef Štálnik, Jakub Vejrosta 3
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Andrej Juríček, Pedro Henrique de Oliveira Santiago 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Pedro Henrique de Oliveira Santiago 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Pedro Henrique de Oliveira Santiago 10
19.12. 13:00 - 16:00 Woollam RC2 Second part of Training Attendees: Ryan Raad 1
6.1. 09:30 - 12:00 DRIE-training Attendees: Kateřina Krajíčková 3
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4