Wednesday 21.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
EVAPORATOR
KRATOS-XPS
MIRA-STAN
LEICACOAT-STAN
VACUUM_OVEN-C1…
ML3-BABY
VERIOS
LASER-DICER
MAGNETRON
WIRE-BONDER
VERSALAB
RIE-FLUORINE
ICON-SPM
DIENER
ZEISS-NANO
BET-DEGASSER
RIGAKU3
FUMEHOOD…
NANOCALC
ARES
TEM-SW
AMBER
BET-ANAMET
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
UHV-LEEM
UV-LASER
UHV-DEPOSITION
PARYLENE-SCS
KERR-MICROSCOPE
CRYOGENIC
UHV-PLD
LPCVD-polySi
TITAN
CHEMLAB-B1.14
IS-NOVOCONTROL
ZEISS-STAN
SCIA
UHV-XPS
MIRA-EBL
LYRA
NANOSAM
3D-PRUSA-XL
MPS150
ALD-BENEQ
ZWICK
APCVD
RIGAKU9
WITEC-RAMAN
MECHANICAL…
HELIOS
NIKON-NANO
UHV-PREPARATION
UHV-SPM
NANO-ONE-2PP
SPONGEBOB
RAITH
ULTRAFAST-LASER
ACCURION_RSE
STEMI
SNOM-NANONICS
RTP
ICON-SPM
nanoCT
SHAKER-B1.18
MINIFLEX
SUSS-RCD8
SUMMIT
RIE-CHLORINE
LaserMIRA
RSA
SEE-SYSTEM
SIMS
nano-CT
SW-BEAMER
Heliscan
SW-LAB
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID4
UHV-MBE
TGA96
THEORY-SUPPORT
SPINCOATER…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
Q-LAB
EBPG
SAW-ACCUTOM
4-POINT
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
DRIE
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DHR
SW-CT
TEGRAMIN
BRILLOUIN
GLOVEBOX…
APCVD-Diffusion
MAGNETRON-AJA
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
DAWN-HELEOS
VNA-MPI
MIRKA
CITOPRESS
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
DSC-DISCOVERY
MONOWAVE
NANOSCAN
PROTOMAT
NIRQUEST512
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PECVD
LVEM
LAKESHORE
PECVD-NANOFAB
IR-RAMAN
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
FISCHIONE-TEM…
KAUFMAN
K70
LPCVD-SiN
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
WOOLLAM-MIR
Citterberg, Daniel
Kalousková, Petra
Štálnik, Jozef
Rovenská, Katarína
Červinka, Ondřej
Cmíralová, Marie
Martyniuk, Oleh
Kupková, Kristýna
Janoušek, Tomáš
Jakešová, Marie
Jakešová, Marie
Martyniuk, Oleh
Jakešová, Marie
Čechal, Jan
Fatima, Areej
Kubinec, Ondrej
Papež, Nikola
Pavliňák, David
Žaloudková, Lucie
Vijithra, Vijithra
Vijithra, Vijithra
Pavliňák, David
Pišťák, Jan
Vijithra, Vijithra
Dey, Sharmistha
Dey, Sharmistha
Danchuk, Viktor
Citterberg, Daniel
Martyniuk, Oleh
Martyniuk, Oleh
T Kicmerova, Dina
Šťastný, Jakub
Pišťák, Jan
Kumar, Sanjay
Štálnik, Jozef
Papež, Nikola
Bajwa, Laiba Asad
Molnár, Tomáš
T Prášek, Jan
Otýpka, Martin
Otýpka, Martin
Kostka, Marek
Danchuk, Viktor
SAHIL, Muhammad
Bajwa, Laiba Asad
Martyniuk, Oleh
B Máčala, Jakub
Šťastný, Jakub
E Zita, Jiří
Bajwa, Laiba Asad
E Zita, Jiří
Jakešová, Marie
Lee, Hyesung
Lee, Hyesung
Wirthová, Michaela
Bednaříková, Vendula
E Zita, Jiří
Kharchenko, Ganna
E Zita, Jiří
Dinis, Matej
T Lepcio, Petr
B Lepcio, Petr
Ali, Hasan
Štindl, Jáchym
Iakoubovskii, Konstantin
Wang, Yue
Lee, Hyesung
Lee, Hyesung
E Zita, Jiří
E Zita, Jiří
E Zita, Jiří
Fanisaberi, Amirmohsen
Hrůza, Dominik
Kumar, Sanjay
Hrůza, Dominik
Bajwa, Laiba Asad
Molnár, Tomáš
Lukiienko, Iryna
Dey, Sharmistha
Dinis, Matej
T Michalička, Jan
Fanisaberi, Amirmohsen
Danchuk, Viktor
Skálová, Zdenka
Eliáš, Marek
Hrůza, Dominik
Štálnik, Jozef
Řepa, Rostislav
Staňo, Michal
Fecko, Peter
S Lehchenkova, Iryna
Štálnik, Jozef
Sevriugina, Veronika
Dinis, Matej
Staňo, Michal
Havelka, Tomáš
Varga, Dominik
B Man, Ondřej
E Zita, Jiří
Hrůza, Dominik
Hrůza, Dominik
Slovák, Michal
Jakešová, Marie
Kalousková, Petra
Jasenský, Kryštof

Upcoming trainings

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Term Name Description Max. attendees
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
22.10. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Michael Foltýn, Carolina Sanna 4
23.10. 09:00 - 17:30 Amber EDS-EBSD training Attendees: Veronika Mazánová, Dinara Sobola 2
25.10. 10:30 - 12:00 Novocontrol-Basic training DRS spectroscopy 2
27.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský 3
27.10. 10:00 - 12:00 DLS-ZetaSizer Part 2 Assisted hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer Ultra. Attendees: Carolina Sanna 1
29.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
30.10. 10:00 - 12:00 NANO-ONE-2PP Advance Training Advanced NANO-ONE-2PP training for printing with optically transparent resins. Attendees: Vladislav Dvořák, Michal Slovák 2
3.11. 10:00 - 14:00 UHV-PLD UHV-PLD repeat training Attendees: Saleh Hekmat Saleh Fawaeer 1
4.11. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Philipp Jäger 4
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Lukáš Dokulil 3
10.11. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1
18.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Ying Hu, Karol Križan, Martin Kužílek 3
20.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1