Thursday 20.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
GLOVEBOX…
VERIOS
3D-PRUSA-XL
KRATOS-XPS
RIGAKU3
WITEC-RAMAN
KERR-MICROSCOPE
AMBER
FUMEHOOD…
HELIOS
JASCO
RAITH
MIRA-STAN
MONOWAVE
TITAN
WOOLLAM-RC2
ICON-SPM
BET-DEGASSER
RIE-CHLORINE
FUMEHOOD…
LYRA
MAGNETRON
UHV-DEPOSITION
SUSS-MA8
ELECTROWORKSHOP
UHV-PREPARATION
UHV-LEIS
CRYOGENIC
TEGRAMIN
DRYING-OVEN-B1…
ML3-BABY
JAZ3-CHANNEL
DRIE
SUSS-WETBENCH
3D-PRUSA-BLACK
ALD-BENEQ
BET-ANAMET
NMR
R2-PECVD
BAMBULAB
BRILLOUIN
TORNADO-M4
SEE-SYSTEM
MECHANICAL…
L450
LEICACOAT-STAN
NANOSAM
SUSS-RCD8
FTIR
RIE-FLUORINE
NANOCALC
LaserMIRA
STEMI
SHAKER-B1.18
SUMMIT
nanoCT
SIMS
PARYLENE-SCS
SNOM-NANONICS
MIRA-EBL
RSA
nano-CT
SW-LAB
MINIFLEX
DIENER
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
SW-BEAMER
THEORY-SUPPORT
SW-TRACER
VACUUM-OVEN-B1…
UHV…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
UHV-CLUSTER
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV…
UHV-SPM
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
PECVD
UHV-PLD
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-MBE
UHV-XPS
MIRKA
NANO-ONE-2PP
TEM-SW
FUMEHOOD-HF
LECTROPOL
EVAPORATOR
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
DIMPLING…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
SPONGEBOB
DHR
VNA-MPI
CEITEC-NANO
MPS150
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
TUBE-FURNACE
SW-CT
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
VERSALAB
CRYOMILL
DAWN-HELEOS
PECVD-NANOFAB
PARYLENE-DIENER
DSC-DISCOVERY
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
DEKTAK
LABOTOM5
WOOLLAM-MIR
CITOPRESS
LPCVD-polySi
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
LPCVD-SiN
LITESCOPE-MIRA…
LEICACOAT-NANO
FISCHIONE-TEM…
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
KAUFMAN
LITESCOPE-LYRA
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Tmejová, Kateřina
U Tmejová, Kateřina
Saldan, Ivan
U Tmejová, Kateřina
T Kicmerova, Dina
Valadi Palliyalil, Anjali
U Kicmerova, Dina
Mikerásek, Vojtěch
Kumar, Sanjay
Kumar, Sanjay
Kumar, Sanjay
Pekárková, Jana
Fatima, Areej
Beliančínová, Beáta
T Roupcová, Pavla
T Roupcová, Pavla
Daradkeh, Samer
paiva de araujo, Estacio
Konečný, Martin
Iakoubovskii, Konstantin
Molnár, Tomáš
Molnár, Tomáš
SAHIL, Muhammad
Spousta, Jiří
Iakoubovskii, Konstantin
Iakoubovskii, Konstantin
Valadi Palliyalil, Anjali
Říhová, Martina
Říhová, Martina
Vařeka, Karel
Vařeka, Karel
Říhová, Martina
Říhová, Martina
MURTAS, DAVIDE
Lišková, Zuzana
Paredes Sánchez, Claudia
Pribytova, Ekaterina
Ullattil, Sanjay Gopal
Valadi Palliyalil, Anjali
Foltýn, Michael
Michalička, Jan
T Franta, Daniel
Cuccu, Elisa
Fallahpour, Mojdeh
Tsalagkas, Dimitrios
Surana, Karan Singh
Surana, Karan Singh
B Fecko, Peter
Fecko, Peter
Ullattil, Sanjay Gopal
Valadi Palliyalil, Anjali
S Šamořil, Tomáš
Otýpka, Martin
Jakub, Zdeněk
Fecko, Peter
Kumar, Sanjay
Jakub, Zdeněk
Vaníčková, Elena
Pribytova, Ekaterina
Skálová, Zdenka
Valadi Palliyalil, Anjali
Fecko, Peter
Iakoubovskii, Konstantin
Fecko, Peter
MURTAS, DAVIDE
Polčák, Josef
Formánek, Šimon
Surana, Karan Singh
B Jewula, Pawel
Janů, Lucie
T Spusta, Tomáš
Krčma, Jakub
Spotz, Zdeněk
T Polášková, Kateřina
Varga, Dominik
Slovák, Vojtěch
Paredes Sánchez, Claudia
S Danchuk, Viktor
Fecko, Peter
Janů, Lucie
Fecko, Peter

Upcoming trainings

Show more

Term Name Description Max. attendees
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 09:00 - 12:00 SEE SYSTEM training Training in contact angle measurements and surface free energy determination. Meeting point in front of the User office. Attendees: Jiří Strnad 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 10:15 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko 2
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
21.8. 10:15 - 11:00 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko 2
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Andrej Juríček, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3