Friday 19.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
WITEC-RAMAN
AMBER
ML3-BABY
MIRA-EBL
EVAPORATOR
MIRA-STAN
SUSS-WETBENCH
DHR
LAKESHORE
VERSALAB
UHV-PREPARATION
DRIE
LITESCOPE-MIRA…
TITAN
RAITH
TGA-DISCOVERY
LIBS-FireFly
UHV-XPS
UHV-LEEM
CRYOGENIC
HELIOS
ICON-SPM
ALD-FIJI
UHV-LEIS
FTIR-CHEMLAB
TUBE-FURNACE
VERIOS
NANOSCAN
SCIA
WOOLLAM-MIR
STEMI
NANOCALC
RSA
SUMMIT
SHAKER-B1.18
SNOM-NANONICS
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
RIE-CHLORINE
nano-CT
SAW-ACCUTOM
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SPINCOATER…
nanoCT
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
RIE-FLUORINE
MINIFLEX
BET-ANAMET
Test O2
SW-BEAMER
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
ZEISS-NANO
TEST2
Test školení
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-SPM
ULTRACENTRIFUGE
NANO-ONE-2PP
NMR
LYRA
SW-CT
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
TIC3X
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
CLARUS-680
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
Micromex
WOOLLAM-VIS
WOOLLAM-RC2
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LIBS-Discovery
DEKTAK
LABOTOM5
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSAM
NIKON-NANO
NIRQUEST512
LIBS-LabSys1
LAURELL-NANO
micro-CT-L240
CHEMLAB-B1.14
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
LASER-DICER
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER
Polčák, Josef
Valiyev, Rasul
Šárfy, Pavlína
Daradkeh, Samer
Liška, Jiří
Iakoubovskii, Konstantin
Daradkeh, Samer
Iakoubovskii, Konstantin
Kolíbalová, Eva
Iakoubovskii, Konstantin
Petrosyan, Derenik
Petrosyan, Derenik
Davidková, Kristyna
Davidková, Kristyna
Davidková, Kristyna
Petrosyan, Derenik
Dao, Radek
Surana, Karan Singh
Davidková, Kristyna
Petrosyan, Derenik
T Lepcio, Petr
Holcman, Vladimír
Klimek, Jan
Stará, Veronika
T Eliáš, Marek
Dao, Radek
Huang, Yong
Holobrádek, Jakub
Žaloudková, Lucie
Zikmundová, Eva
Stará, Veronika
Stará, Veronika
Lukiienko, Iryna
Ali, Hasan
Kubinec, Ondrej
Eliáš, Marek
Průša, Stanislav
Sanna, Carolina
Havelka, Tomáš
Vijithra, Vijithra
Kovařík, Martin
Davidková, Kristyna
Franta, Daniel

Upcoming trainings

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Term Name Description Max. attendees
19.6. 09:30 - 12:00 DRIE-training Attendees: Matej Dinis, Jiří Strnad 3
19.6. 13:00 - 15:30 DHR 2/2 Finish the basic rheology training with a hands-on session. Attendees: Amirmohsen Fanisaberi 1
22.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Hyesung Lee, Pedro Henrique de Oliveira Santiago 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB Attendees: DAVIDE MURTAS 5
23.6. 09:30 - 12:00 DHR 2/2 Finish the basic rheology training with a hands-on session. Attendees: Carolina Sanna 1
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Šimon Krútek, Debika Devi Thongam 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: DAVIDE MURTAS 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Debika Devi Thongam, DAVIDE MURTAS 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Debika Devi Thongam 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson 4
24.6. 10:00 - 11:30 JASCO training Description of holders and software, basic measurement Attendees: Martina Říhová, David Pavliňák 2
24.6. 13:00 - 15:00 Leicacoat-NANO training Attendees: Michela Sanna, Samer Daradkeh 2
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2
30.6. 10:00 - 12:00 ICON-SPM basic training Attendees: Dimitrios Tsalagkas, Sharmistha Dey 3
2.7. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Nikol Kaděrová, Ying Hu 2
22.7. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Sharmistha Dey 4
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh 3
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kateřina Polášková 3