Saturday 6.6.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-CHLORINE
VERSALAB
KEITHLEY-4200
VACUUM-OVEN-B1…
NANOINDENTER
TITAN
HELIOS
RIGAKU3
RIGAKU9
KRATOS-XPS
WOOLLAM-VIS
LAKESHORE
RSA
MIRA-EBL
SNOM-NANONICS
nano-CT
nanoCT
ICON-SPM
PARYLENE-SCS
NANO-ONE-2PP
SIMS
SEE-SYSTEM
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
LaserMIRA
SUSS-RCD8
MINIFLEX
PARYLENE-DIENER
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
RIE-FLUORINE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SW-TRACER
DIENER
SW-LAB
FISCHIONE-160
LEICA-TXP
CITOVAC
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
UHV-PREPARATION
UHV…
TENUPOL
Heliscan
NANOSCAN
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-CLUSTER
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
NANOSAM
ML3-BABY
CITOPRESS
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUMEHOOD…
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
MONOWAVE
KERR-MICROSCOPE
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
PROTOMAT
LVEM
HENRY-MAGNET
LIBS-FireFly
MAGNETRON
MAGNETRON-AJA
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
LIBS-Discovery
LAURELL-NANO
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
CHEMLAB-B1.14
LASER-DICER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
R2-PECVD
UV-LASER
Eliáš, Marek
Daradkeh, Samer
Patil, Virendra
Lepcio, Petr
Daghbouj, Nabil
Ali, Hasan
Daghbouj, Nabil
Daradkeh, Samer
Lukiienko, Iryna
Daradkeh, Samer
Duchaň, Marek
Holcman, Vladimír

Upcoming trainings

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Term Name Description Max. attendees
8.6. 09:00 - 17:30 Amber Practice Attendees: Rostislav Řepa, Jakub Šťastný 2
8.6. 09:00 - 11:00 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Veronika Sevriugina, Lucie Žaloudková 4
9.6. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nikol Kaděrová 3
9.6. 09:30 - 10:30 ULTRASONIC-PROBE Basic training for sample dispersion with the ultrasonic probe. The meeting point is at the Chemical Laboratory (B1.15). Attendees: Ying Hu 2
9.6. 09:30 - 14:00 miniflex in front of entrance to sTAN Attendees: Samer Daradkeh 2
10.6. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Nabil Daghbouj, Mohamed Bensalem, Ondřej Šik 4
11.6. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nikol Kaděrová 1
11.6. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.6. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2
16.6. 08:30 - 15:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Hasan Ali 3
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB 5
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis 10
24.6. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Rosmi Vinson, Sharmistha Dey 4
25.6. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva 2