Sunday 1.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RAITH
WOOLLAM-VIS
VERSALAB
KRATOS-XPS
RIGAKU9
KEITHLEY-4200
EVAPORATOR
CHEMLAB-B1.14
CRYOGENIC
MPS150
PARYLENE-SCS
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
LaserMIRA
SIMS
SEE-SYSTEM
nanoCT
SUMMIT
SHAKER…
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
nano-CT
DIENER
MINIFLEX
PECVD
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
RIE-CHLORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SW-TRACER
RIE-FLUORINE
SW-LAB
AMBER
LEICA-TXP
CITOVAC
UHV-PREPARATION
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
TENUPOL
Heliscan
FISCHIONE-160
NANOSAM
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-SPM
UHV-MBE2
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
NIKON-NANO
DSC-DISCOVERY
NANOSCAN
FLOWBOX
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
HELIOS
CRYOMILL
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
SW-CT
TIC3X
Micromex
VACUUM_OVEN…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CLARUS-680
micro-CT-L240
CITOPRESS
KERR-MICROSCOPE
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
LIBS-Discovery
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
GLOVEBOX…
MONOWAVE
LIBS-LabSys1
LIBS-FireFly
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.18
LAURELL-NANO
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
R2-PECVD
LASER-DICER
UV-LASER
Lišková, Zuzana
Knoblochová, Alžběta
Daradkeh, Samer
Daradkeh, Samer
Caha, Ondřej
Patil, Virendra
S Prášek, Jan
Daradkeh, Samer
Lukiienko, Iryna

Upcoming trainings

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Term Name Description Max. attendees
2.2. 08:30 - 11:00 Woollam RC2 First part of training Attendees: Nima Bolouki 1
2.2. 15:00 - 17:00 SUSS Wetbench training Training of the new user Attendees: Laiba Bajwa 2
3.2. 10:00 - 13:00 Tornado-M4 Attendees: Samer Daradkeh, Konstantin Iakoubovskii 3
3.2. 13:30 - 16:30 Evaporator EN Standard training in English Attendees: Radim Slovák, Laiba Bajwa 2
4.2. 13:00 - 15:00 Laser Dicer training Attendees: Iryna Lukiienko, Jozef Štálnik, Radim Slovák 3
5.2. 09:30 - 13:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 3
5.2. 13:00 - 15:30 MIRA-STAN for returning and Lyra users Renewal training for returning users. Attendees: Ekaterina Pribytova, Eduard Jelínek 2
6.2. 08:30 - 11:00 LYRA advanced training - EDS analysis The training focused on the elemental analysis by EDS. We will meet in the LYRA lab. Attendees: Kryštof Jasenský, Marek Eliáš 3
9.2. 09:30 - 11:00 RIE-flourine- training Attendees: Ekaterina Pribytova, Franz Vilsmeier, Fabian Majcen, Kryštof Matějka 3
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh 4
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab 10