Friday 18.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
ICON-SPM
KRATOS-XPS
MPS150
KEITHLEY-4200
RIGAKU3
LITESCOPE-MIRA…
LEICACOAT-STAN
KERR-MICROSCOPE
R2-PECVD
DRIE
SUSS-WETBENCH
VERIOS
TGA-DISCOVERY
VERSALAB
DRYING-OVEN-B1…
WITEC-RAMAN
MAGNETRON-AJA
EVAPORATOR
TEM-SW
UHV-DEPOSITION
UHV-LEEM
FUMEHOOD-HF
UHV-XPS
TITAN
CHEMLAB-B1.14
NANO-ONE-2PP
KAUFMAN
NANOCALC
LYRA
CRYOGENIC
LVEM
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
RIE-CHLORINE
DIENER
WOOLLAM-VIS
4-POINT
PECVD
HELIOS
UHV-PREPARATION
ALD-BENEQ
L450
VACUUM_OVEN-C1…
TIC3X
ULTRAFAST-LASER
LEXT
UHV-SPM
UHV-FTIR
RIGAKU9
FTIR
CITOVAC
PARYLENE-SCS
VACUUM-OVEN-B1…
SNOM-NANONICS
VACUUM-OVEN-B1…
MIRA-EBL
VUVAS
VISCOMETER
RSA
UHV-CLUSTER
WIRE-BONDER
XEF2
nano-CT
SEE-SYSTEM
nanoCT
MINIFLEX
microCT
RIE-FLUORINE
ZWICK
SUSS-RCD8
ACCURION_RSE
RTP
ZETASIZER
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
SIMS
LaserMIRA
UHV…
DWL
UHV-MBE2
UHV-MBE1
UHV-LEIS
Heliscan
THEORY-SUPPORT
TGA96
ULTRASONIC…
TEST-RFID2
Test školení
TEST2
US-CUTTER
Test O2
Test Ondra 3
AMBER
FISCHIONE-160
SUMMIT
JASCO
TENUPOL
LEICA-TXP
SW-TRACER
SW-LAB
SW-BEAMER
BET-ANAMET
UHV…
STEMI
JAZ3-CHANNEL
UHV-MBE
UHV-PLD
FTIR-CHEMLAB
SHAKER-B1.18
TEST-RFID4
WOOLLAM-MIR
3D-PRUSA-ORANGE
FTIRMAG
DIMPLING…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FUMEHOOD…
DHR
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
PARYLENE-DIENER
SW-CT
micro-CT-L240
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BRILLOUIN
CRYOMILL
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
CPD
Micromex
micro-CT-m300
3D-PRUSA-BLACK
MONOWAVE
LAKESHORE
PROTOMAT
HENRY-MAGNET
LABOTOM5
3D-PRUSA-XL
ML3-BABY
DSC-DISCOVERY
CITOPRESS
LPCVD-polySi
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LPCVD-SiN
LITESCOPE-LYRA
DAWN-HELEOS
IS-NOVOCONTROL
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-LabSys1
SCIA
FISCHIONE-TEM…
IR-RAMAN
K70
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Kovařík, Martin
Ulč, Filip
Virágová, Eliška
Žaloudková, Lucie
MURTAS, DAVIDE
Fu, Hongbo
Surana, Karan Singh
Ulč, Filip
Vymazal, Jan
Vymazal, Jan
Vymazal, Jan
Vymazal, Jan
Vymazal, Jan
Kelarová, Štěpánka
Polášková, Kateřina
Ondračka, Pavel
Čechal, Jan
Hrdý, Radim
Citterberg, Daniel
Šimůnková, Helena
Hrdý, Radim
Citterberg, Daniel
Šimůnková, Helena
Nghiem, Xuan Duc
Žaloudková, Lucie
Tkachenko, Serhii
Kovařík, Martin
Ulč, Filip
Ulč, Filip
Fu, Hongbo
Bednaříková, Vendula
SAHIL, Muhammad
SAHIL, Muhammad
U Janů, Lucie
Polášková, Kateřina
Jelínek, Eduard
Arregi Uribeetxebarria, Jon Ander
Dinis, Matej
Prášek, Jan
Cao, Hoang-Anh
Surana, Karan Singh
Pavliňák, David
Sanna, Carolina
Otýpka, Martin
Danchuk, Viktor
Štindl, Jáchym
Štindl, Jáchym
T Spotz, Zdeněk
Spotz, Zdeněk
B Jasenský, Kryštof
Arregi Uribeetxebarria, Jon Ander
Šimůnková, Helena
U Prášek, Jan
Huang, Yong
U Danchuk, Viktor
Hrůza, Dominik
Citterberg, Daniel
Hrůza, Dominik
Duchoň, Jan
Štindl, Jáchym
Slovák, Michal
Prášek, Jan
Dinis, Matej
S Šamořil, Tomáš
S Danchuk, Viktor
Surana, Karan Singh
Prášek, Jan
U Franta, Daniel
Dinis, Matej
Jelínek, Eduard
Eliáš, Marek
Strnad, Jiří
Duchaň, Marek
T Danchuk, Viktor
Cuccu, Elisa
Kolíbalová, Eva
Hrůza, Dominik
Fecko, Peter
Jelínek, Adam
Otýpka, Martin
T Man, Ondřej
Arregi Uribeetxebarria, Jon Ander
Mathew, Grigory
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
18.9. 09:00 - 13:00 TIC3X_basic TIC3X_basic: training for new users Attendees: Eliška Šiška Virágová 2
18.9. 12:00 - 13:00 4-Point Probe Basic training Attendees: Sharmistha Dey 2
21.9. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Daniel Burda, Vladislav Dvořák, Nikola Papež 3
21.9. 12:30 - 13:00 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Jakub Máčala, Saleh Hekmat Saleh Fawaeer, Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh, Tomáš Henzl, Filip Janík 10
22.9. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: Sujan Maity, Matthias Knopf, Stefan Schultschik 2
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Jakub Máčala, Maneesha Ramesh, Filip Janík 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10