Friday 4.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
VERIOS
ML3-BABY
DEKTAK
RIGAKU3
SUSS-WETBENCH
MIRA-STAN
VERSALAB
UHV-XPS
RAITH
FUMEHOOD…
TITAN
R2-PECVD
FUMEHOOD…
LAURELL-NANO
FUMEHOOD…
CRYOGENIC
KERR-MICROSCOPE
MAGNETRON
PECVD
SUSS-MA8
MONOWAVE
HELIOS
SPINCOATER…
RIE-FLUORINE
ICON-SPM
NANOCALC
BET-ANAMET
UHV-SPM
VACUUM_OVEN-C1…
FTIR-CHEMLAB
VACUUM-OVEN-B1…
WITEC-RAMAN
RIGAKU9
LYRA
NANO-ONE-2PP
DRIE
LEICACOAT-STAN
BET-DEGASSER
DRYING-OVEN-B1…
LEICA-TXP
STEMI
ALD-FIJI
SW-BEAMER
SW-LAB
SW-TRACER
EVAPORATOR
TENUPOL
DISCO-DICING…
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
FISCHIONE-160
SHAKER-B1.18
BAMBULAB
nanoCT
ACCURION_RSE
TORNADO-M4
SUSS-RCD8
DIENER
BRILLOUIN
RIE-CHLORINE
MINIFLEX
nano-CT
THEORY-SUPPORT
RSA
MIRA-EBL
SNOM-NANONICS
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
TGA96
TGA-DISCOVERY
Heliscan
L450
ARES
FTIR
CITOVAC
VACUUM-OVEN-B1…
APCVD-Diffusion
VUVAS
VISCOMETER
WIRE-BONDER
JAZ3-CHANNEL
ALD-BENEQ
XEF2
GLOVEBOX…
MPS150
microCT
ZWICK
ZETASIZER
MAGNETRON-AJA
JASCO
Q-LAB
NANOWIZARD
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
DWL
APCVD
UHV-CLUSTER
UHV…
UHV…
UHV-PREPARATION
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
RTP
MIRKA
MECHANICAL…
CHEMLAB-B1.18
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
SW-CT
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
IS-NOVOCONTROL
TEGRAMIN
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
VNA-MPI
DAWN-HELEOS
LASER-DICER
DIMPLING…
R4…
FLOWBOX
LECTROPOL
SPONGEBOB
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
micro-CT-m300
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
CLARUS-680
Micromex
micro-CT-L240
CRYOMILL
TIC3X
SAW-ACCUTOM
ZEISS-NANO
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
DSC-DISCOVERY
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
CEITEC-NANO
ELECTROWORKSHOP
TUBE-FURNACE
3D-PRUSA-XL
LIBS-FireFly
LAKESHORE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
CPD
LPCVD-polySi
LPCVD-SiN
MINIEVAP
WOOLLAM-MIR
PROTOMAT
LVEM
LEXT
HENRY-MAGNET
SW-COMSOL
WOOLLAM-RC2
CLR-ISO8-Lab…
LABOTOM5
UV-LASER
T Polčák, Josef
Nandi, Sunny
Daradkeh, Samer
Polášková, Kateřina
T Kicmerova, Dina
Nandi, Sunny
Šťastný, Přemysl
Supalová, Linda
Jelínek, Eduard
Jelínek, Eduard
Figura, Daniel
T Roupcová, Pavla
Bednaříková, Vendula
Supalová, Linda
Cuccu, Elisa
Valadi Palliyalil, Anjali
Mařák, Vojtěch
Pham, Sy Nguyen
Daradkeh, Samer
Molnár, Tomáš
Jakub, Zdeněk
Cuccu, Elisa
Holobrádek, Jakub
Valadi Palliyalil, Anjali
Bajwa, Laiba Asad
S Michalička, Jan
Bolouki, Nima
Figura, Daniel
Figura, Daniel
Figura, Daniel
T Danchuk, Viktor
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Cuccu, Elisa
Figura, Daniel
Ullattil, Sanjay Gopal
Bahadur, Fateh
Bajwa, Laiba Asad
Supalová, Linda
B Gablech, Evelína
Jelínek, Eduard
Tmejová, Kateřina
Jakub, Zdeněk
Dey, Sharmistha
Poláková, Veronika
Valiyev, Rasul
Devi Thongam, Debika
Varshney, Devanshu
S Šamořil, Tomáš
T Sanna, Michela
Jelínek, Eduard
Mařák, Vojtěch
Tmejová, Kateřina
Valadi Palliyalil, Anjali

Upcoming trainings

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Term Name Description Max. attendees
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Karan Singh Surana 3
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10