Sunday 31.5.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
AMBER
VACUUM-OVEN-B1…
UHV-XPS
WOOLLAM-VIS
VNA-MPI
KRATOS-XPS
FUMEHOOD…
SPONGEBOB
VERSALAB
CRYOGENIC
MAGNETRON
CHEMLAB-B1.14
ICON-SPM
RSA
SNOM-NANONICS
MIRA-EBL
SIMS
PARYLENE-SCS
SUMMIT
SEE-SYSTEM
LaserMIRA
nanoCT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
nano-CT
DIENER
MINIFLEX
PECVD
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
RIE-CHLORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SW-TRACER
RIE-FLUORINE
SW-LAB
NanoOne250
LEICA-TXP
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VUVAS
UHV-PREPARATION
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
TENUPOL
Heliscan
FISCHIONE-160
NANOSAM
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV…
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
UHV-CLUSTER
NIKON-NANO
ML3-BABY
NANOSCAN
R4…
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
TIC3X
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
FUMEHOOD…
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
CITOPRESS
LVEM
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
LAURELL-NANO
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
LIBS-FireFly
LASER-DICER
CLARUS-680
TITAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
R2-PECVD
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Spousta, Jiří
Fu, Hongbo
Hrůza, Dominik
Duchaň, Marek
Pribytova, Ekaterina
Daradkeh, Samer
Tmejová, Kateřina
Tvrdoňová, Anna
Daradkeh, Samer
Pribytova, Ekaterina
U Prášek, Jan
Daradkeh, Samer

Upcoming trainings

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Term Name Description Max. attendees
2.6. 10:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Anjali Valadi Palliyalil, Lucie Žaloudková, Iosif Tantis 4
2.6. 11:30 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Anjali Valadi Palliyalil, Lucie Žaloudková, Iosif Tantis 4
3.6. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Ying Hu, Iosif Tantis, Carolina Sanna, Debika Devi Thongam 3
4.6. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Šimon Formánek, Iosif Tantis 2
8.6. 09:00 - 17:30 Amber Practice Attendees: Rostislav Řepa, Jakub Šťastný 2
9.6. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nikol Kaděrová 3
11.6. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nikol Kaděrová 1
11.6. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.6. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
15.6. 09:00 - 13:00 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna 2
22.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/324197360288872?p=8YaxjqMg8zpRrwFFMC ) Meeting ID: 324 197 360 288 872 Access code: hW3qJ6bB 5
23.6. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
23.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
23.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
23.6. 14:25 - 14:55 Safety excursion - Structural Analysis 10