Thursday 23.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
TITAN
RIGAKU3
EVAPORATOR
LVEM
MIRA-STAN
WOOLLAM-RC2
VERIOS
ELECTROWORKSHOP
DIENER
BRILLOUIN
UHV-XPS
DEKTAK
ALD-FIJI
WITEC-RAMAN
ICON-SPM
RAITH
FUMEHOOD…
MIRA-EBL
LAKESHORE
PARYLENE-SCS
UHV-DEPOSITION
FUMEHOOD-HF
MAGNETRON
UHV-LEIS
UHV-LEEM
HELIOS
LYRA
KERR-MICROSCOPE
DRYING-OVEN-B1…
TEST-RFID2
LIBS-FireFly
UHV-PREPARATION
BET-DEGASSER
BET-ANAMET
ZWICK
R2-PECVD
RIGAKU9
MAGNETRON-AJA
IS-NOVOCONTROL
ULTRACENTRIFUGE
L450
CHEMLAB-B1.18
NMR
TUBE-FURNACE
NANOSAM
NANOSCAN
NANOINDENTER
VERSALAB
micro-CT-L240
LITESCOPE-MIRA…
SHAKER-B1.18
STEMI
NANOCALC
SUMMIT
NANO-ONE-2PP
LaserMIRA
RIE-CHLORINE
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
RIE-FLUORINE
MINIFLEX
SEE-SYSTEM
nanoCT
nano-CT
RSA
SW-LAB
SNOM-NANONICS
SIMS
SW-BEAMER
TEST-RFID4
SW-TRACER
FTIR
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV…
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
MIRKA
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-SPM
SAW-ACCUTOM
ML3-BABY
PECVD
4-POINT
DRIE
DHR
DIMPLING…
SPONGEBOB
LECTROPOL
R4…
FLOWBOX
FTIRMAG
CRYOMILL
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
SW-CT
TIC3X
micro-CT-m300
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
BAMBULAB
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
Micromex
DAWN-HELEOS
TEM-SW
MONOWAVE
PROTOMAT
HENRY-MAGNET
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
CITOPRESS
LPCVD-SiN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
CRYOGENIC
LPCVD-polySi
TEGRAMIN
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
SCIA
KAUFMAN
SUSS-WETBENCH
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Polčák, Josef
Dey, Sharmistha
Polášková, Kateřina
Kovařík, Martin
Lee, Hyesung
Kolíbalová, Eva
Řepa, Rostislav
S Michalička, Jan
Procházková, Anna
Daradkeh, Samer
Bednaříková, Vendula
Burda, Daniel
Supalová, Linda
Surana, Karan Singh
Říhová, Martina
Ulč, Filip
AL Soud, Ammar
T Franta, Daniel
Rusnaková, Nicole
T Kicmerova, Dina
Saldan, Ivan
Staňo, Michal
Spusta, Tomáš
Supalová, Linda
Supalová, Linda
Krčma, Jakub
Pavelka, Dominik
Jakub, Zdeněk
Molnár, Tomáš
Liška, Jiří
Fecko, Peter
Song, Yanzhen
Supalová, Linda
Kepič, Peter
Kalleshappa, Bindu
Hrdinová, Sára
Bakhshikhah, Mahan
Mukherjee, Aniket
Liška, Jiří
Holcman, Vladimír
Jakešová, Marie
Endstrasser, Zdeněk
Fecko, Peter
Papež, Nikola
Bábor, Petr
Endstrasser, Zdeněk
Bahadur, Fateh
S Šamořil, Tomáš
Arregi Uribeetxebarria, Jon Ander
Štindl, Jáchym
Spusta, Tomáš
Zikmundová, Eva
Endstrasser, Zdeněk
AL Soud, Ammar
AL Soud, Ammar
Fu, Hongbo
Mukherjee, Aniket
Arregi Uribeetxebarria, Jon Ander
U Klíma, Jan
AL Soud, Ammar
Saldan, Ivan
Kolář, David
U Tmejová, Kateřina
Kotásková, Lucie
Rovenská, Katarína
S Danchuk, Viktor
Kovařík, Martin
B Gablech, Evelína
Hrdinová, Sára
Kolář, David
Ulč, Filip

Upcoming trainings

Show more

Term Name Description Max. attendees
23.7. 09:00 - 11:00 RC2 The first part of the training Attendees: Sharmistha Dey 1
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Ondrej Kubinec, Debika Devi Thongam 3
24.7. 09:00 - 23.7. 14:00 Nanoindenter basic training Attendees: Rasul Valiyev, Dimitrios Tsalagkas 2
24.7. 09:30 - 13:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. Attendees: Lukáš Zezulka, Roshan Velluvakandy, Vladislav Dvořák 3
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Debika Devi Thongam 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ondrej Kubinec 1
27.7. 09:30 - 13:30 ZWICK Meeting point is in front of the Advanced Chemical laboratory. Obligatory prerequisites 1. Pass the Chemical laboratory safety excursion in Moodle (https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=173): 2. Answer the ZWICK applicant questionnaire 3. Read the ZWICK rules (mark the activity as complete with ✔️) 4. Bring your own sample Recommended prerequisites 5. Get familiar with the Layout for ZWICK basic training (mark the activity as complete with ✔️) Attendees: Rasul Valiyev 2
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 2
30.7. 09:00 - 13:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Ivan Saldan, Sára Hrdinová, Debika Devi Thongam 1
30.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Franc Paré Estalella 2
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1