Tuesday 14.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
WITEC-RAMAN
EVAPORATOR
MIRA-STAN
FUMEHOOD…
ML3-BABY
VERIOS
LEICACOAT-NANO
MIRA-EBL
MPS150
NMR
VACUUM_OVEN-C1…
SUSS-MA8
ICON-SPM
PARYLENE-SCS
DIENER
MECHANICAL…
KEITHLEY-4200
AMBER
KRATOS-XPS
CRYOGENIC
CHEMLAB-B1.14
FUMEHOOD-HF
LITESCOPE-MIRA…
FUMEHOOD…
UHV-XPS
LAKESHORE
SEE-SYSTEM
CHEMLAB-B1.16
UHV-LEEM
WOOLLAM-MIR
IS_NOVOCONTROL
TGA-DISCOVERY
CHEMLAB-B1.18
WOOLLAM-RC2
TITAN
MAGNETRON
UHV-PREPARATION
SNOM-NANONICS
ZEISS-NANO
RIGAKU3
ALD-BENEQ
ZWICK
ALD-FIJI
BAMBULAB
BRILLOUIN
PARYLENE-DIENER
TUBE-FURNACE
MINIFLEX
LEICACOAT-STAN
LITESCOPE-LYRA
VACUUM-OVEN-B1…
LIBS-FireFly
TIC3X
JAZ3-CHANNEL
ULTRAFAST-LASER
R4…
SPONGEBOB
DWL
RAITH
FTIR-CHEMLAB
FTIR
VERSALAB
RIE-CHLORINE
SHAKER-B1.18
SUMMIT
NANOCALC
STEMI
RSA
BET-ANAMET
SUSS-RCD8
nano-CT
SW-BEAMER
SIMS
LaserMIRA
nanoCT
3D-PRUSA-XL
SW-LAB
VACUUM-OVEN-B1…
UHV-CLUSTER
UHV…
UHV…
ULTRASONIC…
US-CUTTER
JASCO
CITOVAC
VUVAS
UHV-PLD
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZETASIZER
UHV-SPM
UHV-MBE
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TGA96
UHV-LEIS
THEORY-SUPPORT
RTP
Heliscan
UHV-MBE2
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
ACCURION_RSE
MONOWAVE
Q-LAB
FTIRMAG
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
HELIOS
LYRA
4-POINT
FUMEHOOD…
DIMPLING…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DRYING-OVEN-B1…
DHR
TEGRAMIN
TORNADO-M4
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BET-DEGASSER
CEITEC-NANO
DRIE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
CRYOMILL
SW-CT
DAWN-HELEOS
VNA-MPI
SPINCOATER…
WOOLLAM-VIS
LABOTOM5
DSC-DISCOVERY
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
ULTRACENTRIFUGE
HENRY-MAGNET
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
DEKTAK
KERR-MICROSCOPE
PECVD-NANOFAB
K70
FRASCAN
NANOINDENTER
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
R2-PECVD
LVEM
LASER-DICER
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LPCVD-polySi
LPCVD-SiN
PROTOMAT
UV-LASER
Tvrdoňová, Anna
Povey, Rhys Geoffrey
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Koňařík, Lukáš
Supalová, Linda
Tvrdoňová, Anna
Bajwa, Laiba Asad
Koňařík, Lukáš
Koňařík, Lukáš
Petrosyan, Derenik
Janoušek, Tomáš
Janoušek, Tomáš
paiva de araujo, Estacio
Pazourek, Petr
Supalová, Linda
T Prášek, Jan
Bajo, Viktor
Otýpka, Martin
Supalová, Linda
Žaloudková, Lucie
Kovařík, Martin
Tkachenko, Serhii
Jewula, Pawel
U Jewula, Pawel
Jewula, Pawel
Tvrdoňová, Anna
Povey, Rhys Geoffrey
Koňařík, Lukáš
T Kicmerova, Dina
Janoušek, Tomáš
Jadhao, Pranjali
Yuan, Yunhuan
Vijithra, Vijithra
Bajo, Viktor
Štálnik, Jozef
Supalová, Linda
Kovařík, Martin
Jewula, Pawel
Jewula, Pawel
Danchuk, Viktor
Zdeg, Ikram
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Janůšová, Martina
Kramář, Jan
Tvrdoňová, Anna
Bajwa, Laiba Asad
Bokaei Khelejan, Hatef
Bajwa, Laiba Asad
Varga, Dominik
Varga, Dominik
Supalová, Linda
Kovařík, Martin
Jelínek, Eduard
Kratochvílová, Ivana
Polčák, Josef
Pavliňák, David
Danchuk, Viktor
Lukiienko, Iryna
Jewula, Pawel
Lukiienko, Iryna
Kovařík, Martin
Tvrdoňová, Anna
Molnár, Tomáš
Holcman, Vladimír
Polášková, Kateřina
T Lepcio, Petr
Molnár, Tomáš
Franta, Daniel
Fu, Hongbo
Pavliňák, David
T Lepcio, Petr
Eliáš, Marek
S Michalička, Jan
Povey, Rhys Geoffrey
Molnár, Tomáš
Klok, Pavel
Lukiienko, Iryna
Fu, Jialin
Mirdamadi Khouzani, Sayed Hossein
Fu, Hongbo
Eliáš, Marek
Fecko, Peter
Krčma, Jakub
U Fecko, Peter
Havelka, Tomáš
T Spotz, Zdeněk
Tkachenko, Serhii
Klok, Pavel
T Lepcio, Petr
Vaňková, Karolína
Kramář, Jan
Bolouki, Nima
Arregi Uribeetxebarria, Jon Ander
Janůšová, Martina
Tvrdoňová, Anna
Hrdý, Radim
U Lišková, Zuzana
T Lepcio, Petr
Kelarová, Štěpánka
Lukiienko, Iryna

Upcoming trainings

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Term Name Description Max. attendees
14.4. 09:00 - 11:30 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Tomáš Janoušek 3
14.4. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Grigory Mathew, Rasul Valiyev 2
14.4. 10:00 - 10.4. 12:00 miniflex Attendees: Konstantin Iakoubovskii 3
14.4. 10:00 - 13:00 FTIR-CHEMLAB - transmission Transmission training Attendees: Sanjay Kumar, Virendra Patil, Saurabh Pathak 3
14.4. 13:30 - 13.4. 16:30 Evaporator CZ Standard training in the Czech language Attendees: Zuzana Košelová, Nikola Papež 2
16.4. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Carolina Oliver Urrutia, Aida Fazlič, Ondrej Kubinec 4
16.4. 09:30 - 12:00 DRIE-training Attendees: Niko Plantak, Jon Ander Arregi Uribeetxebarria 3
16.4. 10:00 - 11:30 JASCO training Description of holders and software, basic measurement Attendees: Amirmohsen Fanisaberi 3
17.4. 13:30 - 16:00 EBSD Verios/Helios (2/2) EBSD Verios/Helios (2/2): practical demonstration @ Helios Attendees: Karel Vařeka, Adam Očkovič, Mohamed Bensalem 5
20.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/31245607839153?p=QX552nhoP9PxXCL4FX) Meeting ID: 312 456 078 391 53 Access code: i5xd7zL3 5
21.4. 09:30 - 12:00 ICON-SPM basic training Attendees: Viktor Danchuk 3
21.4. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Petr Sysel, Thông Thái Trần, Rosmi Vinson 5
21.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
21.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Thông Thái Trần, Rosmi Vinson 10
21.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Carolina Oliver Urrutia, Thông Thái Trần, Rosmi Vinson 10
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik, Sujan Maity 3
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
23.4. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Karan Singh Surana 1
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta 4