Tuesday 14.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
SUSS-WETBENCH
KRATOS-XPS
WOOLLAM-RC2
WITEC-RAMAN
VERSALAB
RIE-FLUORINE
R2-PECVD
WOOLLAM-VIS
VERIOS
NANOINDENTER
DRYING-OVEN-B1…
TITAN
MIRA-EBL
CRYOGENIC
LAKESHORE
UHV-XPS
HELIOS
LYRA
ICON-SPM
LEICACOAT-NANO
SCIA
DRIE
CLARUS-680
micro-CT-L240
BET-ANAMET
VNA-MPI
ML3-BABY
RAITH
VUVAS
LEICACOAT-STAN
BET-DEGASSER
BAMBULAB
VACUUM-OVEN-B1…
CITOPRESS
NIKON-NANO
DSC-DISCOVERY
RIGAKU3
DIENER
ALD-BENEQ
SPINCOATER…
SAW-ACCUTOM
NANOCALC
SW-TRACER
SW-LAB
SW-BEAMER
Q-LAB
MIRKA
STEMI
PECVD
MINIFLEX
SUMMIT
RTP
SHAKER-B1.18
nanoCT
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
ACCURION_RSE
SNOM-NANONICS
SUSS-RCD8
RSA
TENUPOL
RIE-CHLORINE
nano-CT
LEICA-TXP
TEST-RFID2
FISCHIONE-160
FTIR
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV…
VACUUM-OVEN-B1…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV-PREPARATION
UHV…
AMBER
Heliscan
Test Ondra 3
Test O2
TEST2
Test školení
PARYLENE-DIENER
TEST-RFID4
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-CLUSTER
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
TEM-SW
NANO-ONE-2PP
3D-PRUSA-ORANGE
4-POINT
DHR
DIMPLING…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
CRYOMILL
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
micro-CT-m300
3D-PRUSA-BLACK
WOOLLAM-MIR
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
LPCVD-polySi
MONOWAVE
NANOSCAN
NANOSAM
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LPCVD-SiN
LITESCOPE-MIRA…
DAWN-HELEOS
FISCHIONE-TEM…
TEGRAMIN
PECVD-NANOFAB
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
KAUFMAN
LITESCOPE-LYRA
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Vinson, Rosmi
Žaloudková, Lucie
Sanna, Michela
Wang, Yue
Jelínek, Eduard
Bakhshikhah, Mahan
Supalová, Linda
Janůšová, Martina
Mukherjee, Aniket
Kovařík, Martin
Přibyl, Roman
Přibyl, Roman
T Spotz, Zdeněk
Mařák, Vojtěch
Klimek, Jan
Molnár, Tomáš
T Eliáš, Marek
Supalová, Linda
Beliančínová, Beáta
Janůšová, Martina
S Nebojsa, Alois
Franta, Daniel
Janoušek, Tomáš
Wang, Yue
Štindl, Jáchym
S Michalička, Jan
Supalová, Linda
Klíma, Jan
Holcman, Vladimír
Hrubá, Daniela
Man, Ondřej
S Šamořil, Tomáš
Cuccu, Elisa
Sanna, Michela
Eliáš, Marek
Jelínek, Eduard
U Sanna, Michela
Kareš, Martin
Valadi Palliyalil, Anjali
Klíma, Jan
Jelínek, Eduard
Holobrádek, Jakub
Přibyl, Roman
Surana, Karan Singh
Bednaříková, Vendula
Fecko, Peter
Fanisaberi, Amirmohsen
T Holas, Jiří
T Supalová, Linda
Lepcio, Petr
Rossetti, Nicoló
Tvrdoňová, Anna
Eliáš, Marek

Upcoming trainings

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Term Name Description Max. attendees
14.7. 09:45 - 13.7. 10:15 Citopress training Attendees: Fateh Bahadur 1
14.7. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Elisa Cuccu, DAVIDE MURTAS 2
14.7. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Yue Wang, Debika Devi Thongam, Peter Fecko 4
14.7. 15:00 - 16:30 RIE-flourine-training Attendees: DAVIDE MURTAS 3
15.7. 09:00 - 17:30 Amber 2/2 Practice Attendees: Lukáš Zezulka 1
16.7. 09:00 - 11:00 Woollam IR-VASE First part of training Attendees: Luca Mascaretti 1
16.7. 10:00 - 10:45 Solvent fumehood training - ISO 5 clean room Training for a solvent fume hood. Attendees: DAVIDE MURTAS 2
16.7. 10:45 - 11:30 Etching Fumehood training - ISO5 cleanroom Training for Etching Fumehood. We will meet directly in ISO5 clean room. Attendees: DAVIDE MURTAS 2
20.7. 09:00 - 13.7. 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Debika Devi Thongam 2
20.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 354 620 049 035 61 Access code: 7AD77PX3 Attendees: Nikol Kaděrová, Redzic Milica, Cimolato Andrea, Le Thien 5
21.7. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Petr Sysel, Debika Devi Thongam 3
21.7. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Laiba Asad Bajwa, Jana Burdíková 5
21.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Nikol Kaděrová, Redzic Milica, Cimolato Andrea, Le Thien 5
21.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Vladislav Dvořák, Redzic Milica, Le Thien, Jana Burdíková, Laura Búšová 10
21.7. 14:25 - 14:55 Safety excursion - Structural Analysis 10
22.7. 09:00 - 10:30 JASCO training- CZ Description of holders and software, basic measurement Attendees: Marie Jakešová, Anna Tvrdoňová, Šimon Krútek 3
22.7. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Iosif Tantis, Debika Devi Thongam 4
22.7. 10:30 - 12:00 JASCO training - EN Description of holders and software, basic measurement Attendees: Laiba Asad Bajwa, Rosmi Vinson 2
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh, Ondrej Kubinec, Debika Devi Thongam 3
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Debika Devi Thongam 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ondrej Kubinec 1
27.7. 09:30 - 13:30 ZWICK Meeting point is in front of the Advanced Chemical laboratory. Obligatory prerequisites 1. Pass the Chemical laboratory safety excursion in Moodle (https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=173): 2. Answer the ZWICK applicant questionnaire 3. Read the ZWICK rules (mark the activity as complete with ✔️) 4. Bring your own sample Recommended prerequisites 5. Get familiar with the Layout for ZWICK basic training (mark the activity as complete with ✔️) Attendees: Rasul Valiyev 2
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Iosif Tantis, Debika Devi Thongam 2
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1