Saturday 8.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
AMBER
LVEM
LYRA
RIGAKU3
VACUUM-OVEN-B1…
VERSALAB
NANOSAM
KRATOS-XPS
WOOLLAM-VIS
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
MINIFLEX
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
nanoCT
RIE-CHLORINE
NMR
PECVD
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
NIRQUEST512
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
RIE-FLUORINE
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
NIKON-NANO
SUSS-RCD8
LEICA-TXP
DIENER
NANO-ONE-2PP
Test Ondra 3
TENUPOL
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VUVAS
UHV-PREPARATION
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
TGA-DISCOVERY
CITOPRESS
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE1
UHV…
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
NANOSCAN
ML3-BABY
MONOWAVE
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
TIC3X
FLOWBOX
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
DSC-DISCOVERY
LAKESHORE
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
R2-PECVD
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
LASER-DICER
KEITHLEY-4200
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
TITAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Iakoubovskii, Konstantin
Surana, Karan Singh
S Šamořil, Tomáš
AL Soud, Ammar
Fanisaberi, Amirmohsen
Daradkeh, Samer
S Danchuk, Viktor
Daradkeh, Samer

Upcoming trainings

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Term Name Description Max. attendees
11.8. 15:00 - 7.8. 16:50 CRYOGENIC DCR CRYOGENIK DCR Attendees: Ekaterina Pribytova 1
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, DAVIDE MURTAS 4
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3