Tuesday 17.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
VERIOS
ML3-BABY
KRATOS-XPS
MIRA-STAN
WITEC-RAMAN
RIE-FLUORINE
TEGRAMIN
UHV-XPS
RAITH
LEICACOAT-STAN
NANOSAM
CRYOGENIC
RIGAKU3
SCIA
WOOLLAM-RC2
R4…
UHV-SPM
HELIOS
LYRA
LITESCOPE-MIRA…
CHEMLAB-B1.16
SPONGEBOB
R2-PECVD
ZETASIZER
UHV-LEEM
FUMEHOOD…
FUMEHOOD…
NANOCALC
UHV-DEPOSITION
ICON-SPM
LASER-DICER
WOOLLAM-VIS
LIBS-FireFly
BET-DEGASSER
CHEMLAB-B1.14
NANOINDENTER
CHEMLAB-B1.18
TITAN
VACUUM_OVEN-C1…
RSA
DRYING_OVEN-B1…
VERSALAB
BET-ANAMET
DRIE
DHR
UHV-PREPARATION
SW-LAB
STEMI
SW-BEAMER
PARYLENE-SCS
SHAKER-B1.18
MINIFLEX
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-CHLORINE
nanoCT
SUMMIT
nano-CT
MIRA-EBL
SNOM-NANONICS
LEICA-TXP
SIMS
SEE-SYSTEM
LaserMIRA
SW-TRACER
3D-PRUSA-XL
TENUPOL
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ULTRAFAST-LASER
UHV…
FISCHIONE-160
TGA96
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
MIRKA
THEORY-SUPPORT
UHV-CLUSTER
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
SAW-ACCUTOM
DSC-DISCOVERY
PECVD
FTIRMAG
SW-CT
DIMPLING…
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
4-POINT
FUMEHOOD…
TIC3X
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
CRYOMILL
CPD
DAWN-HELEOS
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
micro-CT-m300
VNA-MPI
TEM-SW
NANOSCAN
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
MPS150
MONOWAVE
CITOPRESS
NIKON-NANO
HENRY-MAGNET
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
MAGNETRON
KERR-MICROSCOPE
PECVD-NANOFAB
K70
LEICACOAT-NANO
FRASCAN
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
LVEM
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
UV-LASER
Jelínek, Eduard
Tvrdoňová, Anna
Idesová, Beáta
Niapos, Eleftherios
Niapos, Eleftherios
Citterberg, Daniel
Citterberg, Daniel
Bednaříková, Vendula
Bednaříková, Vendula
Koňařík, Lukáš
Ronoh, Kipkurui
Jadhao, Pranjali
Jelínek, Eduard
Tvrdoňová, Anna
Niapos, Eleftherios
Citterberg, Daniel
Kumar, Sanjay
Fu, Jialin
Fu, Jialin
T Dao, Radek
Rotter, Marek
Kalleshappa, Bindu
Raad, Ryan
paiva de araujo, Estacio
Havelka, Tomáš
Tvrdoňová, Anna
Citterberg, Daniel
Havlíková, Tereza
Skálová, Zdenka
Hrůza, Dominik
Hrůza, Dominik
Delforge, Cyril
B Švarc, Vojtěch
Kalleshappa, Bindu
Bednaříková, Vendula
T Danchuk, Viktor
Danchuk, Viktor
Danchuk, Viktor
Lukiienko, Iryna
Šťastný, Přemysl
Bednaříková, Vendula
Niapos, Eleftherios
Raad, Ryan
Janů, Lucie
Hrůza, Dominik
U Man, Ondřej
Kramář, Jan
T Dao, Radek
T Sanna, Michela
Tvrdoňová, Anna
Janů, Lucie
T Sanna, Michela
Endstrasser, Zdeněk
Tvrdoňová, Anna
Jewula, Pawel
Jelínek, Eduard
Endstrasser, Zdeněk
Bakhshikhah, Mahan
Jelínek, Eduard
Franta, Daniel
Kratochvilová, Lucie
AL Soud, Ammar
Jewula, Pawel
Gablech, Evelína
T Sanna, Michela
T Michalička, Jan
T Danchuk, Viktor
Sevriugina, Veronika
Jewula, Pawel
Sobola, Dinara
AL Soud, Ammar
Jelínek, Eduard
Chamradová, Ivana
Endstrasser, Zdeněk

Upcoming trainings

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Term Name Description Max. attendees
17.2. 09:30 - 12:30 DLS-ZetaSizer Part 1+2 This training will provide hands-on practice with basic methods for measuring particle size using the DLS technique. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Ammar AL Soud 3
17.2. 14:00 - 15:00 Vacuum Drying Oven Vacuum Oven basic training Attendees: Sára Hrdinová 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
20.2. 08:30 - 14:30 LYRA advanced training - FIB, GIS, nanomanipulator The training focused on FIB, GIS, and the nanomanipulator. We will meet in the LYRA lab. Attendees: Pavel Klok, Cyril Delforge, Ivana Kratochvílová, Elisa Cuccu 4
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Jan Kotouček, Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Hasan Ali 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek, Hasan Ali 10
27.2. 08:30 - 11:00 LYRA basic training for MIRA experienced users The training focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Pavel Klok 4
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 09:30 - 11:30 MIRA-STAN for returning users Renewing the certificate for long-inactive users. Meeting point at the microscope. Attendees: Michela Sanna, Martin Kovařík 2
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4