Friday 31.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-XPS
UHV-SPM
KRATOS-XPS
MIRA-STAN
RIE-FLUORINE
JASCO
TITAN
TEGRAMIN
VERSALAB
EVAPORATOR
R2-PECVD
SUSS-WETBENCH
RIGAKU9
SIMS
LYRA
LAKESHORE
LAURELL-NANO
RAITH
UHV-DEPOSITION
SEE-SYSTEM
DHR
MIRA-EBL
LVEM
SW-CT
PARYLENE-SCS
WOOLLAM-RC2
K70
MAGNETRON-AJA
ICON-SPM
ZETASIZER
RIGAKU3
ACCURION_RSE
FTIR-CHEMLAB
ZWICK
ZEISS-STAN
MAGNETRON
NANOSAM
CHEMLAB-B1.18
WITEC-RAMAN
CHEMLAB-B1.16
STEMI
NANOCALC
SHAKER-B1.18
SUMMIT
LaserMIRA
NANO-ONE-2PP
MINIFLEX
SNOM-NANONICS
SPINCOATER…
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
Q-LAB
RSA
RTP
SUSS-RCD8
DIENER
RIE-CHLORINE
nanoCT
nano-CT
BET-ANAMET
Test Ondra 3
SW-BEAMER
VACUUM_OVEN-C1…
UHV…
UHV…
UHV-PREPARATION
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JAZ3-CHANNEL
FTIR
UHV-PLD
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
UHV-CLUSTER
UHV-MBE
SW-LAB
Test školení
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
3D-PRUSA-BLUE
Test O2
TEST2
TEST-RFID2
UHV-LEIS
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
3D-PRUSA-BLACK
ML3-BABY
ULTRACENTRIFUGE
FLOWBOX
CRYOMILL
DRIE
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
HELIOS
CPD
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
ZEISS-NANO
LABOTOM5
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
SUSS-MA8
DEKTAK
WOOLLAM-MIR
LITESCOPE-LYRA
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
LITESCOPE-MIRA…
LIBS-LabSys1
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
LIBS-Discovery
CHEMLAB-B1.14
IS-NOVOCONTROL
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
LASER-DICER
LIBS-FireFly
UV-LASER
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Janů, Lucie
Fatima, Areej
Lee, Hyesung
Remešová, Michaela
Vinson, Rosmi
Bednaříková, Vendula
Bakhshikhah, Mahan
Otýpka, Martin
Arenas Buelvas, Daina Dayana
Kotásková, Lucie
Kuběna, Ivo
Michalička, Jan
Ščasnovič, Erik
Mařák, Vojtěch
Hrdinová, Sára
Vijithra, Vijithra
Šimůnková, Helena
Jasenský, Kryštof
Janů, Lucie
Bolouki, Nima
Supalová, Linda
Bakhshikhah, Mahan
Staňo, Michal
Arregi Uribeetxebarria, Jon Ander
Bábor, Petr
S Šamořil, Tomáš
Holcman, Vladimír
Tvrdoňová, Anna
Bakhshikhah, Mahan
Hrůza, Dominik
Valiyev, Rasul
Kreuzerová, Monika
Supalová, Linda
S Kolíbalová, Eva
Kareš, Martin
Tvrdoňová, Anna
Rusnaková, Nicole
Klusák, Radovan
Arregi Uribeetxebarria, Jon Ander
Kubinec, Ondrej
Dinparvar, Sahar
T Roupcová, Pavla
Rusnaková, Nicole
Sevriugina, Veronika
Sevriugina, Veronika
Mařák, Vojtěch
Papež, Nikola
S Danchuk, Viktor
Kotásková, Lucie
T Spotz, Zdeněk
Kotásková, Lucie

Upcoming trainings

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Term Name Description Max. attendees
31.7. 15:30 - 17:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Sára Hrdinová 1
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10