Thursday 24.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
EVAPORATOR
RIE-FLUORINE
ML3-BABY
KRATOS-XPS
TITAN
MIRA-STAN
AMBER
FTIR-CHEMLAB
VERIOS
RIGAKU3
SUSS-MA8
WIRE-BONDER
MIRA-EBL
DRIE
NANO-ONE-2PP
FUMEHOOD…
FUMEHOOD…
UHV-DEPOSITION
UHV-LEEM
HELIOS
R4…
FUMEHOOD-HF
ICON-SPM
SCIA
NANOCALC
K70
PARYLENE-SCS
CRYOGENIC
RIE-CHLORINE
KERR-MICROSCOPE
MAGNETRON
SUSS-RCD8
3D-PRUSA-XL
NANOSAM
WOOLLAM-VIS
UHV-XPS
ULTRACENTRIFUGE
VACUUM_OVEN-C1…
SPONGEBOB
UHV-SPM
VERSALAB
BRILLOUIN
ALD-BENEQ
UHV-PREPARATION
BAMBULAB
nanoCT
VUVAS
MINIFLEX
RSA
nano-CT
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
SNOM-NANONICS
CITOVAC
FTIR
SIMS
VISCOMETER
UHV-PLD
DIENER
SAW-ACCUTOM
3D-PRUSA-ORANGE
TEM-SW
ZETASIZER
PECVD
MIRKA
ZWICK
SPINCOATER…
L450
Q-LAB
RTP
microCT
ACCURION_RSE
RIGAKU9
XEF2
SEE-SYSTEM
WITEC-RAMAN
SHAKER-B1.18
LaserMIRA
UHV-MBE1
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
ULTRAFAST-LASER
TGA-DISCOVERY
UHV-MBE2
Test školení
UHV…
UHV…
UHV-FTIR
UHV-CLUSTER
UHV-LEIS
UHV-MBE
3D-PRUSA-BLACK
TEST2
SUMMIT
SW-LAB
JAZ3-CHANNEL
JASCO
DWL
STEMI
BET-ANAMET
SW-BEAMER
SW-TRACER
Test O2
LEICA-TXP
US-CUTTER
TENUPOL
FISCHIONE-160
ULTRASONIC…
Test Ondra 3
TEST-RFID2
WOOLLAM-MIR
3D-PRUSA-BLUE
FLOWBOX
SW-CT
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
ELECTROWORKSHOP
LYRA
TIC3X
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BET-DEGASSER
MINIEVAP
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
ZEISS-NANO
WOOLLAM-RC2
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
DEKTAK
LIBS-Discovery
LABOTOM5
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
LIBS-LabSys1
LIBS-FireFly
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LAURELL-NANO
IS-NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
R2-PECVD
LASER-DICER
UV-LASER
Jelínek, Eduard
Koller, Philipp
Škubník, Karel
Jakešová, Marie
Kharchenko, Ganna
Kovařík, Martin
Matějka, Kryštof
Martyniuk, Oleh
Jakešová, Marie
Otýpka, Martin
Matějka, Kryštof
Škubník, Karel
Kupková, Kristýna
Jakešová, Marie
Jelínek, Eduard
Koller, Philipp
Škubník, Karel
Polčák, Josef
Polčák, Josef
Burda, Daniel
Kolíbalová, Eva
B Michalička, Jan
S Michalička, Jan
MURTAS, DAVIDE
Žaloudková, Lucie
Jelínek, Eduard
Spousta, Jiří
Hu, Ying
Devi Thongam, Debika
U Kicmerova, Dina
Devi Thongam, Debika
T Roupcová, Pavla
Devi Thongam, Debika
Jakešová, Marie
Putz, Stefan
Matějka, Kryštof
Piastek, Jakub
Kovařík, Martin
Matějka, Kryštof
Jelínek, Eduard
Koller, Philipp
Slovák, Michal
Jewula, Pawel
Kharchenko, Ganna
Stará, Veronika
Stará, Veronika
E Man, Ondřej
Eliáš, Marek
Jakešová, Marie
Jan, Hnilica
U Eliáš, Marek
Jelínek, Eduard
Klusák, Radovan
Jakešová, Marie
Lukiienko, Iryna
T Eliáš, Marek
SAHIL, Muhammad
Otýpka, Martin
Putz, Stefan
Spusta, Tomáš
S Danchuk, Viktor
Dubroka, Adam
Stará, Veronika
Hu, Ying
Otýpka, Martin
Jakešová, Marie
Stará, Veronika
Otýpka, Martin
Wojewoda, Ondřej
Matějka, Kryštof
Stará, Veronika
Spusta, Tomáš

Upcoming trainings

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Term Name Description Max. attendees
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
25.9. 10:00 - 12:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik 1
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10