Friday 28.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
KRATOS-XPS
ML3-BABY
SUSS-WETBENCH
LEICACOAT-STAN
FUMEHOOD…
ZEISS-NANO
FUMEHOOD…
ICON-SPM
VERIOS
VERSALAB
TITAN
WOOLLAM-RC2
SUSS-MA8
ULTRAFAST-LASER
UHV-PREPARATION
KERR-MICROSCOPE
LAURELL-NANO
RAITH
3D-PRUSA-ORANGE
UHV-XPS
HELIOS
LYRA
FUMEHOOD-HF
FUMEHOOD…
TEGRAMIN
JASCO
UHV-DEPOSITION
RIGAKU9
3D-PRUSA-XL
FTIR
R2-PECVD
KEITHLEY-4200
AMBER
VUVAS
NIKON-NANO
MPS150
BAMBULAB
RIGAKU3
ULTRACENTRIFUGE
ZWICK
MAGNETRON-AJA
SUMMIT
PARYLENE-SCS
NANOCALC
SHAKER-B1.18
SIMS
LaserMIRA
SEE-SYSTEM
RIE-CHLORINE
SNOM-NANONICS
ACCURION_RSE
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
SUSS-RCD8
MIRA-EBL
DIENER
RIE-FLUORINE
BET-ANAMET
MINIFLEX
nanoCT
nano-CT
RSA
STEMI
TEST-RFID2
SW-BEAMER
CITOVAC
UHV…
UHV…
ULTRASONIC…
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
VACUUM-OVEN-B1…
UHV-SPM
VACUUM-OVEN-B1…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZETASIZER
UHV-CLUSTER
UHV-PLD
SW-LAB
TEST-RFID4
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TGA96
UHV-MBE
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
PARYLENE-DIENER
NANO-ONE-2PP
3D-PRUSA-BLACK
R4…
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
SW-CT
TIC3X
micro-CT-L240
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
Micromex
micro-CT-m300
3D-PRUSA-BLUE
LABOTOM5
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
HENRY-MAGNET
MAGNETRON
DEKTAK
WOOLLAM-MIR
LITESCOPE-MIRA…
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIRQUEST512
WOOLLAM-VIS
NMR
LPCVD-polySi
LITESCOPE-LYRA
DAWN-HELEOS
IS-NOVOCONTROL
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-LabSys1
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
LASER-DICER
LIBS-FireFly
LIBS-Discovery
UV-LASER
Havlíková, Tereza
Ščasnovič, Erik
Fecko, Peter
Ščasnovič, Erik
Polčák, Josef
Daradkeh, Samer
Přibyl, Roman
Polčák, Josef
E Jakešová, Marie
Piastek, Jakub
Liška, Jiří
Cuccu, Elisa
E Jakešová, Marie
Piastek, Jakub
Havlíková, Tereza
Pišťák, Jan
Havlíková, Tereza
Tvrdoňová, Anna
E Jakešová, Marie
E Jakešová, Marie
Hrdý, Radim
E Jakešová, Marie
Hrdý, Radim
Tsalagkas, Dimitrios
S Gablech, Evelína
Nghiem, Xuan Duc
Pišťák, Jan
Molnár, Tomáš
Danchuk, Viktor
S Michalička, Jan
S Michalička, Jan
Přibyl, Roman
E Jakešová, Marie
Jasenský, Kryštof
Jakub, Zdeněk
Arregi Uribeetxebarria, Jon Ander
Tvrdoňová, Anna
MURTAS, DAVIDE
Pavelka, Dominik
Jakub, Zdeněk
Staňo, Michal
S Šamořil, Tomáš
Jasenský, Kryštof
E Jakešová, Marie
Havlíková, Tereza
Říhová, Martina
Jakub, Zdeněk
Caha, Ondřej
Kumar, Sanjay
Přibyl, Roman
Janů, Lucie
Citterberg, Daniel
Spousta, Jiří
Přibyl, Roman
MURTAS, DAVIDE
Citterberg, Daniel
Roupcová, Pavla
T Roupcová, Pavla
Pavliňák, David
Sevriugina, Veronika
B Jasenský, Kryštof

Upcoming trainings

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Term Name Description Max. attendees
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10