Friday 4.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
DEKTAK
RIGAKU3
KRATOS-XPS
RAITH
SUSS-MA8
LEICACOAT-STAN
FUMEHOOD…
FUMEHOOD…
VERIOS
MIRA-STAN
CRYOGENIC
LAURELL-NANO
UHV-XPS
VERSALAB
FUMEHOOD…
CHEMLAB-B1.18
BET-ANAMET
ZEISS-NANO
FTIR-CHEMLAB
VACUUM_OVEN-C1…
EVAPORATOR
UHV-SPM
NANO-ONE-2PP
HELIOS
LYRA
ICON-SPM
SEE-SYSTEM
R2-PECVD
NANOCALC
TITAN
SUSS-WETBENCH
DRYING-OVEN-B1…
BET-DEGASSER
SPINCOATER…
WITEC-RAMAN
KERR-MICROSCOPE
NANOSCAN
MONOWAVE
MAGNETRON-AJA
RIGAKU9
ML3-BABY
DIENER
RIE-FLUORINE
MAGNETRON
DRIE
PECVD
STEMI
MIRKA
SAW-ACCUTOM
SHAKER-B1.18
SW-BEAMER
SUMMIT
LaserMIRA
MINIFLEX
Q-LAB
RTP
SIMS
PARYLENE-SCS
SNOM-NANONICS
ACCURION_RSE
MIRA-EBL
RSA
SUSS-RCD8
nano-CT
nanoCT
RIE-CHLORINE
SW-LAB
TEST-RFID2
SW-TRACER
CITOVAC
UHV-PREPARATION
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV…
UHV-CLUSTER
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
3D-PRUSA-ORANGE
TEST-RFID4
THEORY-SUPPORT
UHV-PLD
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
TEM-SW
WOOLLAM-MIR
3D-PRUSA-BLACK
R4…
SW-CT
DHR
PARYLENE-DIENER
DIMPLING…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
3D-PRUSA-BLUE
LABOTOM5
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
HENRY-MAGNET
WOOLLAM-RC2
3D-PRUSA-XL
LIBS-LabSys1
DSC-DISCOVERY
CITOPRESS
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
IS-NOVOCONTROL
LIBS-FireFly
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
UV-LASER
Jelínek, Eduard
Figura, Daniel
Jasenský, Kryštof
Figura, Daniel
Figura, Daniel
T Roupcová, Pavla
Bednaříková, Vendula
Roupcová, Pavla
Roupcová, Pavla
T Polčák, Josef
Nandi, Sunny
Daradkeh, Samer
Polášková, Kateřina
Cuccu, Elisa
Holobrádek, Jakub
Holobrádek, Jakub
Figura, Daniel
Figura, Daniel
Figura, Daniel
Mařák, Vojtěch
Kumar, Sanjay
Kumar, Sanjay
Figura, Daniel
Jelínek, Eduard
Figura, Daniel
Valadi Palliyalil, Anjali
Bajwa, Laiba Asad
Valadi Palliyalil, Anjali
T Kicmerova, Dina
Nandi, Sunny
Šťastný, Přemysl
Valadi Palliyalil, Anjali
Mařák, Vojtěch
T Danchuk, Viktor
Dey, Sharmistha
Figura, Daniel
Figura, Daniel
Molnár, Tomáš
Jakub, Zdeněk
Pham, Sy Nguyen
Daradkeh, Samer
Figura, Daniel
Figura, Daniel
Pavliňák, David
Pavliňák, David
Tmejová, Kateřina
Tmejová, Kateřina
Holobrádek, Jakub
Holobrádek, Jakub
Poláková, Veronika
Tantis, Iosif
Dey, Sharmistha
Dey, Sharmistha
Otýpka, Martin
Jakub, Zdeněk
T Sanna, Michela
Bahadur, Fateh
S Šamořil, Tomáš
B Gablech, Evelína
Bolouki, Nima
Bolouki, Nima
Jelínek, Eduard
S Michalička, Jan
Cuccu, Elisa
Valadi Palliyalil, Anjali
Tmejová, Kateřina
Bajwa, Laiba Asad
Devi Thongam, Debika
Arregi Uribeetxebarria, Jon Ander
Kovařík, Martin
Ullattil, Sanjay Gopal
U Jasenský, Kryštof
Varshney, Devanshu
Jelínek, Eduard
Figura, Daniel
Jasenský, Kryštof
Arregi Uribeetxebarria, Jon Ander
Jelínek, Eduard
Cuccu, Elisa

Upcoming trainings

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Term Name Description Max. attendees
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Carolina Sanna, Debika Devi Thongam 2
4.9. 09:00 - 11:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Lukáš Zezulka 1
4.9. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Marek Eliáš 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Karan Singh Surana 3
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis 10