Wednesday 11.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
KRATOS-XPS
VERIOS
RIGAKU3
DIENER
ML3-BABY
PARYLENE-SCS
EVAPORATOR
MIRA-STAN
HELIOS
RAITH
CRYOGENIC
TITAN
NANOINDENTER
VERSALAB
ICON-SPM
VACUUM_OVEN-C1…
3D-PRUSA-XL
ALD-BENEQ
BET-DEGASSER
LEICACOAT-STAN
RIGAKU9
WITEC-RAMAN
BET-ANAMET
MPS150
LASER-DICER
ZWICK
CLARUS-680
UHV-LEEM
UHV-DEPOSITION
MIRA-EBL
DEKTAK
FUMEHOOD-HF
KERR-MICROSCOPE
ALD-FIJI
BRILLOUIN
DISCO-DICING…
BAMBULAB
KEITHLEY-4200
UHV-SPM
UHV-XPS
NANOSCAN
LYRA
NANOSAM
UHV-PREPARATION
DRIE
R4…
ULTRAFAST-LASER
GLOVEBOX…
WOOLLAM-VIS
3D-PRUSA-ORANGE
JASCO
MINIFLEX
Q-LAB
SUMMIT
NANOCALC
SHAKER-B1.18
SEE-SYSTEM
STEMI
SPINCOATER…
LaserMIRA
SUSS-RCD8
RTP
SIMS
ACCURION_RSE
RIE-CHLORINE
microCT
SNOM-NANONICS
RSA
ZETASIZER
nano-CT
nanoCT
VISCOMETER
Test Ondra 3
SW-BEAMER
DWL
UHV-PLD
UHV-CLUSTER
UHV…
UHV…
XEF2
US-CUTTER
WIRE-BONDER
UHV-LEIS
JAZ3-CHANNEL
L450
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
VACUUM_OVEN-B1…
UHV-MBE
UHV-FTIR
SW-LAB
TEST2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
VUVAS
Test O2
Test školení
UHV-MBE1
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
MIRKA
TGA-DISCOVERY
UHV-MBE2
SAW-ACCUTOM
DSC-DISCOVERY
PECVD
FUMEHOOD…
ELECTROWORKSHOP
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SPONGEBOB
FUMEHOOD…
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
LECTROPOL
DRYING_OVEN-B1…
LEICACOAT-NANO
TUBE-FURNACE
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
DIMPLING…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CRYOMILL
SW-CT
DHR
PECVD-NANOFAB
FRASCAN
TEM-SW
CITOPRESS
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
MONOWAVE
NIKON-NANO
PROTOMAT
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PARYLENE-DIENER
LVEM
LAKESHORE
CHEMLAB-B1.14
IR-RAMAN
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
K70
LPCVD-SiN
R2-PECVD
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
UV-LASER
Majcen, Fabian
Bajwa, Laiba Asad
Delforge, Cyril
Jakešová, Marie
Štálnik, Jozef
Otýpka, Martin
Koňařík, Lukáš
Majcen, Fabian
Štálnik, Jozef
Citterberg, Daniel
Martyniuk, Oleh
Polčák, Josef
Varaďa, Jan
Šik, Ondřej
Fatima, Areej
Pišťák, Jan
Koňařík, Lukáš
Ronoh, Kipkurui
Wang, Yue
Pišťák, Jan
Arenas Buelvas, Daina Dayana
T Eliáš, Marek
Citterberg, Daniel
Kovařík, Martin
Martyniuk, Oleh
Jakešová, Marie
Otýpka, Martin
Bajwa, Laiba Asad
Fecko, Peter
Tvrdoňová, Anna
Prášek, Jan
U Prášek, Jan
Martyniuk, Oleh
Kalleshappa, Bindu
Sevriugina, Veronika
Wang, Yue
Šťastný, Přemysl
Huang, Yong
Pistis, Martino
Delforge, Cyril
U Danchuk, Viktor
Andres Navarro Giraldo, Jorge
Kolíbalová, Eva
S Michalička, Jan
Wang, Yue
B Gablech, Evelína
Slavíček, Radek
Niapos, Eleftherios
Talíř, Marek
Staňo, Michal
Slavíček, Radek
Slavíček, Radek
Spusta, Tomáš
Spusta, Tomáš
Mirdamadi Khouzani, Sayed Hossein
Eliáš, Marek
Daradkeh, Samer
AL Soud, Ammar
Kalleshappa, Bindu
Lepcio, Petr
Malecot, Axel Fabien Benoit
Varshney, Devanshu
Chamradová, Ivana
Havelka, Tomáš
AL Soud, Ammar
Kovařík, Martin
Delforge, Cyril
Fanisaberi, Amirmohsen
S Tmejová, Kateřina
Danchuk, Viktor
Hrubá, Daniela
Majcen, Fabian
Citterberg, Daniel
Jakešová, Marie
Lukiienko, Iryna
Štálnik, Jozef
Delforge, Cyril
Zita, Jiří
Spusta, Tomáš
Kovařík, Martin
Hrubá, Daniela
Molnár, Tomáš
Kovařík, Martin
Staňo, Michal
T Danchuk, Viktor
Danchuk, Viktor
Pistis, Martino
Janů, Lucie
Arregi Uribeetxebarria, Jon Ander
Saldan, Ivan
Franta, Daniel
Pavelka, Dominik
Skálová, Zdenka

Upcoming trainings

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Term Name Description Max. attendees
12.2. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Veronika Sevriugina, Martino Pistis, Elisa Cuccu 4
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
18.2. 08:30 - 12:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Amirmohsen Fanisaberi 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1