| 9.9. 13:00 - 14:30 |
JASCO training
|
Description of holders and software, basic measurement
Attendees:
Debika
Devi Thongam
|
3
|
| 10.9. 14:19 - 15:19 |
Rigaku 3 - special
|
Bring your typical sample.
A 1.15
Attendees:
Ivan
Saldan
|
1
|
| 11.9. 10:00 - 12:00 |
Witec-Raman
|
in front of user office
Attendees:
Mohammad
Allaham,
Saleh Hekmat Saleh
Fawaeer,
Iosif
Tantis
|
4
|
| 14.9. 10:00 - 12:00 |
NANO-ONE-2PP 2/2
|
Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office.
Attendees:
Martina
Triebelová
|
1
|
| 15.9. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
|
3
|
| 15.9. 09:30 - 15:00 |
Mira-EBL training
|
Attendees:
Maria
Baeva
|
1
|
| 17.9. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 17.9. 09:30 - 12:00 |
RIE-chlorine-training
|
Attendees:
David Jonathan
Walcher
|
3
|
| 17.9. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 17.9. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 21.9. 09:30 - 14:30 |
NANO-ONE-2PP 1/2
|
The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training.
Attendees:
Daniel
Burda
|
3
|
| 21.9. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL)
Meeting ID: 366 554 789 519 442
Access code: kW9V5B48
|
5
|
| 22.9. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
|
Attendees:
Maneesha
Ramesh
|
5
|
| 22.9. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
|
5
|
| 22.9. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Maneesha
Ramesh
|
10
|
| 22.9. 14:25 - 14:55 |
Safety excursion - Structural Analysis
|
Attendees:
Maneesha
Ramesh
|
10
|
| 24.9. 09:00 - 16:00 |
Helios_basic (1/2)
|
Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Anjali
Valadi Palliyalil,
Šimon
Formánek
|
2
|
| 25.9. 09:00 - 12:00 |
Verios/Helios_EDS
|
Practical demonstration of EDS analytical system at Verios and Helios.
Attendees:
Kryštof
Jasenský,
Šimon
Formánek
|
3
|
VERIOS
LITESCOPE-MIRA…
LYRA