Sunday 23.11.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
CRYOGENIC
RIGAKU9
ML3-BABY
CHEMLAB-B1.18
HELIOS
EVAPORATOR
DIENER
VERSALAB
LAKESHORE
UHV-PREPARATION
NMR
WITEC-RAMAN
SEE-SYSTEM
MIRA-EBL
SNOM-NANONICS
ICON-SPM
WOOLLAM-VIS
PARYLENE-SCS
SIMS
3D-PRUSA-BLACK
RSA
LaserMIRA
SUMMIT
SHAKER…
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
NIRQUEST512
MINIFLEX
nanoCT
Q-LAB
PARYLENE-DIENER
PECVD
MIRKA
3D-PRUSA-BLUE
ULTRACENTRIFUGE
SAW-ACCUTOM
SPINCOATER…
RTP
3D-PRUSA-ORANGE
ACCURION_RSE
RIGAKU3
SW-LAB
SUSS-RCD8
ZEISS-NANO
RIE-FLUORINE
RIE-CHLORINE
SW-BEAMER
FISCHIONE-160
SW-TRACER
FTIR
UHV-SPM
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV-XPS
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV-PLD
UHV-MBE
LEICA-TXP
THEORY-SUPPORT
TENUPOL
NANOSCAN
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
TGA-DISCOVERY
UHV-LEIS
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
NANOSAM
MPS150
CITOPRESS
R4…
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
SW-CT
TIC3X
CLARUS-680
VACUUM_OVEN…
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUME_HOOD-B1.18
DAWN-HELEOS
MONOWAVE
KERR-MICROSCOPE
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
HENRY-MAGNET
LIBS-FireFly
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
LIBS-Discovery
LAURELL-NANO
GLOVEBOX
CHEMLAB-B1.14
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.16
LASER-DICER
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER
Wang, Yue
Lee, Hyesung
Lee, Hyesung
Daradkeh, Samer
Daradkeh, Samer
Caha, Ondřej
Varshney, Devanshu
Martyniuk, Oleh
Dolejšová, Eliška
Bahadur, Fateh
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Daradkeh, Samer
Holcman, Vladimír
Šebestová, Zuzana
Dolejšová, Eliška
Liška, Jiří

Upcoming trainings

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Term Name Description Max. attendees
24.11. 10:00 - 12.11. 15:00 RAITH training individual RAITH training for Mira users Attendees: Gyandeep Pradhan 1
24.11. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 319 779 632 749 3 Přístupový kód: Gq2BX9zw Attendees: Saurabh Pathak 5
24.11. 15:00 - 16:30 FTIR-CHEMLAB Basic FTIR training for experienced users Attendees: Anna Jančík Procházková 2
25.11. 09:00 - 11:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Bindu Kalleshappa 1
25.11. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Nicolò Rossetti, Václav Vít 2
25.11. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Hatef Bokaei Khelejan 5
25.11. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Saurabh Pathak 5
25.11. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Saurabh Pathak, Elena D'Angelo 10
25.11. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Mohamed Bensalem, Karan Singh Surana, Saurabh Pathak, Elisa Cuccu 10
26.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Karan Singh Surana, Saurabh Pathak, Elisa Cuccu 3
27.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Elisa Cuccu 1
27.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Saurabh Pathak 1
27.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.11. 13:00 - 15:00 RIE-flourine-training Attendees: Hugo Weisz, Fabian Majcen, Gyandeep Pradhan 3
28.11. 09:00 - 13:00 Rigaku 3 - basic Bring your typipical sample Attendees: Nicolò Rossetti 2
1.12. 09:30 - 11:00 LEXT training Attendees: Grigory Mathew 2
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab 10
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4