Friday 7.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
VERIOS
MIRA-STAN
AMBER
VERSALAB
RIE-FLUORINE
WITEC-RAMAN
NIKON-NANO
TITAN
RIGAKU3
TORNADO-M4
RIE-CHLORINE
R2-PECVD
HENRY-MAGNET
UHV-PREPARATION
LVEM
SPONGEBOB
UHV-SPM
UHV-PLD
LAURELL-NANO
LYRA
UHV-LEEM
PARYLENE-SCS
UHV-DEPOSITION
ICON-SPM
FUMEHOOD…
UHV-XPS
SUSS-WETBENCH
SW-CT
BET-DEGASSER
NMR
ZWICK
CHEMLAB-B1.14
RIGAKU9
MAGNETRON-AJA
NANOSAM
VACUUM-OVEN-B1…
TUBE-FURNACE
LEICACOAT-STAN
VNA-MPI
VACUUM_OVEN-C1…
MIRA-EBL
DEKTAK
SHAKER-B1.18
LaserMIRA
NANOCALC
SIMS
SEE-SYSTEM
SUMMIT
NANO-ONE-2PP
SNOM-NANONICS
Q-LAB
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
RTP
RSA
ACCURION_RSE
SUSS-RCD8
DIENER
BET-ANAMET
MINIFLEX
nanoCT
nano-CT
STEMI
Test školení
SW-BEAMER
FTIR
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
CITOVAC
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
3D-PRUSA-BLACK
TEST-RFID4
UHV-MBE
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
3D-PRUSA-ORANGE
ML3-BABY
3D-PRUSA-BLUE
4-POINT
DRYING-OVEN-B1…
RAITH
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
FTIRMAG
DHR
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DIMPLING…
DRIE
Micromex
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
CRYOMILL
BRILLOUIN
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CLARUS-680
micro-CT-L240
ULTRACENTRIFUGE
LABOTOM5
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
WOOLLAM-MIR
LITESCOPE-MIRA…
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
LPCVD-polySi
LITESCOPE-LYRA
micro-CT-m300
IS-NOVOCONTROL
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-LabSys1
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LIBS-FireFly
LIBS-Discovery
UV-LASER
Procházková, Anna
Přibyl, Roman
Bolouki, Nima
Daradkeh, Samer
Šťastný, Přemysl
T Kicmerova, Dina
Burda, Daniel
U Kicmerova, Dina
Bednaříková, Vendula
Bednaříková, Vendula
Žaloudková, Lucie
Říhová, Martina
Spousta, Jiří
Iakoubovskii, Konstantin
Iakoubovskii, Konstantin
Hrdinová, Sára
Daradkeh, Samer
Otýpka, Martin
Supalová, Linda
AL Soud, Ammar
Supalová, Linda
T Supalová, Linda
Tvrdoňová, Anna
Michalička, Jan
U Michalička, Jan
T Roupcová, Pavla
Valadi Palliyalil, Anjali
T Spotz, Zdeněk
Pavliňák, David
Burda, Daniel
Janů, Lucie
Pavelka, Dominik
Procházka, Pavel
U Kolíbalová, Eva
Tvrdoňová, Anna
Hrůza, Dominik
T Danchuk, Viktor
Tvrdoňová, Anna
S Šamořil, Tomáš
Procházka, Pavel
Tvrdoňová, Anna
D'Angelo, Elena
Mukherjee, Aniket
Tvrdoňová, Anna
D'Angelo, Elena
MURTAS, DAVIDE
Kareš, Martin
AL Soud, Ammar
Dolejšová, Eliška
Sevriugina, Veronika
Fanisaberi, Amirmohsen
Staňo, Michal
Arregi Uribeetxebarria, Jon Ander
S Danchuk, Viktor
Fanisaberi, Amirmohsen
Kepič, Peter
Šťastný, Přemysl
Pavelka, Dominik
Dey, Sharmistha
Supalová, Linda
Burda, Daniel

Upcoming trainings

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Term Name Description Max. attendees
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Muhammad SAHIL, Iosif Tantis 2
7.8. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Attendees: Matej Dinis, Jiří Strnad 2
11.8. 15:00 - 7.8. 16:50 CRYOGENIC DCR CRYOGENIK DCR Attendees: Ekaterina Pribytova 1
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, DAVIDE MURTAS 4
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3