Friday 25.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
EVAPORATOR
ML3-BABY
SUSS-WETBENCH
KRATOS-XPS
SPONGEBOB
TITAN
MAGNETRON
DEKTAK
UHV-PREPARATION
HELIOS
UHV-SPM
LEICACOAT-STAN
UHV-XPS
FUMEHOOD…
UHV-LEEM
UHV-DEPOSITION
MIRA-STAN
LAURELL-NANO
VERIOS
WITEC-RAMAN
AMBER
NANOSAM
RIGAKU3
LYRA
SCIA
SUSS-RCD8
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
NIKON-NANO
KERR-MICROSCOPE
LVEM
FUMEHOOD…
ALD-BENEQ
UHV-FTIR
LITESCOPE-MIRA…
ALD-FIJI
R4…
K70
RIE-CHLORINE
IS-NOVOCONTROL
VACUUM_OVEN-C1…
CHEMLAB-B1.14
VERSALAB
WOOLLAM-VIS
ULTRACENTRIFUGE
3D-PRUSA-XL
BRILLOUIN
RIE-FLUORINE
SUSS-MA8
RAITH
BAMBULAB
ICON-SPM
DRIE
STEMI
BET-ANAMET
SW-BEAMER
NANOCALC
SW-LAB
NANO-ONE-2PP
SHAKER-B1.18
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
SNOM-NANONICS
MIRA-EBL
RSA
nano-CT
nanoCT
MINIFLEX
DIENER
ACCURION_RSE
RTP
SW-TRACER
THEORY-SUPPORT
LEICA-TXP
VACUUM-OVEN-B1…
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRASONIC…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
ULTRAFAST-LASER
TENUPOL
SPINCOATER…
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
UHV…
Q-LAB
WOOLLAM-MIR
SAW-ACCUTOM
4-POINT
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
FTIRMAG
CRYOMILL
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
SW-CT
TIC3X
DAWN-HELEOS
DISCO-DICING…
MPS150
GLOVEBOX…
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
BET-DEGASSER
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
micro-CT-m300
TEGRAMIN
MIRKA
NANOSCAN
PROTOMAT
HENRY-MAGNET
WOOLLAM-RC2
LABOTOM5
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NIRQUEST512
LAKESHORE
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
CRYOGENIC
LPCVD-SiN
VNA-MPI
FISCHIONE-TEM…
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
KAUFMAN
LPCVD-polySi
IR-RAMAN
KEITHLEY-4200
R2-PECVD
LASER-DICER
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
B Zita, Jiří
Jakešová, Marie
Burda, Daniel
B Zita, Jiří
T Piastek, Jakub
Otýpka, Martin
B Zita, Jiří
T Hrdý, Radim
Otýpka, Martin
Pekárková, Jana
Valiyev, Rasul
Čechal, Jan
Jakešová, Marie
Jakešová, Marie
Jakešová, Marie
Ali, Hasan
Horák, Michal
B Kolíbalová, Eva
B Zita, Jiří
Staňo, Michal
B Zita, Jiří
Otýpka, Martin
Hrůza, Dominik
Stará, Veronika
T Man, Ondřej
B Man, Ondřej
Hrůza, Dominik
Stará, Veronika
Kalleshappa, Bindu
Gejdoš, Pavel
Hrůza, Dominik
Stará, Veronika
B Zita, Jiří
Jakešová, Marie
Hrůza, Dominik
Stará, Veronika
Hrůza, Dominik
Stará, Veronika
Kramář, Jan
Kalleshappa, Bindu
B Zita, Jiří
Jakešová, Marie
T Kicmerova, Dina
Ali, Hasan
U Spotz, Zdeněk
Spotz, Zdeněk
B Man, Ondřej
Spousta, Jiří
S Danchuk, Viktor
Žaloudková, Lucie
Staňo, Michal
B Zita, Jiří
B Zita, Jiří
B Zita, Jiří
B Zita, Jiří
B Zita, Jiří
B Zita, Jiří
Molnár, Tomáš
Cao, Hoang-Anh
Jewula, Pawel
B Zita, Jiří
Hrůza, Dominik
Kramář, Jan
B Zita, Jiří
Eliáš, Marek
Klusák, Radovan
B Zita, Jiří
Fu, Hongbo
Otýpka, Martin
Saldan, Ivan
Otýpka, Martin
Dubroka, Adam
Saldan, Ivan
Spusta, Tomáš
Wojewoda, Ondřej
B Zita, Jiří
B Zita, Jiří
B Zita, Jiří
Spusta, Tomáš
B Máčala, Jakub
B Zita, Jiří

Upcoming trainings

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Term Name Description Max. attendees
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
25.9. 10:00 - 12:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik 3
25.9. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: Kristýna Kupková 2
30.9. 14:00 - 15:00 Copy - Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Josef Hynšt, Aneta Opluštilová 5
30.9. 14:00 - 15:00 Copy - Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Josef Hynšt, Aneta Opluštilová 5
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
5.10. 09:30 - 21.7. 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Maneesha Ramesh 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jáchym Štindl, Filip Janík 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10