Saturday 24.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
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KRATOS-XPS
EVAPORATOR
DIENER
AMBER
LAKESHORE
TITAN
ICON-SPM
UHV-DEPOSITION
UHV-LEEM
UHV-XPS
UHV-SPM
RIE-CHLORINE
LASER-DICER
CLARUS-680
3D-PRUSA-XL
ARES
NIRQUEST512
NIKON-NANO
SNOM-NANONICS
NANOSAM
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
3D-PRUSA-ORANGE
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
MIRA-EBL
RSA
TEM-SW
RIGAKU3
PECVD
3D-PRUSA-BLACK
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
nano-CT
3D-PRUSA-BLUE
ULTRACENTRIFUGE
SW-TRACER
ZEISS-NANO
MINIFLEX
NMR
nanoCT
WOOLLAM-VIS
RIE-FLUORINE
EBPG
LEICA-TXP
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV-PREPARATION
TENUPOL
THEORY-SUPPORT
FISCHIONE-160
CITOPRESS
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
UHV…
NANOSCAN
WOOLLAM-MIR
MONOWAVE
ELECTROWORKSHOP
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
R4…
VERSALAB
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
BAMBULAB
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
FUMEHOOD…
DSC-DISCOVERY
PROTOMAT
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
LVEM
R2-PECVD
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
NANO-ONE-2PP
ML3-BABY
LAURELL-NANO
KEITHLEY-4200
FUMEHOOD…
LEICACOAT-NANO
FUMEHOOD…
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
FRASCAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Ondračka, Pavel
Hu, Ying
Kalleshappa, Bindu
Kalleshappa, Bindu
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Spousta, Jiří
Holcman, Vladimír
Foltýn, Michael
Hrdinová, Sára
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
U Eliáš, Marek
Papež, Nikola
B Sanna, Michela
Fecko, Peter
B Lepcio, Petr

Upcoming trainings

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Term Name Description Max. attendees
25.10. 10:30 - 12:00 Novocontrol-Basic training DRS spectroscopy Attendees: Keval Sonigara 2
27.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský 3
27.10. 10:00 - 12:00 DLS-ZetaSizer Part 2 Assisted hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer Ultra. Attendees: Carolina Sanna 1
27.10. 10:00 - 23.10. 13:00 VERSALAB VSM VERSALAB VSM training Attendees: Tomáš Henzl 1
27.10. 10:30 - 23.10. 11:30 Vacuum Drying Oven Basic Vacuum Drying Oven training Attendees: Tomáš Henzl 1
27.10. 14:00 - 23.10. 15:00 4-POINT 4-POINT training Attendees: Marie Jakešová, Laiba Asad Bajwa 2
29.10. 09:30 - 12:00 ALD-Beneq-training Attendees: Nikol Kaděrová 3
29.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
29.10. 13:00 - 17:00 Rigaku 3 - basic Rigaku 3 - basic Bring your typical sample A1.15 Attendees: Karthik Prasad Elangovan 3
30.10. 08:30 - 15:00 LYRA basic training - SEM part The training is focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Romana Ščotková, Filip Janík, Jakub Bartušek, Karthik Prasad Elangovan 4
30.10. 10:00 - 12:00 NANO-ONE-2PP Advance Training Advanced NANO-ONE-2PP training for printing with optically transparent resins. Attendees: Vladislav Dvořák, Michal Slovák 2
2.11. 09:30 - 10:30 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Bring your typical sample. Attendees: Jozef Štálnik, Katarína Rovenská 2
2.11. 10:00 - 11:30 Wirebonder training Training of the new user Attendees: Sujan Maity, Redzic Milica 2
3.11. 10:00 - 14:00 UHV-PLD UHV-PLD repeat training Attendees: Saleh Hekmat Saleh Fawaeer 1
3.11. 10:00 - 11:30 MPS150+Keithley4200 training Training of the new user Attendees: Sujan Maity 1
3.11. 14:00 - 16:00 Wirebonder training Training of the new user Attendees: Vojtěch Mikerásek, Sára Hrdinová 2
4.11. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Philipp Jäger 4
6.11. 10:00 - 11:30 MPS150+Keithley4200 training Training of the new user Attendees: Hugo Weisz, Tomáš Henzl 2
9.11. 09:00 - 9.6. 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Tomáš Janoušek, Šimon Formánek 3
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Lukáš Dokulil 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1
18.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Ying Hu, Karol Križan, Martin Kužílek 3
20.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Martin Kužílek 1
20.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ying Hu 1
20.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1