Wednesday 5.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
VERIOS
SUSS-WETBENCH
RIGAKU3
AMBER
NMR
LEICACOAT-STAN
UV-LASER
WITEC-RAMAN
WIRE-BONDER
RIE-FLUORINE
TITAN
CHEMLAB-B1.18
R2-PECVD
EVAPORATOR
HENRY-MAGNET
WOOLLAM-RC2
SUSS-MA8
VERSALAB
VNA-MPI
KRATOS-XPS
VACUUM-OVEN-B1…
BET-ANAMET
LVEM
LEICACOAT-NANO
UHV-SPM
UHV-PLD
UHV-XPS
LASER-DICER
UHV-DEPOSITION
LAURELL-NANO
ZETASIZER
PARYLENE-SCS
DIENER
MAGNETRON
NANOCALC
NANOSAM
NIKON-NANO
SIMS
UHV-PREPARATION
RIGAKU9
SUSS-RCD8
VACUUM_OVEN-C1…
NANO-ONE-2PP
ML3-BABY
TUBE-FURNACE
LYRA
TORNADO-M4
TEST-RFID4
TEST-RFID2
Test školení
TEST2
Test O2
Test Ondra 3
STEMI
FISCHIONE-160
TENUPOL
TGA96
LEICA-TXP
SW-TRACER
SW-LAB
SW-BEAMER
THEORY-SUPPORT
BRILLOUIN
CEITEC-NANO
MECHANICAL…
RSA
LEXT
SW-COMSOL
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
MIRA-EBL
TGA-DISCOVERY
SNOM-NANONICS
ICON-SPM
CLR-ISO8-Lab…
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
Heliscan
UHV-MBE1
CPD
L450
FTIR
CITOVAC
MAGNETRON-AJA
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
ARES
APCVD
APCVD-Diffusion
XEF2
ALD-BENEQ
GLOVEBOX…
microCT
ZWICK
MPS150
FTIR-CHEMLAB
JAZ3-CHANNEL
UHV-MBE2
ALD-FIJI
BET-DEGASSER
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
BAMBULAB
DISCO-DICING…
UHV-CLUSTER
JASCO
UHV…
UHV…
NANOWIZARD
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
MINIEVAP
FUMEHOOD…
ACCURION_RSE
KAUFMAN
CHEMLAB-B1.16
FLOWBOX
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
IR-RAMAN
NANOINDENTER
K70
KEITHLEY-4200
R4…
ELECTROWORKSHOP
LECTROPOL
LIBS-FireFly
LIBS-Discovery
CHEMLAB-B1.14
HELIOS
LITESCOPE-LYRA
CLARUS-680
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
Micromex
FRASCAN
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
FTIRMAG
4-POINT
PECVD-NANOFAB
LIBS-LabSys1
LITESCOPE-MIRA…
FUMEHOOD-HF
3D-PRUSA-BLACK
CRYOMILL
NIRQUEST512
WOOLLAM-VIS
TIC3X
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
NANOSCAN
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
SW-CT
CITOPRESS
SPONGEBOB
DRYING-OVEN-B1…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
RAITH
KERR-MICROSCOPE
DIMPLING…
MONOWAVE
DHR
DRIE
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
RTP
Žaloudková, Lucie
Havlíková, Tereza
Mařák, Vojtěch
Tantis, Iosif
AL Soud, Ammar
T Kicmerova, Dina
Cao, Hoang-Anh
Surana, Karan Singh
Cao, Hoang-Anh
Supalová, Linda
Otýpka, Martin
Hrdý, Radim
Martyniuk, Oleh
Spotz, Zdeněk
Ščasnovič, Erik
B Caha, Ondřej
AL Soud, Ammar
Man, Ondřej
Iakoubovskii, Konstantin
B Man, Ondřej
Brtníková, Jana
Kotásková, Lucie
Fanisaberi, Amirmohsen
Mařák, Vojtěch
Havlíková, Tereza
Gejdoš, Pavel
Spusta, Tomáš
Spusta, Tomáš
Spusta, Tomáš
Kalleshappa, Bindu
Bakhshikhah, Mahan
paiva de araujo, Estacio
Zdeg, Ikram
Koller, Philipp
Zdeg, Ikram
Supalová, Linda
Supalová, Linda
Kolíbalová, Eva
S Michalička, Jan
Lukiienko, Iryna
Fanisaberi, Amirmohsen
Bolouki, Nima
Bolouki, Nima
Martyniuk, Oleh
Otýpka, Martin
Klíma, Jan
Kharchenko, Ganna
Beliančínová, Beáta
Janů, Lucie
Supalová, Linda
Hrdý, Radim
Klimek, Jan
U Danchuk, Viktor
Klíma, Jan
Kharchenko, Ganna
Kelarová, Štěpánka
Kolíbal, Miroslav
Pavliňák, David
Pavliňák, David
Tantis, Iosif
AL Soud, Ammar
Říhová, Martina
Yuan, Yunhuan
Hrůza, Dominik
T Danchuk, Viktor
D'Angelo, Elena
Fanisaberi, Amirmohsen
D'Angelo, Elena
Krútek, Šimon
Kreuzerová, Monika
Krútek, Šimon
Eliáš, Marek
Rovenská, Katarína
Supalová, Linda
S Danchuk, Viktor
Supalová, Linda
Bábor, Petr
D'Angelo, Elena
U Caha, Ondřej
Hrdý, Radim
Dey, Sharmistha
T Sanna, Michela
Otýpka, Martin
Kepič, Peter
S Šamořil, Tomáš
T Spotz, Zdeněk

Upcoming trainings

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Term Name Description Max. attendees
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Michal Slovák 3
5.8. 10:00 - 12:00 Tornado-M4 Attendees: Vendula Bednaříková 3
6.8. 09:30 - 12:00 NMR training course Use of 60 MHz Magritec NMR spectrometer, preparation samples, basic NMR theory Attendees: Michela Sanna, Lucie Žaloudková 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Muhammad SAHIL, Iosif Tantis 2
7.8. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Attendees: Matej Dinis, Jiří Strnad 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3