Thursday 12.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-EBL
RIGAKU3
KRATOS-XPS
RIE-FLUORINE
MIRA-STAN
SUSS-WETBENCH
ICON-SPM
HELIOS
UHV-DEPOSITION
EVAPORATOR
WITEC-RAMAN
ML3-BABY
TITAN
RAITH
CHEMLAB-B1.14
LEICA-TXP
VERIOS
RIGAKU9
NANOSAM
KERR-MICROSCOPE
DSC-DISCOVERY
ACCURION_RSE
FUMEHOOD…
WOOLLAM-VIS
CLARUS-680
TGA-DISCOVERY
DIENER
AMBER
IS_NOVOCONTROL
LVEM
WOOLLAM-MIR
BET-ANAMET
SUSS-MA8
LASER-DICER
PARYLENE-SCS
WOOLLAM-RC2
MAGNETRON
UHV-LEIS
CRYOGENIC
UHV-LEEM
PARYLENE-DIENER
TUBE-FURNACE
LYRA
VACUUM_OVEN-C1…
UHV-XPS
UHV-SPM
VERSALAB
ELECTROWORKSHOP
FTIR-CHEMLAB
UHV-PREPARATION
ALD-BENEQ
VACUUM_OVEN-B1…
LEICACOAT-STAN
UHV-MBE
nanoCT
VACUUM_OVEN-B1…
FTIR
nano-CT
CITOVAC
RSA
SNOM-NANONICS
MINIFLEX
VISCOMETER
VUVAS
JASCO
L450
RIE-CHLORINE
WIRE-BONDER
XEF2
microCT
SUSS-RCD8
ZWICK
ZETASIZER
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
JAZ3-CHANNEL
SUMMIT
SIMS
Test Ondra 3
UHV-FTIR
UHV-PLD
UHV-MBE1
UHV-MBE2
UHV-CLUSTER
Heliscan
THEORY-SUPPORT
TGA96
TEST-RFID2
Test školení
PECVD
TEST2
Test O2
UHV…
SEE-SYSTEM
UHV…
FISCHIONE-160
TENUPOL
ULTRAFAST-LASER
ULTRASONIC…
SW-TRACER
SW-LAB
SW-BEAMER
US-CUTTER
STEMI
NANOCALC
DWL
SHAKER-B1.18
LaserMIRA
3D-PRUSA-XL
MONOWAVE
TEM-SW
FLOWBOX
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
4-POINT
CRYOMILL
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
Micromex
SW-CT
TIC3X
micro-CT-m300
BAMBULAB
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CPD
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
micro-CT-L240
DAWN-HELEOS
3D-PRUSA-ORANGE
MPS150
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
DEKTAK
LABOTOM5
CITOPRESS
LITESCOPE-LYRA
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LITESCOPE-MIRA…
LIBS-LabSys1
TEGRAMIN
ZEISS-STAN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
SCIA
LIBS-Discovery
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-FireFly
UV-LASER
Lukiienko, Iryna
Klíma, Jan
Staňo, Michal
Staňo, Michal
Valášek, Daniel
Havlíková, Tereza
Rotter, Marek
Daradkeh, Samer
Procházková, Anna
Fatima, Areej
Varaďa, Jan
Kovařík, Martin
Bajwa, Laiba Asad
Jakešová, Marie
Kovařík, Martin
Koňařík, Lukáš
B Lepcio, Petr
B Lepcio, Petr
B Lepcio, Petr
Lepcio, Petr
Lukiienko, Iryna
Supalová, Linda
Bajwa, Laiba Asad
Tvrdoňová, Anna
Fallahpour, Mojdeh
Fallahpour, Mojdeh
Bakhshikhah, Mahan
Caha, Ondřej
Bahadur, Fateh
Man, Ondřej
Cohl, Alexandr
Hrůza, Dominik
Hrůza, Dominik
Kovařík, Martin
Staňo, Michal
Tvrdoňová, Anna
paiva de araujo, Estacio
Kumar, Sanjay
Havelka, Tomáš
Supalová, Linda
Supalová, Linda
Tvrdoňová, Anna
T Michalička, Jan
T Michalička, Jan
Idesová, Beáta
Delforge, Cyril
Štindl, Jáchym
Daradkeh, Samer
Holas, Jiří
Man, Ondřej
Surana, Karan Singh
Pišťák, Jan
Novák, Jiří
Arregi Uribeetxebarria, Jon Ander
Kumar, Sanjay
Staňo, Michal
Delforge, Cyril
Fu, Hongbo
Rusnaková, Nicole
Tvrdoňová, Anna
Franta, Daniel
Sanna, Michela
Petruš, Josef
Tvrdoňová, Anna
T Iakoubovskii, Konstantin
Daradkeh, Samer
S Kolíbalová, Eva
Franta, Daniel
Tkachenko, Serhii
Bajwa, Laiba Asad
Štálnik, Jozef
Jakešová, Marie
MASCARETTI, Luca
Lukiienko, Iryna
Průša, Stanislav
Slavíček, Radek
Cohl, Alexandr
Bajwa, Laiba Asad
Havelka, Tomáš
S Šamořil, Tomáš
Slavíček, Radek
Hrůza, Dominik
Cohl, Alexandr
Niapos, Eleftherios
T Spusta, Tomáš
Sevriugina, Veronika
Cohl, Alexandr
Idesová, Beáta
Fu, Hongbo
Jyoti, Jyoti

Upcoming trainings

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Term Name Description Max. attendees
12.3. 10:00 - 10:30 Electroworkshop - basics Basic & safety training for entering the electroworkshop. It is a prerequisite for all subsequent trainings (3d printers, soldering, laser) for instruments located in the electroworkshop. Attendees: Amirmohsen Fanisaberi, Karan Singh Surana, Konstantin Iakoubovskii 3
12.3. 11:30 - 17:30 Amber Meeting point at the microscope. Attendees: Adam Očkovič, Ivana Kratochvílová 4
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
18.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
19.3. 09:00 - 16:00 Helios_basic (2/2) Helios_basic (2/2): Hands-on session for attendees of Helios_basic (1/2). Attendees: Mohamed Bensalem 1
20.3. 13:30 - 15:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Amirmohsen Fanisaberi, Saurabh Pathak 2
23.3. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 341 031 483 654 Přístupový kód: hz6gW67Y Attendees: Šimon Formánek 5
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Tomáš Janoušek 3
24.3. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Šimon Formánek, Rasul Valiyev 5
24.3. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Petr Pazourek, Šimon Formánek 5
24.3. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Petr Pazourek, Rasul Valiyev 10
24.3. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Petr Pazourek, Šimon Formánek 10
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Radim Slovák 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Carolina Oliver Urrutia, Ondrej Kubinec 4