Wednesday 22.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
DIENER
RIGAKU3
WITEC-RAMAN
SUSS-WETBENCH
MIRA-STAN
UHV-XPS
ML3-BABY
EVAPORATOR
DEKTAK
FUMEHOOD-HF
RAITH
LEICACOAT-STAN
BET-ANAMET
WOOLLAM-RC2
DRIE
BET-DEGASSER
JASCO
VACUUM-OVEN-B1…
TITAN
VERIOS
KRATOS-XPS
VNA-MPI
LITESCOPE-MIRA…
LASER-DICER
R2-PECVD
IS-NOVOCONTROL
LAKESHORE
CRYOGENIC
LAURELL-NANO
MIRA-EBL
KERR-MICROSCOPE
NANOSCAN
NANOSAM
ICON-SPM
PARYLENE-SCS
AMBER
UHV-DEPOSITION
UHV-LEEM
UHV-PREPARATION
FTIR-CHEMLAB
FTIR
L450
RIGAKU9
ZWICK
FUMEHOOD…
UV-LASER
SPONGEBOB
MAGNETRON-AJA
TORNADO-M4
BRILLOUIN
HELIOS
DRYING-OVEN-B1…
LYRA
TUBE-FURNACE
ALD-FIJI
SW-COMSOL
SW-TRACER
THEORY-SUPPORT
TGA96
RIE-CHLORINE
TEST-RFID4
MINIFLEX
TEST-RFID2
Test školení
TEST2
Test O2
Test Ondra 3
MECHANICAL…
FISCHIONE-160
TENUPOL
LEICA-TXP
SW-LAB
CLR-ISO8-Lab…
SW-BEAMER
nanoCT
CEITEC-NANO
nano-CT
STEMI
NANOCALC
RSA
LEXT
SHAKER-B1.18
SUMMIT
LaserMIRA
SNOM-NANONICS
SEE-SYSTEM
SIMS
Heliscan
FUMEHOOD…
TGA-DISCOVERY
WIRE-BONDER
APCVD
CITOVAC
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
ARES
APCVD-Diffusion
VACUUM_OVEN-C1…
XEF2
ALD-BENEQ
GLOVEBOX…
microCT
MPS150
ZETASIZER
NANOWIZARD
JAZ3-CHANNEL
UHV-MBE1
UHV-PLD
UHV-MBE2
MINIEVAP
UHV-FTIR
UHV-LEIS
UHV-MBE
BAMBULAB
UHV-SPM
DWL
UHV-CLUSTER
UHV…
UHV…
DISCO-DICING…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
RIE-FLUORINE
ACCURION_RSE
SUSS-RCD8
K70
CHEMLAB-B1.18
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
CHEMLAB-B1.14
FLOWBOX
R4…
ELECTROWORKSHOP
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
CHEMLAB-B1.16
NANOINDENTER
LPCVD-polySi
Micromex
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
micro-CT-L240
FRASCAN
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
FTIRMAG
4-POINT
PECVD-NANOFAB
LEICACOAT-NANO
LECTROPOL
LPCVD-SiN
CPD
PARYLENE-DIENER
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
NIRQUEST512
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
FUMEHOOD…
WOOLLAM-VIS
NIKON-NANO
DIMPLING…
SUSS-MA8
PROTOMAT
LVEM
DHR
HENRY-MAGNET
MAGNETRON
SW-CT
CRYOMILL
TIC3X
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
VERSALAB
NANO-ONE-2PP
Povey, Rhys Geoffrey
Piastek, Jakub
Kovařík, Martin
Supalová, Linda
Fecko, Peter
Jakešová, Marie
Bednaříková, Vendula
Nandi, Sunny
AL Soud, Ammar
Daradkeh, Samer
Kepič, Peter
Havelka, Tomáš
Vymazal, Jan
Sobola, Dinara
Povey, Rhys Geoffrey
Supalová, Linda
Jelínek, Eduard
T Lepcio, Petr
Ulč, Filip
Remešová, Michaela
U Polčák, Josef
Molnár, Tomáš
Molnár, Tomáš
Povey, Rhys Geoffrey
Jelínek, Eduard
Povey, Rhys Geoffrey
Krútek, Šimon
Jelínek, Eduard
Lukiienko, Iryna
Fecko, Peter
Fecko, Peter
T Lišková, Zuzana
Bakhshikhah, Mahan
Surana, Karan Singh
Poláková, Veronika
Valadi Palliyalil, Anjali
AL Soud, Ammar
Rusnaková, Nicole
Ligmajer, Filip
Fecko, Peter
Jelínek, Eduard
AL Soud, Ammar
AL Soud, Ammar
T Tmejová, Kateřina
T Tmejová, Kateřina
Bednaříková, Vendula
U Tmejová, Kateřina
Duchoň, Jan
T Michalička, Jan
U Kicmerova, Dina
Nandi, Sunny
Šárfy, Pavlína
Kovařík, Martin
Klíma, Jan
Pribytova, Ekaterina
Ulč, Filip
Kumar, Sanjay
Bolouki, Nima
AL Soud, Ammar
Holcman, Vladimír
Klíma, Jan
Krútek, Šimon
Supalová, Linda
Arregi Uribeetxebarria, Jon Ander
Kovařík, Martin
S Danchuk, Viktor
Kubinec, Ondrej
Jakešová, Marie
Spousta, Jiří
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Sysel, Petr
Nebojsa, Alois
Jelínek, Adam
Arregi Uribeetxebarria, Jon Ander
Fu, Hongbo
Mukherjee, Aniket
Prášek, Jan
Krútek, Šimon
U Klíma, Jan
T Spotz, Zdeněk
Krčma, Jakub
Huang, Yong
Štindl, Jáchym
S Šamořil, Tomáš
Kepič, Peter
Song, Yanzhen

Upcoming trainings

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Term Name Description Max. attendees
22.7. 09:00 - 10:30 JASCO training- CZ Description of holders and software, basic measurement Attendees: Marie Jakešová, Anna Tvrdoňová, Šimon Krútek 3
22.7. 09:00 - 12:00 RAITH training basic 2/3 RAITH basic training. Electron beam lithography on a training sample. Attendees: DAVIDE MURTAS 1
22.7. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
22.7. 10:30 - 12:00 JASCO training - EN Description of holders and software, basic measurement Attendees: Laiba Asad Bajwa, Rosmi Vinson 2
23.7. 09:00 - 11:00 RC2 The first part of the training Attendees: Sharmistha Dey 1
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh, Ondrej Kubinec, Debika Devi Thongam 3
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 09:30 - 13:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. Attendees: Lukáš Zezulka, Roshan Velluvakandy, Vladislav Dvořák 3
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Debika Devi Thongam 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ondrej Kubinec 1
27.7. 09:30 - 13:30 ZWICK Meeting point is in front of the Advanced Chemical laboratory. Obligatory prerequisites 1. Pass the Chemical laboratory safety excursion in Moodle (https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=173): 2. Answer the ZWICK applicant questionnaire 3. Read the ZWICK rules (mark the activity as complete with ✔️) 4. Bring your own sample Recommended prerequisites 5. Get familiar with the Layout for ZWICK basic training (mark the activity as complete with ✔️) Attendees: Rasul Valiyev 2
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 2
30.7. 09:00 - 13:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Ivan Saldan, Sára Hrdinová, Debika Devi Thongam 1
30.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Maria Baeva, Franc Paré Estalella 2
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1