| 6.10. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jáchym
Štindl,
Tadeáš
Lesovský,
Filip
Janík
|
3
|
| 6.10. 09:00 - 12:00 |
FTIR
|
Basic training
Attendees:
Romana
Ščotková
|
1
|
| 6.10. 09:30 - 12:00 |
ICON-SPM basic training
|
Attendees:
Areej
Fatima,
Štěpánka
Kelarová
|
3
|
| 6.10. 09:30 - 12:00 |
RIE-chlorine-training
|
Attendees:
Kryštof
Jasenský
|
3
|
| 6.10. 10:00 - 17:00 |
NANO-ONE-2PP 2/2
|
Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13.
Attendees:
Daniel
Burda,
Vladislav
Dvořák
|
2
|
| 6.10. 10:00 - 12:00 |
VERSALAB VSM
|
VERSALAB VSM training
Attendees:
Yanzhen
Song
|
2
|
| 6.10. 13:15 - 16:15 |
Magnetron EN
|
Standard training in English
Attendees:
Laiba Asad
Bajwa
|
1
|
| 7.10. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Filip
Janík
|
1
|
| 7.10. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Jáchym
Štindl
|
1
|
| 7.10. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Tadeáš
Lesovský
|
1
|
| 8.10. 09:30 - 12:00 |
ALD-Beneq-training
|
Attendees:
Andrej
Juríček,
David
Neradilek,
Peter
Kepič
|
3
|
| 9.10. 10:00 - 13:00 |
DLS-ZetaSizer Part 1
|
This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer.
The session will cover:
-An overview of DLS principles, including light scattering and Brownian motion.
-Step-by-step guidance on preparing samples for size and zeta potential measurements.
-The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples.
Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface.
By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization.
Attendees:
Carolina
Sanna
|
3
|
| 12.10. 09:00 - 12:30 |
RAITH training basic 1/3
|
RAITH basic training.
Introduction to the RAITH150 Two system and the Electron Optics software. Operation of ZEISS SEM and basic functions.
Attendees:
Marie
Cmíralová
|
1
|
| 13.10. 10:30 - 12:00 |
RIE-flourine-training
|
|
3
|
| 15.10. 09:30 - 16:30 |
MIRA-STAN 1/2
|
Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Tadeáš
Lesovský,
Sy Nguyen
Pham,
Sharmistha
Dey
|
4
|
| 16.10. 09:00 - 13:00 |
KRATOS-XPS
|
Basic training (session 1/2) - max 2 attendees.
In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz.
Attendees:
Tadeáš
Lesovský
|
2
|
| 19.10. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6)
Meeting ID: 385 586 219 854 116
Access code: zt6FS25C
Attendees:
David
Neradilek
|
5
|
| 20.10. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
|
Attendees:
Dominik
Hrůza,
Tadeáš
Lesovský,
Romana
Ščotková,
Miriama
Malček Šimunková
|
5
|
| 20.10. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
David
Neradilek
|
5
|
| 20.10. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Tadeáš
Lesovský,
Karol
Križan,
Lukáš
Dokulil
|
10
|
| 20.10. 14:25 - 14:55 |
Safety excursion - Structural Analysis
|
Attendees:
Romana
Ščotková,
Lukáš
Dokulil
|
10
|
MIRA-STAN
RAITH
WOOLLAM-VIS