Wednesday 22.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
SUSS-WETBENCH
WITEC-RAMAN
MIRA-STAN
MIRA-EBL
DEKTAK
ML3-BABY
BRILLOUIN
SEE-SYSTEM
RIGAKU3
LYRA
VERIOS
VERSALAB
RIE-CHLORINE
JASCO
UHV-LEEM
UHV-DEPOSITION
MECHANICAL…
LEICACOAT-STAN
UHV-PREPARATION
AMBER
ELECTROWORKSHOP
KRATOS-XPS
TITAN
ALD-BENEQ
SAW-ACCUTOM
LEICACOAT-NANO
FUMEHOOD…
UHV-XPS
SNOM-NANONICS
UHV-LEIS
WOOLLAM-RC2
ICON-SPM
CHEMLAB-B1.14
LITESCOPE-MIRA…
LAKESHORE
TEGRAMIN
UHV-SPM
LASER-DICER
LITESCOPE-LYRA
R2-PECVD
3D-PRUSA-BLACK
SPINCOATER…
ULTRACENTRIFUGE
L450
WOOLLAM-VIS
SCIA
FTIR-CHEMLAB
VACUUM_OVEN-C1…
TIC3X
DWL
IS_NOVOCONTROL
MPS150
RAITH
EVAPORATOR
R4…
ULTRAFAST-LASER
SHAKER-B1.18
NANOCALC
STEMI
3D-PRUSA-XL
SUMMIT
LaserMIRA
SIMS
PARYLENE-SCS
RSA
nano-CT
MINIFLEX
DIENER
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
nanoCT
Test školení
BET-ANAMET
VACUUM-OVEN-B1…
UHV…
ULTRASONIC…
US-CUTTER
JAZ3-CHANNEL
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV-CLUSTER
VISCOMETER
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
UHV…
UHV-PLD
SW-BEAMER
TEST2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
PECVD
UHV-MBE
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
MIRKA
DSC-DISCOVERY
TEM-SW
FTIRMAG
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
FLOWBOX
HELIOS
4-POINT
FUMEHOOD-HF
DRIE
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DHR
SW-CT
micro-CT-L240
BAMBULAB
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
CRYOMILL
TORNADO-M4
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
Micromex
micro-CT-m300
PARYLENE-DIENER
CITOPRESS
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
LABOTOM5
WOOLLAM-MIR
MONOWAVE
NanoOne250
PROTOMAT
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
LVEM
CRYOGENIC
DAWN-HELEOS
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
KAUFMAN
LPCVD-SiN
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LPCVD-polySi
UV-LASER
Supalová, Linda
Lukiienko, Iryna
Lukiienko, Iryna
Koňařík, Lukáš
Koňařík, Lukáš
Koňařík, Lukáš
Štálnik, Jozef
Slovák, Radim
Supalová, Linda
Petrosyan, Derenik
Štálnik, Jozef
Asatryan, Heriknaz
Slovák, Radim
Janoušek, Tomáš
Vymazal, Jan
Havelka, Tomáš
Klok, Pavel
Žaloudková, Lucie
Lukiienko, Iryna
Mathew, Grigory
Kumar, Sanjay
Slovák, Radim
Štálnik, Jozef
Slovák, Radim
Štálnik, Jozef
Koňařík, Lukáš
Lukiienko, Iryna
Lukiienko, Iryna
Lukiienko, Iryna
Supalová, Linda
Koňařík, Lukáš
Asatryan, Heriknaz
Krčma, Jakub
Pavelka, Dominik
Krčma, Jakub
Polášková, Kateřina
U Polášková, Kateřina
Souawda, Nada
Ščasnovič, Erik
Spotz, Zdeněk
Žaloudková, Lucie
Souawda, Nada
Weisz, Hugo
Jelínek, Eduard
T Kicmerova, Dina
Pathak, Saurabh
U Kicmerova, Dina
Klimek, Jan
Lukiienko, Iryna
Slovák, Radim
Eliáš, Marek
de Oliveira Santiago, Pedro Henrique
Fanisaberi, Amirmohsen
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Varga, Dominik
Varga, Dominik
Šťastný, Přemysl
Žaloudková, Lucie
Hrůza, Dominik
Hrůza, Dominik
Kratochvílová, Ivana
Iakoubovskii, Konstantin
Pavelka, Dominik
Janků, Matěj
Jadhao, Pranjali
Jadhao, Pranjali
Řepa, Rostislav
Michalička, Jan
Štálnik, Jozef
Štálnik, Jozef
Valášek, Daniel
Iakoubovskii, Konstantin
T Švarc, Vojtěch
Yuan, Yunhuan
Figura, Daniel
Hrůza, Dominik
Klok, Pavel
Průša, Stanislav
Ligmajer, Filip
Weisz, Hugo
Fanisaberi, Amirmohsen
Kumar, Sanjay
Holcman, Vladimír
Ščasnovič, Erik
Hrůza, Dominik
Danchuk, Viktor
Klok, Pavel
Beliančínová, Beáta
Kumar, Sanjay
Fanisaberi, Amirmohsen
Saldan, Ivan
Slovák, Vojtěch
Franta, Daniel
Štálnik, Jozef
Michlovská, Lenka
Danchuk, Viktor
Kramář, Jan
Fecko, Peter
Patil, Virendra
T Hrdý, Radim
S Lišková, Zuzana
U Prášek, Jan
Janůšová, Martina
Jasenský, Kryštof

Upcoming trainings

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Term Name Description Max. attendees
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik 3
22.4. 14:30 - 16:00 MPS150 + Keithley4200 training Training of the new user Attendees: Niko Plantak 1
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Karan Singh Surana 1
24.4. 14:00 - 28.5. 16:00 LVEM_basic (2/2) Hands-on session Attendees: Karan Singh Surana 1
28.4. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Sharmistha Dey 2
28.4. 09:30 - 12:00 DRIE-training Attendees: Rhys Geoffrey Povey, Heriknaz Asatryan 3
5.5. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Carolina Oliver Urrutia 4
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta, Ying Hu 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1