CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
28.4. 09:00 - 13:00	KRATOS-XPS	Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Sharmistha Dey	2
28.4. 14:00 - 16:00	DRIE-training	Attendees: Rhys Geoffrey Povey, Heriknaz Asatryan	3
5.5. 10:00 - 11:15	Leicacoat StAn training	Meeting point: at the cleanroom filter (building A) Attendees: Carolina Oliver Urrutia	4
6.5. 09:30 - 16:30	MIRA-STAN 1/2	Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta, Ying Hu	4
18.5. 10:30 - 11:15	Nanofab interview - Meeting room C2.11 or C2.07	This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/310295373414983?p=A06Vu2fman9ojWr9i0) Meeting ID: 310 295 373 414 983 Access code: Cw9Ff2yW Attendees: Sujan Maity	5
19.5. 12:15 - 12:50	Safety excursion Chem lab		5
19.5. 13:00 - 13:50	Safety excursion - Nanofabrication lab	Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Sujan Maity	5
19.5. 13:55 - 14:20	Safety excursion - Nanocharacterization lab		10
19.5. 14:25 - 14:55	Safety excursion - StAn lab		10
27.5. 09:00 - 24.4. 14:00	LVEM_basic (1/2)	Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil	2
28.5. 09:00 - 11:00	LVEM_basic (2/2)	Hands-on session Attendees: Anjali Valadi Palliyalil	1
28.5. 13:00 - 15:00	LVEM_basic (2/2)	Hands-on session	1

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RAITH
CRYOGENIC
SNOM-NANONICS
VERSALAB
CHEMLAB-B1.14
BRILLOUIN
FUMEHOOD…
LITESCOPE-LYRA
RIE-FLUORINE
RIGAKU9
KRATOS-XPS
UHV-XPS
EVAPORATOR
WOOLLAM-VIS
LAKESHORE
RSA
MIRA-EBL
ICON-SPM
PARYLENE-SCS
3D-PRUSA-XL
SIMS
SEE-SYSTEM
nano-CT
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
LaserMIRA
DIENER
nanoCT
PECVD
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
MINIFLEX
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
LEICA-TXP
RIE-CHLORINE
SW-TRACER
Test O2
TENUPOL
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
TGA-DISCOVERY
AMBER
Test Ondra 3
NIKON-NANO
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV…
UHV-MBE1
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
UHV-CLUSTER
NIRQUEST512
DSC-DISCOVERY
NANOSAM
LYRA
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
4-POINT
SW-CT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
Micromex
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
CLARUS-680
micro-CT-L240
NANOSCAN
MAGNETRON
LIBS-LabSys1
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LIBS-FireFly
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
MPS150
MONOWAVE
CITOPRESS
NanoOne250
LIBS-Discovery
LAURELL-NANO
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.18
LASER-DICER
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER