Monday 7.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-LEEM
SUSS-WETBENCH
UHV-XPS
UHV-PREPARATION
VERIOS
KRATOS-XPS
UHV-DEPOSITION
RIGAKU3
RAITH
BET-ANAMET
ML3-BABY
DIENER
MAGNETRON-AJA
RIGAKU9
NANOSAM
UHV-SPM
UHV-MBE
NANO-ONE-2PP
LYRA
EVAPORATOR
UHV-FTIR
HELIOS
LITESCOPE-MIRA…
LITESCOPE-LYRA
R2-PECVD
FUMEHOOD…
MIRA-STAN
UHV…
UHV-PLD
UHV…
VACUUM_OVEN-C1…
BET-DEGASSER
SPINCOATER…
TITAN
JASCO
VERSALAB
3D-PRUSA-BLACK
STEMI
NANOCALC
ZEISS-NANO
ULTRACENTRIFUGE
SHAKER-B1.18
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
ICON-SPM
3D-PRUSA-BLUE
SNOM-NANONICS
MIRA-EBL
ACCURION_RSE
RSA
nano-CT
RIE-FLUORINE
MINIFLEX
3D-PRUSA-ORANGE
TEM-SW
RIE-CHLORINE
PECVD
MIRKA
SAW-ACCUTOM
Q-LAB
RTP
SUSS-RCD8
nanoCT
TEST2
SW-BEAMER
VACUUM-OVEN-B1…
US-CUTTER
DWL
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV-CLUSTER
SW-LAB
WOOLLAM-VIS
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
Test školení
UHV-LEIS
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
NMR
WOOLLAM-MIR
NIRQUEST512
ELECTROWORKSHOP
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
R4…
TIC3X
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
CLARUS-680
NIKON-NANO
HENRY-MAGNET
LIBS-LabSys1
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
MAGNETRON
LIBS-FireFly
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-Discovery
LAURELL-NANO
Micromex
CHEMLAB-B1.14
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
LASER-DICER
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Bajwa, Laiba Asad
Holobrádek, Jakub
Holobrádek, Jakub
U Danchuk, Viktor
Jakub, Zdeněk
Hrubá, Daniela
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Rovenská, Katarína
T Kicmerova, Dina
Bolouki, Nima
Polášková, Kateřina
Pavliňák, David
Allaham, Mohammad
U Danchuk, Viktor
Endstrasser, Zdeněk
Endstrasser, Zdeněk
Wang, Yue
Žaloudková, Lucie
Daradkeh, Samer
Cuccu, Elisa
Fecko, Peter
Tmejová, Kateřina
Tmejová, Kateřina
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Varshney, Devanshu
Arregi Uribeetxebarria, Jon Ander
U Danchuk, Viktor
Staňo, Michal
U Danchuk, Viktor
U Danchuk, Viktor
Sanna, Michela
S Šamořil, Tomáš
Bajwa, Laiba Asad
U Danchuk, Viktor
Bahadur, Fateh
Ulč, Filip
Klok, Pavel
Beliančínová, Beáta
Bajwa, Laiba Asad
Ulč, Filip
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Otýpka, Martin
Surana, Karan Singh
Bajwa, Laiba Asad
S Michalička, Jan
E Tmejová, Kateřina
Otýpka, Martin

Upcoming trainings

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Term Name Description Max. attendees
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Maneesha Ramesh 10