Monday 2.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
RIE-FLUORINE
RIGAKU3
EVAPORATOR
VERIOS
UHV-XPS
RIE-CHLORINE
MIRA-EBL
UHV-PREPARATION
LEICACOAT-STAN
WITEC-RAMAN
UHV-LEEM
KRATOS-XPS
MIRA-STAN
RAITH
VERSALAB
MAGNETRON
ML3-BABY
UHV-DEPOSITION
UHV-SPM
DIENER
ICON-SPM
TITAN
LASER-DICER
RIGAKU9
CRYOGENIC
IS_NOVOCONTROL
UHV-MBE
SCIA
FUMEHOOD…
LYRA
UHV-FTIR
LIBS-FireFly
HENRY-MAGNET
NANOINDENTER
TGA-DISCOVERY
LVEM
CHEMLAB-B1.18
VNA-MPI
HELIOS
NANOSAM
ZETASIZER
WOOLLAM-VIS
SPONGEBOB
UHV…
UHV…
UHV-PLD
ULTRACENTRIFUGE
BET-DEGASSER
JASCO
SPINCOATER…
SHAKER-B1.18
Q-LAB
LaserMIRA
SAW-ACCUTOM
MIRKA
SUMMIT
SIMS
SEE-SYSTEM
RTP
ACCURION_RSE
PARYLENE-SCS
SUSS-RCD8
SNOM-NANONICS
MINIFLEX
nanoCT
nano-CT
RSA
STEMI
NANOCALC
3D-PRUSA-XL
BET-ANAMET
VACUUM_OVEN-B1…
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
ULTRAFAST-LASER
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ULTRASONIC…
UHV-CLUSTER
SW-BEAMER
Test O2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
TEM-SW
UHV-LEIS
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
PECVD
MONOWAVE
PARYLENE-DIENER
R4…
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
3D-PRUSA-ORANGE
DSC-DISCOVERY
PROTOMAT
KERR-MICROSCOPE
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
MPS150
LPCVD-SiN
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LAKESHORE
LPCVD-polySi
micro-CT-m300
FISCHIONE-TEM…
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
KAUFMAN
LITESCOPE-MIRA…
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Delforge, Cyril
Koňařík, Lukáš
Citterberg, Daniel
Štálnik, Jozef
Supalová, Linda
Piastek, Jakub
Koňařík, Lukáš
Citterberg, Daniel
Štálnik, Jozef
Citterberg, Daniel
Piastek, Jakub
Mathew, Grigory
Gejdoš, Pavel
AL Soud, Ammar
Daradkeh, Samer
Citterberg, Daniel
Slovák, Radim
Bokaei Khelejan, Hatef
Jasenský, Kryštof
Kicmerova, Dina
Tran, Quynh Nhu Thi
Šárfy, Pavlína
Koňařík, Lukáš
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Idesová, Beáta
Kovařík, Martin
Slovák, Radim
Štálnik, Jozef
Klíma, Jan
Jasenský, Kryštof
U Weisz, Hugo
U Danchuk, Viktor
D'Angelo, Elena
Šárfy, Pavlína
Gejdoš, Pavel
Mathew, Grigory
Konečný, Martin
Vymazal, Jan
paiva de araujo, Estacio
U Weisz, Hugo
U Danchuk, Viktor
D'Angelo, Elena
S Polčák, Josef
Jadhao, Pranjali
Polášková, Kateřina
Valadi Palliyalil, Anjali
Mathew, Grigory
Tkachenko, Serhii
Delforge, Cyril
Citterberg, Daniel
B Danchuk, Viktor
Lukiienko, Iryna
Arregi Uribeetxebarria, Jon Ander
Klíma, Jan
Koňařík, Lukáš
Piastek, Jakub
U Danchuk, Viktor
D'Angelo, Elena
U Danchuk, Viktor
D'Angelo, Elena
Kovařík, Martin
Bokaei Khelejan, Hatef
Bahadur, Fateh
Fallahpour, Mojdeh
Kolíbalová, Eva
Michalička, Jan
Delforge, Cyril
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Arregi Uribeetxebarria, Jon Ander
Klíma, Jan
Daradkeh, Samer
U Danchuk, Viktor
Idesová, Beáta
Kovařík, Martin
Staňo, Michal
U Danchuk, Viktor
Vozár, Tomáš
Urbánek, Michal
Bensalem, Mohamed
B Petruš, Josef
S Kolíbalová, Eva
Tkachenko, Serhii
Urbánek, Michal
Šťastný, Přemysl
U Danchuk, Viktor
Saldan, Ivan
Franta, Daniel
Tvrdoňová, Anna
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Kalleshappa, Bindu
Tkachenko, Serhii
U Tmejová, Kateřina

Upcoming trainings

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Term Name Description Max. attendees
2.3. 09:30 - 10:30 UV marking Laser Training is focused on the basic operations of the 5W marking UV laser and the connected Lightburn software. 2
4.3. 09:00 - 16:00 GC-MS CLARUS-680 Training GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová 2
4.3. 09:00 - 11:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Derenik Petrosyan, Heriknaz Asatryan 2
5.3. 10:00 - 4.3. 11:30 ML3-Baby ML3 Baby MicroWriter training Attendees: Jiří Liška 1
6.3. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Petr Pazourek, Sujan Maity, Tomáš Janoušek 4
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ondrej Kubinec 4