Friday 10.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
NIKON-NANO
MIRA-STAN
MPS150
RAITH
CHEMLAB-B1.14
WITEC-RAMAN
SUSS-WETBENCH
TEGRAMIN
VERIOS
JASCO
VERSALAB
CHEMLAB-B1.18
UHV-SPM
LEICACOAT-STAN
RIE-FLUORINE
MIRA-EBL
RIGAKU3
LAKESHORE
NMR
4-POINT
UHV-PLD
FUMEHOOD…
FUMEHOOD-HF
UHV-XPS
UHV-LEEM
micro-CT-L240
VNA-MPI
WOOLLAM-VIS
LEICACOAT-NANO
CRYOGENIC
NANOSAM
TITAN
DIENER
AMBER
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
ICON-SPM
LYRA
ML3-BABY
TEM-SW
DWL
GLOVEBOX…
ALD-BENEQ
BAMBULAB
BRILLOUIN
VISCOMETER
FTIR-CHEMLAB
VACUUM-OVEN-B1…
EVAPORATOR
UHV-PREPARATION
DRYING-OVEN-B1…
ELECTROWORKSHOP
SIMS
UHV…
SNOM-NANONICS
WIRE-BONDER
PARYLENE-SCS
UHV-FTIR
SEE-SYSTEM
nano-CT
LaserMIRA
SUMMIT
L450
SHAKER-B1.18
RSA
RIE-CHLORINE
nanoCT
MINIFLEX
VUVAS
XEF2
RIGAKU9
microCT
ZWICK
SUSS-RCD8
ZETASIZER
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
UHV-MBE
STEMI
NANOCALC
Test školení
UHV-MBE2
UHV-MBE1
TGA-DISCOVERY
ULTRAFAST-LASER
Heliscan
THEORY-SUPPORT
MIRKA
ULTRASONIC…
US-CUTTER
TGA96
TEST-RFID4
JAZ3-CHANNEL
TEST-RFID2
VACUUM_OVEN-C1…
UHV-LEIS
UHV-DEPOSITION
TEST2
Test O2
Test Ondra 3
FTIR
FISCHIONE-160
TENUPOL
LEICA-TXP
CITOVAC
VACUUM-OVEN-B1…
SW-TRACER
UHV…
SW-LAB
SW-BEAMER
BET-ANAMET
UHV-CLUSTER
NANO-ONE-2PP
PECVD
FTIRMAG
DHR
DIMPLING…
SPONGEBOB
LECTROPOL
R4…
FLOWBOX
HELIOS
FUMEHOOD…
SW-CT
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DRIE
CRYOMILL
DAWN-HELEOS
BET-DEGASSER
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
micro-CT-m300
PECVD-NANOFAB
PARYLENE-DIENER
DSC-DISCOVERY
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
MONOWAVE
KERR-MICROSCOPE
CITOPRESS
NANOSCAN
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
HENRY-MAGNET
LVEM
FRASCAN
IR-RAMAN
NANOINDENTER
CHEMLAB-B1.16
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
K70
PROTOMAT
LASER-DICER
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
UV-LASER
Polčák, Josef
Janů, Lucie
Dey, Sharmistha
Fatima, Areej
Jasenský, Kryštof
Jasenský, Kryštof
Jasenský, Kryštof
Jasenský, Kryštof
Baeva, Maria
Song, Yanzhen
Allaham, Mohammad
Kovařík, Martin
Šimůnková, Helena
S Lehchenkova, Iryna
Kunc, Jan
Kunc, Jan
U Lišková, Zuzana
U Tmejová, Kateřina
Tmejová, Kateřina
Fanisaberi, Amirmohsen
T Spotz, Zdeněk
Bakhshikhah, Mahan
AL Soud, Ammar
Supalová, Linda
Liška, Jiří
Liška, Jiří
Havlíková, Tereza
Ščasnovič, Erik
De, Puja
Pišťák, Jan
Tmejová, Kateřina
Valadi Palliyalil, Anjali
Hrdinová, Sára
Slavíček, Radek
U Tmejová, Kateřina
Tmejová, Kateřina
Hrubá, Daniela
Hrubá, Daniela
Remešová, Michaela
Pišťák, Jan
Kunc, Jan
Supalová, Linda
Supalová, Linda
Supalová, Linda
T Roupcová, Pavla
Kalleshappa, Bindu
Holcman, Vladimír
Fanisaberi, Amirmohsen
Šimůnková, Helena
Kepič, Peter
Jasenský, Kryštof
Jasenský, Kryštof
Hrubá, Daniela
Hrubá, Daniela
Kolář, David
Pribytova, Ekaterina
Franta, Daniel
Daradkeh, Samer
Pribytova, Ekaterina
S Danchuk, Viktor
S Michalička, Jan
Kovařík, Martin
T Iakoubovskii, Konstantin
Šimůnková, Helena
Bolouki, Nima
Krútek, Šimon
Hrdinová, Sára
S Šamořil, Tomáš
Liška, Jiří
Kicmerova, Dina
Hrdý, Radim
T Tmejová, Kateřina
Kunc, Jan
Roupcová, Pavla
Krčma, Jakub
E Tmejová, Kateřina
Lepcio, Petr
U Tmejová, Kateřina
Krútek, Šimon
Hrubá, Daniela
Štindl, Jáchym
Staňo, Michal

Upcoming trainings

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Term Name Description Max. attendees
10.7. 09:00 - 17:30 Amber Practice Attendees: Lukáš Zezulka 2
10.7. 09:00 - 13:00 Sharmisha Day - hands on Sharmisha Day - hands on Attendees: Sharmistha Dey 1
10.7. 10:00 - 11:00 Glovebox training Basic description of the instrument (transfer chambers, accessories) Attendees: Amirmohsen Fanisaberi 3
14.7. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Debika Devi Thongam, Peter Fecko 4
14.7. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point at the microscope, bring your typical sample. Attendees: Elisa Cuccu, DAVIDE MURTAS 2
16.7. 09:00 - 11:00 Woollam IR-VASE First part of training Attendees: Luca Mascaretti 1
16.7. 10:00 - 10:45 Solvent fumehood training - ISO 5 clean room Training for a solvent fume hood. Attendees: DAVIDE MURTAS 2
16.7. 10:45 - 11:30 Etching Fumehood training - ISO5 cleanroom Training for Etching Fumehood. We will meet directly in ISO5 clean room. Attendees: DAVIDE MURTAS 2
20.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 354 620 049 035 61 Access code: 7AD77PX3 Attendees: Redzic Milica, Cimolato Andrea, Le Thien 5
21.7. 09:30 - 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Petr Sysel, Debika Devi Thongam 3
21.7. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
21.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Redzic Milica, Cimolato Andrea, Le Thien 5
21.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Vladislav Dvořák, Redzic Milica, Le Thien, Laura Búšová 10
21.7. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Lukáš Zezulka 10
22.7. 09:00 - 10:30 JASCO training- CZ Description of holders and software, basic measurement Attendees: Marie Jakešová, Anna Tvrdoňová, Šimon Krútek 3
22.7. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Iosif Tantis, Sharmistha Dey, Debika Devi Thongam 4
22.7. 10:30 - 12:00 JASCO training - EN Description of holders and software, basic measurement Attendees: Laiba Asad Bajwa, Rosmi Vinson 2
23.7. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Navajsharif Shamshuddin Shaikh, Ondrej Kubinec, Debika Devi Thongam 3
24.7. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.7. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Debika Devi Thongam 1
24.7. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ondrej Kubinec 1
27.7. 09:30 - 13:30 ZWICK Meeting point is in front of the Advanced Chemical laboratory. Obligatory prerequisites 1. Pass the Chemical laboratory safety excursion in Moodle (https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=173): 2. Answer the ZWICK applicant questionnaire 3. Read the ZWICK rules (mark the activity as complete with ✔️) 4. Bring your own sample Recommended prerequisites 5. Get familiar with the Layout for ZWICK basic training (mark the activity as complete with ✔️) Attendees: Rasul Valiyev 2
29.7. 09:30 - 13:00 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Iosif Tantis, Debika Devi Thongam 2
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Debika Devi Thongam, Kateřina Polášková 3
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1