Wednesday 4.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIE-FLUORINE
SUSS-WETBENCH
WITEC-RAMAN
KRATOS-XPS
VERIOS
MAGNETRON
UHV-XPS
MIRA-EBL
EVAPORATOR
VERSALAB
LASER-DICER
MIRA-STAN
TITAN
CRYOGENIC
LEICACOAT-NANO
ICON-SPM
ML3-BABY
ULTRACENTRIFUGE
LVEM
UHV-LEEM
LEICACOAT-STAN
SUSS-MA8
UHV-DEPOSITION
WOOLLAM-RC2
WIRE-BONDER
micro-CT-L240
TGA-DISCOVERY
PARYLENE-SCS
SIMS
ALD-FIJI
DEKTAK
PARYLENE-DIENER
RIGAKU9
NANOINDENTER
CHEMLAB-B1.18
IS_NOVOCONTROL
ZWICK
LITESCOPE-MIRA…
LEICA-TXP
NANOCALC
LIBS-FireFly
UHV-LEIS
FUMEHOOD…
BET-DEGASSER
JASCO
SW-CT
RIE-CHLORINE
RIGAKU3
NANOSAM
VACUUM_OVEN-C1…
FTIR-CHEMLAB
RAITH
SPONGEBOB
UHV-PREPARATION
WOOLLAM-VIS
TORNADO-M4
BET-ANAMET
HELIOS
LYRA
NMR
DIENER
STEMI
RTP
SHAKER-B1.18
MINIFLEX
SUMMIT
LaserMIRA
ACCURION_RSE
SEE-SYSTEM
nanoCT
nano-CT
SUSS-RCD8
RSA
SNOM-NANONICS
3D-PRUSA-XL
TEST-RFID2
SW-BEAMER
CITOVAC
UHV…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
JAZ3-CHANNEL
FTIR
VACUUM_OVEN-B1…
UHV-CLUSTER
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
XEF2
microCT
ZETASIZER
UHV…
UHV-SPM
SW-LAB
Test školení
SW-TRACER
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
SPINCOATER…
UHV-PLD
TGA96
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-MBE
Q-LAB
MONOWAVE
SAW-ACCUTOM
4-POINT
DHR
DIMPLING…
DRYING_OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
CRYOMILL
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
DRIE
TIC3X
micro-CT-m300
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BRILLOUIN
CPD
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
Micromex
DAWN-HELEOS
MIRKA
NANOSCAN
KERR-MICROSCOPE
HENRY-MAGNET
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
MPS150
CITOPRESS
NIKON-NANO
LAKESHORE
NIRQUEST512
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
PROTOMAT
LPCVD-SiN
TEGRAMIN
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
ZEISS-STAN
SCIA
KAUFMAN
LPCVD-polySi
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Piastek, Jakub
Supalová, Linda
Supalová, Linda
Bajwa, Laiba Asad
Prášek, Jan
Koňařík, Lukáš
Delforge, Cyril
Piastek, Jakub
Supalová, Linda
paiva de araujo, Estacio
Weisz, Hugo
Mikerásek, Vojtěch
Havelka, Tomáš
Polčák, Josef
Pavliňák, David
Fatima, Areej
Bensalem, Mohamed
Valadi Palliyalil, Anjali
Koňařík, Lukáš
Arregi Uribeetxebarria, Jon Ander
Prášek, Jan
Papež, Nikola
Šebestová, Zuzana
Hrůza, Dominik
Hrůza, Dominik
Liška, Jiří
Klíma, Jan
Štálnik, Jozef
Slovák, Radim
Prášek, Jan
S Prášek, Jan
Lukiienko, Iryna
Tichý, Martin
Hrdinová, Sára
Delforge, Cyril
Piastek, Jakub
T Dao, Radek
Fecko, Peter
S Michalička, Jan
Michalička, Jan
Lukiienko, Iryna
Klíma, Jan
Yuan, Yunhuan
Velluvakandy, Roshan
Bakhshikhah, Mahan
B Gablech, Evelína
T Piastek, Jakub
Supalová, Linda
Foltýn, Michael
S Kolíbalová, Eva
Šebestová, Zuzana
Kalleshappa, Bindu
Supalová, Linda
U Polčák, Josef
Přibyl, Roman
T Hrdý, Radim
Petřík, Michal
B Petruš, Josef
Tvrdoňová, Anna
Vařeka, Karel
Niapos, Eleftherios
Liška, Jiří
Bajwa, Laiba Asad
Caha, Ondřej
Bensalem, Mohamed
Tkachenko, Serhii
Daradkeh, Samer
Sevriugina, Veronika
T Dao, Radek
Man, Ondřej
Supalová, Linda
Vozár, Tomáš
Průša, Stanislav
Tmejová, Kateřina
Tkachenko, Serhii
Foltýn, Michael
Kareš, Martin
Eliáš, Marek
Mathew, Grigory
Kumar, Sanjay
Danchuk, Viktor
Mathew, Grigory
S Lišková, Zuzana
Tvrdoňová, Anna
Šebestová, Zuzana
Franta, Daniel
Kicmerova, Dina
Tkachenko, Serhii
Bahadur, Fateh
Jelínek, Eduard
Michlovská, Lenka
U Eliáš, Marek

Upcoming trainings

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Term Name Description Max. attendees
4.3. 09:00 - 11:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Derenik Petrosyan, Heriknaz Asatryan 2
5.3. 10:00 - 4.3. 11:30 ML3-Baby ML3 Baby MicroWriter training Attendees: Jiří Liška 1
6.3. 10:00 - 13:01 CRYOGENIC VSM Basic CRYOGENIC VSM Attendees: Radek Slavíček 2
6.3. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Petr Pazourek, Ondrej Kubinec, Sujan Maity, Tomáš Janoušek 4
9.3. 09:00 - 16:00 GC-MS CLARUS-680 Training GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová 2
10.3. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak 3
11.3. 09:00 - 10:30 JASCO training Description of holders and software, basic measurement Attendees: Daina Dayana Arenas Buelvas, Karan Singh Surana, Pedro Henrique de Oliveira Santiago 3
12.3. 10:00 - 10:30 Electroworkshop - basics Basic & safety training for entering the electroworkshop. It is a prerequisite for all subsequent trainings (3d printers, soldering, laser) for instruments located in the electroworkshop. 3
13.3. 09:30 - 12:00 ICON-SPM basic training Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek 3
17.3. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem 3
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Tomáš Janoušek 3
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ondrej Kubinec 4