Wednesday 11.2.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
DIENER
RIE-FLUORINE
KRATOS-XPS
EVAPORATOR
VERIOS
MIRA-STAN
ML3-BABY
RAITH
VERSALAB
WITEC-RAMAN
BET-DEGASSER
SUSS-MA8
CRYOGENIC
ICON-SPM
RIGAKU3
LEICACOAT-STAN
HELIOS
TITAN
RIGAKU9
PARYLENE-SCS
R4…
ALD-BENEQ
UHV-SPM
ALD-FIJI
KEITHLEY-4200
UHV-PREPARATION
FUMEHOOD-HF
UHV-LEEM
FUMEHOOD…
CLARUS-680
MIRA-EBL
ULTRAFAST-LASER
SPONGEBOB
MPS150
BRILLOUIN
CHEMLAB-B1.14
WOOLLAM-VIS
NANOSAM
NANOSCAN
BET-ANAMET
ZWICK
LASER-DICER
DRYING_OVEN-B1…
UHV-DEPOSITION
LaserMIRA
SUMMIT
SEE-SYSTEM
NANOCALC
SHAKER-B1.18
STEMI
3D-PRUSA-XL
SIMS
SNOM-NANONICS
RSA
nano-CT
nanoCT
SW-LAB
MINIFLEX
RIE-CHLORINE
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
SW-BEAMER
THEORY-SUPPORT
SW-TRACER
CITOVAC
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
UHV…
UHV-CLUSTER
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEM-SW
UHV-PLD
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
PECVD
DSC-DISCOVERY
PARYLENE-DIENER
FUMEHOOD…
DIMPLING…
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
DRIE
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
DHR
SW-CT
PECVD-NANOFAB
TORNADO-M4
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
VNA-MPI
LEICACOAT-NANO
3D-PRUSA-ORANGE
WOOLLAM-MIR
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
DEKTAK
LABOTOM5
MONOWAVE
LAKESHORE
CITOPRESS
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
PROTOMAT
LPCVD-SiN
FRASCAN
KAUFMAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
IR-RAMAN
LPCVD-polySi
K70
R2-PECVD
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
UV-LASER
Majcen, Fabian
Bajwa, Laiba Asad
Tvrdoňová, Anna
Delforge, Cyril
Jakešová, Marie
Jakešová, Marie
Bokaei Khelejan, Hatef
T Eliáš, Marek
Citterberg, Daniel
Jakešová, Marie
Tvrdoňová, Anna
Koňařík, Lukáš
Majcen, Fabian
Polčák, Josef
Wang, Yue
Varaďa, Jan
Šik, Ondřej
Bajwa, Laiba Asad
Bokaei Khelejan, Hatef
Prášek, Jan
Pišťák, Jan
Koňařík, Lukáš
Ronoh, Kipkurui
Kalleshappa, Bindu
Sevriugina, Veronika
Wang, Yue
Tvrdoňová, Anna
Martyniuk, Oleh
Jakešová, Marie
Pistis, Martino
Delforge, Cyril
Slavíček, Radek
Niapos, Eleftherios
Chamradová, Ivana
Havelka, Tomáš
Daradkeh, Samer
AL Soud, Ammar
Jakešová, Marie
Tvrdoňová, Anna
U Danchuk, Viktor
Andres Navarro Giraldo, Jorge
Talíř, Marek
Bahadur, Fateh
Wang, Yue
Pišťák, Jan
Kalleshappa, Bindu
Lepcio, Petr
Šťastný, Přemysl
Huang, Yong
Kolíbalová, Eva
S Michalička, Jan
Malecot, Axel Fabien Benoit
Varshney, Devanshu
Bajwa, Laiba Asad
Fecko, Peter
Janů, Lucie
Mirdamadi Khouzani, Sayed Hossein
Hrubá, Daniela
Štálnik, Jozef
Kovařík, Martin
Danchuk, Viktor
Jakešová, Marie
Danchuk, Viktor
Foltýn, Michael
S Tmejová, Kateřina
Majcen, Fabian
Arregi Uribeetxebarria, Jon Ander
Tvrdoňová, Anna
Kovařík, Martin
Delforge, Cyril
Foltýn, Michael
Franta, Daniel
T Danchuk, Viktor
Kovařík, Martin
AL Soud, Ammar
Fanisaberi, Amirmohsen
Delforge, Cyril
Foltýn, Michael
Hrubá, Daniela

Upcoming trainings

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Term Name Description Max. attendees
12.2. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Eduard Jelínek, Navaj Shaikh, Saurabh Pathak 4
12.2. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Martino Pistis, Elisa Cuccu 4
13.2. 10:00 - 11:00 Laser Dicer - basics Basic training - how to cut a Si wafer. Attendees: Iryna Lukiienko 2
13.2. 14:00 - 18:00 Rigaku 3 - hands on Hands on Attendees: Pedro Henrique de Oliveira Santiago 1
17.2. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák 2
19.2. 09:30 - 12:00 ICON-SPM basic training 3
23.2. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Jakub Krčma, Kryštof Jasenský 3
23.2. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 347 469 442 329 50 Přístupový kód: Nh7js27A 5
24.2. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Monika Kreuzerová 2
24.2. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Ekaterina Pribytova 5
24.2. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
24.2. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
24.2. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Eduard Jelínek 10
27.2. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Kryštof Jasenský 1
27.2. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jakub Krčma 1
27.2. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1