Thursday 15.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
ICON-SPM
VERSALAB
BET-ANAMET
VERIOS
TITAN
NANOCALC
RIE-FLUORINE
LEICACOAT-STAN
RIGAKU3
UHV-LEEM
UHV-PREPARATION
KRATOS-XPS
IS-NOVOCONTROL
UHV-DEPOSITION
EVAPORATOR
LEICACOAT-NANO
RAITH
SUSS-WETBENCH
UHV-SPM
LPCVD-polySi
TEGRAMIN
FUMEHOOD…
ELECTROWORKSHOP
UHV-XPS
SNOM-NANONICS
VNA-MPI
HELIOS
MAGNETRON
FUMEHOOD…
FUMEHOOD…
UHV-LEIS
LASER-DICER
WOOLLAM-RC2
DHR
CHEMLAB-B1.18
R2-PECVD
NMR
WITEC-RAMAN
APCVD
WOOLLAM-VIS
ALD-FIJI
CHEMLAB-B1.14
NIKON-NANO
BET-DEGASSER
NANOSAM
VACUUM-OVEN-B1…
SUSS-RCD8
DIENER
FTIR-CHEMLAB
VACUUM_OVEN-C1…
RIE-CHLORINE
AMBER
SUSS-MA8
MIRA-STAN
SHAKER-B1.18
STEMI
EBPG
SUMMIT
nanoCT
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
MINIFLEX
nano-CT
LaserMIRA
RSA
SW-BEAMER
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
MIRA-EBL
Test školení
SW-LAB
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR
CITOVAC
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
PECVD
TEST-RFID2
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-MBE
UHV-PLD
MIRKA
WOOLLAM-MIR
TEM-SW
R4…
SW-CT
DRIE
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
FLOWBOX
TIC3X
LYRA
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
CLARUS-680
DISCO-DICING…
3D-PRUSA-XL
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
NANOWIZARD
BAMBULAB
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
FUMEHOOD…
Micromex
3D-PRUSA-ORANGE
ML3-BABY
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
DEKTAK
LABOTOM5
NANO-ONE-2PP
DSC-DISCOVERY
LAKESHORE
MONOWAVE
CITOPRESS
NANOSCAN
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
CRYOGENIC
LPCVD-SiN
micro-CT-L240
FISCHIONE-TEM…
micro-CT-m300
DAWN-HELEOS
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
ZEISS-STAN
SCIA
KAUFMAN
LITESCOPE-MIRA…
IR-RAMAN
K70
KEITHLEY-4200
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Staňo, Michal
B Máčala, Jakub
Staňo, Michal
Staňo, Michal
T Danchuk, Viktor
Song, Yanzhen
Song, Yanzhen
Lee, Hyesung
Tantis, Iosif
Kicmerova, Dina
Pišťák, Jan
Ali, Hasan
B Michalička, Jan
E Zita, Jiří
Dinis, Matej
Jakešová, Marie
Kratochvílová, Ivana
U Holas, Jiří
Pišťák, Jan
Přibyl, Roman
Bednaříková, Vendula
David, Jiří
Polčák, Josef
David, Jiří
Molnár, Tomáš
S Polčák, Josef
Jadhao, Pranjali
Danchuk, Viktor
Danchuk, Viktor
D'Angelo, Elena
Jakešová, Marie
Kumar, Sanjay
Lišková, Zuzana
E Zita, Jiří
D'Angelo, Elena
Dinis, Matej
Rotter, Marek
E Zita, Jiří
Staňo, Michal
Molnár, Tomáš
Kepič, Peter
Pribytova, Ekaterina
Bahadur, Fateh
U Prášek, Jan
E Zita, Jiří
E Zita, Jiří
Vaníčková, Elena
Kumar, Sanjay
B Nebojsa, Alois
Kreuzerová, Monika
Fanisaberi, Amirmohsen
Bolouki, Nima
Fanisaberi, Amirmohsen
paiva de araujo, Estacio
Dinis, Matej
Dubroka, Adam
Jelínek, Eduard
Hu, Ying
E Zita, Jiří
Tantis, Iosif
U Staňo, Michal
Hu, Ying
E Zita, Jiří
E Zita, Jiří
Hu, Ying
T Danchuk, Viktor
Burda, Daniel
T Iakoubovskii, Konstantin
E Zita, Jiří
T Lepcio, Petr

Upcoming trainings

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Term Name Description Max. attendees
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
15.10. 13:00 - 17:30 Amber SEM-FIB training Attendees: Jan Kramář, Dinara Sobola 2
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 09:00 - 17:30 Amber EDS-EBSD training Attendees: Veronika Mazánová, Dinara Sobola 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek, Marc Arvie Talavera 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Patricie Chýlková, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:40 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Michal Slovák, Zequn Zhang, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Patricie Chýlková, Karol Križan, Lukáš Dokulil, Martin Kužílek 10
20.10. 14:30 - 15:20 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek 5
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Karol Križan, Lukáš Dokulil, Martin Kužílek 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1