Wednesday 23.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
RIGAKU3
EVAPORATOR
ML3-BABY
TEM-SW
3D-PRUSA-ORANGE
SUSS-MA8
ELECTROWORKSHOP
TITAN
AMBER
FUMEHOOD-HF
RIE-FLUORINE
VACUUM_OVEN-C1…
IS-NOVOCONTROL
R4…
MIRA-STAN
MIRA-EBL
LYRA
UHV-XPS
HELIOS
LASER-DICER
CRYOGENIC
FUMEHOOD…
LAURELL-NANO
FUMEHOOD…
PARYLENE-SCS
UHV-DEPOSITION
FUMEHOOD…
NANOCALC
DEKTAK
UHV-PREPARATION
TORNADO-M4
MPS150
3D-PRUSA-BLACK
ULTRACENTRIFUGE
ZEISS-NANO
NMR
WOOLLAM-VIS
BAMBULAB
DHR
CHEMLAB-B1.14
NANOSAM
NANOINDENTER
FTIR
LEICACOAT-STAN
DIENER
3D-PRUSA-XL
DRIE
LITESCOPE-MIRA…
BET-ANAMET
SUMMIT
SW-BEAMER
SHAKER-B1.18
STEMI
NANO-ONE-2PP
LaserMIRA
SEE-SYSTEM
SIMS
ICON-SPM
SNOM-NANONICS
SW-LAB
nano-CT
nanoCT
MINIFLEX
RIE-CHLORINE
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
RSA
TEST-RFID2
SW-TRACER
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
LEICA-TXP
THEORY-SUPPORT
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
SAW-ACCUTOM
TEST-RFID4
TGA96
Heliscan
UHV-CLUSTER
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
SPINCOATER…
WOOLLAM-MIR
MIRKA
LECTROPOL
CRYOMILL
SW-CT
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
Micromex
ALD-FIJI
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
MINIEVAP
BET-DEGASSER
BRILLOUIN
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
PECVD
MAGNETRON
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LIBS-LabSys1
LABOTOM5
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
3D-PRUSA-BLUE
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.18
LIBS-FireFly
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER
Povey, Rhys Geoffrey
Matějka, Kryštof
Matějka, Kryštof
Jelínek, Eduard
Jakešová, Marie
Jakešová, Marie
Jelínek, Eduard
Tantis, Iosif
Polčák, Josef
Sobola, Dinara
Danchuk, Viktor
Žaloudková, Lucie
Novotná, Lenka
Žaloudková, Lucie
Povey, Rhys Geoffrey
Idesová, Beáta
Holobrádek, Jakub
Povey, Rhys Geoffrey
Jelínek, Eduard
T Piastek, Jakub
Duchoň, Jan
Huang, Yong
Kumar, Sanjay
Fecko, Peter
Jakešová, Marie
Jakešová, Marie
Kumar, Sanjay
Kumar, Sanjay
T Michalička, Jan
S Michalička, Jan
T Iakoubovskii, Konstantin
T Iakoubovskii, Konstantin
Jakešová, Marie
Jakešová, Marie
Matějka, Kryštof
Jakešová, Marie
Lukiienko, Iryna
Lukiienko, Iryna
S Sobola, Dinara
Eliáš, Marek
Ulč, Filip
Matějka, Kryštof
Jelínek, Eduard
D'Angelo, Elena
Ali, Hasan
Jelínek, Eduard
Lukiienko, Iryna
Jakešová, Marie
Tvrdoňová, Anna
Tvrdoňová, Anna
Jakešová, Marie
D'Angelo, Elena
Jewula, Pawel
Jelínek, Eduard
Jelínek, Eduard
D'Angelo, Elena
Pavliňák, David
Liška, Jiří
Kumar, Sanjay
Saldan, Ivan
Holobrádek, Jakub
U Jewula, Pawel
Dubroka, Adam
Spusta, Tomáš
Chamradová, Ivana
Saldan, Ivan
S Danchuk, Viktor
B Máčala, Jakub
Liška, Jiří
Gejdoš, Pavel
Povey, Rhys Geoffrey
Spusta, Tomáš
Jelínek, Eduard
Ulč, Filip

Upcoming trainings

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Term Name Description Max. attendees
23.9. 15:30 - 17:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Sujan Maity 1
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
25.9. 10:00 - 12:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik 1
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10