Friday 21.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
AMBER
VNA-MPI
RIGAKU3
WOOLLAM-RC2
RIE-FLUORINE
MIRA-STAN
VERSALAB
DEKTAK
FUMEHOOD…
SUSS-WETBENCH
TEGRAMIN
LITESCOPE-MIRA…
VACUUM-OVEN-B1…
TITAN
VERIOS
LASER-DICER
R2-PECVD
ZEISS-STAN
KERR-MICROSCOPE
HENRY-MAGNET
CHEMLAB-B1.18
CHEMLAB-B1.14
SUSS-MA8
WOOLLAM-MIR
3D-PRUSA-XL
NANO-ONE-2PP
NANOSAM
JASCO
ZWICK
WITEC-RAMAN
L450
VUVAS
FTIR
VACUUM_OVEN-C1…
UHV-PREPARATION
NIKON-NANO
UHV-DEPOSITION
BET-ANAMET
ICON-SPM
MIRA-EBL
SUSS-RCD8
PECVD
NMR
ULTRACENTRIFUGE
ML3-BABY
FUMEHOOD…
FUMEHOOD…
SPONGEBOB
DRIE
EVAPORATOR
BET-DEGASSER
HELIOS
LYRA
BRILLOUIN
LEICACOAT-STAN
PARYLENE-SCS
TENUPOL
Heliscan
THEORY-SUPPORT
TGA96
TEST-RFID4
TEST-RFID2
Test školení
nanoCT
nano-CT
TEST2
Test O2
Test Ondra 3
RSA
FISCHIONE-160
LEICA-TXP
SIMS
SW-TRACER
SW-LAB
SW-BEAMER
UHV-MBE1
CEITEC-NANO
STEMI
SNOM-NANONICS
NANOCALC
TORNADO-M4
SHAKER-B1.18
SUMMIT
LaserMIRA
MECHANICAL…
SEE-SYSTEM
TGA-DISCOVERY
UHV-FTIR
UHV-MBE2
APCVD-Diffusion
APCVD
CITOVAC
VACUUM-OVEN-B1…
MAGNETRON-AJA
ARES
VISCOMETER
WIRE-BONDER
NANOWIZARD
ALD-BENEQ
XEF2
RIGAKU9
GLOVEBOX…
microCT
MPS150
ZETASIZER
FTIR-CHEMLAB
JAZ3-CHANNEL
BAMBULAB
UHV-SPM
RIE-CHLORINE
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-CLUSTER
ALD-FIJI
UHV…
UHV…
DISCO-DICING…
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
DWL
MINIFLEX
ACCURION_RSE
TUBE-FURNACE
KEITHLEY-4200
R4…
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
ELECTROWORKSHOP
FLOWBOX
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LECTROPOL
IS-NOVOCONTROL
CHEMLAB-B1.16
LPCVD-SiN
Micromex
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
micro-CT-L240
NANOINDENTER
micro-CT-m300
DAWN-HELEOS
FTIRMAG
4-POINT
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
LPCVD-polySi
LAKESHORE
DIENER
TEM-SW
ZEISS-NANO
LEXT
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
SW-COMSOL
WOOLLAM-VIS
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
FUMEHOOD-HF
CLR-ISO8-Lab…
MINIEVAP
NIRQUEST512
CRYOGENIC
DHR
PROTOMAT
LVEM
RAITH
DRYING-OVEN-B1…
MAGNETRON
DIMPLING…
LABOTOM5
CPD
SW-CT
CRYOMILL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
TIC3X
UV-LASER
Polčák, Josef
Fatima, Areej
Bahadur, Fateh
Beliančínová, Beáta
Kratochvílová, Ivana
Iakoubovskii, Konstantin
Iakoubovskii, Konstantin
Klíma, Jan
Pribytova, Ekaterina
Kharchenko, Ganna
Bednaříková, Vendula
Hrdinová, Sára
Kalleshappa, Bindu
Janů, Lucie
T Franta, Daniel
Cuccu, Elisa
T Eliáš, Marek
Tvrdoňová, Anna
Fecko, Peter
Ščasnovič, Erik
Ulč, Filip
Ulč, Filip
Daradkeh, Samer
Molnár, Tomáš
Liška, Jiří
Liška, Jiří
Tvrdoňová, Anna
T Supalová, Linda
Liška, Jiří
MURTAS, DAVIDE
Skálová, Zdenka
Havlíková, Tereza
Ulč, Filip
Ulč, Filip
E Tmejová, Kateřina
Valiyev, Rasul
Ali, Hasan
Kuběna, Ivo
Nghiem, Xuan Duc
Kubinec, Ondrej
Kharchenko, Ganna
Janů, Lucie
S Lehchenkova, Iryna
SAHIL, Muhammad
Kharchenko, Ganna
Lepcio, Petr
Saldan, Ivan
Fecko, Peter
Cuccu, Elisa
Kumar, Sanjay
T Sanna, Michela
S Danchuk, Viktor
Říhová, Martina
Lepcio, Petr
Bakhshikhah, Mahan
Slovák, Vojtěch
Přibyl, Roman
Cuccu, Elisa
Danchuk, Viktor
Jakub, Zdeněk
Tvrdoňová, Anna
Jakub, Zdeněk
Surana, Karan Singh
Dey, Sharmistha
Liška, Jiří
Fecko, Peter
Cuccu, Elisa
de Oliveira Santiago, Pedro Henrique
Saldan, Ivan
Liška, Jiří
T Supalová, Linda
T Supalová, Linda
Tvrdoňová, Anna
Fecko, Peter
Piastek, Jakub
Surana, Karan Singh
Kicmerova, Dina
S Šamořil, Tomáš
Krčma, Jakub
Ščasnovič, Erik

Upcoming trainings

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Term Name Description Max. attendees
21.8. 09:30 - 10:15 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko 2
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
21.8. 10:15 - 11:00 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko 2
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 10:00 - 11:15 Citovac training Attendees: Bindu Kalleshappa, Karan Singh Surana 2
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kristýna Kupková, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Hnilica Jan, Kristýna Kupková, Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Kristýna Kupková, Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3