Wednesday 23.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
ML3-BABY
EVAPORATOR
RIE-FLUORINE
FUMEHOOD-HF
RIGAKU3
SUSS-MA8
AMBER
TITAN
CRYOGENIC
DRIE
UHV-PREPARATION
LITESCOPE-MIRA…
NANO-ONE-2PP
KEITHLEY-4200
VERSALAB
MIRA-EBL
FUMEHOOD…
PARYLENE-SCS
HELIOS
LAURELL-NANO
UHV-DEPOSITION
LASER-DICER
UHV-XPS
DIENER
FUMEHOOD…
ULTRACENTRIFUGE
MPS150
CHEMLAB-B1.14
WOOLLAM-VIS
TEM-SW
NANOSAM
NANOCALC
BAMBULAB
3D-PRUSA-XL
MIRA-STAN
DEKTAK
LEICACOAT-STAN
SUMMIT
STEMI
SIMS
BET-ANAMET
SHAKER-B1.18
SEE-SYSTEM
LaserMIRA
nanoCT
ICON-SPM
SNOM-NANONICS
RSA
nano-CT
MINIFLEX
RIE-CHLORINE
SUSS-RCD8
ACCURION_RSE
RTP
Q-LAB
SPINCOATER…
SAW-ACCUTOM
MIRKA
PECVD
3D-PRUSA-ORANGE
SW-BEAMER
TEST2
SW-LAB
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
SW-TRACER
THEORY-SUPPORT
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-SPM
UHV-CLUSTER
3D-PRUSA-BLACK
WOOLLAM-MIR
3D-PRUSA-BLUE
ELECTROWORKSHOP
SW-CT
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
R4…
TIC3X
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
FUMEHOOD…
DISCO-DICING…
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BET-DEGASSER
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
FUMEHOOD…
CLARUS-680
ZEISS-NANO
MAGNETRON
LITESCOPE-LYRA
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LIBS-Discovery
LABOTOM5
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
NMR
LIBS-LabSys1
LIBS-FireFly
Micromex
FRASCAN
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
R2-PECVD
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER
Povey, Rhys Geoffrey
Matějka, Kryštof
Matějka, Kryštof
Jelínek, Eduard
Jelínek, Eduard
Povey, Rhys Geoffrey
Jakešová, Marie
Jakešová, Marie
Tantis, Iosif
Polčák, Josef
Sobola, Dinara
Povey, Rhys Geoffrey
Jelínek, Eduard
T Piastek, Jakub
Povey, Rhys Geoffrey
Idesová, Beáta
Holobrádek, Jakub
Matějka, Kryštof
Jakešová, Marie
Jakešová, Marie
Jakešová, Marie
Žaloudková, Lucie
Novotná, Lenka
Jakešová, Marie
Jakešová, Marie
T Iakoubovskii, Konstantin
T Iakoubovskii, Konstantin
T Michalička, Jan
S Michalička, Jan
Lukiienko, Iryna
Jelínek, Eduard
D'Angelo, Elena
Ulč, Filip
Slovák, Michal
Šimůnková, Helena
Arregi Uribeetxebarria, Jon Ander
Matějka, Kryštof
Tvrdoňová, Anna
Jakešová, Marie
Ali, Hasan
Tvrdoňová, Anna
D'Angelo, Elena
Jelínek, Eduard
D'Angelo, Elena
Povey, Rhys Geoffrey
Jakešová, Marie
Saldan, Ivan
Šimůnková, Helena
Saldan, Ivan
Dubroka, Adam
Duchoň, Jan
S Danchuk, Viktor
Jelínek, Eduard
Spusta, Tomáš
Spusta, Tomáš
Ulč, Filip
Jelínek, Eduard
Gejdoš, Pavel

Upcoming trainings

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Term Name Description Max. attendees
23.9. 15:30 - 17:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Sujan Maity 1
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Šimon Formánek 2
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
25.9. 10:00 - 12:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Ganna Kharchenko, Matthias Knopf, Stefan Schultschik 1
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10