Friday 2.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
WITEC-RAMAN
LVEM
RIE-FLUORINE
TITAN
MIRA-STAN
VERIOS
UHV-SPM
VERSALAB
UHV-PREPARATION
FUMEHOOD…
RAITH
CHEMLAB-B1.18
UHV-PLD
WOOLLAM-RC2
UHV-XPS
MIRA-EBL
SUSS-WETBENCH
HELIOS
LYRA
UHV-LEEM
UHV-DEPOSITION
KEITHLEY-4200
VACUUM_OVEN-C1…
FUMEHOOD-HF
APCVD
DEKTAK
RIGAKU3
MPS150
WOOLLAM-VIS
BET-ANAMET
AMBER
BRILLOUIN
K70
BET-DEGASSER
WIRE-BONDER
ALD-FIJI
SCIA
PARYLENE-SCS
STEMI
ICON-SPM
SEE-SYSTEM
NANOCALC
LaserMIRA
SHAKER-B1.18
SUMMIT
SIMS
NANO-ONE-2PP
ICON-SPM
RTP
3D-PRUSA-ORANGE
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
ACCURION_RSE
SNOM-NANONICS
SUSS-RCD8
DIENER
RIE-CHLORINE
MINIFLEX
nanoCT
SW-BEAMER
RSA
nano-CT
TEST-RFID2
SW-LAB
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV…
VUVAS
VISCOMETER
L450
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TEST-RFID4
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
3D-PRUSA-BLUE
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
3D-PRUSA-BLACK
ML3-BABY
ULTRACENTRIFUGE
FLOWBOX
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
4-POINT
DRIE
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
SW-CT
Micromex
TORNADO-M4
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
NANOWIZARD
DISCO-DICING…
BAMBULAB
MECHANICAL…
CRYOMILL
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CLARUS-680
micro-CT-L240
ZEISS-NANO
LABOTOM5
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
SUSS-MA8
WOOLLAM-MIR
LITESCOPE-MIRA…
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
LPCVD-polySi
LITESCOPE-LYRA
micro-CT-m300
CHEMLAB-B1.16
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
IS-NOVOCONTROL
LIBS-LabSys1
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
UV-LASER
Polčák, Josef
Hu, Ying
Polčák, Josef
Daradkeh, Samer
T Spotz, Zdeněk
Pazourek, Petr
U Spotz, Zdeněk
Kolíbalová, Eva
Kolíbalová, Eva
Cao, Hoang-Anh
Supalová, Linda
Citterberg, Daniel
T Kolíbalová, Eva
S Michalička, Jan
Oliver Urrutia, Carolina
Nghiem, Xuan Duc
Nghiem, Xuan Duc
Mirdamadi Khouzani, Sayed Hossein
David, Jiří
Sobola, Dinara
David, Jiří
Jewula, Pawel
S Lišková, Zuzana
Tmejová, Kateřina
Dey, Sharmistha
Mirdamadi Khouzani, Sayed Hossein
D'Angelo, Elena
Baeva, Maria
Cmíralová, Marie
U Man, Ondřej
Fecko, Peter
U Polčák, Josef
D'Angelo, Elena
Citterberg, Daniel
Dey, Sharmistha
Citterberg, Daniel
Hrdý, Radim
Otýpka, Martin
Nghiem, Xuan Duc
Citterberg, Daniel
Dubroka, Adam
Tmejová, Kateřina
Spousta, Jiří
Krčma, Jakub
Klusák, Radovan
Tmejová, Kateřina
Kunc, Jan
Supalová, Linda
Otýpka, Martin

Upcoming trainings

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Term Name Description Max. attendees
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
5.10. 09:30 - 21.7. 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Maneesha Ramesh 3
5.10. 10:00 - 11:30 ML3-Baby ML3 Baby MicroWriter training Attendees: Tomáš Henzl 1
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jáchym Štindl, Tadeáš Lesovský, Filip Janík 3
6.10. 09:30 - 12:00 ICON-SPM basic training Attendees: Areej Fatima, Štěpánka Kelarová 3
6.10. 09:30 - 12:00 RIE-chlorine-training Attendees: Kryštof Jasenský 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
6.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Yanzhen Song 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tadeáš Lesovský 1
8.10. 09:30 - 12:00 ALD-Beneq-training Attendees: Andrej Juríček, David Neradilek, Peter Kepič 3
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sharmistha Dey 4
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský, Romana Ščotková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: David Neradilek, Lukáš Dokulil 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková 10