Saturday 10.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
DRIE
TITAN
UHV-SPM
RAITH
VERSALAB
SNOM-NANONICS
UHV-LEEM
TUBE-FURNACE
TORNADO-M4
BET-ANAMET
WOOLLAM-VIS
RIGAKU9
MIRA-STAN
SW-LAB
SW-BEAMER
RSA
MIRA-EBL
ICON-SPM
ICON-SPM
NANOCALC
PARYLENE-SCS
STEMI
SIMS
SEE-SYSTEM
nano-CT
LaserMIRA
SUMMIT
SHAKER-B1.18
NANO-ONE-2PP
RIE-FLUORINE
nanoCT
PECVD
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
MIRKA
MINIFLEX
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
LEICA-TXP
RIE-CHLORINE
SW-TRACER
TEST2
TENUPOL
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
UHV-PREPARATION
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
FISCHIONE-160
Heliscan
AMBER
Test Ondra 3
Test O2
NANOSCAN
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV…
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-CLUSTER
NANOSAM
ML3-BABY
CITOPRESS
HELIOS
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DHR
CRYOMILL
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
TIC3X
BET-DEGASSER
BRILLOUIN
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
CLARUS-680
MONOWAVE
PROTOMAT
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
LVEM
LAURELL-NANO
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
LIBS-FireFly
LASER-DICER
Micromex
NANOINDENTER
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
R2-PECVD
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Fatima, Areej
Daradkeh, Samer
Arregi Uribeetxebarria, Jon Ander
Ali, Hasan
David, Jiří
Lišková, Zuzana
Arregi Uribeetxebarria, Jon Ander
Kepič, Peter
U Polčák, Josef
Kepič, Peter
Daradkeh, Samer
Lee, Hyesung
Dubroka, Adam
Arregi Uribeetxebarria, Jon Ander

Upcoming trainings

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Term Name Description Max. attendees
12.10. 09:00 - 12:30 RAITH training basic 1/3 RAITH basic training. Introduction to the RAITH150 Two system and the Electron Optics software. Operation of ZEISS SEM and basic functions. Attendees: Marie Cmíralová 1
12.10. 15:00 - 17:00 SUSS-MA8 training Attendees: Marie Cmíralová ---
13.10. 09:00 - 14.10. 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Marie Cmíralová, Sujan Maity 3
13.10. 10:30 - 11:30 DEKTAK training Attendees: Helena Šimůnková 1
14.10. 09:30 - 12:00 ALD-Fiji- training Attendees: Tomáš Henzl 3
14.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek, Kristýna Kupková 3
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Aneta Opluštilová, Lukáš Dokulil, Martin Kužílek 10