Monday 20.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
UHV-PREPARATION
UHV-LEEM
LEICACOAT-STAN
RIE-FLUORINE
UHV-DEPOSITION
VERIOS
UHV-XPS
UHV-SPM
ML3-BABY
DIENER
WITEC-RAMAN
VERSALAB
EVAPORATOR
AMBER
RIGAKU3
ALD-FIJI
LYRA
MIRA-STAN
KRATOS-XPS
UHV-MBE
MIRA-EBL
FUMEHOOD-HF
UHV-FTIR
FUMEHOOD…
R2-PECVD
ICON-SPM
CRYOGENIC
LAKESHORE
SIMS
TEGRAMIN
SEE-SYSTEM
LITESCOPE-MIRA…
TITAN
NANOINDENTER
IS_NOVOCONTROL
UHV-PLD
UHV…
NANOSAM
TIC3X
BRILLOUIN
KEITHLEY-4200
MPS150
FTIR
ALD-BENEQ
DWL
SUSS-MA8
WOOLLAM-RC2
RAITH
UHV…
NANOCALC
MIRKA
Q-LAB
STEMI
SHAKER-B1.18
SAW-ACCUTOM
SUMMIT
SPINCOATER…
RSA
LaserMIRA
RTP
ACCURION_RSE
SUSS-RCD8
RIE-CHLORINE
PARYLENE-SCS
SNOM-NANONICS
MINIFLEX
nanoCT
nano-CT
3D-PRUSA-XL
TEST-RFID2
BET-ANAMET
VUVAS
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
ULTRASONIC…
L450
WIRE-BONDER
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
US-CUTTER
ULTRAFAST-LASER
SW-BEAMER
TEST2
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
Test školení
UHV-CLUSTER
TEM-SW
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-LEIS
PECVD
MONOWAVE
PARYLENE-DIENER
HELIOS
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
DRIE
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
DHR
SW-CT
micro-CT-m300
BET-DEGASSER
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
TORNADO-M4
CRYOMILL
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
micro-CT-L240
DAWN-HELEOS
3D-PRUSA-ORANGE
CITOPRESS
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
DEKTAK
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
NANOSCAN
PROTOMAT
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
LVEM
LPCVD-SiN
VNA-MPI
FISCHIONE-TEM…
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
SCIA
KAUFMAN
LPCVD-polySi
IR-RAMAN
K70
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
UV-LASER
Koňařík, Lukáš
Asatryan, Heriknaz
Supalová, Linda
Petrosyan, Derenik
Lukiienko, Iryna
Lukiienko, Iryna
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Holas, Jiří
Drotárová, Lenka
Pišťák, Jan
Pathak, Saurabh
U Eliáš, Marek
Koňařík, Lukáš
Koňařík, Lukáš
Weisz, Hugo
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
U Kicmerova, Dina
Janoušek, Tomáš
Pišťák, Jan
Koňařík, Lukáš
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Hrůza, Dominik
Koňařík, Lukáš
Asatryan, Heriknaz
Petrosyan, Derenik
Supalová, Linda
Bokaei Khelejan, Hatef
Citterberg, Daniel
Bakhshikhah, Mahan
Janoušek, Tomáš
Mikerásek, Vojtěch
Daradkeh, Samer
Pathak, Saurabh
Lukiienko, Iryna
Lukiienko, Iryna
Bokaei Khelejan, Hatef
Kratochvílová, Ivana
Iakoubovskii, Konstantin
Spotz, Zdeněk
Žaloudková, Lucie
Eliáš, Marek
Supalová, Linda
S Šamořil, Tomáš
Souawda, Nada
Ulč, Filip
Fu, Hongbo
Pavliňák, David
Bednaříková, Vendula
U Danchuk, Viktor
Lukiienko, Iryna
Lukiienko, Iryna
U Danchuk, Viktor
Tmejová, Kateřina
Bolouki, Nima
Kramář, Jan
Danchuk, Viktor
Holcman, Vladimír
Danchuk, Viktor
Ščasnovič, Erik
Valiyev, Rasul
Ulč, Filip
S Michalička, Jan
Gablech, Evelína
Fu, Hongbo
U Danchuk, Viktor
U Danchuk, Viktor
U Danchuk, Viktor
Kramář, Jan
Krčma, Jakub
Citterberg, Daniel
Citterberg, Daniel
Franta, Daniel
Mirdamadi Khouzani, Sayed Hossein
Fecko, Peter
Supalová, Linda
Arregi Uribeetxebarria, Jon Ander
S Lišková, Zuzana
U Danchuk, Viktor

Upcoming trainings

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Term Name Description Max. attendees
20.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/31245607839153?p=QX552nhoP9PxXCL4FX) Meeting ID: 312 456 078 391 53 Access code: i5xd7zL3 5
21.4. 09:30 - 12:00 ICON-SPM basic training Attendees: Viktor Danchuk 3
21.4. 10:00 - 10:45 Solvent fumehood training (ISO 5) Training for the solvent fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 10:45 - 11:30 Etching fumehood training (ISO 5) Training for the etching fume hood in nanofabrication. Meeting point is inside the lab. Attendees: David Jonathan Walcher 2
21.4. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Petr Sysel, Ying Hu, Thông Thái Trần, Rosmi Vinson 5
21.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
21.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Ying Hu, Thông Thái Trần, Rosmi Vinson, Sharmistha Dey 10
21.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Carolina Oliver Urrutia, Ying Hu, Thông Thái Trần, Rosmi Vinson, Sharmistha Dey 10
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik, Sujan Maity 3
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
23.4. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Karan Singh Surana 1
24.4. 14:00 - 28.5. 16:00 LVEM_basic (2/2) Hands-on session Attendees: Karan Singh Surana 1
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Jiří Spousta 4
27.5. 09:00 - 24.4. 14:00 LVEM_basic (1/2) Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil 2
28.5. 09:00 - 11:00 LVEM_basic (2/2) Hands-on session Attendees: Anjali Valadi Palliyalil 1
28.5. 13:00 - 15:00 LVEM_basic (2/2) Hands-on session 1