Saturday 11.4.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
TEGRAMIN
LYRA
R2-PECVD
ALD-BENEQ
DWL
PARYLENE-DIENER
CHEMLAB-B1.14
BRILLOUIN
MIRA-STAN
LAKESHORE
SCIA
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
SEE-SYSTEM
SHAKER-B1.18
LaserMIRA
SUMMIT
RSA
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
MIRA-EBL
3D-PRUSA-XL
nano-CT
SAW-ACCUTOM
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
PECVD
MIRKA
SPINCOATER…
nanoCT
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
RIE-FLUORINE
RIE-CHLORINE
TENUPOL
MINIFLEX
Test Ondra 3
FISCHIONE-160
VUVAS
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VISCOMETER
ULTRAFAST-LASER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
KRATOS-XPS
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV-PREPARATION
AMBER
UHV-MBE2
NIRQUEST512
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV…
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
UHV…
WOOLLAM-VIS
MONOWAVE
NIKON-NANO
R4…
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
SW-CT
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
CLARUS-680
TORNADO-M4
GLOVEBOX…
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BET-DEGASSER
MECHANICAL…
VERSALAB
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
FUMEHOOD…
Micromex
NANOSAM
MAGNETRON
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
WOOLLAM-RC2
LIBS-LabSys1
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
MPS150
CITOPRESS
NANOSCAN
LITESCOPE-LYRA
LIBS-Discovery
micro-CT-L240
CHEMLAB-B1.16
micro-CT-m300
DAWN-HELEOS
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.18
LIBS-FireFly
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
UV-LASER
Havlíková, Tereza
S Šamořil, Tomáš
Janů, Lucie
Štálnik, Jozef
Plantak, Niko
U Fecko, Peter
Daradkeh, Samer
Krčma, Jakub
Fu, Hongbo
Holcman, Vladimír
Štálnik, Jozef

Upcoming trainings

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Term Name Description Max. attendees
14.4. 09:00 - 11:30 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Tomáš Janoušek 3
14.4. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Grigory Mathew, Rasul Valiyev 2
14.4. 10:00 - 13:00 FTIR-CHEMLAB - transmission Transmission training Attendees: Sanjay Kumar, Virendra Patil, Saurabh Pathak 3
14.4. 10:00 - 10.4. 12:00 miniflex Attendees: Konstantin Iakoubovskii 3
16.4. 09:30 - 12:00 DRIE-training Attendees: Jon Ander Arregi Uribeetxebarria 3
16.4. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Carolina Oliver Urrutia, Aida Fazlič, Ondrej Kubinec 4
17.4. 13:30 - 16:00 EBSD Verios/Helios (2/2) EBSD Verios/Helios (2/2): practical demonstration @ Helios Attendees: Karel Vařeka, Adam Očkovič, Mohamed Bensalem 5
20.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/31245607839153?p=QX552nhoP9PxXCL4FX) Meeting ID: 312 456 078 391 53 Access code: i5xd7zL3 5
21.4. 09:30 - 12:00 ICON-SPM basic training 3
21.4. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Petr Sysel, Thông Thái Trần, Rosmi Vinson 5
21.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
21.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Thông Thái Trần, Rosmi Vinson 10
21.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Thông Thái Trần, Rosmi Vinson 10
22.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jozef Štálnik, Sujan Maity 3
23.4. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jozef Štálnik 1
23.4. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
23.4. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.4. 09:00 - 13:00 LVEM_basic (1/2) Attendees: Karan Singh Surana 1
6.5. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 4