Wednesday 26.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
ML3-BABY
KRATOS-XPS
EVAPORATOR
ICON-SPM
TITAN
VERSALAB
CRYOGENIC
DEKTAK
WITEC-RAMAN
UHV-DEPOSITION
LYRA
TEGRAMIN
VERIOS
ZWICK
CHEMLAB-B1.14
CHEMLAB-B1.18
RIGAKU9
KEITHLEY-4200
R2-PECVD
LITESCOPE-MIRA…
ULTRASONIC…
AMBER
LVEM
KERR-MICROSCOPE
MAGNETRON
UHV-PREPARATION
ULTRACENTRIFUGE
RIGAKU3
DIENER
UHV-XPS
MIRA-STAN
BET-ANAMET
HELIOS
NANO-ONE-2PP
TIC3X
MPS150
RAITH
BET-DEGASSER
BRILLOUIN
TENUPOL
STEMI
DISCO-DICING…
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
ALD-FIJI
FISCHIONE-160
BAMBULAB
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
NANOCALC
LaserMIRA
SHAKER-B1.18
nanoCT
RTP
ACCURION_RSE
TORNADO-M4
SUSS-RCD8
RIE-FLUORINE
RIE-CHLORINE
MINIFLEX
nano-CT
SUMMIT
RSA
MIRA-EBL
SNOM-NANONICS
PARYLENE-SCS
SIMS
SEE-SYSTEM
THEORY-SUPPORT
TGA96
LECTROPOL
Heliscan
VISCOMETER
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VACUUM-OVEN-B1…
VUVAS
L450
JASCO
WIRE-BONDER
APCVD-Diffusion
XEF2
ALD-BENEQ
GLOVEBOX…
microCT
ZETASIZER
JAZ3-CHANNEL
DWL
SPINCOATER…
UHV-MBE
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
NANOWIZARD
UHV-FTIR
UHV-LEEM
UHV-LEIS
APCVD
US-CUTTER
UHV-PLD
UHV-SPM
UHV-CLUSTER
UHV…
UHV…
MAGNETRON-AJA
ULTRAFAST-LASER
ARES
Q-LAB
MIRKA
SAW-ACCUTOM
SW-CT
VNA-MPI
DHR
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
DRIE
NANOINDENTER
CHEMLAB-B1.16
DAWN-HELEOS
CRYOMILL
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
DIMPLING…
micro-CT-m300
CPD
FUMEHOOD-HF
ELECTROWORKSHOP
R4…
FLOWBOX
DRYING-OVEN-B1…
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
micro-CT-L240
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
K70
LASER-DICER
SPONGEBOB
WOOLLAM-VIS
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
WOOLLAM-MIR
ZEISS-NANO
MECHANICAL…
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
3D-PRUSA-XL
LABOTOM5
LAURELL-NANO
LPCVD-SiN
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
MINIEVAP
LEXT
LPCVD-polySi
LAKESHORE
CEITEC-NANO
SW-COMSOL
PROTOMAT
LEICACOAT-STAN
CLR-ISO8-Lab…
HENRY-MAGNET
TUBE-FURNACE
WOOLLAM-RC2
SUSS-MA8
UV-LASER
Baeva, Maria
Baeva, Maria
Baeva, Maria
Baeva, Maria
Jelínek, Eduard
Cuccu, Elisa
Cuccu, Elisa
MURTAS, DAVIDE
Jasenský, Kryštof
Baeva, Maria
Baeva, Maria
Jelínek, Eduard
Bolouki, Nima
Polášková, Kateřina
Pham, Sy Nguyen
Baeva, Maria
Martyniuk, Oleh
Otýpka, Martin
Tsalagkas, Dimitrios
S Gablech, Evelína
Ali, Hasan
Horák, Michal
Danchuk, Viktor
Daradkeh, Samer
T Danchuk, Viktor
Pribytova, Ekaterina
Baeva, Maria
Danchuk, Viktor
Spotz, Zdeněk
Liška, Jiří
Jakub, Zdeněk
S Šamořil, Tomáš
Bahadur, Fateh
Ali, Hasan
Sevriugina, Veronika
Hu, Ying
Hu, Ying
Caha, Ondřej
Citterberg, Daniel
Bolouki, Nima
Kramář, Jan
Hu, Ying
Spousta, Jiří
U Kolíbalová, Eva
Molnár, Tomáš
Otýpka, Martin
Jakub, Zdeněk
Hu, Ying
Kalleshappa, Bindu
Strnad, Jiří
Jakub, Zdeněk
Kramář, Jan
Pavliňák, David
Bahadur, Fateh
T Sanna, Michela
Kramář, Jan
Citterberg, Daniel
Cuccu, Elisa
Pavliňák, David
Krčma, Jakub

Upcoming trainings

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Term Name Description Max. attendees
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
1.9. 09:30 - 12:00 ALD-Beneq- training Attendees: Shidhin Mappoli 3
3.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Debika Devi Thongam 3
3.9. 13:20 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Debika Devi Thongam 3
4.9. 09:00 - 13:00 Rigaku 3 - Basic Bring your typical sample A1.15 Attendees: Debika Devi Thongam 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi, Sanjay Gopal Ullattil, Karan Singh Surana 3
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3