Friday 20.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
KRATOS-XPS
VERIOS
MIRA-EBL
LYRA
MAGNETRON
ML3-BABY
RIGAKU9
TITAN
RIE-FLUORINE
VERSALAB
ICON-SPM
CRYOGENIC
VNA-MPI
UHV-LEEM
UHV-XPS
LVEM
HELIOS
TGA-DISCOVERY
UHV-DEPOSITION
FUMEHOOD…
SPONGEBOB
SUSS-WETBENCH
LITESCOPE-MIRA…
SIMS
AMBER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
EVAPORATOR
UHV-SPM
RAITH
FTIR-CHEMLAB
ZWICK
WITEC-RAMAN
NMR
WOOLLAM-VIS
KERR-MICROSCOPE
TUBE-FURNACE
NANOSAM
HENRY-MAGNET
BET-ANAMET
UHV-PREPARATION
LaserMIRA
STEMI
PECVD
SW-BEAMER
MIRKA
NANOCALC
SAW-ACCUTOM
SHAKER-B1.18
nanoCT
SUMMIT
DIENER
SUSS-RCD8
SPINCOATER…
PARYLENE-SCS
Q-LAB
nano-CT
RTP
ACCURION_RSE
MINIFLEX
SNOM-NANONICS
RIGAKU3
RIE-CHLORINE
RSA
SEE-SYSTEM
3D-PRUSA-XL
SW-LAB
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-TRACER
TEST-RFID2
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
PARYLENE-DIENER
Test O2
TEST2
Test školení
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
TEM-SW
MONOWAVE
3D-PRUSA-ORANGE
R4…
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
LECTROPOL
ELECTROWORKSHOP
FLOWBOX
TIC3X
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
CPD
Micromex
BAMBULAB
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BET-DEGASSER
MINIEVAP
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
CLARUS-680
micro-CT-L240
3D-PRUSA-BLACK
WOOLLAM-MIR
LPCVD-SiN
LAKESHORE
PROTOMAT
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
DSC-DISCOVERY
LITESCOPE-LYRA
MPS150
CITOPRESS
NANOSCAN
NIKON-NANO
NIRQUEST512
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LPCVD-polySi
LIBS-LabSys1
micro-CT-m300
SCIA
DAWN-HELEOS
TEGRAMIN
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
IS_NOVOCONTROL
ZEISS-STAN
FISCHIONE-TEM…
LIBS-Discovery
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Lepcio, Petr
Kovařík, Martin
T Lepcio, Petr
Lukiienko, Iryna
Pavliňák, David
Beliančínová, Beáta
Tahsin, Muhammad
Cao, Hoang-Anh
Idesová, Beáta
Staňo, Michal
Lukiienko, Iryna
Liška, Jiří
S Šamořil, Tomáš
Supalová, Linda
Eliáš, Marek
Arregi Uribeetxebarria, Jon Ander
Koller, Philipp
Kratochvílová, Ivana
Slavíček, Radek
Arregi Uribeetxebarria, Jon Ander
S Michalička, Jan
Tichý, Martin
Lukiienko, Iryna
Kratochvílová, Ivana
Daradkeh, Samer
Slavíček, Radek
T Gablech, Evelína
Slavíček, Radek
S Danchuk, Viktor
Urbánek, Michal
Hrůza, Dominik
Hrůza, Dominik
S Kolíbalová, Eva
Man, Ondřej
T Petruš, Josef
Hrůza, Dominik
Jewula, Pawel
Tvrdoňová, Anna
Kratochvílová, Ivana
Kovařík, Martin
Bábor, Petr
Iakoubovskii, Konstantin
U Tmejová, Kateřina
U Tmejová, Kateřina
U Tmejová, Kateřina
U Eliáš, Marek
Hrůza, Dominik
U Lišková, Zuzana
T Lepcio, Petr
Sevriugina, Veronika
Iakoubovskii, Konstantin
Jewula, Pawel
Franta, Daniel
Arregi Uribeetxebarria, Jon Ander
Kepič, Peter
Danchuk, Viktor
Urbánek, Michal
U Tmejová, Kateřina
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
20.3. 09:00 - 10:29 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 4
20.3. 09:00 - 12:00 TGA Discovery Basic training for practical operation on TGA Discovery. At the training day meeting point is in the ChemLab (B1.15) in the building B. Attendees: Lucie Žaloudková 1
20.3. 13:30 - 15:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Saurabh Pathak 2
23.3. 10:00 - 11:30 JASCO training Description of holders and software, basic measurement Attendees: Daina Dayana Arenas Buelvas, Pedro Henrique de Oliveira Santiago 3
23.3. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 341 031 483 654 Přístupový kód: hz6gW67Y Attendees: Petr Pazourek, Šimon Formánek, David Jonathan Walcher 5
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Hasan Ali, Tomáš Janoušek 3
24.3. 09:00 - 17:30 Amber Meeting point at the microscope. Attendees: Adam Očkovič 4
24.3. 09:30 - 12:00 ALD-Beneq-training Attendees: Jozef Štálnik, Derenik Petrosyan, Heriknaz Asatryan 3
24.3. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Areej Fatima, Šimon Formánek, Rasul Valiyev, David Jonathan Walcher 5
24.3. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Petr Pazourek, Šimon Formánek, David Jonathan Walcher 5
24.3. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Petr Pazourek, Rasul Valiyev, David Jonathan Walcher 10
24.3. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Petr Pazourek, Šimon Formánek, David Jonathan Walcher 10
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Radim Slovák 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
27.3. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Grigory Mathew, Sujan Maity 2
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Carolina Oliver Urrutia, Ondrej Kubinec 4
27.3. 10:00 - 16.3. 12:00 Witec-Raman in front of user office Attendees: Yue Wang, Saurabh Pathak 4