Tuesday 18.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
JASCO
KRATOS-XPS
EVAPORATOR
AMBER
TITAN
CHEMLAB-B1.14
RAITH
MIRA-STAN
ICON-SPM
WITEC-RAMAN
VERIOS
ULTRACENTRIFUGE
UHV-DEPOSITION
FUMEHOOD…
UHV-LEIS
LYRA
HELIOS
UHV-XPS
UHV-PLD
ML3-BABY
TEGRAMIN
R2-PECVD
SEE-SYSTEM
PARYLENE-SCS
CRYOGENIC
RIE-FLUORINE
DIENER
SUSS-MA8
3D-PRUSA-XL
BET-ANAMET
NMR
FTIR
BET-DEGASSER
UHV-PREPARATION
LEXT
LEICACOAT-STAN
WIRE-BONDER
VERSALAB
GLOVEBOX…
VACUUM_OVEN-C1…
UHV…
RIGAKU9
MINIFLEX
nanoCT
RSA
nano-CT
XEF2
MIRA-EBL
SNOM-NANONICS
L450
SIMS
VISCOMETER
RIE-CHLORINE
SUSS-RCD8
microCT
MIRKA
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
PECVD
SAW-ACCUTOM
ZWICK
ZETASIZER
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUMMIT
LaserMIRA
STEMI
SHAKER-B1.18
UHV-LEEM
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
JAZ3-CHANNEL
UHV-FTIR
DWL
TGA96
US-CUTTER
UHV-MBE
ULTRASONIC…
ULTRAFAST-LASER
UHV-SPM
UHV-CLUSTER
THEORY-SUPPORT
TEST-RFID4
VUVAS
VACUUM-OVEN-B1…
NANOCALC
UHV…
VACUUM-OVEN-B1…
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TEST-RFID2
CITOVAC
TENUPOL
FISCHIONE-160
FTIR-CHEMLAB
Test Ondra 3
Test O2
TEST2
Test školení
NANO-ONE-2PP
ZEISS-NANO
4-POINT
DHR
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
FTIRMAG
SW-CT
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
Micromex
DISCO-DICING…
MPS150
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
TIC3X
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
MINIEVAP
CPD
CLARUS-680
micro-CT-L240
WOOLLAM-VIS
WOOLLAM-RC2
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
DEKTAK
LITESCOPE-LYRA
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
LITESCOPE-MIRA…
LIBS-LabSys1
micro-CT-m300
IS-NOVOCONTROL
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-Discovery
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
LIBS-FireFly
UV-LASER
Bakhshikhah, Mahan
MURTAS, DAVIDE
Tvrdoňová, Anna
Piastek, Jakub
Fatima, Areej
Skálová, Zdenka
Tvrdoňová, Anna
Jakešová, Marie
Beliančínová, Beáta
Polášková, Kateřina
Fatima, Areej
Pribytova, Ekaterina
Piastek, Jakub
Kratochvílová, Ivana
Iakoubovskii, Konstantin
Michalička, Jan
Huang, Yong
Saldan, Ivan
Tvrdoňová, Anna
Bakhshikhah, Mahan
MURTAS, DAVIDE
Vijithra, Vijithra
E Konečná, Gabriela
Fallahpour, Mojdeh
Fallahpour, Mojdeh
paiva de araujo, Estacio
Kostka, Marek
T Kicmerova, Dina
Cao, Hoang-Anh
Saldan, Ivan
Jakub, Zdeněk
Tvrdoňová, Anna
Vaníčková, Elena
S Šamořil, Tomáš
Vařeka, Karel
Jakub, Zdeněk
T Klimek, Jan
Piastek, Jakub
Havlíková, Tereza
Janů, Lucie
Valiyev, Rasul
E Jakešová, Marie
Pribytova, Ekaterina
Piastek, Jakub
E Jakešová, Marie
Tvrdoňová, Anna
Kumar, Sanjay
Surana, Karan Singh
B Jewula, Pawel
S Nebojsa, Alois
Surana, Karan Singh
Jakub, Zdeněk
Gablech, Evelína
Konečná, Gabriela
Kostka, Marek
Klimek, Jan
U Tmejová, Kateřina
Dey, Sharmistha

Upcoming trainings

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Term Name Description Max. attendees
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Andrej Juríček, Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Andrej Juríček 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 09:00 - 12:00 SEE SYSTEM training Training in contact angle measurements and surface free energy determination. Meeting point in front of the User office. Attendees: Jiří Strnad 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3