Wednesday 5.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
LEICACOAT-STAN
RIGAKU3
SUSS-WETBENCH
KRATOS-XPS
VERIOS
EVAPORATOR
TITAN
R2-PECVD
SUSS-MA8
WITEC-RAMAN
AMBER
VERSALAB
NANOSAM
WOOLLAM-RC2
HENRY-MAGNET
MAGNETRON
LVEM
LITESCOPE-MIRA…
LEICACOAT-NANO
NANO-ONE-2PP
SUSS-RCD8
PARYLENE-DIENER
LYRA
DIENER
RIE-FLUORINE
SIMS
BET-ANAMET
UHV-DEPOSITION
UHV-XPS
UHV-PLD
UHV-SPM
UHV-PREPARATION
VACUUM_OVEN-C1…
VACUUM-OVEN-B1…
RIGAKU9
ZETASIZER
VNA-MPI
ML3-BABY
TUBE-FURNACE
TORNADO-M4
FLOWBOX
TENUPOL
STEMI
BRILLOUIN
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
BET-DEGASSER
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
NANOCALC
SUMMIT
SHAKER-B1.18
nano-CT
ACCURION_RSE
SW-COMSOL
CLR-ISO8-Lab…
CEITEC-NANO
RIE-CHLORINE
MINIFLEX
nanoCT
RSA
THEORY-SUPPORT
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
MECHANICAL…
SEE-SYSTEM
LaserMIRA
TGA96
Heliscan
Q-LAB
L450
FTIR-CHEMLAB
FTIR
CITOVAC
ARES
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
JAZ3-CHANNEL
APCVD-Diffusion
XEF2
ALD-BENEQ
GLOVEBOX…
microCT
ZWICK
MPS150
MAGNETRON-AJA
JASCO
TGA-DISCOVERY
DISCO-DICING…
UHV-MBE1
UHV-MBE2
BAMBULAB
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
ALD-FIJI
DWL
NANOWIZARD
UHV-CLUSTER
UHV…
UHV…
APCVD
ULTRAFAST-LASER
ULTRASONIC…
US-CUTTER
RTP
SPINCOATER…
HELIOS
IS-NOVOCONTROL
SPONGEBOB
FRASCAN
RAITH
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LECTROPOL
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
DRYING-OVEN-B1…
PECVD-NANOFAB
ELECTROWORKSHOP
LAURELL-NANO
FUMEHOOD…
R4…
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
TEGRAMIN
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
LASER-DICER
LIBS-FireFly
SAW-ACCUTOM
ZEISS-NANO
CITOPRESS
NANOSCAN
MINIEVAP
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ULTRACENTRIFUGE
DSC-DISCOVERY
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
LEXT
TEM-SW
PECVD
MIRKA
MONOWAVE
3D-PRUSA-XL
LIBS-Discovery
CRYOGENIC
LIBS-LabSys1
LITESCOPE-LYRA
DIMPLING…
DHR
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
WOOLLAM-MIR
DRIE
KERR-MICROSCOPE
SW-CT
CRYOMILL
TIC3X
CPD
DEKTAK
LABOTOM5
UV-LASER
Žaloudková, Lucie
Ulč, Filip
Havlíková, Tereza
Mařák, Vojtěch
Tantis, Iosif
Mařák, Vojtěch
Havlíková, Tereza
Gejdoš, Pavel
Spotz, Zdeněk
Ščasnovič, Erik
B Caha, Ondřej
Supalová, Linda
Otýpka, Martin
Hrdý, Radim
Kelarová, Štěpánka
Kelarová, Štěpánka
Kolíbal, Miroslav
T Kicmerova, Dina
Cao, Hoang-Anh
Surana, Karan Singh
Martyniuk, Oleh
Otýpka, Martin
Kolíbalová, Eva
S Michalička, Jan
Bolouki, Nima
Bolouki, Nima
Supalová, Linda
Hrdý, Radim
Kalleshappa, Bindu
Bakhshikhah, Mahan
Man, Ondřej
Iakoubovskii, Konstantin
Klimek, Jan
U Danchuk, Viktor
S Danchuk, Viktor
Beliančínová, Beáta
Klíma, Jan
Rovenská, Katarína
Říhová, Martina
Ulč, Filip
Yuan, Yunhuan
T Sanna, Michela
Hrdý, Radim
Krútek, Šimon
S Šamořil, Tomáš
Eliáš, Marek
Supalová, Linda
Bábor, Petr
Tantis, Iosif
D'Angelo, Elena
D'Angelo, Elena
T Danchuk, Viktor
Hrůza, Dominik
D'Angelo, Elena
Dey, Sharmistha
Pavliňák, David
U Caha, Ondřej
Kreuzerová, Monika
Klíma, Jan
Otýpka, Martin
Kepič, Peter
T Spotz, Zdeněk

Upcoming trainings

Show more

Term Name Description Max. attendees
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Michal Slovák 3
5.8. 10:00 - 12:00 Tornado-M4 Attendees: Vendula Bednaříková 3
6.8. 09:30 - 12:00 NMR training course Use of 60 MHz Magritec NMR spectrometer, preparation samples, basic NMR theory Attendees: Michela Sanna, Lucie Žaloudková 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Muhammad SAHIL, Iosif Tantis 2
7.8. 10:00 - 10:45 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Attendees: Matej Dinis, Jiří Strnad 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3