Friday 31.7.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
NIKON-NANO
KRATOS-XPS
EVAPORATOR
UHV-XPS
UHV-SPM
MIRA-STAN
RIE-FLUORINE
JASCO
HELIOS
TEGRAMIN
TITAN
CHEMLAB-B1.18
R2-PECVD
VERSALAB
FUMEHOOD…
FUMEHOOD-HF
ACCURION_RSE
LVEM
WOOLLAM-RC2
RIGAKU9
DEKTAK
WITEC-RAMAN
RIGAKU3
MIRA-EBL
FUMEHOOD…
SAW-ACCUTOM
TGA-DISCOVERY
NANOSAM
VERIOS
NANOSCAN
CHEMLAB-B1.16
ZEISS-STAN
LAKESHORE
K70
SUSS-RCD8
SUSS-MA8
LAURELL-NANO
SEE-SYSTEM
SIMS
PARYLENE-SCS
ICON-SPM
ML3-BABY
TEM-SW
UHV-DEPOSITION
FTIR-CHEMLAB
RAITH
FTIR
DHR
ZWICK
SW-CT
ZETASIZER
LYRA
ULTRAFAST-LASER
JAZ3-CHANNEL
SNOM-NANONICS
MINIFLEX
VACUUM_OVEN-C1…
RSA
DWL
US-CUTTER
nano-CT
nanoCT
VACUUM-OVEN-B1…
CITOVAC
VACUUM-OVEN-B1…
RIE-CHLORINE
VUVAS
DIENER
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
RTP
Q-LAB
SPINCOATER…
MIRKA
PECVD
ULTRASONIC…
UHV-PREPARATION
LaserMIRA
AMBER
UHV-MBE2
UHV-MBE1
UHV-LEEM
Heliscan
THEORY-SUPPORT
TGA96
TEST-RFID4
TEST-RFID2
Test školení
TEST2
PARYLENE-DIENER
UHV-LEIS
Test Ondra 3
UHV-MBE
FISCHIONE-160
SUMMIT
TENUPOL
UHV-PLD
LEICA-TXP
SW-TRACER
UHV-CLUSTER
SW-LAB
SW-BEAMER
BET-ANAMET
STEMI
NANOCALC
UHV…
UHV…
SHAKER-B1.18
UHV-FTIR
Test O2
NANO-ONE-2PP
3D-PRUSA-ORANGE
LECTROPOL
CPD
TIC3X
CRYOMILL
DRIE
DIMPLING…
DRYING-OVEN-B1…
SPONGEBOB
ELECTROWORKSHOP
LEXT
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
MINIEVAP
SW-COMSOL
FUMEHOOD…
ALD-FIJI
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
DISCO-DICING…
LEICACOAT-STAN
BAMBULAB
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
FUMEHOOD…
CLARUS-680
3D-PRUSA-BLACK
3D-PRUSA-XL
LPCVD-SiN
CRYOGENIC
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
LITESCOPE-MIRA…
MONOWAVE
CITOPRESS
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
LPCVD-polySi
LITESCOPE-LYRA
Micromex
CHEMLAB-B1.14
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
IS-NOVOCONTROL
LIBS-LabSys1
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
KEITHLEY-4200
LASER-DICER
LIBS-FireFly
LIBS-Discovery
UV-LASER
Supalová, Linda
Bakhshikhah, Mahan
Fecko, Peter
Jasenský, Kryštof
Jasenský, Kryštof
Jasenský, Kryštof
Janů, Lucie
Fatima, Areej
Lee, Hyesung
Šimůnková, Helena
Jasenský, Kryštof
Fecko, Peter
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Remešová, Michaela
Vinson, Rosmi
Bednaříková, Vendula
Bakhshikhah, Mahan
Otýpka, Martin
Supalová, Linda
Arenas Buelvas, Daina Dayana
Kotásková, Lucie
Staňo, Michal
Staňo, Michal
Ščasnovič, Erik
Mařák, Vojtěch
Kuběna, Ivo
Michalička, Jan
Kotásková, Lucie
Lepcio, Petr
Janů, Lucie
Bolouki, Nima
Hrdinová, Sára
Vijithra, Vijithra
T Supalová, Linda
Jasenský, Kryštof
Fecko, Peter
Jasenský, Kryštof
Rusnaková, Nicole
Rusnaková, Nicole
S Kolíbalová, Eva
B Kolíbalová, Eva
Rusnaková, Nicole
Rusnaková, Nicole
Staňo, Michal
Arregi Uribeetxebarria, Jon Ander
Jasenský, Kryštof
Liška, Jiří
T Spotz, Zdeněk
Supalová, Linda
T Roupcová, Pavla
Roupcová, Pavla
Supalová, Linda
T Supalová, Linda
Prajzler, Vladimír
AL Soud, Ammar
S Danchuk, Viktor
Cao, Hoang-Anh
Kovařík, Martin
Kotásková, Lucie
Mařák, Vojtěch
Holcman, Vladimír
Klusák, Radovan
Fecko, Peter
Fecko, Peter
Tvrdoňová, Anna
Valiyev, Rasul
Bábor, Petr
Tvrdoňová, Anna
Kubinec, Ondrej
Fecko, Peter
Kolíbalová, Eva
Hrůza, Dominik
Sevriugina, Veronika
Bakhshikhah, Mahan
Bolouki, Nima
Kreuzerová, Monika
Sevriugina, Veronika
Kareš, Martin
Dinparvar, Sahar
S Šamořil, Tomáš
Jasenský, Kryštof

Upcoming trainings

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Term Name Description Max. attendees
31.7. 15:15 - 16:00 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Attendees: Karel Škubník 2
31.7. 15:30 - 17:00 Rigaku 3 - hands on Hands on - Hrdinová - dlouho neměřila Attendees: Sára Hrdinová 1
31.7. 16:00 - 16:30 Etching fumehood - ISO 5 Training for the etching fumehoods in nanofabrication. Attendees: Karel Škubník 2
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10