| 16.1. 09:00 - 13:00 |
Rigaku 3-Basic
|
Bring your typical sample
A1.15
Attendees:
Saurabh
Pathak,
Pedro Henrique
de Oliveira Santiago
|
2
|
| 19.1. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
ID schůzky: 388 937 741 186 64
Přístupový kód: eS6dM7MD
Attendees:
Laiba
Bajwa
|
5
|
| 20.1. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jiří
Spousta,
Lukáš
Koňařík,
Mohamed
Bensalem
|
3
|
| 20.1. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion.
Attendees:
Lucie
Žaloudková,
Ondrej
Kubinec
|
5
|
| 20.1. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Laiba
Bajwa
|
5
|
| 20.1. 13:00 - 17:00 |
KRATOS-XPS
|
Basic training (session 1/2) - max 2 attendees.
In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz.
Attendees:
Nicole
Rusnaková,
Kryštof
Matějka
|
2
|
| 20.1. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Areej
Fatima,
Laiba
Bajwa
|
10
|
| 20.1. 14:25 - 14:55 |
Safety excursion - StAn lab
|
Attendees:
Laiba
Bajwa
|
10
|
| 21.1. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Jiří
Spousta
|
1
|
| 21.1. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Mohamed
Bensalem
|
1
|
| 21.1. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Lukáš
Koňařík
|
1
|
| 22.1. 09:30 - 12:00 |
ICON-SPM basic training
|
|
3
|
| 23.1. 08:30 - 15:00 |
LYRA basic training - SEM part
|
The training is focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building.
Attendees:
Cyril
Delforge,
Elisa
Cuccu,
Jakub
Piastek
|
4
|
| 23.1. 09:30 - 16:00 |
MIRA-STAN 1/2
|
Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Navaj
Shaikh,
Grigory
Mathew,
Karan Singh
Surana,
Nicolò
Rossetti
|
4
|
| 26.1. 09:00 - 13:00 |
KRATOS-XPS
|
Basic training (session 1/2) - max 2 attendees.
In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz.
Attendees:
Areej
Fatima
|
2
|
| 27.1. 09:30 - 12:00 |
ALD-Beneq-training
|
Attendees:
Thanh Lam
BUI,
Kryštof
Matějka,
Jan
Kunc
|
3
|
| 27.1. 10:00 - 11:15 |
Saw Accutom
|
Meeting point: in front of the lab A1.04
Attendees:
Tereza
Havlíková
|
4
|
| 4.2. 09:30 - 13:30 |
MIRA-STAN 2/2
|
Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
|
2
|
| 5.2. 09:30 - 13:30 |
MIRA-STAN 2/2
|
Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
|
2
|
RIE-FLUORINE
VERSALAB
UHV-PLD