| 19.10. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6)
Meeting ID: 385 586 219 854 116
Access code: zt6FS25C
Attendees:
David
Neradilek,
Marc Arvie
Talavera,
Václav
Bálka
|
5
|
| 20.10. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
|
Attendees:
Dominik
Hrůza,
Tadeáš
Lesovský,
Tereza
Konečná,
Patricie
Skoumalová,
Romana
Ščotková,
Miriama
Malček Šimunková
|
5
|
| 20.10. 13:00 - 13:40 |
Safety excursion - Structural Analysis
|
Attendees:
Tadeáš
Lesovský,
Šimon
Krútek,
Markéta
Šulcová,
Michal
Slovák,
Zequn
Zhang,
Aneta
Opluštilová,
Lukáš
Dokulil,
Martin
Kužílek,
Václav
Bálka
|
10
|
| 20.10. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Patricie
Skoumalová,
Lukáš
Dokulil,
Martin
Kužílek,
Václav
Bálka
|
10
|
| 20.10. 14:30 - 15:20 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
David
Neradilek,
Marc Arvie
Talavera,
Václav
Bálka
|
5
|
| 21.10. 10:00 - 11:00 |
DIENER-training
|
Attendees:
Franc
Paré Estalella,
Matthias
Knopf
|
3
|
| 21.10. 13:00 - 16:30 |
ARES for DHR users - photorheology
|
Initial photorheological training for users experienced with the DHR rheometer.
Attendees:
Ivana
Chamradová
|
2
|
| 22.10. 10:00 - 11:15 |
Leicacoat StAn training
|
Meeting point: at the cleanroom filter (building A)
Attendees:
Michael
Foltýn,
Carolina
Sanna
|
4
|
| 23.10. 09:00 - 17:30 |
Amber
|
EDS-EBSD training
Attendees:
Veronika
Mazánová,
Dinara
Sobola
|
2
|
| 27.10. 09:30 - 12:30 |
MIRA-STAN 2/2
|
Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
Attendees:
Tadeáš
Lesovský
|
3
|
| 27.10. 10:00 - 12:00 |
DLS-ZetaSizer Part 2
|
Assisted hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer Ultra.
Attendees:
Carolina
Sanna
|
1
|
| 29.10. 09:30 - 12:30 |
MIRA-STAN 2/2
|
Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>.
|
3
|
| 30.10. 10:00 - 12:00 |
NANO-ONE-2PP Advance Training
|
Advanced NANO-ONE-2PP training for printing with optically transparent resins.
Attendees:
Vladislav
Dvořák,
Michal
Slovák
|
2
|
| 10.11. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Michal
Slovák,
Aneta
Opluštilová,
Karol
Križan,
Lukáš
Dokulil,
Martin
Kužílek
|
3
|
| 11.11. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Michal
Slovák
|
1
|
| 11.11. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Aneta
Opluštilová
|
1
|
| 11.11. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Karol
Križan
|
1
|
SUSS-WETBENCH
WOOLLAM-VIS
TEST2