Sunday 25.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
UHV-PREPARATION
UHV-LEEM
CLARUS-680
RIE-CHLORINE
UHV-XPS
LAKESHORE
ARES
UHV-SPM
SHAKER-B1.18
RSA
SW-BEAMER
BET-ANAMET
STEMI
MINIFLEX
nanoCT
NANOCALC
nano-CT
MIRA-EBL
SUMMIT
MIRA-STAN
ICON-SPM
PARYLENE-SCS
RIE-FLUORINE
SIMS
SEE-SYSTEM
LaserMIRA
SNOM-NANONICS
EBPG
DIENER
3D-PRUSA-BLUE
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLACK
SUSS-RCD8
3D-PRUSA-ORANGE
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SW-LAB
FISCHIONE-160
SW-TRACER
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
LEICA-TXP
TGA96
TENUPOL
DSC-DISCOVERY
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
THEORY-SUPPORT
UHV…
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
MONOWAVE
WOOLLAM-MIR
ML3-BABY
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
3D-PRUSA-XL
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
NANO-ONE-2PP
LPCVD-polySi
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-SiN
K70
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
KEITHLEY-4200
IR-RAMAN
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
FUMEHOOD…
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
LEICACOAT-NANO
KAUFMAN
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
UV-LASER
Beliančínová, Beáta
Ondračka, Pavel
Tahsin, Muhammad
Hrůza, Dominik
Hrůza, Dominik
B Sanna, Michela
U Eliáš, Marek
Hrůza, Dominik
Holcman, Vladimír
B Lepcio, Petr
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
25.10. 10:30 - 12:00 Novocontrol-Basic training DRS spectroscopy Attendees: Keval Sonigara 2
27.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský 3
27.10. 10:00 - 12:00 DLS-ZetaSizer Part 2 Assisted hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer Ultra. Attendees: Carolina Sanna 1
27.10. 10:00 - 23.10. 13:00 VERSALAB VSM VERSALAB VSM training Attendees: Tomáš Henzl 1
27.10. 10:30 - 23.10. 11:30 Vacuum Drying Oven Basic Vacuum Drying Oven training Attendees: Tomáš Henzl 1
27.10. 14:00 - 23.10. 15:00 4-POINT 4-POINT training Attendees: Marie Jakešová, Laiba Asad Bajwa 2
29.10. 09:30 - 12:00 ALD-Beneq-training Attendees: Nikol Kaděrová 3
29.10. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 3
29.10. 13:00 - 17:00 Rigaku 3 - basic Rigaku 3 - basic Bring your typical sample A1.15 Attendees: Karthik Prasad Elangovan 3
30.10. 08:30 - 15:00 LYRA basic training - SEM part The training is focused on the SEM part of the LYRA system. We will meet in the coffee room next to the user office in the C building. Attendees: Romana Ščotková, Filip Janík, Jakub Bartušek, Karthik Prasad Elangovan 4
30.10. 10:00 - 12:00 NANO-ONE-2PP Advance Training Advanced NANO-ONE-2PP training for printing with optically transparent resins. Attendees: Vladislav Dvořák, Michal Slovák 2
2.11. 09:30 - 10:30 Nikon Nano - optical microscope ISO 5 Hands-on training for the Nikon optical microscope in the nanofabrication cleanroom. Meeting point inside the cleanroom, by the microscope. Bring your typical sample. Attendees: Jozef Štálnik, Katarína Rovenská 2
2.11. 10:00 - 11:30 Wirebonder training Training of the new user Attendees: Sujan Maity, Redzic Milica 2
3.11. 10:00 - 14:00 UHV-PLD UHV-PLD repeat training Attendees: Saleh Hekmat Saleh Fawaeer 1
3.11. 10:00 - 11:30 MPS150+Keithley4200 training Training of the new user Attendees: Sujan Maity 1
3.11. 14:00 - 16:00 Wirebonder training Training of the new user Attendees: Vojtěch Mikerásek, Sára Hrdinová 2
4.11. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Philipp Jäger 4
6.11. 10:00 - 11:30 MPS150+Keithley4200 training Training of the new user Attendees: Hugo Weisz, Tomáš Henzl 2
9.11. 09:00 - 9.6. 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Tomáš Janoušek, Šimon Formánek 3
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Michal Slovák, Aneta Opluštilová, Lukáš Dokulil 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Michal Slovák 1
11.11. 09:30 - 12:30 MIRA-STAN 2/2 Meeting point at the microscope. This is a two-step training, register for part 1 in our booking system. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. 2
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Karol Križan 1
18.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Ying Hu, Karol Križan, Martin Kužílek 3
20.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Martin Kužílek 1
20.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Ying Hu 1
20.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1