Friday 16.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
EVAPORATOR
ML3-BABY
TITAN
R2-PECVD
MIRA-STAN
RIGAKU3
VERIOS
UHV-SPM
ULTRACENTRIFUGE
HELIOS
LYRA
FUMEHOOD-HF
AMBER
LEICACOAT-NANO
RIE-FLUORINE
WOOLLAM-RC2
CHEMLAB-B1.14
UHV-PREPARATION
ICON-SPM
SNOM-NANONICS
MAGNETRON
VERSALAB
WOOLLAM-VIS
VACUUM_OVEN-C1…
WIRE-BONDER
WITEC-RAMAN
FTIR-CHEMLAB
VACUUM-OVEN-B1…
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
MIRA-EBL
L450
ICON-SPM
VISCOMETER
PARYLENE-SCS
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
XEF2
ULTRAFAST-LASER
DIENER
PECVD
NMR
ZEISS-NANO
ZETASIZER
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
MIRKA
SUSS-RCD8
ZWICK
microCT
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU9
VUVAS
NANOCALC
ULTRASONIC…
UHV-LEEM
JAZ3-CHANNEL
JASCO
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
DWL
UHV-FTIR
UHV-LEIS
Heliscan
UHV-MBE
UHV-XPS
UHV-PLD
US-CUTTER
UHV-CLUSTER
UHV…
UHV…
TGA-DISCOVERY
THEORY-SUPPORT
VACUUM-OVEN-B1…
LEICA-TXP
STEMI
CITOVAC
BET-ANAMET
FTIR
SW-BEAMER
SW-LAB
SW-TRACER
TENUPOL
TGA96
FISCHIONE-160
NIRQUEST512
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
Test Ondra 3
NANO-ONE-2PP
NIKON-NANO
SPONGEBOB
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
LECTROPOL
CPD
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
TIC3X
MINIEVAP
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
LEXT
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
FUMEHOOD…
FUMEHOOD…
NANOSAM
KERR-MICROSCOPE
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
PROTOMAT
LVEM
HENRY-MAGNET
LIBS-FireFly
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
3D-PRUSA-XL
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
LIBS-Discovery
LAURELL-NANO
FUMEHOOD…
NANOINDENTER
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
CHEMLAB-B1.16
LASER-DICER
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Polčák, Josef
Jadhao, Pranjali
Tantis, Iosif
Hu, Ying
T Prášek, Jan
Idesová, Beáta
Bajwa, Laiba Asad
Bajwa, Laiba Asad
Bajwa, Laiba Asad
B Michalička, Jan
S Michalička, Jan
Janů, Lucie
Bolouki, Nima
Hu, Ying
Kalleshappa, Bindu
Bednaříková, Vendula
Surana, Karan Singh
David, Jiří
T Tmejová, Kateřina
Bahadur, Fateh
Staňo, Michal
Bajwa, Laiba Asad
T Iakoubovskii, Konstantin
Hu, Ying
Soldán, Marek
Nebojsa, Alois
Hu, Ying
David, Jiří
Hrdinová, Sára
Kepič, Peter
U Prášek, Jan
Dey, Sharmistha
Dubroka, Adam
Dey, Sharmistha
Papež, Nikola
T Spotz, Zdeněk
Ramesh, Maneesha
Hu, Ying

Upcoming trainings

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Term Name Description Max. attendees
13.10. 10:30 - 12:00 RIE-flourine-training Attendees: Eduard Jelínek, Marie Cmíralová, Marek Soldán 3
13.10. 10:30 - 11:30 DEKTAK training Attendees: Helena Šimůnková 1
13.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Hugo Weisz, Tomáš Janoušek 2
14.10. 09:00 - 17:30 Amber SEM-FIB training Attendees: Veronika Mazánová, Jan Kramář 2
14.10. 09:30 - 12:00 ALD-Fiji- training Attendees: Eduard Jelínek, Tomáš Henzl 3
14.10. 10:00 - 13:00 DLS-ZetaSizer Part 1 This training will provide hands-on practice with basic methods for measuring particle size and zeta potential using the ZetaSizer. The session will cover: -An overview of DLS principles, including light scattering and Brownian motion. -Step-by-step guidance on preparing samples for size and zeta potential measurements. -The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples. Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface. By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization. Attendees: Carolina Sanna 3
15.10. 09:00 - 12:30 Amber SEM-FIB training Attendees: Mahan Bakhshikhah, Dinara Sobola 2
15.10. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Tadeáš Lesovský, Sy Nguyen Pham, Sharmistha Dey 4
15.10. 10:00 - 12:00 VERSALAB VSM VERSALAB VSM training Attendees: Muhammad SAHIL 1
16.10. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Tadeáš Lesovský, Rosmi Vinson 2
16.10. 10:00 - 11:30 Ultracentrifuge training The introduction and manipulation with the ultracentrifuge and rotors Attendees: Maneesha Ramesh 2
16.10. 13:30 - 16:30 Evaporator CZ Standard training in Czech Attendees: Sujan Maity, Kristýna Kupková, Tomáš Henzl 2
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: David Neradilek 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Bindu Kalleshappa, Tadeáš Lesovský, Tereza Konečná, Romana Ščotková, Miriama Malček Šimunková 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Vojtěch Mikerásek, David Neradilek, Martin Kužílek 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský, Karol Križan, Lukáš Dokulil 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Romana Ščotková, Markéta Šulcová, Zequn Zhang, Aneta Opluštilová, Lukáš Dokulil, Martin Kužílek 10
21.10. 10:00 - 11:00 DIENER-training Attendees: Franc Paré Estalella, Matthias Knopf 3
21.10. 13:00 - 16:30 ARES for DHR users - photorheology Initial photorheological training for users experienced with the DHR rheometer. Attendees: Ivana Chamradová 2
10.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Aneta Opluštilová 3
11.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Aneta Opluštilová 1
11.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
11.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1