Wednesday 7.10.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
HELIOS
LEICA-TXP
UHV-PREPARATION
VERIOS
UHV-LEEM
ULTRACENTRIFUGE
UHV-DEPOSITION
TITAN
PARYLENE-SCS
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
ICON-SPM
NANO-ONE-2PP
SIMS
SEE-SYSTEM
nanoCT
LaserMIRA
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
nano-CT
RIE-FLUORINE
MINIFLEX
3D-PRUSA-ORANGE
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
3D-PRUSA-BLUE
3D-PRUSA-BLACK
TEM-SW
RIE-CHLORINE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
SW-LAB
FISCHIONE-160
SW-TRACER
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
TENUPOL
THEORY-SUPPORT
MONOWAVE
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
CITOPRESS
ML3-BABY
DSC-DISCOVERY
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
3D-PRUSA-XL
LAKESHORE
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
R2-PECVD
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
LASER-DICER
KEITHLEY-4200
FUMEHOOD…
LEICACOAT-NANO
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
FRASCAN
K70
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
UV-LASER
Polčák, Josef
Hu, Ying
Ondračka, Pavel
Ali, Hasan
B Man, Ondřej
Endstrasser, Zdeněk
T Kicmerova, Dina
Endstrasser, Zdeněk
S Tmejová, Kateřina
Endstrasser, Zdeněk
Michalička, Jan

Upcoming trainings

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Term Name Description Max. attendees
29.9. 09:00 - 09:45 Solvent fumehood training - ISO 5 clean room Training for a solvent fume hood. Attendees: Tomáš Henzl 2
29.9. 09:30 - 25.9. 12:00 ALD-Fiji -training Attendees: Morteza AFSHAR 3
29.9. 09:45 - 10:30 Etching Fumehood training - ISO5 cleanroom Training for Etching Fumehood. We will meet directly in ISO5 clean room. Attendees: Tomáš Henzl 2
30.9. 14:00 - 15:00 Copy - Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Josef Hynšt, Aneta Opluštilová 5
30.9. 14:00 - 15:00 Copy - Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jiří Rypl, Marek Soldán, Tomáš Janoušek, Josef Hynšt, Aneta Opluštilová 5
1.10. 09:30 - 13:00 FTIR Basic Training Attendees: Jiří Strnad 1
1.10. 09:30 - 12:00 Hysitron_basic Basic training on hysitron nanoindenter. Attendees: Rasul Valiyev, Štěpánka Kelarová 2
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
5.10. 09:30 - 21.7. 12:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Maneesha Ramesh 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jáchym Štindl, Tadeáš Lesovský, Filip Janík 3
6.10. 09:30 - 12:00 ICON-SPM basic training Attendees: Areej Fatima, Štěpánka Kelarová 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Filip Janík 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jáchym Štindl 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tadeáš Lesovský 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Dominik Hrůza, Tadeáš Lesovský 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Tadeáš Lesovský 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10