Sunday 27.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
TITAN
WOOLLAM-VIS
NANO-ONE-2PP
SEE-SYSTEM
nanoCT
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
LaserMIRA
RIE-CHLORINE
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
MINIFLEX
DIENER
RIE-FLUORINE
3D-PRUSA-BLACK
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
TENUPOL
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
LEICA-TXP
FISCHIONE-160
DSC-DISCOVERY
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
KRATOS-XPS
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV-PREPARATION
AMBER
UHV-MBE1
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV…
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-SPM
UHV-CLUSTER
UHV…
MONOWAVE
WOOLLAM-MIR
ML3-BABY
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
3D-PRUSA-XL
LPCVD-SiN
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LAKESHORE
KEITHLEY-4200
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
R2-PECVD
K70
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
LEICACOAT-NANO
IR-RAMAN
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
UV-LASER
Ali, Hasan
Dubroka, Adam

Upcoming trainings

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Term Name Description Max. attendees
21.9. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Daniel Burda, Vladislav Dvořák, Nikola Papež 3
21.9. 12:30 - 13:00 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Jakub Máčala, Saleh Hekmat Saleh Fawaeer, Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Morteza AFSHAR, Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Jakub Máčala, Romana Ščotková, Maneesha Ramesh, Tomáš Henzl, Filip Janík, Jakub Bartušek 10
22.9. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: Sujan Maity, Matthias Knopf, Stefan Schultschik 2
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Jakub Máčala, Maneesha Ramesh, Filip Janík, Jakub Bartušek 10
23.9. 15:30 - 17:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Sujan Maity 1
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Šimon Formánek 2
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
25.9. 10:00 - 12:00 ML3-Baby ML3 Baby MicroWriter training Attendees: Ganna Kharchenko 1
2.10. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Karan Singh Surana 4
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
6.10. 10:00 - 17:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Dvorak from 10, Burda from 13. Attendees: Daniel Burda, Vladislav Dvořák 2
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10