Friday 25.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
TITAN
UHV-LEEM
HELIOS
UHV-XPS
UHV-DEPOSITION
UHV-PREPARATION
UHV-SPM
WOOLLAM-VIS
FTIR-CHEMLAB
LEICACOAT-NANO
VERIOS
MIRA-STAN
UHV-FTIR
VACUUM-OVEN-B1…
CHEMLAB-B1.14
AMBER
NANO-ONE-2PP
MIRA-EBL
nano-CT
RSA
SEE-SYSTEM
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
SIMS
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
nanoCT
RIE-CHLORINE
MINIFLEX
TEM-SW
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PECVD
BET-ANAMET
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
RIE-FLUORINE
STEMI
FISCHIONE-160
SW-BEAMER
VACUUM-OVEN-B1…
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
CITOVAC
VUVAS
UHV…
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
CITOPRESS
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID4
UHV-CLUSTER
TGA96
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-LEIS
UHV-MBE
UHV-PLD
NANOSCAN
WOOLLAM-MIR
MONOWAVE
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
DSC-DISCOVERY
CRYOGENIC
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
LASER-DICER
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
ML3-BABY
LAURELL-NANO
R2-PECVD
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
FRASCAN
KEITHLEY-4200
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER
Polčák, Josef
Pekárková, Jana
Valiyev, Rasul
Čechal, Jan
Ali, Hasan
Horák, Michal
B Kolíbalová, Eva
Hrůza, Dominik
Stará, Veronika
T Man, Ondřej
B Man, Ondřej
Hrůza, Dominik
Stará, Veronika
Hrůza, Dominik
Stará, Veronika
Hrůza, Dominik
Stará, Veronika
Hrůza, Dominik
Stará, Veronika
Dubroka, Adam
Hu, Ying
Hu, Ying
T Kicmerova, Dina
Hu, Ying
Hrůza, Dominik
Hu, Ying
Hu, Ying
B Man, Ondřej

Upcoming trainings

Show more

Term Name Description Max. attendees
21.9. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Daniel Burda, Vladislav Dvořák, Nikola Papež 3
21.9. 12:30 - 13:00 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Jakub Máčala, Saleh Hekmat Saleh Fawaeer, Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Tomáš Henzl, Filip Janík, Jakub Bartušek 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh, Tomáš Henzl, Filip Janík 10
22.9. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: Sujan Maity, Matthias Knopf, Stefan Schultschik 2
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Jakub Máčala, Maneesha Ramesh, Filip Janík 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2
24.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský, Šimon Formánek 3
6.10. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
7.10. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
7.10. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
19.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/385586219854116?p=ua7bQZ5EfzCA2ueQx6) Meeting ID: 385 586 219 854 116 Access code: zt6FS25C 5
20.10. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
20.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
20.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
20.10. 14:25 - 14:55 Safety excursion - Structural Analysis 10