| 18.9. 09:00 - 13:00 |
TIC3X_basic
|
TIC3X_basic: training for new users
Attendees:
Eliška
Šiška Virágová
|
2
|
| 18.9. 12:00 - 13:00 |
4-Point Probe
|
Basic training
Attendees:
Sharmistha
Dey
|
2
|
| 21.9. 09:30 - 14:30 |
NANO-ONE-2PP 1/2
|
The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training.
Attendees:
Daniel
Burda,
Vladislav
Dvořák,
Nikola
Papež
|
3
|
| 21.9. 12:30 - 13:00 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL)
Meeting ID: 366 554 789 519 442
Access code: kW9V5B48
Attendees:
Tomáš
Henzl,
Filip
Janík,
Jakub
Bartušek
|
5
|
| 22.9. 12:15 - 12:50 |
Safety excursion - Advanced Chemical lab
|
Attendees:
Jakub
Máčala,
Saleh Hekmat Saleh
Fawaeer,
Marc Arvie
Talavera,
Maneesha
Ramesh
|
5
|
| 22.9. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
Attendees:
Tomáš
Henzl,
Filip
Janík,
Jakub
Bartušek
|
5
|
| 22.9. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Maneesha
Ramesh,
Tomáš
Henzl,
Filip
Janík
|
10
|
| 22.9. 14:00 - 15:30 |
SUSS Wetbench training
|
Training of the new user
Attendees:
Sujan
Maity,
Matthias
Knopf,
Stefan
Schultschik
|
2
|
| 22.9. 14:25 - 14:55 |
Safety excursion - Structural Analysis
|
Attendees:
Jakub
Máčala,
Maneesha
Ramesh,
Filip
Janík
|
10
|
| 24.9. 09:00 - 16:00 |
Helios_basic (1/2)
|
Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Anjali
Valadi Palliyalil,
Šimon
Formánek
|
2
|
| 24.9. 09:30 - 12:00 |
RIE-chlorine-training
|
Attendees:
David Jonathan
Walcher
|
3
|
| 25.9. 09:00 - 12:00 |
Verios/Helios_EDS
|
Practical demonstration of EDS analytical system at Verios and Helios.
Attendees:
Kryštof
Jasenský,
Šimon
Formánek
|
3
|
| 6.10. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
|
3
|
| 7.10. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 7.10. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|
| 7.10. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
|
1
|