Tuesday 15.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-PREPARATION
KRATOS-XPS
UHV-LEEM
TITAN
UHV-XPS
MIRA-EBL
MIRA-STAN
WOOLLAM-VIS
LITESCOPE-MIRA…
VERIOS
UHV-SPM
UHV-DEPOSITION
NANO-ONE-2PP
nano-CT
RSA
nanoCT
SNOM-NANONICS
SIMS
ICON-SPM
PARYLENE-SCS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
STEMI
BET-ANAMET
MINIFLEX
DIENER
RIE-CHLORINE
3D-PRUSA-ORANGE
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
TEM-SW
RIE-FLUORINE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SW-LAB
SW-BEAMER
FISCHIONE-160
SW-TRACER
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
LEICA-TXP
TGA96
TENUPOL
MONOWAVE
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
THEORY-SUPPORT
UHV…
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
CITOPRESS
WOOLLAM-MIR
DSC-DISCOVERY
LECTROPOL
CRYOMILL
SW-CT
DRIE
DHR
PARYLENE-DIENER
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
EVAPORATOR
TIC3X
ELECTROWORKSHOP
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
ML3-BABY
LAKESHORE
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
CRYOGENIC
KEITHLEY-4200
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
3D-PRUSA-XL
R2-PECVD
K70
FUMEHOOD…
PECVD-NANOFAB
FUMEHOOD…
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
LEICACOAT-NANO
IR-RAMAN
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
UV-LASER
Hrůza, Dominik
David, Jiří
Kelarová, Štěpánka
Maity, Sujan
Hrůza, Dominik
David, Jiří
Huang, Yong
Hrůza, Dominik
T Švarc, Vojtěch
Ulč, Filip
Duchaň, Marek
Ulč, Filip
T Kicmerova, Dina
Hrůza, Dominik
Hrůza, Dominik

Upcoming trainings

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Term Name Description Max. attendees
8.9. 09:30 - 12:00 RIE-flourine-training Attendees: Estácio Paiva de Araújo, Elisa Cuccu, Kristýna Kupková 3
9.9. 13:00 - 14:30 JASCO training Description of holders and software, basic measurement Attendees: Debika Devi Thongam 3
10.9. 14:19 - 15:19 Rigaku 3 - special Bring your typical sample. A 1.15 Attendees: Ivan Saldan 1
11.9. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Iosif Tantis 4
14.9. 10:00 - 12:00 NANO-ONE-2PP 2/2 Second part of the NANO-ONE-2PP training. Assisted printing with users who had already attended the first part of the training. Meeting point in front of the User Office. Attendees: Martina Triebelová 1
15.9. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. 3
15.9. 09:30 - 15:00 Mira-EBL training Attendees: Maria Baeva 1
17.9. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 09:30 - 12:00 RIE-chlorine-training Attendees: David Jonathan Walcher 3
17.9. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
17.9. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
21.9. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/366554789519442?p=e8DKbgiFLWGtCdHTIL) Meeting ID: 366 554 789 519 442 Access code: kW9V5B48 5
22.9. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Maneesha Ramesh 5
22.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
22.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Maneesha Ramesh 10
22.9. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Maneesha Ramesh 10
24.9. 09:00 - 16:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Anjali Valadi Palliyalil, Šimon Formánek 2
25.9. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Kryštof Jasenský 3