Tuesday 1.9.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-PREPARATION
UHV-XPS
KRATOS-XPS
UHV-LEIS
UHV-LEEM
ICON-SPM
RIE-CHLORINE
MINIFLEX
nanoCT
nano-CT
RSA
MIRA-EBL
SNOM-NANONICS
NANO-ONE-2PP
RIE-FLUORINE
SIMS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
MIRA-STAN
NANOCALC
STEMI
BET-ANAMET
SW-BEAMER
PARYLENE-SCS
SUSS-RCD8
DIENER
3D-PRUSA-BLACK
CITOPRESS
NANOSCAN
NANOSAM
NIKON-NANO
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-ORANGE
SW-TRACER
PARYLENE-DIENER
TEM-SW
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SW-LAB
FISCHIONE-160
LEICA-TXP
VACUUM-OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM-OVEN-B1…
VUVAS
ULTRAFAST-LASER
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
TENUPOL
THEORY-SUPPORT
DSC-DISCOVERY
AMBER
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TEST-RFID4
TGA96
Heliscan
UHV…
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-DEPOSITION
UHV-FTIR
UHV-MBE
UHV-PLD
UHV-SPM
UHV-CLUSTER
MONOWAVE
ML3-BABY
3D-PRUSA-XL
EVAPORATOR
CRYOMILL
SW-CT
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
TIC3X
R4…
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
VERSALAB
CPD
FUMEHOOD…
DISCO-DICING…
MPS150
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
MAGNETRON-AJA
APCVD
NANOWIZARD
ALD-FIJI
BAMBULAB
MINIEVAP
BET-DEGASSER
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
FUMEHOOD…
FUMEHOOD…
WOOLLAM-MIR
LPCVD-SiN
LASER-DICER
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LAKESHORE
KEITHLEY-4200
CRYOGENIC
PROTOMAT
LVEM
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
R2-PECVD
K70
FUMEHOOD…
LEICACOAT-NANO
FUMEHOOD…
CLARUS-680
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
FRASCAN
IR-RAMAN
TITAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
UV-LASER
Molnár, Tomáš
Molnár, Tomáš
Polčák, Josef
Vaníčková, Elena
Molnár, Tomáš

Upcoming trainings

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Term Name Description Max. attendees
12.8. 10:00 - 11:15 Leicacoat StAn training Meeting point: at the cleanroom filter (building A) Attendees: Nima Bolouki, Rosmi Vinson, DAVIDE MURTAS 4
13.8. 09:00 - 14.8. 17:30 Amber SEM-FIB training Attendees: Yue Wang, Peter Fecko 2
14.8. 13:00 - 13:45 Solvent fumehood - ISO 5 Training for solvent fumehood in Nanofabrication. Meeting point by the fumehoods inside the cleanroom. Attendees: Ganna Kharchenko, Sujan Maity 2
14.8. 13:45 - 14:30 Etching fumehood - ISO 5 Training for the etching fumehoods in Nanofabrication. Attendees: Ganna Kharchenko, Sujan Maity 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
20.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Attendees: Muhammad SAHIL 1
20.8. 13:00 - 17:00 Rigaku3-hands on Rigaku3-hands on Sharmistha Attendees: Sharmistha Dey 1
21.8. 09:30 - 12:00 RIE-flourine - training Attendees: Nikol Kaděrová, DAVIDE MURTAS, Karel Škubník 3
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C Attendees: Philipp Jäger 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Yue Wang, Philipp Jäger 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Philipp Jäger 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis Attendees: Philipp Jäger 10
26.8. 09:30 - 14:30 NANO-ONE-2PP 1/2 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). All prerequisites must be fulfilled two days before the training. Attendees: Martina Triebelová 3
27.8. 09:00 - 13:00 Rigaku3-hands on Rigaku3-hands on Iosif Tantis Attendees: Iosif Tantis 1
27.8. 13:00 - 15:00 LVEM_EDS (3) Attendees: Anjali Valadi Palliyalil, Karan Singh Surana 2
4.9. 10:00 - 13:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Sunny Nandi 3