Monday 3.8.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
Danchuk, Viktor
Polášková, Kateřina
Supalová, Linda
D'Angelo, Elena
Jasenský, Kryštof
Tvrdoňová, Anna
Arregi…
Hrůza, Dominik
Tantis, Iosif
Burda, Daniel
Bajwa, Laiba Asad
Janů, Lucie
Procházka, Pavel
Vijithra, Vijithra
Kreuzerová, Monika
Janůšová, Martina
Lepcio, Petr
Havelka, Tomáš
AL Soud, Ammar
Šamořil, Tomáš
Kareš, Martin
Daradkeh, Samer
Bolouki, Nima
Klusák, Radovan
Michalička, Jan
Fatima, Areej
Polčák, Josef
U UHV-PREPARATION
U NANOSAM
S NANOSAM
S NANOSAM
U UHV-SPM
U UHV-LEEM
U UHV-XPS
U UHV-DEPOSITION
U UHV-TransferLine_2
U UHV-TransferLine_1
U UHV-PLD
U UHV-MBE
U UHV-FTIR
FUMEHOOD-ChemLab-II
VERIOS
CHEMLAB-B1.14
JASCO
EVAPORATOR
RIE-FLUORINE
MIRA-EBL
ALD-FIJI
UHV-PREPARATION
UHV-XPS
UHV-DEPOSITION
SUSS-WETBENCH
EVAPORATOR
RAITH
SUSS-WETBENCH
RIE-FLUORINE
SUSS-MA8
MAGNETRON-AJA
RIGAKU9
UHV-SPM
UHV-SPM
FTIR-CHEMLAB
BET-DEGASSER
RIE-CHLORINE
DEKTAK
SUSS-WETBENCH
ML3-BABY
KRATOS-XPS
WOOLLAM-RC2
UHV-PREPARATION
UHV-LEEM
MIRA-STAN
MIRA-STAN
KRATOS-XPS
T MIRA-STAN
WITEC-RAMAN
WITEC-RAMAN
S LYRA
SW-CT
KRATOS-XPS
R2-PECVD
K70
S TITAN
KRATOS-XPS
KRATOS-XPS

Upcoming trainings

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Term Name Description Max. attendees
3.8. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Mohammad Allaham, Franc Paré Estalella, Iosif Tantis, Debika Devi Thongam 4
4.8. 09:00 - 12:00 Verios/Helios_EDS Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Debika Devi Thongam, Kateřina Polášková 3
4.8. 10:00 - 11:30 MPS 150 training Training of the new user Attendees: Nikol Kaděrová 2
4.8. 14:00 - 15:30 SUSS Wetbench training Training of the new user Attendees: DAVIDE MURTAS, Karel Škubník 2
5.8. 09:30 - 14:30 NANO-ONE-2PP Training Part 1 The training consists of a theoretical introduction to the two-photon polymerization printing technique, followed by a basic practical demonstration of the printing process. The printer, along with all available resins and accessories, will be introduced to users. By the end of the training, participants will gain both theoretical insights and practical experience with the NanoOne250 printer for fabricating structures ranging from the macro to the micrometer scale. The meeting point is in front of the User Office (Building C, 1st floor). Attendees: Veronika Sevriugina, Shidhin Mappoli, Michal Slovák 3
7.8. 09:00 - 13:00 Basic-Rigaku3 Bring your typical sample A1.15 You will not be admitted to the training without a completed "Request for training" in the booking system and an interview. Follow up on the instructions: [How to apply for training](https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=36) Attendees: Iosif Tantis, Debika Devi Thongam 2
18.8. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Nima Bolouki, Šimon Formánek 3
19.8. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Šimon Formánek 1
19.8. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Nima Bolouki 1
19.8. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
24.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Join: [HERE](https://teams.microsoft.com/meet/35462004903561?p=GpHxeNZeulO7czefLV) Meeting ID: 317 713 074 790 138 Access code: ya9A3E3C 5
25.8. 12:15 - 12:50 Safety excursion - Advanced Chemical lab 5
25.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
25.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
25.8. 14:25 - 14:55 Safety excursion - Structural Analysis 10