Saturday 28.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-SPM
ICON-SPM
UHV-DEPOSITION
CRYOGENIC
R2-PECVD
LVEM
UHV-LEEM
HELIOS
TITAN
MIRA-STAN
UHV-PREPARATION
AMBER
WOOLLAM-VIS
MIRA-EBL
nano-CT
SNOM-NANONICS
nanoCT
RSA
3D-PRUSA-XL
PARYLENE-SCS
SEE-SYSTEM
LaserMIRA
SUMMIT
SHAKER-B1.18
NANOCALC
STEMI
BET-ANAMET
SIMS
RIE-CHLORINE
MINIFLEX
PECVD
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
TEM-SW
MIRKA
SW-LAB
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
DIENER
RIE-FLUORINE
SW-BEAMER
FISCHIONE-160
SW-TRACER
VUVAS
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
VACUUM_OVEN-B1…
VISCOMETER
ULTRASONIC…
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
RIGAKU9
KRATOS-XPS
microCT
ZWICK
ZETASIZER
US-CUTTER
ULTRAFAST-LASER
LEICA-TXP
Heliscan
TENUPOL
NANOSAM
Test Ondra 3
Test O2
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV…
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-XPS
UHV-PLD
UHV-CLUSTER
UHV…
NIKON-NANO
MONOWAVE
NANOSCAN
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
VERSALAB
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
CRYOMILL
TIC3X
FUMEHOOD…
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BRILLOUIN
CPD
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUMEHOOD…
CLARUS-680
CITOPRESS
KERR-MICROSCOPE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
LAURELL-NANO
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
MPS150
LIBS-FireFly
LASER-DICER
Micromex
NANOINDENTER
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
CHEMLAB-B1.14
KEITHLEY-4200
CHEMLAB-B1.16
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER
Soldán, Marek
Šťastný, Jakub
Soldán, Marek
Danchuk, Viktor
Bolouki, Nima
S Kolíbalová, Eva
Soldán, Marek
E Man, Ondřej
T Michalička, Jan
E Kovařík, Martin
Soldán, Marek
B Man, Ondřej
Franta, Daniel

Upcoming trainings

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Term Name Description Max. attendees
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Hasan Ali, Tomáš Janoušek 3
24.3. 09:00 - 17:30 Amber Meeting point at the microscope. Attendees: Adam Očkovič 4
24.3. 09:30 - 12:00 ALD-Beneq-training Attendees: Jozef Štálnik, Derenik Petrosyan 3
24.3. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Areej Fatima, Šimon Formánek, Rasul Valiyev, David Jonathan Walcher 5
24.3. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Šimon Formánek, David Jonathan Walcher 5
24.3. 13:00 - 15:00 ICON-SPM basic training Do not sign up for this training, this is extra training for request. Thank you. Attendees: Daniel Franta 1
24.3. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Petr Pazourek, Šimon Formánek, Rasul Valiyev, David Jonathan Walcher 10
24.3. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Petr Pazourek, Ondrej Kubinec, Šimon Formánek, David Jonathan Walcher 10
24.3. 15:00 - 17:00 Woollam RC2 Second part of training Attendees: Beáta Kavcová 1
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Radim Slovák 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
27.3. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Grigory Mathew, Sujan Maity 2
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Carolina Oliver Urrutia, Ondrej Kubinec 4
27.3. 10:00 - 12:00 Witec-Raman in front of user office Attendees: Lucie Žaloudková 4
16.4. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Aida Fazlič 4