Sunday 22.3.2026
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
EVAPORATOR
DIENER
UHV-PREPARATION
UHV-SPM
RIE-FLUORINE
VERSALAB
UHV-LEEM
UHV-DEPOSITION
CRYOGENIC
TUBE-FURNACE
LVEM
UHV-XPS
WOOLLAM-VIS
MIRA-STAN
KRATOS-XPS
RIGAKU9
RSA
BET-ANAMET
STEMI
nanoCT
nano-CT
LaserMIRA
SEE-SYSTEM
MIRA-EBL
SNOM-NANONICS
ICON-SPM
SHAKER-B1.18
SUMMIT
PARYLENE-SCS
SIMS
NANOCALC
3D-PRUSA-XL
MINIFLEX
TEM-SW
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
RIE-CHLORINE
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SW-LAB
SW-BEAMER
Test Ondra 3
SW-TRACER
VACUUM_OVEN-B1…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
CITOVAC
VACUUM_OVEN-B1…
ULTRAFAST-LASER
VUVAS
VISCOMETER
L450
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRASONIC…
UHV…
LEICA-TXP
TGA96
TENUPOL
FISCHIONE-160
AMBER
NANOSAM
Test O2
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV…
Heliscan
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
UHV-CLUSTER
NIKON-NANO
MONOWAVE
NANOSCAN
HELIOS
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
SW-CT
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
DRIE
CRYOMILL
Micromex
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BRILLOUIN
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
CLARUS-680
micro-CT-L240
CITOPRESS
KERR-MICROSCOPE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
HENRY-MAGNET
LAURELL-NANO
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
MPS150
LIBS-FireFly
LASER-DICER
micro-CT-m300
CHEMLAB-B1.14
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.16
R2-PECVD
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Supalová, Linda
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Bokaei Khelejan, Hatef
Šebestová, Zuzana
Šebestová, Zuzana
Supalová, Linda
Daradkeh, Samer
Šebestová, Zuzana
Šebestová, Zuzana
S Danchuk, Viktor
Kepič, Peter
S Kolíbalová, Eva
Šebestová, Zuzana
Franta, Daniel
Lukiienko, Iryna
Tahsin, Muhammad
Arregi Uribeetxebarria, Jon Ander

Upcoming trainings

Show more

Term Name Description Max. attendees
20.3. 09:00 - 10:29 MIRA-STAN - EDS detector Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Grigory Mathew, Karan Singh Surana, Nicolò Rossetti 4
20.3. 09:00 - 12:00 TGA Discovery Basic training for practical operation on TGA Discovery. At the training day meeting point is in the ChemLab (B1.15) in the building B. Attendees: Lucie Žaloudková 1
20.3. 13:30 - 15:30 FTIR-CHEMLAB Meeting point in Chemlab. Attendees: Saurabh Pathak 2
23.3. 10:00 - 11:30 JASCO training Description of holders and software, basic measurement Attendees: Daina Dayana Arenas Buelvas, Pedro Henrique de Oliveira Santiago 3
23.3. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 341 031 483 654 Přístupový kód: hz6gW67Y Attendees: Petr Pazourek, Šimon Formánek, David Jonathan Walcher 5
24.3. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jan Klíma, Radim Slovák, Hasan Ali, Tomáš Janoušek 3
24.3. 09:00 - 17:30 Amber Meeting point at the microscope. Attendees: Adam Očkovič 4
24.3. 09:30 - 12:00 ALD-Beneq-training Attendees: Jozef Štálnik, Derenik Petrosyan, Heriknaz Asatryan 3
24.3. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion. Attendees: Areej Fatima, Šimon Formánek, Rasul Valiyev, David Jonathan Walcher 5
24.3. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Petr Pazourek, Šimon Formánek, David Jonathan Walcher 5
24.3. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Petr Pazourek, Rasul Valiyev, David Jonathan Walcher 10
24.3. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Petr Pazourek, Šimon Formánek, David Jonathan Walcher 10
25.3. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Tomáš Janoušek 1
25.3. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Radim Slovák 1
25.3. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Jan Klíma 1
27.3. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Grigory Mathew, Sujan Maity 2
27.3. 09:30 - 16:30 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Carolina Oliver Urrutia, Ondrej Kubinec 4
27.3. 10:00 - 16.3. 12:00 Witec-Raman in front of user office Attendees: Yue Wang, Saurabh Pathak 4