CEITEC VUT Equipment

Upcoming trainings

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Term	Name	Description	Max. attendees
2.3. 09:30 - 10:30	UV marking Laser	Training is focused on the basic operations of the 5W marking UV laser and the connected Lightburn software.	2
4.3. 09:00 - 16:00	GC-MS CLARUS-680 Training	GC-MS CLARUS-680 Training from Perkin Elmer Attendees: Michela Sanna, Kateřina Tmejová	2
6.3. 10:00 - 12:00	Witec-Raman	in front of user office Attendees: Petr Pazourek, Sujan Maity, Tomáš Janoušek	4
10.3. 09:00 - 12:00	Verios/Helios_EDS	Practical demonstration of EDS analytical system at Verios and Helios. Attendees: Karan Singh Surana, Saurabh Pathak	3
13.3. 09:30 - 12:00	ICON-SPM basic training	Attendees: Martina Janůšová, Ondrej Kubinec, Tomáš Janoušek	3
17.3. 09:00 - 17:00	Helios_basic (1/2)	Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Jiří Spousta, Jan Pišťák, Mohamed Bensalem	3
27.3. 09:30 - 16:30	MIRA-STAN 1/2	Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Ondrej Kubinec	4

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KRATOS-XPS
MIRA-STAN
TITAN
CRYOGENIC
WITEC-RAMAN
RIGAKU3
WOOLLAM-VIS
TGA-DISCOVERY
NANOCALC
UHV-DEPOSITION
VERIOS
UHV-LEEM
LIBS-FireFly
UHV-XPS
RAITH
UHV-SPM
BET-ANAMET
LITESCOPE-MIRA…
DIENER
UHV-PREPARATION
HELIOS
AMBER
RIE-FLUORINE
ZWICK
BET-DEGASSER
MAGNETRON
RIGAKU9
LVEM
STEMI
ZEISS-NANO
ULTRACENTRIFUGE
SHAKER-B1.18
3D-PRUSA-BLUE
SUMMIT
LaserMIRA
SEE-SYSTEM
SIMS
PARYLENE-SCS
ICON-SPM
SNOM-NANONICS
MIRA-EBL
RTP
RSA
ACCURION_RSE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
nanoCT
PARYLENE-DIENER
MINIFLEX
TEM-SW
RIE-CHLORINE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
SUSS-RCD8
nano-CT
3D-PRUSA-XL
SW-BEAMER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV…
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
Test školení
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
UHV-MBE2
UHV-MBE1
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
NMR
MONOWAVE
NIRQUEST512
R4…
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
FLOWBOX
CRYOMILL
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
VERSALAB
CLARUS-680
BRILLOUIN
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
TORNADO-M4
TIC3X
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
Micromex
NIKON-NANO
WOOLLAM-RC2
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
SUSS-MA8
LIBS-Discovery
DEKTAK
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
MPS150
CITOPRESS
NANOSCAN
NANOSAM
LIBS-LabSys1
LAURELL-NANO
micro-CT-L240
CHEMLAB-B1.16
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
NANOINDENTER
CHEMLAB-B1.14
CHEMLAB-B1.18
LASER-DICER
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
R2-PECVD
UV-LASER