| 16.2. 10:00 - 13:00 |
Tornado-M4
|
Attendees:
Jon Ander
Arregi Uribeetxebarria
|
3
|
| 17.2. 09:00 - 17:00 |
Helios_basic (1/2)
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Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jiří
Spousta,
Jan
Pišťák
|
2
|
| 17.2. 09:30 - 12:30 |
DLS-ZetaSizer Part 1+2
|
This training will provide hands-on practice with basic methods for measuring particle size using the DLS technique.
The session will cover:
-An overview of DLS principles, including light scattering and Brownian motion.
-Step-by-step guidance on preparing samples for size and zeta potential measurements.
-The use of different measurement cells (e.g., disposable and reusable cuvettes) and their applications for specific types of samples.
Practical demonstration of data acquisition, optimization of measurement parameters, and analysis using the Malvern software interface.
By the end of the training, participants will gain both theoretical insights and practical expertise in using the Malvern device for comprehensive particle characterization.
Attendees:
Ammar
AL Soud
|
3
|
| 18.2. 08:30 - 12:00 |
KRATOS-XPS
|
Basic training (session 1/2) - max 2 attendees.
In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz.
Attendees:
Amirmohsen
Fanisaberi
|
2
|
| 19.2. 09:30 - 12:00 |
ICON-SPM basic training
|
|
3
|
| 20.2. 08:30 - 14:30 |
LYRA advanced training - FIB, GIS, nanomanipulator
|
The training focused on FIB, GIS, and the nanomanipulator. We will meet in the LYRA lab.
Attendees:
Pavel
Klok,
Cyril
Delforge,
Ivana
Kratochvílová,
Elisa
Cuccu
|
4
|
| 23.2. 09:00 - 13:00 |
Verios_basic (1/2)
|
Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum.
Attendees:
Jan
Klíma,
Jakub
Krčma,
Kryštof
Jasenský
|
3
|
| 23.2. 10:30 - 11:15 |
Nanofab interview - Meeting room C2.11 or C2.07
|
This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab.
ID schůzky: 347 469 442 329 50
Přístupový kód: Nh7js27A
|
5
|
| 24.2. 10:00 - 11:30 |
Ultracentrifuge training
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The introduction and manipulation with the ultracentrifuge and rotors
Attendees:
Monika
Kreuzerová
|
2
|
| 24.2. 12:15 - 12:50 |
Safety excursion Chem lab
|
The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/index.php?categoryid=48. It must be finished 2 work days before the excursion.
Attendees:
Ekaterina
Pribytova
|
5
|
| 24.2. 13:00 - 13:50 |
Safety excursion - Nanofabrication lab
|
Please enroll in this training only in parallel with the "Nanofab interview."
Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month).
|
5
|
| 24.2. 13:55 - 14:20 |
Safety excursion - Nanocharacterization lab
|
Attendees:
Hasan
Ali
|
10
|
| 24.2. 14:25 - 14:55 |
Safety excursion - StAn lab
|
Attendees:
Eduard
Jelínek,
Hasan
Ali
|
10
|
| 27.2. 09:00 - 10:30 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Kryštof
Jasenský
|
1
|
| 27.2. 09:30 - 11:30 |
MIRA-STAN for returning users
|
Renewing the certificate for long-inactive users. Meeting point at the microscope.
Attendees:
Michela
Sanna,
Martin
Kovařík
|
2
|
| 27.2. 10:30 - 12:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Jakub
Krčma
|
1
|
| 27.2. 12:30 - 14:00 |
Verios_basic (2/2)
|
Verios_basic (2/2): hands-on session. Bring your real sample(s) with you.
Attendees:
Jan
Klíma
|
1
|
VERIOS
EVAPORATOR
PARYLENE-SCS