Monday 24.11.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
MIRA-STAN
UHV-LEEM
KRATOS-XPS
SUSS-WETBENCH
UHV-PREPARATION
RAITH
WITEC-RAMAN
CHEMLAB-B1.14
VERSALAB
FUME_HOOD-B1.14
FUMEHOOD…
CRYOGENIC
ICON-SPM
R2-PECVD
R4…
UHV-FTIR
EVAPORATOR
UHV-DEPOSITION
LYRA
UHV…
HELIOS
UHV…
LVEM
SEE-SYSTEM
MIRA-EBL
LIBS-FireFly
LAKESHORE
ML3-BABY
UHV-MBE
JASCO
UHV-XPS
RIGAKU9
NANOSAM
FTIR-CHEMLAB
SUSS-MA8
DIENER
TIC3X
UHV-SPM
UHV-PLD
LaserMIRA
SUMMIT
3D-PRUSA-BLACK
PECVD
SIMS
3D-PRUSA-ORANGE
PARYLENE-SCS
PARYLENE-DIENER
SNOM-NANONICS
SAW-ACCUTOM
RSA
nanoCT
MIRKA
MINIFLEX
RIE-CHLORINE
SPINCOATER…
Q-LAB
RTP
RIE-FLUORINE
ACCURION_RSE
RIGAKU3
SUSS-RCD8
SHAKER…
TEST2
NANOCALC
CITOVAC
ULTRAFAST-LASER
US-CUTTER
DWL
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR
VACUUM_OVEN-B1…
UHV-CLUSTER
VUVAS
VISCOMETER
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
UHV-LEIS
UHV-MBE1
STEMI
FISCHIONE-160
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
Test Ondra 3
UHV-MBE2
Test O2
ULTRACENTRIFUGE
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
3D-PRUSA-BLUE
MPS150
ZEISS-NANO
ELECTROWORKSHOP
SW-CT
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
FLOWBOX
CPD
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUME_HOOD-B1.18
CLARUS-680
DAWN-HELEOS
CRYOMILL
MINIEVAP
TEGRAMIN
BET-DEGASSER
ALD-BENEQ
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
LEXT
BRILLOUIN
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
GLOVEBOX
VNA-MPI
NMR
DEKTAK
LPCVD-polySi
LPCVD-SiN
PROTOMAT
KERR-MICROSCOPE
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
LABOTOM5
LITESCOPE-LYRA
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
MONOWAVE
CITOPRESS
NANOSCAN
NIRQUEST512
WOOLLAM-VIS
LITESCOPE-MIRA…
LIBS-LabSys1
VERIOS
IS_NOVOCONTROL
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
NANOINDENTER
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
LIBS-Discovery
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
LAURELL-NANO
UV-LASER
Wang, Yue
Pradhan, Gyandeep
Wang, Yue
Kumar, Sanjay
U Danchuk, Viktor
Šebestová, Zuzana
Šebestová, Zuzana
Čechal, Jan
Kelarová, Štěpánka
Lee, Hyesung
Pradhan, Gyandeep
Idesová, Beáta
Liška, Jiří
U Danchuk, Viktor
Šebestová, Zuzana
Šebestová, Zuzana
T Lišková, Zuzana
Idesová, Beáta
Stará, Veronika
T Spotz, Zdeněk
U Jewula, Pawel
Jewula, Pawel
Daradkeh, Samer
Sobola, Dinara
U Jewula, Pawel
Jewula, Pawel
Figura, Daniel
Figura, Daniel
Sobola, Dinara
S Danchuk, Viktor
Wang, Yue
T Gablech, Evelína
Bolouki, Nima
Bolouki, Nima
U Danchuk, Viktor
Pradhan, Gyandeep
U Danchuk, Viktor
Bensalem, Mohamed
U Danchuk, Viktor
Tichý, Martin
U Danchuk, Viktor
T Kolíbalová, Eva
Bolouki, Nima
Liška, Jiří
Vozár, Tomáš
Holcman, Vladimír
Talíř, Marek
U Danchuk, Viktor
E Tmejová, Kateřina
U Danchuk, Viktor
Varshney, Devanshu
U Danchuk, Viktor
T Lepcio, Petr
Figura, Daniel
Jakešová, Marie
Kramář, Jan
U Danchuk, Viktor
U Danchuk, Viktor

Upcoming trainings

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Term Name Description Max. attendees
24.11. 10:00 - 12.11. 15:00 RAITH training individual RAITH training for Mira users Attendees: Gyandeep Pradhan 1
24.11. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 319 779 632 749 3 Přístupový kód: Gq2BX9zw Attendees: Saurabh Pathak 5
24.11. 15:00 - 16:30 FTIR-CHEMLAB Basic FTIR training for experienced users Attendees: Anna Jančík Procházková 2
25.11. 09:00 - 11:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Bindu Kalleshappa 1
25.11. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Nicolò Rossetti, Václav Vít 2
25.11. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Hatef Bokaei Khelejan 5
25.11. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Saurabh Pathak 5
25.11. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Saurabh Pathak, Elena D'Angelo 10
25.11. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Mohamed Bensalem, Karan Singh Surana, Saurabh Pathak, Elisa Cuccu 10
26.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Karan Singh Surana, Saurabh Pathak, Elisa Cuccu 3
27.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Elisa Cuccu 1
27.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Saurabh Pathak 1
27.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.11. 13:00 - 15:00 RIE-flourine-training Attendees: Hugo Weisz, Fabian Majcen, Gyandeep Pradhan 3
28.11. 09:00 - 13:00 Rigaku 3 - basic Bring your typipical sample Attendees: Nicolò Rossetti 2
1.12. 09:30 - 11:00 LEXT training Attendees: Grigory Mathew 2
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab 10
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4