Saturday 22.11.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KRATOS-XPS
ML3-BABY
CRYOGENIC
CHEMLAB-B1.18
FUMEHOOD…
ICON-SPM
UHV-DEPOSITION
UHV-LEEM
UHV-XPS
UHV-SPM
VERSALAB
SUSS-WETBENCH
LAKESHORE
UHV-PREPARATION
ALD-FIJI
RIGAKU9
NMR
PARYLENE-SCS
nanoCT
RSA
MIRA-EBL
SNOM-NANONICS
WOOLLAM-VIS
PECVD
MINIFLEX
SEE-SYSTEM
NIRQUEST512
LaserMIRA
SUMMIT
SHAKER…
MIRA-STAN
NANOCALC
SIMS
RIE-FLUORINE
RIE-CHLORINE
RTP
SAW-ACCUTOM
PARYLENE-DIENER
3D-PRUSA-ORANGE
SPINCOATER…
Q-LAB
3D-PRUSA-BLACK
3D-PRUSA-BLUE
MIRKA
ULTRACENTRIFUGE
ACCURION_RSE
BET-ANAMET
ZEISS-NANO
RIGAKU3
SUSS-RCD8
DIENER
STEMI
FISCHIONE-160
SW-BEAMER
CITOVAC
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV-PLD
VUVAS
VISCOMETER
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV-MBE
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
NANOSCAN
Test Ondra 3
Test O2
TEST2
Test školení
TGA96
UHV-LEIS
THEORY-SUPPORT
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-FTIR
NANOSAM
MPS150
CITOPRESS
ELECTROWORKSHOP
DRIE
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
R4…
CRYOMILL
FLOWBOX
HELIOS
LYRA
4-POINT
FTIRMAG
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
SW-CT
TIC3X
FUME_HOOD-B1.18
BRILLOUIN
ALD-BENEQ
ARES
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
VACUUM_OVEN…
TORNADO-M4
CPD
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
FUME_HOOD-B1.14
CLARUS-680
MONOWAVE
KERR-MICROSCOPE
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
HENRY-MAGNET
LAURELL-NANO
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
GLOVEBOX…
DSC-DISCOVERY
LIBS-FireFly
LASER-DICER
DAWN-HELEOS
NANOINDENTER
GLOVEBOX
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.14
R2-PECVD
CHEMLAB-B1.16
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
UV-LASER
Čechal, Jan
Lee, Hyesung
Martyniuk, Oleh
Daradkeh, Samer
Dolejšová, Eliška
Martyniuk, Oleh
Wang, Yue
Kurowská, Anna
Kurowská, Anna
Kurowská, Anna
Kurowská, Anna
Daradkeh, Samer
Martyniuk, Oleh
Holcman, Vladimír
Kurowská, Anna
Idesová, Beáta
Caha, Ondřej
Dolejšová, Eliška

Upcoming trainings

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Term Name Description Max. attendees
24.11. 10:00 - 12.11. 15:00 RAITH training individual RAITH training for Mira users Attendees: Gyandeep Pradhan 1
24.11. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 319 779 632 749 3 Přístupový kód: Gq2BX9zw Attendees: Saurabh Pathak 5
24.11. 15:00 - 16:30 FTIR-CHEMLAB Basic FTIR training for experienced users Attendees: Anna Jančík Procházková 2
25.11. 09:00 - 11:30 SEE-SYSTEM training meeting point - in front of the user office C1.04 Attendees: Bindu Kalleshappa 1
25.11. 09:00 - 13:00 KRATOS-XPS Basic training (session 1/2) - max 2 attendees. In case of interest for the training (when it is full) write to josef.polcak@ceitec.vutbr.cz. Attendees: Nicolò Rossetti, Václav Vít 2
25.11. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Hatef Bokaei Khelejan 5
25.11. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Saurabh Pathak 5
25.11. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Saurabh Pathak, Elena D'Angelo 10
25.11. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Mohamed Bensalem, Karan Singh Surana, Saurabh Pathak, Elisa Cuccu 10
26.11. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Karan Singh Surana, Saurabh Pathak, Elisa Cuccu 3
27.11. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Elisa Cuccu 1
27.11. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Saurabh Pathak 1
27.11. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
27.11. 13:00 - 15:00 RIE-flourine-training Attendees: Hugo Weisz, Fabian Majcen, Gyandeep Pradhan 3
28.11. 09:00 - 13:00 Rigaku 3 - basic Bring your typipical sample Attendees: Nicolò Rossetti 2
1.12. 09:30 - 11:00 LEXT training Attendees: Grigory Mathew 2
15.12. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 370 940 608 734 3 Přístupový kód: LL7vT9Y2 5
16.12. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
16.12. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.12. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
16.12. 14:25 - 14:55 Safety excursion - StAn lab 10
23.1. 09:30 - 16:00 MIRA-STAN 1/2 Meeting point at the microscope. This is a two-step training, register for part 2 in our booking system. Obligatory prerequisites must be completed 2 days before the training. More information about the training is available on our <a href=”https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76”>Moodle</a>. Attendees: Navaj Shaikh, Grigory Mathew, Karan Singh Surana, Saurabh Pathak, Nicolò Rossetti 4