Monday 15.9.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
UHV-LEEM
MECHANICAL…
UHV-XPS
ML3-BABY
UHV-DEPOSITION
RIGAKU3
UHV-SPM
LYRA
WOOLLAM-MIR
ICON-SPM
FUME_HOOD-B1.14
VERIOS
LVEM
LEICACOAT-NANO
CHEMLAB-B1.14
KEITHLEY-4200
UHV-PREPARATION
MPS150
WIRE-BONDER
FTIR
LEICACOAT-STAN
WITEC-RAMAN
ULTRACENTRIFUGE
NMR
CRYOGENIC
TITAN
CHEMLAB-B1.16
SCIA
KRATOS-XPS
ZWICK
KERR-MICROSCOPE
BRILLOUIN
SNOM-NANONICS
MIRA-EBL
LITESCOPE-LYRA
NANOSAM
MIRA-STAN
DEKTAK
FUMEHOOD-HF
VACUUM_OVEN-B1…
RIE-FLUORINE
WOOLLAM-VIS
UHV…
UHV-MBE
EVAPORATOR
UHV-PLD
R4…
UHV-FTIR
ZEISS-NANO
UHV…
LIBS-FireFly
RIE-CHLORINE
Q-LAB
SHAKER…
DIENER
SUMMIT
nanoCT
SIMS
LaserMIRA
SEE-SYSTEM
MINIFLEX
RTP
PARYLENE-SCS
RSA
ACCURION_RSE
SUSS-RCD8
Test O1
NANOCALC
VACUUM_OVEN-C1…
UHV-LEIS
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
FTIR-CHEMLAB
UHV-MBE1
CITOVAC
VUVAS
VISCOMETER
XEF2
RIGAKU9
microCT
ZETASIZER
UHV-CLUSTER
UHV-MBE2
STEMI
FISCHIONE-160
BET-ANAMET
SW-BEAMER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
Test Ondra 3
TGA-DISCOVERY
Test O2
SAW-ACCUTOM
TEST2
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
SPINCOATER…
MONOWAVE
MIRKA
ELECTROWORKSHOP
DHR
DIMPLING…
DRYING_OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
FLOWBOX
SW-CT
HELIOS
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.18
DRIE
CRYOMILL
DAWN-HELEOS
VACUUM_OVEN…
APCVD
NANOWIZARD
ALD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
CEITEC-NANO
VERSALAB
TUBE-FURNACE
CLR-ISO8-Lab…
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CLARUS-680
GLOVEBOX
PECVD
DSC-DISCOVERY
PROTOMAT
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
LABOTOM5
ARES
LPCVD-SiN
CITOPRESS
NANOSCAN
NIRQUEST512
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
LAKESHORE
LPCVD-polySi
TEGRAMIN
FISCHIONE-TEM…
VNA-MPI
PECVD-NANOFAB
FRASCAN
NANOINDENTER
CHEMLAB-B1.18
IS_NOVOCONTROL
ZEISS-STAN
KAUFMAN
LITESCOPE-MIRA…
IR-RAMAN
K70
R2-PECVD
LASER-DICER
LAURELL-NANO
LIBS-Discovery
LIBS-LabSys1
UV-LASER
Citterberg, Daniel
Niapos, Eleftherios
Niapos, Eleftherios
Citterberg, Daniel
Hrůza, Dominik
U Danchuk, Viktor
Molnár, Tomáš
Varga, Dominik
Varga, Dominik
Varga, Dominik
U Danchuk, Viktor
Hrůza, Dominik
S Danchuk, Viktor
Citterberg, Daniel
Niapos, Eleftherios
Niapos, Eleftherios
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Mařák, Vojtěch
Havlíková, Tereza
Ščasnovič, Erik
Hrůza, Dominik
U Danchuk, Viktor
Hrůza, Dominik
Mařáková, Lucie
Paredes Sánchez, Claudia
Dubroka, Adam
Žižka, Rudolf
paiva de araujo, Estacio
U Gablech, Evelína
U Jewula, Pawel
Jewula, Pawel
Jadhao, Pranjali
U Kicmerova, Dina
U Kolíbalová, Eva
B Kolíbalová, Eva
Yuan, Yunhuan
Bednaříková, Vendula
U Jewula, Pawel
Lee, Hyesung
Andres Navarro Giraldo, Jorge
Niapos, Eleftherios
Hrůza, Dominik
U Danchuk, Viktor
Andres Navarro Giraldo, Jorge
Niapos, Eleftherios
Andres Navarro Giraldo, Jorge
Andres Navarro Giraldo, Jorge
Blahová, Lucie
T Nebojsa, Alois
Natarajan, Senthil Nathan
Mařáková, Lucie
paiva de araujo, Estacio
Pavliňák, David
Kalleshappa, Bindu
Lee, Hyesung
U Jewula, Pawel
Michlovská, Lenka
S Danchuk, Viktor
S Michalička, Jan
Lee, Hyesung
U Eliáš, Marek
Lee, Hyesung
Fu, Hongbo
Arregi Uribeetxebarria, Jon Ander
Krčma, Jakub
Klok, Pavel
Lukiienko, Iryna
Klok, Pavel
U Danchuk, Viktor
Natarajan, Senthil Nathan
Citterberg, Daniel
Lukiienko, Iryna
Jewula, Pawel
Lukiienko, Iryna
Blahová, Lucie
U Danchuk, Viktor
U Danchuk, Viktor
Niapos, Eleftherios
U Danchuk, Viktor
Janůšová, Martina
U Danchuk, Viktor
Lukiienko, Iryna
U Danchuk, Viktor
Zikmundová, Eva

Upcoming trainings

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Term Name Description Max. attendees
16.9. 09:00 - 11:30 BET training: Degassing (1/2) Degassing of the sample (1/2) Attendees: Vendula Bednaříková, Nikhil Thekkedath Madhu 4
16.9. 09:00 - 17:00 Helios_basic (1/2) Helios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot (only) for the Helios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Rostislav Řepa, Pavlína Šárfy, Konstantin Iakoubovskii 3
16.9. 11:30 - 15:00 BET training: measurement (2/2) Standard measurement Attendees: Vendula Bednaříková, Nikhil Thekkedath Madhu 4
16.9. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Eduard Jelínek, Amirmohsen Fanisaberi, Franz Vilsmeier, Fabian Majcen, Gyandeep Pradhan, Kryštof Jasenský, Konstantin Iakoubovskii, Serhii Tkachenko, Zdenka Skálová 7
16.9. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Viktor Bajo, Eduard Jelínek, Nicole Rusnaková, Kryštof Matějka, Kryštof Jasenský 5
16.9. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Viktor Bajo, Amirmohsen Fanisaberi, Franz Vilsmeier, Fabian Majcen, Gyandeep Pradhan, Nicole Rusnaková, Karan Singh Surana, Kryštof Matějka, Kryštof Jasenský, Serhii Tkachenko 10
16.9. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Viktor Bajo, Amirmohsen Fanisaberi, Franz Vilsmeier, Fabian Majcen, Gyandeep Pradhan, Kryštof Matějka, Kryštof Jasenský, Lucie Žaloudková, Serhii Tkachenko 10
16.9. 15:00 - 15:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Franz Vilsmeier, Fabian Majcen, Gyandeep Pradhan 5
16.9. 15:00 - 15:25 Safety excursion - Nanocharacterization lab Attendees: Eduard Jelínek, Konstantin Iakoubovskii, Lucie Žaloudková 10
18.9. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your cleanroom stationery set if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Iryna Lukiienko, Amirmohsen Fanisaberi, Grigory Mathew, Konstantin Iakoubovskii 3
19.9. 09:00 - 10:30 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Grigory Mathew 1
19.9. 10:30 - 12:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. Attendees: Amirmohsen Fanisaberi 1
19.9. 12:30 - 14:00 Verios_basic (2/2) Verios_basic (2/2): hands-on session. Bring your real sample(s) with you. 1
26.9. 09:00 - 13:00 Rigaku 3 Hands On Hands On Bindu Attendees: Bindu Kalleshappa, Konstantin Iakoubovskii 1
26.9. 13:30 - 17:00 Renewal-hands on Hands on - Anna Jančík-Procházková Attendees: Anna Jančík Procházková 1
13.10. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. ID schůzky: 335 320 341 298 0 Přístupový kód: f7zZ6od6 5
14.10. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
14.10. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
14.10. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
14.10. 14:25 - 14:55 Safety excursion - StAn lab 10