Wednesday 9.7.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
ML3-BABY
RIE-FLUORINE
MIRA-STAN
CRYOGENIC
RAITH
VERIOS
UHV-XPS
RIGAKU9
BET-ANAMET
KRATOS-XPS
VERSALAB
UHV-SPM
LAKESHORE
IS_NOVOCONTROL
UHV-DEPOSITION
CLARUS-680
LYRA
HELIOS
UHV-LEEM
KERR-MICROSCOPE
UHV-PREPARATION
MIRA-EBL
DHR
BRILLOUIN
RIGAKU3
VNA-MPI
LASER-DICER
FUMEHOOD…
DIENER
TITAN
TUBE-FURNACE
NANOSCAN
BET-DEGASSER
SIMS
SHAKER…
LaserMIRA
STEMI
SEE-SYSTEM
SUMMIT
NANOCALC
MPS150
PARYLENE-SCS
ACCURION_RSE
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
SUSS-RCD8
ICON-SPM
RIE-CHLORINE
MINIFLEX
nanoCT
RSA
SW-LAB
SNOM-NANONICS
TERS
SW-BEAMER
TEST-RFID2
SW-TRACER
CITOVAC
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM_OVEN-B1…
UHV-PLD
VUVAS
VISCOMETER
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
ULTRAFAST-LASER
UHV-MBE
LEICA-TXP
3D-PRUSA-ORANGE
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
Test O1
TEST2
Test školení
TGA96
UHV-LEIS
THEORY-SUPPORT
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-FTIR
PARYLENE-DIENER
MONOWAVE
3D-PRUSA-BLACK
FTIRMAG
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
FLOWBOX
4-POINT
FUMEHOOD…
DIMPLING…
FUMEHOOD-HF
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
DAWN-HELEOS
GLOVEBOX
TEGRAMIN
DRYING_OVEN-B1…
DRIE
LEICACOAT-NANO
CEITEC-NANO
APCVD
NANOWIZARD
ALD
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
MECHANICAL…
CLR-ISO8-Lab…
SW-CT
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CRYOMILL
PECVD-NANOFAB
FRASCAN
3D-PRUSA-BLUE
DSC-DISCOVERY
HENRY-MAGNET
MAGNETRON
SUSS-MA8
DEKTAK
MOCVD
LABOTOM5
WOOLLAM-MIR
ARES
PROTOMAT
CITOPRESS
NANOSAM
NIRQUEST512
WOOLLAM-VIS
NMR
ZEISS-NANO
ULTRACENTRIFUGE
LVEM
LPCVD-SiN
NANOINDENTER
IR-RAMAN
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
K70
LPCVD-polySi
KEITHLEY-4200
R2-PECVD
LAURELL-NANO
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
LITESCOPE-MIRA…
ZETASIZER
Baeva, Maria
Kunc, Jan
Danylchenko, Petro
Danylchenko, Petro
Mendoza Sandoval, Elizabeth
Baeva, Maria
Baeva, Maria
Danylchenko, Petro
Danylchenko, Petro
Baeva, Maria
Danylchenko, Petro
Danylchenko, Petro
Kicmerova, Dina
Havlíková, Tereza
Iryna, Sliusar
Klíma, Jan
Delforge, Cyril
Mendoza Sandoval, Elizabeth
T Kicmerova, Dina
Fallahpour, Mojdeh
Hrůza, Dominik
Hrůza, Dominik
Varshney, Devanshu
Novák, Jiří
E Tmejová, Kateřina
Lee, Hyesung
Bednaříková, Vendula
Tahsin, Muhammad
Niapos, Eleftherios
Hrůza, Dominik
Holcman, Vladimír
T Sobola, Dinara
Hrůza, Dominik
T Tinoco Navarro, Lizeth Katherine
Kramář, Jan
Bahadur, Fateh
David, Jiří
Delforge, Cyril
David, Jiří
Kunc, Jan
T Lepcio, Petr
Delforge, Cyril
Kumari, Archana
Klíma, Jan
Kolář, Richard
Danylchenko, Petro
Mendoza Sandoval, Elizabeth
S Michalička, Jan
Kepič, Peter
Kovařík, Martin
Lee, Hyesung

Upcoming trainings

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Term Name Description Max. attendees
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
8.7. 10:00 - 11:30 SUSS RCD8 training training of the new user Attendees: Maria Baeva, Amirmohsen Fanisaberi 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
9.7. 13:30 - 15:00 DRS basic training Training will give you knowledge about how to: Operate the measurement system confidently. Prepare appropriate samples for dielectric testing. Attendees: Bindu Kalleshappa, Hongbo Fu 2
10.7. 13:30 - 15:00 SUSS Wetbech training Training of the new user Attendees: Martino Pistis 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Jiří Hájek, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh, Jiří Hájek 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas, Jiří Hájek 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10